专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6143083A Substrate transferring mechanism 有权
标题翻译：基板转移机制
公开(公告)号：US6143083A
公开(公告)日：2000-11-07
申请号：US453031
申请日：1999-12-02
申请人： Shuji Yonemitsu , Toshikazu Karino , Hisashi Yoshida , Shinichiro Watahiki , Yuji Yoshida , Hideo Shimura , Takeshi Sugimoto , Yukinori Aburatani , Kazuhito Ikeda
发明人： Shuji Yonemitsu , Toshikazu Karino , Hisashi Yoshida , Shinichiro Watahiki , Yuji Yoshida , Hideo Shimura , Takeshi Sugimoto , Yukinori Aburatani , Kazuhito Ikeda
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67781 , H01L21/67103 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/67742 , H01L21/67745 , H01L21/67754 , H01L21/67766 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.
摘要翻译：衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持架; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

2. 发明授权

US6066210A Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section 失效
标题翻译：具有处理室，传送室，中间保持室和大气压部的基板处理装置
公开(公告)号：US6066210A
公开(公告)日：2000-05-23
申请号：US692461
申请日：1996-08-05
申请人： Shuji Yonemitsu , Toshikazu Karino , Hisashi Yoshida , Shinichiro Watahiki , Yuji Yoshida , Hideo Shimura , Takeshi Sugimoto , Yukinori Aburatani , Kazuhito Ikeda
发明人： Shuji Yonemitsu , Toshikazu Karino , Hisashi Yoshida , Shinichiro Watahiki , Yuji Yoshida , Hideo Shimura , Takeshi Sugimoto , Yukinori Aburatani , Kazuhito Ikeda
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67781 , H01L21/67103 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/67742 , H01L21/67745 , H01L21/67754 , H01L21/67766 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.
摘要翻译：衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持件; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

3. 发明授权

US5788447A Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US5788447A
公开(公告)日：1998-08-04
申请号：US691946
申请日：1996-08-05
申请人： Shuji Yonemitsu , Toshikazu Karino , Hisashi Yoshida , Shinichiro Watahiki , Yuji Yoshida , Hideo Shimura , Takeshi Sugimoto , Yukinori Aburatani , Kazuhito Ikeda
发明人： Shuji Yonemitsu , Toshikazu Karino , Hisashi Yoshida , Shinichiro Watahiki , Yuji Yoshida , Hideo Shimura , Takeshi Sugimoto , Yukinori Aburatani , Kazuhito Ikeda
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67781 , H01L21/67103 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/67742 , H01L21/67745 , H01L21/67754 , H01L21/67766 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A substrate processing apparatus comprises a substrate transfer chamber; a plurality of substrate processing chambers disposed on a first side wall of the substrate transfer chamber and stacked in the vertical direction; a plurality of first gate valves, each being disposed between each of the substrate processing chambers and the substrate transfer chamber; a substrate accommodating chamber disposed on a second side wall of the substrate transfer chamber; a substrate transfer device, disposed within the substrate transfer chamber, for transferring the substrate under reduced pressure between the substrate processing chambers and the substrate accommodating chamber; an elevator disposed outside the substrate transfer chamber and comprising a stationary portion and an elevating portion which is vertically movable with respect to the stationary portion; a rigid connecting member capable of moving through a through-hole formed in a predetermined face of the substrate transfer chamber, the rigid connecting member mechanically connecting the elevating portion and the substrate transfer device through the through-hole; and a sealing member for establishing a hermetic vacuum seal between the predetermined surface and the connecting member which penetrates through the through-hole.
摘要翻译：衬底处理设备包括衬底传送室; 多个基板处理室，设置在所述基板输送室的第一侧壁上，并且在垂直方向上堆叠; 多个第一闸阀，各自设置在每个基板处理室和基板传送室之间; 设置在所述基板传送室的第二侧壁上的基板容纳室; 衬底传送装置，设置在衬底传送室内，用于在衬底处理室和衬底容纳室之间在减压下传送衬底; 设置在所述基板传送室的外侧的电梯，其包括固定部和相对于所述固定部垂直移动的升降部; 刚性连接构件，其能够移动通过形成在所述基板传送室的预定面中的通孔，所述刚性连接构件通过所述通孔机械地连接所述升降部分和所述基板传送装置; 以及密封构件，用于在预定表面和穿过通孔的连接构件之间建立密封的真空密封。

4. 发明授权

US06190104B1 Treatment object conveyor apparatus, semiconductor manufacturing apparatus, and treatment object treatment method 有权
标题翻译：处理对象输送装置，半导体制造装置及处理对象处理方法
公开(公告)号：US06190104B1
公开(公告)日：2001-02-20
申请号：US09326673
申请日：1999-06-07
申请人： Kazuhito Ikeda , Shinichiro Watahiki , Hisashi Yoshida , Yukinori Aburatani
发明人： Kazuhito Ikeda , Shinichiro Watahiki , Hisashi Yoshida , Yukinori Aburatani
IPC分类号： B65G4907
CPC分类号： H01L21/67742 , H01L21/67757 , Y10S414/139
摘要： A method and apparatus for conveying a treatment object whereby a drive unit for driving a treatment object conveyor robot is deployed inside a vacuum chamber. The robot comprises a conveyor arm and a drive unit. The conveyor arm is accommodated outside an airtight vessel and the drive unit is accommodated inside the airtight vessel to avoid damage to the drive unit. In order to raise and lower the robot inside the chamber, an elevator mechanism, deployed outside the chamber, advances and retracts a shaft that is inserted in an airtight manner into the chamber. The airtight structure is secured by O rings provided where a bellows surrounds the shaft and connects to the chamber and the elevator mechanism. The shaft, inserted inside the chamber, is linked to the airtight vessel that accommodates the drive unit of the robot. The airtight vessel communicates to the outside via a hollow portion in the shaft and the interior thereof is always kept at atmospheric pressure.
摘要翻译：一种用于输送处理物体的方法和装置，由此用于驱动处理物体输送机器人的驱动单元部署在真空室内。机器人包括传送臂和驱动单元。输送臂被容纳在密封容器的外部，并且驱动单元容纳在密封容器的内部，以避免损坏驱动单元。为了升高和降低腔室内的机器人，布置在腔室外部的电梯机构使以气密方式插入腔室的轴前进和后退。气密结构由设置在波纹管围绕轴并连接到腔室和升降机构的O形环固定。插入室内的轴连接到容纳机器人的驱动单元的气密容器。气密容器通过轴中的中空部分与外部连通，其内部总是保持在大气压力。

5. 发明申请

US20060075972A1 Substrate processing apparatus and substrate processing method 审中-公开
公开(公告)号：US20060075972A1
公开(公告)日：2006-04-13
申请号：US11258670
申请日：2005-10-25
申请人： Seiyo Nakashima , Michiko Nishiwaki , Yukinori Aburatani , Satoshi Okada , Eisuke Nishitani , Kazuhiro Nakagomi , Kazuhito Ikeda , Kazuhiro Shimeno , Gakuji Ohta , Katsuhisa Kasanami
发明人： Seiyo Nakashima , Michiko Nishiwaki , Yukinori Aburatani , Satoshi Okada , Eisuke Nishitani , Kazuhiro Nakagomi , Kazuhito Ikeda , Kazuhiro Shimeno , Gakuji Ohta , Katsuhisa Kasanami
IPC分类号： C23C16/00
CPC分类号： H01L21/68721 , C23C16/4584 , C23C16/46 , H01J2237/2005 , H01J2237/32 , H01L21/67109 , H01L21/68742 , H01L21/68785 , H01L21/68792
摘要： A substrate processing apparatus comprises a processing chamber; a susceptor on which a substrate to be processed is to be placed; and a heating unit disposed below the susceptor for heating the substrate to be processed placed on the susceptor. The susceptor and the heating unit are accommodated in the processing chamber, and in a state in which the susceptor and the heating unit are relatively rotated, the substrate to be processed is processed. At least the susceptor is lifted and lowered in the processing chamber, and a substrate to be processed lifting and lowering apparatus for lifting and lowering the substrate to be processed with respect to at least a portion of the susceptor is disposed in the processing chamber.

6. 发明授权

US08876453B2 Substrate processing apparatus and method of manufacturing semiconductor device 有权
标题翻译：基板处理装置及半导体装置的制造方法
公开(公告)号：US08876453B2
公开(公告)日：2014-11-04
申请号：US13004495
申请日：2011-01-11
申请人： Yukinori Aburatani , Masakazu Shimada , Osamu Morita
发明人： Yukinori Aburatani , Masakazu Shimada , Osamu Morita
IPC分类号： H01L21/31 , H01L21/67
CPC分类号： H01L21/67109
摘要： A substrate processing apparatus suppresses vibration of a cover when unloading a boat from a process pipe. The apparatus comprises a boat for placing a substrate, a process pipe configured to accommodate the boat, a cover having the boat placed thereon, the cover configured to open and close a furnace port installed on a lower end of the process pipe, a motor to drive an elevation mechanism which moves the cover upward and downward, a sealing member to seal a space between the cover and the process pipe, and a controller to control motor speed and limit motor torque while the cover moves from the furnace port to a predetermined position. The substrate is maintained at a rest position in the boat during a recovery from a deformation of the cover occurring when separating the sealing member from the cover surface or the process pipe surface.
摘要翻译：基板处理装置在从处理管卸载船时抑制盖的振动。该装置包括用于放置基板的船，配置成容纳船的加工管，具有放置在其上的船的盖，盖构造成打开和关闭安装在加工管的下端的炉口，马达驱动上下移动盖的升降机构，用于密封盖和加工管之间的空间的密封构件，以及控制器，当盖从炉口移动到预定位置时控制马达速度并限制马达扭矩。在将密封构件从盖表面或工艺管表面分离时，在从盖的变形恢复期间，基板保持在船的静止位置。

7. 外观设计

USD651990S1 Semiconductor manufacturing equipment 有权
公开(公告)号：USD651990S1
公开(公告)日：2012-01-10
申请号：US29371214
申请日：2010-11-29
申请人： Masakazu Shimada , Takashi Nogami , Satoshi Aizawa , Seiyo Nakashima , Tomoyuki Yamada , Shinobu Sugiura , Yukinori Aburatani , Mitsuhiro Nagata
设计人： Masakazu Shimada , Takashi Nogami , Satoshi Aizawa , Seiyo Nakashima , Tomoyuki Yamada , Shinobu Sugiura , Yukinori Aburatani , Mitsuhiro Nagata

8. 发明申请

US20130012035A1 Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device 有权
标题翻译：基板处理装置及制造半导体装置的方法
公开(公告)号：US20130012035A1
公开(公告)日：2013-01-10
申请号：US13536128
申请日：2012-06-28
申请人： Yukinori Aburatani , Toshiya Shimada , Kenji Shinozaki , Tomihiro Amano , Hiroshi Ashihara , Hidehiro Yanai , Masahiro Miyake , Shin Hiyama
发明人： Yukinori Aburatani , Toshiya Shimada , Kenji Shinozaki , Tomihiro Amano , Hiroshi Ashihara , Hidehiro Yanai , Masahiro Miyake , Shin Hiyama
IPC分类号： H01L21/26
CPC分类号： H01L21/67115 , C23C16/481 , F27B5/14 , F27B17/0025 , F27D2009/0056 , H01L21/324 , H05B3/0047 , H05B3/08
摘要： A substrate processing apparatus capable of increasing the life span of a lamp for heating a substrate is provided. The substrate processing apparatus includes: a light receiving chamber for processing a substrate; a substrate support unit inside the light receiving chamber; a lamp including an electrical wire, and a seal accommodating the electrical wire to hermetically seal the lamp with a gas therein, the lamp irradiating the substrate with a light; a lamp receiving unit outside the light receiving chamber to accommodate the lamp therein, the lamp receiving unit including a lamp connector connected to the lamp to supply an electric current through the electrical wire, a heat absorption member including a material having a thermal conductivity higher than that of the seal, and a base member fixing the heat absorption member; and an external electrical wire connected to the lamp connector to supply current to the lamp connector.
摘要翻译：提供了能够增加用于加热基板的灯的寿命的基板处理装置。基板处理装置包括：用于处理基板的光接收室; 光接收室内的基板支撑单元; 包括电线的灯和容纳所述电线以密封所述灯的密封件的密封件，所述灯用光照射所述基板; 在所述光接收室外部的灯接收单元，用于容纳所述灯，所述灯接收单元包括连接到所述灯的灯连接器以通过所述电线提供电流;吸热构件，其包括导热率高于密封件的固定件和固定吸热件的基件; 以及连接到灯连接器以向灯连接器提供电流的外部电线。

9. 发明授权

US08814488B2 Substrate processing apparatus and semiconductor device manufacturing method 有权
标题翻译：基板加工装置及半导体装置的制造方法
公开(公告)号：US08814488B2
公开(公告)日：2014-08-26
申请号：US12078513
申请日：2008-04-01
申请人： Yukinori Aburatani
发明人： Yukinori Aburatani
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , H01L21/67772 , H01L21/67775
摘要： A substrate processing apparatus comprises a storage container for storing multiple substrates and whose substrate loading and unloading opening is sealed by a lid, a load port for placing the storage container, an attaching and detaching device for attaching and detaching the lid on the substrate loading and unloading opening in the load port, a first placement unit for mounting the storage container in the load port and moving away from and near the attaching and detaching device, and a second placement unit provided separately from the first placement unit, for mounting the storage container in the load port and moving up and down relative to the attaching and detaching device.
摘要翻译：基板处理装置包括用于存储多个基板的存储容器，其基板装载和卸载开口由盖子密封，用于放置存储容器的装载端口，用于将盖子附接和拆卸在基板装载上的安装和拆卸装置，以及卸载开口;第一放置单元，用于将存储容器安装在装载端口中并移动离开安装和拆卸装置;以及第二放置单元，与第一放置单元分开设置，用于安装存储容器在装载端口上相对于安装和拆卸装置上下移动。

10. 发明授权

US07700054B2 Substrate processing apparatus having gas side flow via gas inlet 有权
标题翻译：具有通过气体入口的气体侧流动的基板处理装置
公开(公告)号：US07700054B2
公开(公告)日：2010-04-20
申请号：US11987493
申请日：2007-11-30
申请人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Yukinori Aburatani , Tomoyuki Yamada , Seiyo Nakashima , Masashi Sugishita
发明人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Yukinori Aburatani , Tomoyuki Yamada , Seiyo Nakashima , Masashi Sugishita
IPC分类号： H01L21/00 , B01J19/00 , F27B5/14
CPC分类号： H01L21/67109 , F27B17/0025
摘要： An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.
摘要翻译：本发明的目的是提高基板处理效率。基板处理装置具有处理内部的基板的反应管和设置成围绕反应管的外周的加热装置，使得至少一个气体入口管设置在其中的在反应管内加工基板，加热装置具有围绕反应管的绝热体，从加热装置的下端形成为绝热体的槽状的入口开口，以避免气体入口管和设置在隔热件和反应管之间的加热元件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式