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1. 发明申请

US20070146961A1 ELECTROSTATIC CHUCK 审中-公开
标题翻译：静电卡
公开(公告)号：US20070146961A1
公开(公告)日：2007-06-28
申请号：US11611905
申请日：2006-12-18
申请人： Ikuhisa Morioka , Hideyoshi Tsuruta , Tetsuya Kawajiri , Takeru Torigoe
发明人： Ikuhisa Morioka , Hideyoshi Tsuruta , Tetsuya Kawajiri , Takeru Torigoe
IPC分类号： H01L21/683
CPC分类号： H02N13/00 , H01L21/6831 , H01L21/6875
摘要： An electrostatic chuck includes: a base body; an electrode formed on the base body and generating coulomb force; and a dielectric layer formed on the base body and electrode, having a plurality of projections on a first main face on the side supporting a substrate attracted by the coulomb force, and supporting the substrate on the upper surfaces of these projections. The projections are arranged at substantially uniform intervals. The surface roughness (Ra) of the projection upper faces is 0.5 μm or smaller. The height of the projections is 5 to 20 μm. The relation A1/2×B2>200 is satisfied where A (number/100 cm2) is the number of the projections per unit area of 100 cm2 in the first main face, and B (μm) is the height of the projections.
摘要翻译：静电卡盘包括：基体; 形成在基体上并产生库仑力的电极; 以及形成在基体和电极上的电介质层，在支撑被库仑力吸引的基板的一侧的第一主面上具有多个突起，并且将基板支撑在这些突起的上表面上。突起以大致均匀的间隔布置。投影面的表面粗糙度（Ra）为0.5μm以下。突起的高度为5至20毫米。满足关系A <1/2>×B <2> 200，其中A（数/ 100cm 2）是每单位的突起数第一主面的面积为100cm 2，B（mum）是突起的高度。

2. 发明授权

US06728091B2 Electrostatic adsorption device 有权
标题翻译：静电吸附装置
公开(公告)号：US06728091B2
公开(公告)日：2004-04-27
申请号：US10157774
申请日：2002-05-29
申请人： Hideyoshi Tsuruta , Masahito Eguchi , Tetsuya Kawajiri , Ikuhisa Morioka
发明人： Hideyoshi Tsuruta , Masahito Eguchi , Tetsuya Kawajiri , Ikuhisa Morioka
IPC分类号： H02N1300
CPC分类号： H01L21/6833 , Y10T279/23 , Y10T428/31663 , Y10T428/31721 , Y10T428/31938
摘要： An electrostatic adsorption device has a dielectric layer, electrodes, a cooling member and an insulating adhesive. The dielectric layer is made of a ceramic dielectric material and has an adsorption face and a back face. The electrodes are provided on the back face of the dielectric layer and gaps are defined between the portions of the electrodes. The insulating adhesive is provided between the back face of the dielectric layer and the cooling member. The insulating adhesive covers the electrodes and the back face and is provided in the gaps.
摘要翻译：静电吸附装置具有电介质层，电极，冷却构件和绝缘粘合剂。电介质层由陶瓷电介质材料制成，具有吸附面和背面。电极设置在电介质层的背面，间隙限定在电极部分之间。绝缘粘合剂设置在电介质层的背面和冷却部件之间。绝缘粘合剂覆盖电极和背面并设置在间隙中。

3. 发明授权

US08136820B2 Electrostatic chuck with heater and manufacturing method thereof 有权
标题翻译：带加热器的静电吸盘及其制造方法
公开(公告)号：US08136820B2
公开(公告)日：2012-03-20
申请号：US11841172
申请日：2007-08-20
申请人： Ikuhisa Morioka , Kazuhiro Nobori , Tetsuya Kawajiri , Akiyoshi Hattori
发明人： Ikuhisa Morioka , Kazuhiro Nobori , Tetsuya Kawajiri , Akiyoshi Hattori
IPC分类号： B23B31/28 , H01L21/683
CPC分类号： H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck with a heater includes: a base formed of a sintered body containing alumina; an ESC electrode provided in an upper portion side in the base; and a resistance heating body embedded in a lower portion side in the base. The base is composed of a dielectric layer from the ESC electrode to an upper surface of the base, and of a support member from the ESC electrode to a lower surface of the base. In the support member, a carbon content differs between an ESC electrode neighborhood in contact with the dielectric layer and a lower region below the ESC electrode neighborhood, a carbon content in the dielectric layer is 100 wt ppm or less, the carbon content in the ESC electrode neighborhood is 0.13 wt % or less, the carbon content in the lower region is 0.03 wt % or more and 0.5 wt % or less, and the carbon content in the ESC electrode neighborhood is smaller than the carbon content in the lower region. The resistance heating body contains niobium or platinum.
摘要翻译：具有加热器的静电卡盘包括：由含有氧化铝的烧结体形成的基体; 设置在所述基座的上部侧的ESC电极; 以及嵌入基座的下部侧的电阻加热体。基体由从ESC电极到基底的上表面的电介质层和从ESC电极到基底的下表面的支撑构件构成。在支撑构件中，与电介质层接触的ESC电极附近和ESC电极附近的下部区域之间的碳含量不同，电介质层中的碳含量为100重量ppm以下，ESC中的碳含量电极附近为0.13重量％以下，下部区域的碳含量为0.03重量％以上且0.5重量％以下，ESC电极附近的碳含量低于下部区域的碳含量。电阻加热体包含铌或铂。

4. 发明申请

US20080049374A1 ELECTROSTATIC CHUCK WITH HEATER AND MANUFACTURING METHOD THEREOF 有权
标题翻译：带加热器的静电卡盘及其制造方法
公开(公告)号：US20080049374A1
公开(公告)日：2008-02-28
申请号：US11841172
申请日：2007-08-20
申请人： Ikuhisa Morioka , Kazuhiro Nobori , Tetsuya Kawajiri , Akiyoshi Hattori
发明人： Ikuhisa Morioka , Kazuhiro Nobori , Tetsuya Kawajiri , Akiyoshi Hattori
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck with a heater includes: a base formed of a sintered body containing alumina; an ESC electrode provided in an upper portion side in the base; and a resistance heating body embedded in a lower portion side in the base. The base is composed of a dielectric layer from the ESC electrode to an upper surface of the base, and of a support member from the ESC electrode to a lower surface of the base. In the support member, a carbon content differs between an ESC electrode neighborhood in contact with the dielectric layer and a lower region below the ESC electrode neighborhood, a carbon content in the dielectric layer is 100 wt ppm or less, the carbon content in the ESC electrode neighborhood is 0.13 wt % or less, the carbon content in the lower region is 0.03 wt % or more but 0.5 wt % or less, and the carbon content in the ESC electrode neighborhood is smaller than the carbon content in the lower region. The resistance heating body contains niobium or platinum.
摘要翻译：具有加热器的静电卡盘包括：由含有氧化铝的烧结体形成的基体; 设置在所述基座的上部侧的ESC电极; 以及嵌入基座的下部侧的电阻加热体。基体由从ESC电极到基体的上表面的电介质层和从ESC电极到基底的下表面的支撑体构成。在支撑构件中，与电介质层接触的ESC电极附近和ESC电极附近的下部区域之间的碳含量不同，电介质层中的碳含量为100重量ppm以下，ESC中的碳含量电极附近为0.13重量％以下，下部区域的碳含量为0.03重量％以上且0.5重量％以下，ESC电极附近的碳含量低于下部区域的碳含量。电阻加热体包含铌或铂。

5. 发明授权

US07067200B2 Joined bodies and a method of producing the same 有权
标题翻译：结合体及其生产方法
公开(公告)号：US07067200B2
公开(公告)日：2006-06-27
申请号：US10623052
申请日：2003-07-18
申请人： Tomoyuki Fujii , Hideyoshi Tsuruta , Tetsuya Kawajiri
发明人： Tomoyuki Fujii , Hideyoshi Tsuruta , Tetsuya Kawajiri
IPC分类号： B32B7/04 , B32B7/10 , B32B15/04 , B23K35/26 , B23K101/36
CPC分类号： B23K35/26 , B32B15/04 , B32B18/00 , B32B2309/022 , B32B2311/24 , C04B35/6455 , C04B37/006 , C04B37/023 , C04B37/026 , C04B2235/6567 , C04B2235/6581 , C04B2235/96 , C04B2237/12 , C04B2237/122 , C04B2237/125 , C04B2237/343 , C04B2237/346 , C04B2237/366 , C04B2237/368 , C04B2237/40 , C04B2237/402 , C04B2237/405 , C04B2237/406 , C04B2237/407 , C04B2237/408 , C04B2237/62 , C04B2237/68 , C04B2237/704 , C04B2237/706 , C04B2237/708 , C04B2237/72 , Y10T428/12396 , Y10T428/12528 , Y10T428/12535 , Y10T428/12681 , Y10T428/12708
摘要： A joined body and method of producing the joined body are provided. A first member containing at least a ceramic and a second member containing at least one of a metal and a metal composite are joined with each other via a metal adhesive. The metal adhesive contains at least indium and at least one material containing at least a component capable of reducing the melting point of indium and is provided between the first and second members to provide a laminate. The laminate is heated at a temperature in a solid-liquid coexisting range of an alloy comprising indium and the indium melting point reducing component to join the first and second members.
摘要翻译：提供一种接合体及其制造方法。含有至少陶瓷的第一构件和含有金属和金属复合物中的至少一种的第二构件通过金属粘合剂相互连接。金属粘合剂至少含有铟和至少一种至少含有能够降低铟的熔点的成分的材料，并且设置在第一和第二构件之间以提供层压体。将层压体在包含铟和铟熔点降低组分的合金的固液共存范围内加热，以使第一和第二构件接合。

6. 发明申请

US20060213900A1 Electrostatic chuck and method of manufacturing electrostatic chuck 审中-公开
标题翻译：静电吸盘及制造静电吸盘的方法
公开(公告)号：US20060213900A1
公开(公告)日：2006-09-28
申请号：US11386222
申请日：2006-03-22
申请人： Hiroto Matsuda , Kazuhiro Nobori , Yasuyoshi Imai , Tetsuya Kawajiri
发明人： Hiroto Matsuda , Kazuhiro Nobori , Yasuyoshi Imai , Tetsuya Kawajiri
IPC分类号： H05B3/68
CPC分类号： H02N13/00 , H01L21/6833 , H05B3/143
摘要： An electrostatic chuck includes, a base plate made of ceramic, an electrode for generating an electrostatic clamping force, and a dielectric material layer formed on the electrode and made of ceramic having a volume resistivity of not less than 1×1015 Ω·cm at 100° C. and the same main constituent as the base plate. The base plate has a higher thermal conductivity than the dielectric material layer.
摘要翻译：静电吸盘包括：由陶瓷制成的基板，用于产生静电夹持力的电极和形成在电极上并由体积电阻率不小于1×10 15 /℃的陶瓷制成的介电材料层 > 100℃时的Omeg·cm，与基板相同的主要成分。基板具有比介电材料层更高的热导率。

7. 发明授权

US06292346B1 Equipment for holding a semiconductor wafer, a method for manufacturing the same, and a method for using the same 有权
标题翻译：用于保持半导体晶片的设备及其制造方法及其使用方法
公开(公告)号：US06292346B1
公开(公告)日：2001-09-18
申请号：US09357395
申请日：1999-07-20
申请人： Masashi Ohno , Hirokazu Ichikawa , Naohito Yamada , Tetsuya Kawajiri
发明人： Masashi Ohno , Hirokazu Ichikawa , Naohito Yamada , Tetsuya Kawajiri
IPC分类号： H02N1300
CPC分类号： H01L21/67103 , H01L21/6831 , H02N13/00 , Y10T29/49002
摘要： A semiconductor wafer-holder having a member for holding the semiconductor wafer with a basic member made of a ceramic nitride, a cooling equipment made of a metal, and an intervened layer between the semiconductor wafer-holding member and the cooling equipment, the intervened layer being composed of a metallic foil or a carbon sheet having a thickness of not more than 500 &mgr;m.
摘要翻译：一种半导体晶片保持器，其具有用于将半导体晶片保持为具有由陶瓷氮化物制成的基本构件的部件，由金属制成的冷却设备以及在半导体晶片保持构件和冷却设备之间的介入层，所述介入层由金属箔或厚度不大于500μm的碳片组成。

8. 发明申请

US20050152089A1 Electrostatic chuck and manufacturing method for the same, and alumina sintered member and manufacturing method for the same 有权
标题翻译：静电卡盘及其制造方法相同，氧化铝烧结体及其制造方法相同
公开(公告)号：US20050152089A1
公开(公告)日：2005-07-14
申请号：US11021742
申请日：2004-12-23
申请人： Hiroto Matsuda , Kazuhiro Nobori , Yasuyoshi Imai , Tetsuya Kawajiri
发明人： Hiroto Matsuda , Kazuhiro Nobori , Yasuyoshi Imai , Tetsuya Kawajiri
IPC分类号： C04B35/111 , H01L21/68 , H01L21/683 , H02N13/00 , H02H1/00
CPC分类号： H02N13/00 , H01L21/6833 , Y10T279/23
摘要： An electrostatic chuck comprises a dielectric ceramic layer made of an alumina sintered body having a volume resistivity equal to or greater than about 1×1017Ω·cm at room temperature and a volume resistivity equal to or greater than about 1×1014Ω·cm at 300° C., and an electrode formed on one surface of the dielectric ceramic layer.
摘要翻译：静电卡盘包括由室温下体积电阻率等于或大于约1×10 17Ω·cm的氧化铝烧结体制成的电介质陶瓷层，体积电阻率等于或大于约1×10 3 在300℃下的电导率为14Ω·cm，电介质陶瓷层的一个表面上形成电极。

9. 发明授权

US07848075B2 Electrostatic chuck with heater 有权
标题翻译：带加热器的静电吸盘
公开(公告)号：US07848075B2
公开(公告)日：2010-12-07
申请号：US11777318
申请日：2007-07-13
申请人： Kazuhiro Nobori , Tetsuya Kawajiri , Akiyoshi Hattori
发明人： Kazuhiro Nobori , Tetsuya Kawajiri , Akiyoshi Hattori
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , H01L21/68757
摘要： An electrostatic chuck with a heater including: a base which is composed of a sintered body containing alumina, an electrode disposed in an upper part of the base, and a resistance heating element embedded in a lower part of the base. The base includes a dielectric layer between the electrode and an upper surface of the base and a supporting member between the electrode and a lower surface of the base. The dielectric layer has a carbon content of not more than 100 ppm, and the supporting member has a carbon content of 0.03 to 0.25 wt %. Moreover, the resistance heating element is formed into a coil and mainly composed of niobium.
摘要翻译：一种具有加热器的静电卡盘，包括：由包含氧化铝的烧结体构成的基底，设置在基部的上部的电极和嵌入基座的下部的电阻加热元件。底座包括电极和基座的上表面之间的电介质层，以及在电极和底座的下表面之间的支撑构件。电介质层的碳含量不大于100ppm，并且支撑构件的碳含量为0.03-0.25重量％。此外，电阻加热元件形成为主要由铌构成的线圈。

10. 发明授权

US06432208B1 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US06432208B1
公开(公告)日：2002-08-13
申请号：US09670580
申请日：2000-09-27
申请人： Satoru Kawakami , Katsuhiko Iwabuchi , Ryo Kuwajima , Ryusuke Ushikoshi , Naohito Yamada , Tetsuya Kawajiri
发明人： Satoru Kawakami , Katsuhiko Iwabuchi , Ryo Kuwajima , Ryusuke Ushikoshi , Naohito Yamada , Tetsuya Kawajiri
IPC分类号： C23C1600
CPC分类号： H01L21/67103 , C23C16/4586 , C23C16/46 , H01J2237/2001
摘要： In a plasma processing apparatus, a temperature control of a substrate to be processed is improved. A ceramic made support member having a substantially cylindrical shape is provided in a process chamber. An upper end of the support member is airtightly connected to a back surface of a placement table by solid state bonding. A lower end of the support member is airtightly connected to a bottom of the process chamber via a lower cooling jacket and O-rings. A cooling jacket made of a disc-like aluminum block is provided in an atmosphere chamber formed inside the support member. The cooling jacket is mounted to the back surface of the placement table via a heat conductive sheet member.
摘要翻译：在等离子体处理装置中，提高了待处理基板的温度控制。在处理室中设置具有大致圆柱形状的陶瓷制的支撑构件。支撑构件的上端通过固态粘合气密地连接到放置台的后表面。支撑构件的下端经由下部冷却套和O形环气密地连接到处理室的底部。在形成在支撑构件内部的气氛室中设置由盘状铝块制成的冷却套。冷却套通过导热板构件安装到放置台的后表面。

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