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1. 发明授权

US6076569A Cup rinse with a valvular ring 失效
标题翻译：杯子用阀瓣冲洗
公开(公告)号：US6076569A
公开(公告)日：2000-06-20
申请号：US193513
申请日：1998-11-17
申请人： Hung-Lung Ma , Hsien-Jung Hsu , Kuo-Chen Wang , Kuei-Hsi Lai
发明人： Hung-Lung Ma , Hsien-Jung Hsu , Kuo-Chen Wang , Kuei-Hsi Lai
IPC分类号： B05C11/08 , F16K15/14 , B65B1/04
CPC分类号： F16K15/147 , B05C11/08
摘要： A cup rinse with a valvular ring according to the invention is disclosed. The valvular ring has a plurality of valves in the center thereof. When an inlet tube is inserted through the valvular ring, the valves are forced to open thereby to allow a chemical liquid to flow into the cup resin via the inlet tube. Inversely when the inlet tube is completely pulled out of the valvular ring, the valves are tightly closed without a chemical liquid leakage. Accordingly, the cup rinse of the invention can prevent peripheral precision instruments, such as a motor, from damage by a leaky chemical liquid. Thus, the cup rinse of the invention cannot cause any unnecessary cost consumption.
摘要翻译：公开了根据本发明的用阀瓣冲洗的杯子。瓣环在其中心具有多个阀。当入口管插入阀瓣环时，阀被迫打开，从而允许化学液体通过入口管流入杯形树脂。相反，当入口管完全拉出阀瓣环时，阀门被紧密关闭而没有化学液体泄漏。因此，本发明的杯子冲洗可以防止诸如电动机的周边精密仪器被泄漏的化学液体损坏。因此，本发明的杯子冲洗不能造成任何不必要的成本消耗。

2. 发明授权

US5937876A Rinsing system used in a photoresist coater with capability to avoid a reversed pressure effect 有权
标题翻译：用于光刻胶涂布机的冲洗系统具有避免反向压力效应的能力
公开(公告)号：US5937876A
公开(公告)日：1999-08-17
申请号：US185399
申请日：1998-11-03
申请人： Kuei-Hsi Lai , Ching-Chih Cheng , Hung-Lung Ma
发明人： Kuei-Hsi Lai , Ching-Chih Cheng , Hung-Lung Ma
IPC分类号： G03F7/16 , H01L21/00 , B08B3/08
CPC分类号： H01L21/67051 , H01L21/6704 , G03F7/162
摘要： A rinsing system used in a photoresist coater to remove a brim portion of the formed photoresist layer on a substrate. The rinsing system has capability to avoid a reversed pressure effect. The rinsing system includes several distribution ducts, which are coupled to a solvent container. Each duct includes an one-way valve, an automatically-releasing-gas filter, and a pump with sequential couplings from the solvent container. The pump is used to transport solvent to the substrate to rinse the photoresist layer. The pump also induces the reversed pressure effect, which can be avoided by the automatically-releasing-gas filter, the one-way valve, and the solvent container. The one-way valve includes a spring to hold a ball-like stopper of the valve so that the reversed pressure effect is consumed by the spring force. The automatically-releasing-gas filter contains a gas and includes a releasing-gas valve to release the gas. The solvent container also contain a gas with a pressure of about one atmospheric pressure. The reversed pressure effect is reduced by the pressure induced by the gases.
摘要翻译：一种用于光致抗蚀剂涂布机的漂洗系统，用于去除衬底上形成的光致抗蚀剂层的边缘部分。冲洗系统具有避免反向压力作用的能力。冲洗系统包括多个分配管道，其连接到溶剂容器。每个管道包括单向阀，自动释放气体过滤器和具有来自溶剂容器的顺序耦合的泵。泵用于将溶剂输送到基材上以冲洗光致抗蚀剂层。泵还引起反向压力效应，这可以通过自动释放气体过滤器，单向阀和溶剂容器来避免。单向阀包括用于保持阀的球状塞子的弹簧，使得反作用力由弹簧力消耗。自动释放气体过滤器包含气体并且包括释放气体阀以释放气体。溶剂容器还含有压力约为一个大气压的气体。由气体引起的压力会降低反向压力效应。

3. 发明授权

US06334581B1 Nozzle reposition device used in a resist coating process 失效
标题翻译：用于抗蚀涂层工艺的喷嘴重新定位装置
公开(公告)号：US06334581B1
公开(公告)日：2002-01-01
申请号：US09670386
申请日：2000-09-28
申请人： Kuei-Hsi Lai , Hsi-Huang Lee , Hsien-Jung Hsu , Ching-Chih Cheng
发明人： Kuei-Hsi Lai , Hsi-Huang Lee , Hsien-Jung Hsu , Ching-Chih Cheng
IPC分类号： B05B1508
CPC分类号： B05B15/652 , B05C11/08
摘要： A spray nozzle resetting device comprises a spray nozzle for spraying resist onto a midpoint of a wafer, a rotary robotic arm that has a resist-delivering duct connected to the spray nozzle, a covering nut, a resetting ring, and a fixing ring. The covering nut has an opening of diameter D. The resetting ring has a rotary part of a diameter less than or equal to D, which fits in the opening of the covering nut, and at least two protrusions. The fixing ring, having two recesses that correspond to the two protrusions and interact with them, is used to connect the covering nut and the rotary robotic arm.
摘要翻译：喷嘴复位装置包括用于将抗蚀剂喷射到晶片的中点的喷嘴，具有连接到喷嘴的抗蚀剂输送管道的旋转机器人臂，覆盖螺母，复位环和固定环。覆盖螺母具有直径D的开口。复位环具有直径小于或等于D的旋转部分，其适合于覆盖螺母的开口和至少两个突起。固定环具有对应于两个突起并与之相互作用的两个凹槽，用于连接覆盖螺母和旋转机械臂。

4. 发明授权

US06170512B2 Flow control device 有权
标题翻译：流量控制装置
公开(公告)号：US06170512B2
公开(公告)日：2001-01-09
申请号：US09431938
申请日：1999-11-01
申请人： Kuei-Hsi Lai , Kuo-Feng Huang , Ming-Che Yang , Hung-Lung Mar
发明人： Kuei-Hsi Lai , Kuo-Feng Huang , Ming-Che Yang , Hung-Lung Mar
IPC分类号： G05D706
CPC分类号： G05D7/0676 , Y10T137/3127 , Y10T137/7759
摘要： A supply apparatus comprises a storage tank, a chemical flow pipe to route a chemical solution into a semiconductor processing room, a pressurizing apparatus to supply gas to the storage tank to make the chemical solution flow into the processing room, and an electro-Pneumatic regulator valve to adjust the pressure of the input gas. The flow control device comprises a flow sensor, a set-up apparatus, and a processor for generating a control signal to the pressurizing apparatus depending on a difference between a target value and a measurement value to adjust the flow of the chemical solution in the chemical flow pipe. The flow sensor comprises a hollow cylinder, a choking magnetic core movably positioned inside the hollow cylinder, and a first and second conductive coil wrapped around the outer wall of the hollow cylinder which uses alternating current to generate a magnetic flux and sense a change in the magnetic flux to measure the flow of chemical solution.
摘要翻译：供给装置包括储存箱，将化学溶液输送到半导体处理室的化学流动管，将储存罐供给气体以使化学溶液流入处理室的加压装置，以及电动气动调节器阀门调节输入气体的压力。流量控制装置包括流量传感器，设置装置和处理器，用于根据目标值和测量值之间的差异向加压装置产生控制信号，以调整化学溶液在化学品中的流动流量管。流量传感器包括中空圆筒，可移动地定位在中空圆柱体内的阻塞磁芯，以及缠绕在中空圆柱体的外壁上的第一和第二导电线圈，其使用交流电产生磁通量并感测中空圆柱体的变化磁通量测量化学溶液的流量。

5. 发明授权

US6099646A Dispensing system of a coater 失效
标题翻译：涂布机分配系统
公开(公告)号：US6099646A
公开(公告)日：2000-08-08
申请号：US185404
申请日：1998-11-03
申请人： Ming-Che Yang , Kuo-Feng Huang , En-Tien Tan , Kuei-Hsi Lai
发明人： Ming-Che Yang , Kuo-Feng Huang , En-Tien Tan , Kuei-Hsi Lai
IPC分类号： B05C11/08 , B05C11/10 , B05C11/00
CPC分类号： B05C11/08 , B05C11/1002
摘要： A dispensing system used in a spin coater is provided to transport a solvent to a wafer. The dispensing, system includes a switch valve, a sucking-back valve, a solenoid valve, a speed control unit of the sucking-back valve, and a speed control unit of the switch valve. The switch valve controls a solvent dispensing status. The sucking-back valve receives the solvent from the switch valve and exports the solvent to a wafer. The solenoid valve controls the switch valve and the sucking-back valve. The speed control unit of the switch valve is coupled between the switch valve and the solenoid valve and is used for a control of action speed on the switch valve. The speed control unit of the sucking-back valve is coupled between the switch valve and the sucking-back valve, and is used for a control of action speed of the sucking-back valve by a sufficient delay time of action.
摘要翻译：提供用于旋转涂布机中的分配系统以将溶剂输送到晶片。分配系统包括开关阀，回吸阀，电磁阀，回吸阀的速度控制单元和开关阀的速度控制单元。开关阀控制溶剂分配状态。吸回阀从开关阀接收溶剂并将溶剂输出到晶片。电磁阀控制开关阀和回吸阀。开关阀的速度控制单元连接在开关阀和电磁阀之间，用于控制开关阀上的动作速度。回抽阀的速度控制单元联接在开关阀和回吸阀之间，用于通过足够的延迟动作来控制回抽阀的动作速度。

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