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1. 发明授权

US6012607A Dispense system of a photoresist coating machine 失效
标题翻译：光刻胶涂布机分配系统
公开(公告)号：US6012607A
公开(公告)日：2000-01-11
申请号：US185436
申请日：1998-11-03
申请人： Hsien-Jung Hsu , Shih-Hsun Chiu , Hung-Lung Ma , Cha-Ming Kuo
发明人： Hsien-Jung Hsu , Shih-Hsun Chiu , Hung-Lung Ma , Cha-Ming Kuo
IPC分类号： B05C11/08 , B05C11/10 , H01L21/00 , B67D5/08
CPC分类号： H01L21/6715 , B05C11/1002 , B05C11/08
摘要： A photoresist dispensing system used in a photoresist coating machine includes a pump, a switch valve, a sucking-back valve, a solenoid valve, a first set of speed controllers a second set of speed controllers and a sucking-back speed controller. The pump is used to transport liquid photoresist to a wafer through the switch valve. The sucking-back valve is controlled by solenoid valve through the sucking-back speed controller to produce or release a sucking force on the liquid photoresist to prevent it from undesired dropping onto the wafer. The solenoid valve also controls the switch valve and the pump to start or stop photoresist dispensing. The first set of speed controllers is coupled between the switch valve and the solenoid valve and the second set of speed controller is coupled between the pump and the solenoid valve. The sucking-back speed controller is coupled between the sucking-back valve and the route, which is between the first set of speed controller and the switch valve so that the sucking-back valve has a sufficient delay time to effectively suck the liquid photoresist in a proper time order of operation.
摘要翻译：在光致抗蚀剂涂布机中使用的光刻胶分配系统包括泵，开关阀，回吸阀，电磁阀，第一组速度控制器，第二组速度控制器和吸回速度控制器。该泵用于通过开关阀将液体光致抗蚀剂输送到晶片。吸回阀由电磁阀通过吸回速度控制器控制，以产生或释放液体光致抗蚀剂上的吸力，以防止其不希望掉落到晶片上。电磁阀还控制开关阀和泵启动或停止光刻胶分配。第一组速度控制器耦合在开关阀和电磁阀之间，第二组速度控制器耦合在泵和电磁阀之间。回吸速度控制器连接在第一组速度控制器和开关阀之间的回吸阀和路线之间，使得吸回阀具有足够的延迟时间以有效地吸入液态光致抗蚀剂适当的时间顺序。

2. 发明授权

US6015096A Speed controller with scales 失效
标题翻译：速度控制器与秤
公开(公告)号：US6015096A
公开(公告)日：2000-01-18
申请号：US181100
申请日：1998-10-28
申请人： Kuo-Feng Huang , Kuo-Chen Wang , Hsien-Jung Hsu , Hung-Lung Ma
发明人： Kuo-Feng Huang , Kuo-Chen Wang , Hsien-Jung Hsu , Hung-Lung Ma
IPC分类号： F16K37/00 , B67D5/08
CPC分类号： F16K37/0016 , Y10T137/8175 , Y10T137/8309
摘要： A speed controller with scales according to the invention is used to adjust the amount of an air flow thereby to control the amount of a chemical liquid sprayed. The speed controller includes a housing, a controller body and a transparent tube. The controller body is partly inserted in the housing and has a rotary button located at one end thereof and outside the housing. The rotary button has a slot and an indicator thereon, wherein the indicator is located at one end of the slot. The transparent tube, having a vertical scale on the side thereof and a circular scale on the top circumference thereof, encloses the rotary button. In the invention, the position of the rotary button can be determined by reading the vertical scale and the circular scale so as to precisely control the amount of a chemical liquid sprayed, thereby increasing yield and improving engineering analysis.
摘要翻译：使用根据本发明的具有鳞片的速度控制器来调节空气流量从而控制喷射的化学液体的量。速度控制器包括壳体，控制器主体和透明管。控制器主体部分地插入壳体中，并且具有位于其一端和壳体外部的旋转按钮。旋转按钮在其上具有狭槽和指示器，其中指示器位于狭槽的一端。在其一侧具有垂直刻度的透明管和其顶部圆周上的圆形鳞片包围旋转按钮。在本发明中，可以通过读取垂直刻度和圆形刻度来确定旋转按钮的位置，以精确地控制喷射的化学液体的量，从而提高产量并改进工程分析。

3. 发明授权

US5937876A Rinsing system used in a photoresist coater with capability to avoid a reversed pressure effect 有权
标题翻译：用于光刻胶涂布机的冲洗系统具有避免反向压力效应的能力
公开(公告)号：US5937876A
公开(公告)日：1999-08-17
申请号：US185399
申请日：1998-11-03
申请人： Kuei-Hsi Lai , Ching-Chih Cheng , Hung-Lung Ma
发明人： Kuei-Hsi Lai , Ching-Chih Cheng , Hung-Lung Ma
IPC分类号： G03F7/16 , H01L21/00 , B08B3/08
CPC分类号： H01L21/67051 , H01L21/6704 , G03F7/162
摘要： A rinsing system used in a photoresist coater to remove a brim portion of the formed photoresist layer on a substrate. The rinsing system has capability to avoid a reversed pressure effect. The rinsing system includes several distribution ducts, which are coupled to a solvent container. Each duct includes an one-way valve, an automatically-releasing-gas filter, and a pump with sequential couplings from the solvent container. The pump is used to transport solvent to the substrate to rinse the photoresist layer. The pump also induces the reversed pressure effect, which can be avoided by the automatically-releasing-gas filter, the one-way valve, and the solvent container. The one-way valve includes a spring to hold a ball-like stopper of the valve so that the reversed pressure effect is consumed by the spring force. The automatically-releasing-gas filter contains a gas and includes a releasing-gas valve to release the gas. The solvent container also contain a gas with a pressure of about one atmospheric pressure. The reversed pressure effect is reduced by the pressure induced by the gases.
摘要翻译：一种用于光致抗蚀剂涂布机的漂洗系统，用于去除衬底上形成的光致抗蚀剂层的边缘部分。冲洗系统具有避免反向压力作用的能力。冲洗系统包括多个分配管道，其连接到溶剂容器。每个管道包括单向阀，自动释放气体过滤器和具有来自溶剂容器的顺序耦合的泵。泵用于将溶剂输送到基材上以冲洗光致抗蚀剂层。泵还引起反向压力效应，这可以通过自动释放气体过滤器，单向阀和溶剂容器来避免。单向阀包括用于保持阀的球状塞子的弹簧，使得反作用力由弹簧力消耗。自动释放气体过滤器包含气体并且包括释放气体阀以释放气体。溶剂容器还含有压力约为一个大气压的气体。由气体引起的压力会降低反向压力效应。

4. 发明授权

US06177874B1 Liquid supplying device for providing chemical solution with a liquid level sensor 失效
标题翻译：用于向液位传感器提供化学溶液的液体供应装置
公开(公告)号：US06177874B1
公开(公告)日：2001-01-23
申请号：US09074057
申请日：1998-05-07
申请人： Ching-Chih Cheng , Wen-Liang Fang , Kuo-Feng Huang , Hung-Lung Ma
发明人： Ching-Chih Cheng , Wen-Liang Fang , Kuo-Feng Huang , Hung-Lung Ma
IPC分类号： G08B2100
CPC分类号： G01F23/2925 , Y10S250/902 , Y10S250/904
摘要： A liquid supplying device comprising a liquid container for storing a liquid so as to supply an external device and a liquid level sensor for detecting the liquid level. As the liquid within the liquid container is gradually used up, liquid level drops. As soon as the remaining liquid in the container drops to a predetermined amount, the liquid level sensor emits a warning signal to the operator, and the operator can then replenish the liquid in the container.
摘要翻译：一种液体供应装置，包括用于存储液体以供应外部装置的液体容器和用于检测液面的液位传感器。随着液体容器内的液体逐渐消耗，液面下降。一旦容器中的剩余液体下降到预定量，液位传感器向操作者发出警告信号，然后操作者可以补充容器中的液体。

5. 发明授权

US6076569A Cup rinse with a valvular ring 失效
标题翻译：杯子用阀瓣冲洗
公开(公告)号：US6076569A
公开(公告)日：2000-06-20
申请号：US193513
申请日：1998-11-17
申请人： Hung-Lung Ma , Hsien-Jung Hsu , Kuo-Chen Wang , Kuei-Hsi Lai
发明人： Hung-Lung Ma , Hsien-Jung Hsu , Kuo-Chen Wang , Kuei-Hsi Lai
IPC分类号： B05C11/08 , F16K15/14 , B65B1/04
CPC分类号： F16K15/147 , B05C11/08
摘要： A cup rinse with a valvular ring according to the invention is disclosed. The valvular ring has a plurality of valves in the center thereof. When an inlet tube is inserted through the valvular ring, the valves are forced to open thereby to allow a chemical liquid to flow into the cup resin via the inlet tube. Inversely when the inlet tube is completely pulled out of the valvular ring, the valves are tightly closed without a chemical liquid leakage. Accordingly, the cup rinse of the invention can prevent peripheral precision instruments, such as a motor, from damage by a leaky chemical liquid. Thus, the cup rinse of the invention cannot cause any unnecessary cost consumption.
摘要翻译：公开了根据本发明的用阀瓣冲洗的杯子。瓣环在其中心具有多个阀。当入口管插入阀瓣环时，阀被迫打开，从而允许化学液体通过入口管流入杯形树脂。相反，当入口管完全拉出阀瓣环时，阀门被紧密关闭而没有化学液体泄漏。因此，本发明的杯子冲洗可以防止诸如电动机的周边精密仪器被泄漏的化学液体损坏。因此，本发明的杯子冲洗不能造成任何不必要的成本消耗。

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