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    • 1. 发明授权
    • Process for regulating to desired values the dimensions of the bubbles
of magnetic bubble elements
    • 用于将磁性气泡元件的气泡的尺寸调节到期望值的过程
    • US4322454A
    • 1982-03-30
    • US190389
    • 1980-09-24
    • Didier ChalletonJacques DavalBernard FerrandHubert Moriceau
    • Didier ChalletonJacques DavalBernard FerrandHubert Moriceau
    • G11C11/14C30B19/00C30B29/28H01F10/24H01F41/28B05D5/12
    • H01F10/24H01F41/28Y10S428/90
    • Process for regulating to desired values the size of the bubbles of magnetic bubble elements during the manufacture of such elements by liquid phase deposition into a non-magnetic substrate of a ferrimagnetic garnet film of formula:(T.sub.a.sup.1 T.sub.b.sup.2 T.sub.c.sup.3 Ca.sub.d) (Fe.sub.e Ge.sub.g) O.sub.12in which T.sup.1, T.sup.2 and T.sup.3, which differ from one another, represent an element in the series of rare earths, including yttrium, a,b,c and d are numbers such that their sum is substantially equal to 3 and e and f are numbers such that their sum is substantially equal to 5, wherein such elements are produced by using epitaxy baths comprising calcium oxide or carbonate and predetermined quantities of ferric oxide, oxides of elements T.sup.1, T.sup.2 and T.sup.3 and germanium oxide, wherein calcium carbonate or oxide quantity of each epitaxy bath is regulated as a function of the size of the bubbles which it is desired to obtain in the element produced from said bath and wherein the deposition of said element takes place at a temperature t.sub.d selected as a function of the saturation temperature T.sub.s of the bath to obtain a growth velocity adapted to the size of the bubbles which it is desired to obtain, the deposit being made during a time t such that the element obtained has a thickness similar to that of the bubbles obtained.
    • 通过液相沉积到式(Ta1Tb2Tc3Cad)(FeeGeg)O12的铁磁性石榴石膜的非磁性基底中,将这些元件制造期间的气泡元件气泡的尺寸调节到期望值的方法,其中T1, T2和T3彼此不同,代表了一系列稀土元素,包括钇,a,b,c和d是数字,使得它们的和基本上等于3,e和f是数字,使得它们 总和大致等于5,其中通过使用包含氧化钙或碳酸盐和预定量的氧化铁,元素T1,T2和T3的氧化物和氧化锗的外延浴制备这些元素,其中每个外延浴的碳酸钙或氧化物量 被调节为在由所述浴产生的元素中希望获得的气泡的尺寸的函数,并且其中所述元素的沉积在选定的温度td下进行 Sa的饱和温度Ts的函数,以获得适合于期望获得的气泡尺寸的生长速度,在时间t内形成沉积物,使得获得的元素的厚度类似于 得到气泡。
    • 8. 发明授权
    • Blowing door for ultra-clean confinement container
    • 超声波清洗器集装箱吹风门
    • US5112277A
    • 1992-05-12
    • US662162
    • 1991-02-28
    • Didier CruzJacques Daval
    • Didier CruzJacques Daval
    • B01L1/04E06B5/00E06B7/28F24F7/06H01L21/677
    • H01L21/67757Y10S414/135Y10S414/139
    • The blowing door permits the passage of an object (6) from the interior of a first container (5) to a second container (4) without the respective atmospheres of the interior of these two containers being polluted.The blowing door (2) comprises a pressurized fluid inlet (17), an inner chamber (15) and at least one of its faces is ventilated by means of filter (14) placed between the face (11) and the inner chamber (15). During the opening of the door (2), the face (11) in contact with the external atmosphere is then ventilated, so that polluting particles are not brought into the containers (4, 5) during the closure of the door (2).Application to the treatment of silicon wafers or chips to be used in microelectronics.
    • 吹风门允许物体(6)从第一容器(5)的内部通过到第二容器(4),而不会使这两个容器的内部的相应气氛被污染。 吹风门(2)包括加压流体入口(17),内室(15),并且其表面中的至少一个通过放置在面(11)和内室(15)之间的过滤器(14)通风 )。 在门(2)的打开期间,与外部大气接触的面(11)然后通风,使得在门(2)关闭期间污染的颗粒不会进入容器(4,5)。 应用于微晶电子学中使用的硅片或芯片的处理。