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    • 3. 发明申请
    • P-CHANNEL NON-VOLATILE MEMORY AND OPERATING METHOD THEREOF
    • P-CHANNEL非易失性存储器及其操作方法
    • US20070181937A1
    • 2007-08-09
    • US11307472
    • 2006-02-09
    • Yen-Tai Lin
    • Yen-Tai Lin
    • H01L29/788
    • H01L27/115
    • A P-channel non-volatile memory is described. The P-channel non-volatile memory includes a substrate, a first memory cell, and second memory cell. An N-well is disposed over the substrate, and the first cell and the second cell are disposed over the N-well. The first memory cell includes a first gate, a first charge storage structure, a first doped region and a second doped region. The first doped region and the second doped region are disposed in the substrate on the respective sides of the first gate. The second cell includes a second gate, a second charge storage structure, a third doped region, and the second doped region. The third doped region and the second doped region are disposed in the substrate on the respective sides of the second gate. The second cell and the first cell share the second doped region.
    • 描述P沟道非易失性存储器。 P沟道非易失性存储器包括衬底,第一存储单元和第二存储单元。 在衬底上设置N阱,并且将第一电池和第二电池设置在N阱上。 第一存储单元包括第一栅极,第一电荷存储结构,第一掺杂区和第二掺杂区。 第一掺杂区域和第二掺杂区域设置在第一栅极的相应侧面上的衬底中。 第二单元包括第二栅极,第二电荷存储结构,第三掺杂区和第二掺杂区。 第三掺杂区域和第二掺杂区域设置在第二栅极的相应侧上的衬底中。 第二单元和第一单元共享第二掺杂区。
    • 5. 发明授权
    • Power supply device with reduced power consumption
    • 电源设备功耗降低
    • US06819620B2
    • 2004-11-16
    • US10248495
    • 2003-01-23
    • Yen-Tai LinChing-Yuan LinChien-Hung Ho
    • Yen-Tai LinChing-Yuan LinChien-Hung Ho
    • G11C1134
    • G11C16/30
    • A power supply used for providing a flash memory with an operating voltage has a plurality of memory blocks and a plurality of decoders corresponding to the memory blocks. Each memory block has a plurality of memory cells for storing binary data. Each decoder is used for selecting memory cells in the corresponding memory block. The power supply has at least three power sources for generating different voltages, and controls the power sources for making a voltage difference between a high voltage level and a low voltage level of the unselected decoder less than a voltage difference between a high voltage level and a low voltage level of the selected decoder.
    • 用于提供具有工作电压的闪速存储器的电源具有多个存储块和对应于存储块的多个解码器。 每个存储块具有用于存储二进制数据的多个存储单元。 每个解码器用于选择相应存储块中的存储单元。 电源具有用于产生不同电压的至少三个电源,并且控制电源以使未选择的解码器的高电压电平和低电压电平之间的电压差小于高电压电平和高电压电平之间的电压差 所选解码器的低电压电平。
    • 7. 发明授权
    • Layout structure of multi-use coupling capacitors in reducing ground
bounces and replacing faulty logic components
    • 多用耦合电容器的布局结构,可减少地面反弹和更换故障逻辑元件
    • US5998846A
    • 1999-12-07
    • US50621
    • 1998-03-30
    • Tzong-Shi JanYen-Tai Lin
    • Tzong-Shi JanYen-Tai Lin
    • H01L27/02H01L29/72
    • H01L27/0207
    • A first mask includes a well mask formed over a first portion of the wafer to define a first conductive type well in the wafer. A first polysilicon mask is formed over the well mask including a plurality of first structures and a plurality of second structures to cover a first polysilicon layer, thereby defining polysilicon gates. A first implanting mask is formed over the first polysilicon mask for forming second conductive type region. A second implanting mask is formed over the first polysilicon mask for forming first conductive type region. A second polysilicon mask is formed between gates of a second conductive type MOS and gates of a first conductive type MOS. A contact hole mask is formed over the second polysilicon mask for forming contact holes. A metal mask is formed over the contact hole mask for forming connection.
    • 第一掩模包括在晶片的第一部分上形成的阱掩模,以在晶片中限定第一导电类型阱。 第一多晶硅掩模形成在阱掩模之上,包括多个第一结构和多个第二结构以覆盖第一多晶硅层,从而限定多晶硅栅极。 第一注入掩模形成在第一多晶硅掩模上,用于形成第二导电类型区域。 在第一多晶硅掩模上形成第二注入掩模,用于形成第一导电类型区域。 在第二导电型MOS的栅极和第一导电型MOS的栅极之间形成第二多晶硅掩模。 在第二多晶硅掩模上形成接触孔掩模以形成接触孔。 在用于形成连接的接触孔掩模上形成金属掩模。
    • 8. 发明授权
    • Voltage level shifting apparatus
    • 电压电平转换装置
    • US08373485B2
    • 2013-02-12
    • US13090283
    • 2011-04-20
    • Chen-Hao PoYen-Tai LinWay-Chen WuChing-Shan Chien
    • Chen-Hao PoYen-Tai LinWay-Chen WuChing-Shan Chien
    • H03L5/00
    • H03K3/356182
    • A voltage level shifting apparatus is disclosed. The voltage level shifting apparatus has a cross-coupled transistor pair, a plurality of transistor pairs, a first diode string, a second diode string and an input transistor pair. One of the transistor pairs is coupled to the cross-coupled transistor pair, and the transistor pairs are controlled by a plurality of reference voltages. The first and the second diode strings are coupled between two of the transistor pairs. Each of the first and the second diode strings has at least one diode. The input transistor pair receives a first and a second input voltage, and the first and second input voltages are complementary signals. The cross-coupled transistor pair generates and outputs a first output voltage and a second output voltage by shifting the voltage level of the first and the second input voltage.
    • 公开了一种电压电平转换装置。 电压电平移位装置具有交叉耦合晶体管对,多个晶体管对,第一二极管串,第二二极管串和输入晶体管对。 晶体管对中的一个耦合到交叉耦合晶体管对,并且晶体管对由多个参考电压控制。 第一和第二二极管串耦合在两个晶体管对之间。 第一和第二二极管串中的每一个具有至少一个二极管。 输入晶体管对接收第一和第二输入电压,第一和第二输入电压是互补信号。 交叉耦合晶体管对通过移位第一和第二输入电压的电压电平来产生并输出第一输出电压和第二输出电压。
    • 9. 发明申请
    • OPERATING METHOD OF P-CHANNEL NON-VOLATILE MEMORY
    • P-CHANNEL非易失性存储器的操作方法
    • US20080165587A1
    • 2008-07-10
    • US12046477
    • 2008-03-12
    • Yen-Tai Lin
    • Yen-Tai Lin
    • G11C11/34
    • H01L27/115
    • A P-channel non-volatile memory is described. The P-channel non-volatile memory includes a substrate, a first memory cell, and second memory cell. An N-well is disposed over the substrate, and the first cell and the second cell are disposed over the N-well. The first memory cell includes a first gate, a first charge storage structure, a first doped region and a second doped region. The first doped region and the second doped region are disposed in the substrate on the respective sides of the first gate. The second cell includes a second gate, a second charge storage structure, a third doped region, and the second doped region. The third doped region and the second doped region are disposed in the substrate on the respective sides of the second gate. The second cell and the first cell share the second doped region.
    • 描述P沟道非易失性存储器。 P沟道非易失性存储器包括衬底,第一存储单元和第二存储单元。 在衬底上设置N阱,并且将第一电池和第二电池设置在N阱上。 第一存储单元包括第一栅极,第一电荷存储结构,第一掺杂区和第二掺杂区。 第一掺杂区域和第二掺杂区域设置在第一栅极的相应侧面上的衬底中。 第二单元包括第二栅极,第二电荷存储结构,第三掺杂区和第二掺杂区。 第三掺杂区域和第二掺杂区域设置在第二栅极的相应侧上的衬底中。 第二单元和第一单元共享第二掺杂区。