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    • 9. 发明申请
    • Surface emitting semiconductor laser device
    • 表面发射半导体激光器件
    • US20050041713A1
    • 2005-02-24
    • US10900935
    • 2004-07-27
    • Norihiro IwaiTatsuyuki ShinagawaNoriyuki Yokouchi
    • Norihiro IwaiTatsuyuki ShinagawaNoriyuki Yokouchi
    • H01S5/00H01S5/183
    • H01S5/18313H01S5/0021H01S5/18311H01S5/18344H01S5/3201
    • A surface emitting semiconductor laser device including a substrate, a bottom DBR, and a mesa post having a layer structure, the layer structure including a top DBR including a plurality of pairs, each of said pairs including an Al-containing high-reflectivity layer and an Al-containing low-reflectivity layer, an active layer structure sandwiched between the DBRs for emitting laser, and a current confinement layer disposed within or in a vicinity of one of the DBRs, the current confinement layer including a central current injection area and an annular current blocking area encircling the central current injection area, the annular current blocking area being formed by selective oxidation of Al in an AlXGa1-XAs layer (0.95≦x
    • 一种表面发射半导体激光器件,包括具有层结构的衬底,底部DBR和台面柱,所述层结构包括包括多个对的顶部DBR,每个所述对包括含Al的高反射率层和 含Al的低反射率层,夹在用于发射激光的DBR之间的有源层结构以及设置在一个DBR内或附近的电流限制层,所述电流限制层包括中心电流注入区域和 环形电流阻挡区域,环绕中心电流注入区域,环形电流阻挡区域是通过在厚度低于60nm的Al x Ga 1-x As层(0.95 <= x <1)中选择性氧化Al而形成的, 反射层包括原子比不大于0.8且低于0.9的Al。 通过将Al含量限制在规定范围内,可以抑制形成电流限制氧化物区域的含Al化合物半导体层中的氧化进程,从而实现寿命更长的表面发射半导体激光器件,或 更高的可靠性。