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    • 4. 发明授权
    • Apparatus and method for indirect surface cleaning
    • 用于间接表面清洗的设备和方法
    • US07993464B2
    • 2011-08-09
    • US12055178
    • 2008-03-25
    • Jeffrey E. LeClaireKenneth Gilbert RoesslerDavid Brinkley
    • Jeffrey E. LeClaireKenneth Gilbert RoesslerDavid Brinkley
    • B08B7/00
    • B08B7/0042G03F1/82Y10S134/902
    • A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.
    • 一种用于目标表面的激光表面清洁的方法,该方法在待清洁表面正上方有限制或无法进入环境。 该方法包括清洁表面的能力,降低了底物损伤的风险。 该方法包括对受污染的基底表面的直接激光激发和从基底到污染颗粒或污染层的热转移。 该方法还包括通过将产生表面清洁所需的温度保持在基底材料的热损伤水平以下来产生基于热的去除并降低基底损伤的风险。 此外,该方法包括通过利用相对较长的脉冲宽度降低衬底损伤的风险,提供改善的小污染物/颗粒的去除,以及引导光束穿过相对于作为衬底环境外壳的一部分的表面设置的材料 。
    • 5. 发明申请
    • APPARATUS AND METHOD FOR INDIRECT SURFACE CLEANING
    • 用于间接表面清洁的装置和方法
    • US20090038637A1
    • 2009-02-12
    • US12055178
    • 2008-03-25
    • Jeffrey E. LeClaireKenneth Gilbert RoesslerDavid Brinkley
    • Jeffrey E. LeClaireKenneth Gilbert RoesslerDavid Brinkley
    • B08B7/00
    • B08B7/0042G03F1/82Y10S134/902
    • A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.
    • 一种用于目标表面的激光表面清洁的方法,该方法在待清洁表面正上方有限制或无法进入环境。 该方法包括清洁表面的能力,降低了底物损伤的风险。 该方法包括对受污染的基底表面的直接激光激发和从基底到污染颗粒或污染层的热转移。 该方法还包括通过将产生表面清洁所需的温度保持在基底材料的热损伤水平以下来产生基于热的去除并降低基底损伤的风险。 此外,该方法包括通过利用相对较长的脉冲宽度降低衬底损伤的风险,提供改善的小污染物/颗粒的去除,以及引导光束穿过相对于作为衬底环境外壳的一部分的表面设置的材料 。
    • 6. 发明授权
    • Scanning force microscope with automatic surface engagement
    • 扫描力显微镜具有自动表面接合
    • US06318159B1
    • 2001-11-20
    • US09557457
    • 2000-04-24
    • Dong ChenEdwin FlechaJames Michael HammondKenneth Gilbert Roessler
    • Dong ChenEdwin FlechaJames Michael HammondKenneth Gilbert Roessler
    • G01B528
    • G01Q60/34Y10S977/851
    • The vibrating probe of a scanning force microscope is brought into engagement with a sample surface in an initial approach process moving the probe toward the sample surface until the amplitude of probe vibration at an excitation frequency is measurably affected by forces between the tip and the sample, an then in a final approach process in which a change in vibration amplitude caused by a dithering vibration superimposed on the excitation vibration exceeds a pre-determined threshold limit. The excitation frequency is reduced if the phase angle of vibrations exceeds another limit, and the amplitude of the excitation driving function is increased as the amplitude or tip vibration falls below a setpoint. During approach and scanning, vibration amplitude is measured through a demodulator having an intermediate reference signal locked in phase with the tip motion signal.
    • 扫描力显微镜的振动探针在初始逼近过程中与样品表面接合,使探针朝向样品表面移动,直到探针振动在激发频率处的振幅受到尖端和样品之间的力的可测量影响, 然后在最终进场过程中,由激励振动叠加的抖动振动引起的振动振幅的变化超过预定的阈限。 如果振动的相位角超过另一极限,则励磁频率降低,激励驱动功能的振幅随振幅或尖端振动下降到设定点以下而增加。 在接近和扫描期间,通过具有与尖端运动信号同相锁定的中间参考信号的解调器来测量振幅。