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    • 7. 发明公开
    • 증착 장치 및 용액의 재사용 방법
    • 沉积装置和解决方案的回收方法
    • KR1020140117021A
    • 2014-10-07
    • KR1020130031708
    • 2013-03-25
    • 삼성에스디아이 주식회사
    • 안상혁김현철김정훈차시영백남석
    • H01L31/18H01L31/042
    • H01L31/1828C23C18/1204C23C18/1233C23C18/1245C23C18/125C23C18/1283
    • The present invention relates to a deposition apparatus and a solution recycling method. According to an embodiment of the present invention, the deposition apparatus comprises a bath filled with a solution to be used in a chemical bath deposition method; a tank temporarily storing the solution having been used by the chemical bath deposition method; a first pipe forming a discharge pump to induce the solution, having been used by the chemical bath deposition method, from the bath to the tank; a filter part filtering the solution stored in the tank; and a second pipe connecting the tank to the bath forming a circulation pump re-inducing the solution filtered by the filter part from the tank to the bath, wherein the filter part is positioned on the second pipe. Thereby, the present invention can increase the number of solution uses to form a buffer layer when the buffer layer is formed by the chemical bath deposition method.
    • 本发明涉及沉积设备和溶液回收方法。 根据本发明的实施例,沉积设备包括填充有用于化学浴沉积方法的溶液的浴; 临时储存通过化学浴沉积方法使用的溶液的罐; 形成排出泵的第一管,用于通过化学浴沉积方法从溶液到罐中引导溶液; 过滤器部分过滤储存在罐中的溶液; 以及第二管,其将所述罐连接到形成循环泵的浴,所述循环泵将所述过滤部分过滤的溶液从所述罐再次引导到所述槽,其中所述过滤器部分位于所述第二管上。 因此,当通过化学浴沉积方法形成缓冲层时,本发明可以增加用于形成缓冲层的溶液的使用次数。