会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明公开
    • SF6 분리회수장치 및 방법
    • 硫化氢还原的装置和方法
    • KR1020120117296A
    • 2012-10-24
    • KR1020110034967
    • 2011-04-15
    • 한국과학기술연구원
    • 이상협이현정이중기우주만이민우김한별
    • B01D53/02B01D53/34
    • B01D53/229B01D53/04B01D53/225B01D71/50B01D2253/102B01D2257/302B01D2257/80B01D2258/0216B01D2259/40096B01D2259/414Y02C20/30
    • PURPOSE: An apparatus for collecting and separating sulfur hexafluoride and a method for the same are provided to improve the collecting rate of sulfur hexafluoride by removing moisture and sulfur dioxide from waste gas containing sulfur hexafluoride. CONSTITUTION: A gas pre-treatment unit(120) removes moisture and sulfur dioxide from waste gas containing sulfur hexafluoride. A first sulfur hexafluoride concentrating unit(210) selectively absorbs and desorbs sulfur hexafluoride from the waste gas. A first separation membrane module(130) separates the waste gas from the first sulfur hexafluoride concentrating unit into a first collected gas and a first other gas. A second separation membrane module(140) separates the first collected gas into a second collected gas and a second other gas. A different storing tank(150) stores the first other gas. A third separation membrane module separates the first other gas into sulfur hexafluoride and other gas. [Reference numerals] (120) Gas pre-treatment unit; (AA) Waste gas; (BB) First other gas; (CC) First collecting gas; (DD) Second other gas; (EE) Second collecting gas; (FF) Third other gas; (GG) First separation membrane module; (HH) Second separation membrane module; (II) Third separation membrane module
    • 目的:提供一种用于收集和分离六氟化硫的设备及其方法,用于通过从含六氟化硫的废气中除去水分和二氧化硫来提高六氟化硫的收集率。 构成:气体预处理单元(120)从含六氟化硫的废气中除去水分和二氧化硫。 第一六氟化硫浓缩单元(210)从废气中选择性地吸收和解吸六氟化硫。 第一分离膜组件(130)将废气从第一六氟化硫浓缩单元分离成第一收集气体和第一其它气体。 第二分离膜组件(140)将第一收集气体分离成第二收集气体和第二另外的气体。 不同的储存罐(150)存储第一其它气体。 第三分离膜组件将第一其它气体分成六氟化硫等气体。 (附图标记)(120)气体预处理单元; (AA)废气; (BB)第一其他气体; (CC)第一收集气体; (DD)其他二气; (EE)第二收集气; (FF)三气; (GG)第一分离膜组件; (HH)第二分离膜组件; (二)第三分离膜组件
    • 10. 发明公开
    • 반도체 공정 툴용 필터링 시스템
    • 一种半导体加工工具的过滤系统
    • KR1020090038870A
    • 2009-04-21
    • KR1020097000607
    • 2007-07-13
    • 엔테그리스, 아이엔씨.
    • 그레이퍼,아나톨리키쉬코비치,올레그,피.
    • B01D53/04B01D46/00
    • B01D53/0407B01D46/0023B01D46/0036B01D2253/102B01D2253/206B01D2257/553B01D2257/556B01D2257/708B01D2259/402B01D2259/414B01D2259/4148B01J20/20B01J20/28035B01J39/05Y10T29/49826
    • The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations. The invention also provides a method for filtering gas containing hexamethyldisiloxane and trimethylsilanol in communication with a semiconductor processing tool, which employs a system comprising a first and second filter layer.
    • 本发明提供一种半导体处理工具的过滤系统。 在一个实施例中,过滤系统与半导体处理工具相关联。 本发明的系统包括与气体流动路径流体连通的第一和第二过滤层。 流动路径是包含含有挥发性二氧化硅的化合物如六甲基二硅氧烷和三甲基硅烷醇的气流。 气体流路穿过第一和第二过滤层以与半导体加工工具流体连通。 优选地,过滤系统的第一过滤层沿着沿着来自第二过滤层的气体流动路径的上游。 基于给定的污染物浓度来选择和布置第一和第二过滤层的介质。 本发明还提供了一种用于过滤含有六甲基二硅氧烷和三甲基硅烷醇的气体与半导体加工工具连通的方法,半导体加工工具采用包括第一和第二过滤层的系统。