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1. 发明公开

KR1020080017400A 노광 장치 및 노광 방법 无效
标题翻译：曝光装置和曝光方法
公开(公告)号：KR1020080017400A
公开(公告)日：2008-02-26
申请号：KR1020077030446
申请日：2006-05-30
申请人： 후지필름 가부시키가이샤 , 후지논 가부시키가이샤
发明人： 코모리카즈키 , 이시카와히로미 , 오모리토시히코 , 오카자키요지 , 바바토모유키
IPC分类号： H01L21/027
CPC分类号： G03F7/70291 , G03F7/70275 , G02B26/0833 , G02F2203/12
摘要： An exposure image is accurately projected. The exposure apparatus is provided with, as constituent elements, a light source for outputting exposure light; a DMD, which has a plurality of two-dimensionally arranged pixel sections and performs spatial light modulation to the exposure light entered into the pixels sections from the light source by pixel section, based on an image signal; and a telecentric optical system, which is arranged on an optical path of the exposure light entered into the DMD and makes the main beams of the exposure light parallel.
摘要翻译：准确投影曝光图像。作为组成元件，曝光装置设置有用于输出曝光光的光源; DMD，其具有多个二维排列的像素部分，并且基于图像信号对从像素部分的光源进入像素部分的曝光光进行空间光调制; 以及远心光学系统，其布置在入射到DMD中的曝光光的光路上，并使曝光的主光束平行。

2. 发明公开

KR1020080034124A 패턴형성방법 无效
标题翻译：图案形成方法
公开(公告)号：KR1020080034124A
公开(公告)日：2008-04-18
申请号：KR1020087000936
申请日：2006-06-16
申请人： 후지필름 가부시키가이샤
发明人： 타카시마마사노부 , 코모리카즈키 , 이시카와히로미 , 오카자키요지 , 오모리토시히코
IPC分类号： H01L21/027
CPC分类号： G03F7/70791 , G03F7/033 , G03F7/70275 , G03F7/70291 , G03F7/2051 , G03F7/70075 , G03F7/70383 , G03F7/7055
摘要： Provided is a pattern forming method by which a fine pattern can be accurately formed by making a light quantity of each exposure unit uniform while suppressing cost, for exposure using a digital exposure apparatus having an exposure head wherein the exposure units are two-dimensionally distributed. The method at least includes a step wherein a photosensitive layer is irradiated with optical beams emitted from a light irradiation means, through a focusing optical system having a light distribution correcting means, and exposure is performed by irradiating the photosensitive layer with optical beams modulated by a light modulating means. In the pattern forming method, the exposure is performed by permitting light quantities of the optical beams applied on the light modulating means from the light irradiation means in an irradiation area to have distribution, and that the light quantity distribution of the optical beams modulated by the light modulating means is corrected to be uniform on the plane of the photosensitive layer to be exposed.
摘要翻译：提供了一种图案形成方法，通过使用具有曝光单元的二维分布的具有曝光头的数字曝光装置进行曝光，通过使每个曝光单元的光均匀化，同时抑制成本，可精确地形成精细图案。该方法至少包括一个步骤，其中通过具有光分布校正装置的聚焦光学系统照射从光照射装置发射的光束的感光层，并且通过用光调制的光束照射感光层来进行曝光光调制装置。在图案形成方法中，通过在照射区域中允许从光照射装置施加在光调制装置上的光束的光量具有分布来进行曝光，并且通过由光照射装置调制的光束的光量分布光调制装置被校正为要曝光的感光层的平面上均匀。

3. 发明公开

KR1020070104642A 화상 노광 장치 无效
标题翻译：图像曝光装置
公开(公告)号：KR1020070104642A
公开(公告)日：2007-10-26
申请号：KR1020077020060
申请日：2006-02-08
申请人： 후지필름 가부시키가이샤
发明人： 이시이슈이치 , 키무라코이치 , 스미카츠토 , 이시카와히로미 , 오모리토시히코
IPC分类号： G02B26/00 , G02B27/18
CPC分类号： G02B26/0841 , G03F7/70216 , G03F7/70291 , G03F7/70791
摘要： An image exposing apparatus, in which a photosensitive material is exposed by light modulated by a spatial optical modulation device, which is capable of securing high light utility efficiency and extinction ratio. In an image exposing apparatus including a spatial optical modulation device 50, such as a DMD having multitudes of reflective pixel sections disposed two-dimensionally, each for modulating light irradiated thereon; a light source 66 for irradiating light B on the spatial optical modulation device 50; and an imaging optical system 51 for focusing an image represented by the light B transmitted via the spatial optical modulation device 50 on a photosensitive material 150, each of the pixel sections (e.g., micromirrors of DMD) is shaped like a concave or convex mirror that converges the light B used for image exposure.
摘要翻译：一种图像曝光装置，其中通过由空间光学调制装置调制的光使感光材料曝光，其能够确保高的光效率和消光比。在包括空间光调制装置50的图像曝光装置中，诸如具有二维布置的多个反射像素部分的DMD，每个用于调制在其上照射的光; 用于在空间光调制装置50上照射光B的光源66; 以及用于将由经由空间光学调制装置50传输的光B表示的图像聚焦在感光材料150上的成像光学系统51，每个像素部分（例如，DMD的微反射镜）形成为凹形或凸面的反射镜，会聚用于图像曝光的光B.

4. 发明授权

KR101051646B1 노광장치 有权
标题翻译：曝光装置
公开(公告)号：KR101051646B1
公开(公告)日：2011-07-26
申请号：KR1020030094487
申请日：2003-12-22
申请人： 후지필름 가부시키가이샤
发明人： 오모리토시히코
IPC分类号： G03F7/20
CPC分类号： B41J2/46 , G02B6/06 , G02B27/0927 , G02B27/0961 , G02B27/0994 , G02B2006/0098 , H04N5/7458
摘要： 본 발명은 높은 조명 효율이 얻어짐과 아울러 균일하게 노광할 수 있는 노광장치를 제공하는 것을 과제로 한다.
이를 위해, 광원과, 이 광원으로부터 광이 공급되는 광 적분기와, 이 광 적분기를 경유한 광에 의해 조명되는 2차원 공간 변조 소자를 갖는 노광장치에 있어서, 광 적분기를 향하여 광을 출사하는 광 파이버 번들 단부(174E)를 광원에 설치하고, 출사측으로부터 바라본 광 파이버 번들 단부(174E)의 출사영역(192)을 광 적분기의 출사면의 윤곽형상과 대략 유사한 형상으로 함으로써 광 파이버 번들 단부 (174E)로부터 출사한 광의 대부분을 조명 설정영역에 조사할 수 있으므로 높은 조명 효율이 얻어짐과 아울러 균일하게 노광할 수 있다.
摘要翻译：本发明的目的是提供一种实现高照明效率和均匀曝光的曝光装置。

5. 发明公开

KR1020040067820A 노광장치 有权
标题翻译：能够获得高照明效率并实现均匀曝光的曝光装置
公开(公告)号：KR1020040067820A
公开(公告)日：2004-07-30
申请号：KR1020030094487
申请日：2003-12-22
申请人： 후지필름 가부시키가이샤
发明人： 오모리토시히코
IPC分类号： G03F7/20
CPC分类号： B41J2/46 , G02B6/06 , G02B27/0927 , G02B27/0961 , G02B27/0994 , G02B2006/0098 , H04N5/7458
摘要： PURPOSE: Provided is an exposure apparatus which is capable of obtaining high illumination efficiency and performing uniform exposure. CONSTITUTION: The exposure apparatus comprises a light source; an optical integrator to which light is supplied from the light source; and a two-dimensional spatial light modulator illuminated by light which has transmitted the optical integrator, wherein the light source comprises an optical fiber bundle in which a plurality of optical fibers are arranged and light is emitted from the plurality of optical fibers, and the configuration of a light-emitting area (192) formed at an end portion (174E) of the optical fiber bundle is, as seen from the light-emitting side, substantially similar to the contour configuration of the light-emitting surface of the optical integrator, wherein the optical integrator is a fly-eye type or a rod type.
摘要翻译：目的：提供能够获得高照明效率并且均匀曝光的曝光装置。构成：曝光装置包括光源; 从光源供应光的光学积分器; 以及透过光积分器的由光照射的二维空间光调制器，其中，所述光源包括其中布置有多根光纤并从所述多根光纤发射光的光纤束，从光发射侧看，形成在光纤束的端部（174E）处的发光区域（192）基本上类似于光学积分器的发光表面的轮廓构造，其中所述光学积分器是蝇眼型或杆型。

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