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1. 发明公开

KR1020090116809A 진공 코팅 장치 无效
标题翻译：真空涂装装置
公开(公告)号：KR1020090116809A
公开(公告)日：2009-11-11
申请号：KR1020097020095
申请日：2008-02-29
申请人： 텔 솔라 아게
发明人： 진델,아르노 , 포펠러,마르쿠스 , 짐인,드미트리 , 쿤,한스외르그 , 케슈바우머,요르그
IPC分类号： C23C14/56 , C23C16/54 , C23C14/08 , C23C16/40
CPC分类号： C23C14/568 , C23C14/541 , C23C16/54
摘要： An inline vacuum processing apparatus for processing of substrates in vacuum comprises at least one load-lock chamber (10), at least two subsequent deposition chambers (4-7) to be operated with essentially the same set of coating parameters and at least one unload-lock chamber (10) plus means for transferring, post-processing and/or handling substrates through and in the various chambers. A method for depositing a thin film on a substrate in such processing system comprises the steps of introducing a first substrate into a load-lock chamber, lowering the pressure in said chamber; transferring the substrate into a first deposition chamber; depositing a layer of a first material on said first substrate using a first set of coating parameters; transferring said first substrate into a second, subsequent deposition chamber of said inline system without breaking vacuum and depositing a further layer of said first material on said first substrate using substantially the same set of parameters. Simultaneously to step f) a second substrate is being treated in said inline vacuum system according to step d).
摘要翻译：用于在真空中处理衬底的在线真空处理设备包括至少一个装载锁定室（10），至少两个随后的沉积室（4-7），其基本上具有相同的一组涂层参数和至少一个卸载 - 锁定室（10）以及用于通过各室和在各个室中传送，后处理和/或处理基板的装置。一种在这种处理系统中在衬底上沉积薄膜的方法包括以下步骤：将第一衬底引入加载锁定室，降低所述腔室中的压力; 将衬底转移到第一沉积室中; 使用第一组涂层参数在所述第一衬底上沉积第一材料层; 将所述第一衬底转移到所述在线系统的第二后续沉积室中，而不会破坏真空并且使用基本上相同的参数集将所述第一材料的另一层沉积在所述第一衬底上。在步骤f）的同时，根据步骤d）在所述在线真空系统中处理第二衬底。

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