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    • 6. 发明公开
    • 사출금형 재활용을 위한 표면코팅막 제거 방법
    • 去除涂层以重新注射模具的方法
    • KR1020140000522A
    • 2014-01-03
    • KR1020120067715
    • 2012-06-25
    • 주식회사 한국몰드
    • 고일주최규남이하용이영민
    • B29C33/74C23C16/50
    • The present invention relates to a method for removing a surface coated layer to reuse an injection mold which makes reuse possible by easily removing a diamond like carbon (DLC) coated layer using temperature rising and plasma gas without influencing a base material. The method for removing a surface coated layer to reuse the injection mold comprises the steps of: charging the injection mold into a furnace and forming a vacuum state; performing a glow discharge on the surface of the injection mold under argon gas and hydrogen gas condition; performing a plasma nitriding by forming plasmas on the surface of the injection mold under nitrogen gas and hydrogen gas condition; forming the plasmas under methane gas and hydrogen gas condition and making activated carbons among the plasmas evaporate onto the nitrided surface of the injection mold in order to form a DLC coated layer; and removing the DLC coated layer for surface reprocessing to reuse the injection mold and evaporating under oxygen and argon gas condition and removing the DLC coated layer formed on the surface of the injection mold using the plasma gas and pulsed power. [Reference numerals] (AA) Repeat; (S1) Mold forming step; (S2) Oil removing step; (S3) Inserting and vacuum exhausting step; (S4,S10) Glow discharging step; (S5) Ionnitriding step; (S6) DLC coating step; (S7) Cooling and discharging step; (S8) DLC coating layer removing step; (S9) Surface reprocessing step
    • 本发明涉及一种用于去除表面涂层以重新使用注射模具的方法,其通过使用升温和等离子体气体容易地去除类金刚石碳(DLC)涂层而不影响基底材料而使得可重复使用。 用于去除表面涂层以重新使用注射模具的方法包括以下步骤:将注射模具装入炉中并形成真空状态; 在氩气和氢气条件下在注射模具表面进行辉光放电; 通过在氮气和氢气条件下在注射模具的表面上形成等离子体来进行等离子体氮化; 在甲烷气体和氢气条件下形成等离子体并使等离子体中的活性炭蒸发到注射模具的氮化表面上,以形成DLC涂层; 并除去用于表面再处理的DLC涂层以重新使用注塑模具并在氧气和氩气条件下蒸发,并使用等离子体气体和脉冲功率去除在注塑模具表面上形成的DLC涂层。 (标号)(AA)重复; (S1)成型步骤; (S2)除油步骤; (S3)插入和真空排气步骤; (S4,S10)发光放电步骤; (S5)离子氮化步骤; (S6)DLC涂布步骤; (S7)冷却和排放步骤; (S8)DLC涂层除去工序; (S9)表面再加工步骤
    • 7. 发明公开
    • 대면적 사출금형 표면처리 방법
    • 用于处理具有大面积面积的注射模具表面的方法
    • KR1020130134056A
    • 2013-12-10
    • KR1020120057298
    • 2012-05-30
    • 주식회사 한국몰드
    • 고일주최규남이하용이영민
    • C23C8/24B29C33/56
    • B29C33/56C23C8/02C23C8/34
    • The present invention relates to a method for treating the surface of an injection mold. The present invention can obtain surface hardness and wear resistance through plasma nitrification, enable continuous coating by controlling surficial nitrides in a plasma nitride process, and can increase the adhesion force of a coating film by the rough surface. The present invention comprises the steps of: injecting an injection mold into a furnace and making the furnace in a vacuum state; glow-discharging the surface of the injection mold under an argon and hydrogen gas atmosphere; plasma-nitriding the surface of the injection mold by forming plasma on the surface of the injection mold under an nitrogen and hydrogen gas atmosphere. In the plasma nitriding step, the surface of the injection mold is glow-discharged to plasma-nitride the surface of the injection mold because 600 V is supplied under the atmosphere of the nitrogen and hydrogen gases by putting nitrogen gas (N2) and hydrogen gas (H2) under 1 Torr. The plasma nitride process uses micro pulse power as the power supply with a power cycle in which On-time/Off-time is set as 5/15. The internal atmosphere temperature of a vacuum chamber as the temperature of the process is at 420°C. [Reference numerals] (S1) Mold forming step;(S2) Oil removing step;(S3) Inserting and vacuum exhausting step;(S4) Glow discharging step;(S5) Ionnitriding step;(S6) Cooling and discharging step
    • 本发明涉及一种处理注射模具表面的方法。 本发明可以通过等离子体硝化获得表面硬度和耐磨性,能够通过在氮化物等离子体处理中控制表面氮化物进行连续涂布,并且可以增加粗糙表面对涂膜的粘附力。 本发明包括以下步骤:将注射模注入炉中并使炉处于真空状态; 在氩气和氢气气氛下对喷射模具的表面进行辉光放电; 通过在氮气和氢气气氛下在注射模具的表面上形成等离子体来等离子体渗透注塑模具的表面。 在等离子体氮化步骤中,通过将氮气(N 2)和氢气(N 2)和氢气(N 2)在氮气和氢气的气氛下供给600V,将注射模具的表面辉光放电到等离子体氮化物, (H2)在1乇以下。 等离子氮化物处理使用微脉冲功率作为电源,其中开/关时间设置为5/15。 当过程温度为420℃时,真空室的内部气氛温度。 (S1)成型工序;(S2)除油工序;(S3)插入和真空排气步骤;(S4)辉光放电步骤;(S5)离子氮化步骤;(S6)冷却和排出步骤
    • 8. 发明公开
    • 대면적 사출금형 복합 플라즈마 표면처리 장비
    • 使用等离子体处理大面积喷射模具的表面处理装置
    • KR1020140000523A
    • 2014-01-03
    • KR1020120067716
    • 2012-06-25
    • 주식회사 한국몰드
    • 고일주최규남이하용이영민
    • C23C8/26C23C16/50B29C33/70
    • B29C33/56C23C8/36C23C16/26
    • The present invention relates to an apparatus for treating the surface of large area injection molded complex plasma capable of stably placing a large and high weight injection mold, treating a surface, evenly maintaining the dispersion of temperature in a process chamber by responding to the large and high weight injection mold, optimizing the injection of gas and the location of a pump in order to evenly disperse gas in the process chamber, and having the optimal and uniform effect of surface treatment by controlling micro pulse power. The present invention includes: a base frame; a process chamber which is installed in the upper part of the base frame, is hollow, has an opening on one end part, and has a rail for a jig formed therein in the lengthwise direction; a base rail installed on the bottom in the opening of the process chamber; a moving frame moving in the upper part of the base rail along a rail; a cover which is installed in the upper part of the moving frame and is formed so as to open and close the opening of the process chamber; and a jig which has one end fixated to the cover and has a workpiece installed on the upper part by having a roller placed on the rail for a jig in the lower part of the other end.
    • 本发明涉及一种用于处理大面积注塑复合等离子体表面的装置,其能够稳定地放置大型和高重量注射模具,处理表面,均匀地保持处理室中的温度分散, 高重量注射模具,优化气体注入和泵的位置,以均匀分散气体到处理室,并通过控制微脉冲功率具有最佳和均匀的表面处理效果。 本发明包括:基架; 安装在基架的上部的处理室是中空的,在一个端部具有开口,并且在长度方向上具有用于夹具的导轨, 安装在处理室开口底部的基轨; 移动框架沿着轨道在所述基轨的上部中移动; 安装在移动框架的上部并形成为打开和关闭处理室的开口的盖子; 以及夹具,其一端固定在盖上,并且通过在另一端的下部具有放置在轨道上的夹具用于安装在上部上的工件。
    • 9. 发明授权
    • 사출 성형 장치
    • 注射成型设备
    • KR101228616B1
    • 2013-01-31
    • KR1020100048672
    • 2010-05-25
    • 덕양산업 주식회사주식회사 한국몰드
    • 윤성현이상락곽성복조희수이한영문찬성이하용최규남
    • B29C45/56B29C45/63B29C45/58
    • 사출 성형 장치가 개시된다. 본 발명에 따른 사출 성형 장치는, 용융된 수지를 수용하는 금형 캐비티의 일면에 마련되며, 상기 용융된 수지가 상기 금형 캐비티로 주입되는 것을 인식하는 제1 센서; 상기 금형 캐비티의 일면과 연통되고, 상기 제1 센서에 의해 상기 용융된 수지가 상기 금형 캐비티로 주입되는 것이 인식되면 상기 금형 캐비티의 기설정된 부분에 존재하는 가스를 집중적으로 흡입하는 흡입홀; 상기 흡입홀의 일측에 구비되어 상기 금형 캐비티의 일면 중 일부를 형성하며, 상기 가스의 흡입시 상기 용융된 수지의 유동 속도가 변화되거나 상기 용융된 수지가 상기 흡입홀로 흡입되는 것을 방지하는 가스 흡입 조절부; 및 상기 흡입홀에 마련되어, 상기 제1 센서에 의해 상기 용융된 수지가 상기 금형 캐비티로 주입되는 것이 인식되면 상기 흡입홀을 개방하고, 상기 금형 캐비티에 용융된 수지가 수용된 이후에 기설정된 시간이 경과하면 상기 흡입홀을 폐쇄하는 밸브를 포함하는 것을 특징으로 한다.