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    • 6. 发明公开
    • 중합체 및 이를 포함하는 감광성 수지 조성물
    • 聚合物和光敏树脂组合物包括它们
    • KR1020120116678A
    • 2012-10-23
    • KR1020110034267
    • 2011-04-13
    • 주식회사 엘지화학
    • 김한수김미애박지영류장현허윤희조창호김선화정원진
    • C08G63/66C08G65/28C08L67/00G03F7/027
    • PURPOSE: A polymer is provided to improve chemical resistance by using a polymer of the shape of a hyper branch comprising an allyl group, and to prevent degradation of re-solubility by accepting an aryl-based reactive group. CONSTITUTION: A polymer comprises a unit originated from a monomer comprising an allyl group and an epoxy group, a unit originated from diol comprising acid components, and a unit originated from anhydride comprising acid components. The acid value of the polymer is 30-150 KOH mg/g and the weight average molecular weight is 3,000-50,000. The photoresist resin composition is a polymer, a polymerizable compound comprising ethylenically unsaturated bond, a photo-initiator, and solvent. The content of the polymer is 1-20 weight% based on total weight of the photoresist resin composition.
    • 目的:提供通过使用包含烯丙基的高分支形状的聚合物来提高耐化学性的聚合物,并通过接受芳基反应性基团来防止再溶解度的降低。 构成:聚合物包含源自包含烯丙基和环氧基的单体的单元,源自包含酸组分的二醇的单元和源自包含酸组分的酐的单元。 聚合物的酸值为30-150KOHmg / g,重均分子量为3,000-50,000。 光致抗蚀剂树脂组合物是聚合物,包含烯属不饱和键的可聚合化合物,光引发剂和溶剂。 聚合物的含量相对于光致抗蚀剂树脂组合物的总重量为1-20重量%。