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1. 发明授权

KR101539612B1 폴리이미드 전구체용 반응성 단량체 및 이를 이용한네가티브형 감광성 폴리이미드 전구체 有权
标题翻译：用于聚酰亚胺前体的反应性单体和使用其的负型光敏聚酰亚胺前体
公开(公告)号：KR101539612B1
公开(公告)日：2015-07-28
申请号：KR1020080069827
申请日：2008-07-18
申请人： 주식회사 동진쎄미켐
发明人： 최성묵 , 최중근 , 최진욱
IPC分类号： C07C37/16 , C07C39/18 , C08G73/10
摘要： 본발명에따르면상기반응성단량체를이용하여고감도의네가티브형감광성폴리이미드전구체를용이하게제조할수 있다.

2. 发明授权

KR101481729B1 폴리이미드 전구체용 반응성 단량체 및 이를 이용한폴리이미드 전구체 有权
标题翻译：用于聚酰亚胺前体的反应性单体和使用其的聚酰亚胺前体
公开(公告)号：KR101481729B1
公开(公告)日：2015-01-12
申请号：KR1020070140472
申请日：2007-12-28
申请人： 주식회사 동진쎄미켐
发明人： 최성묵 , 최중근 , 최진욱
IPC分类号： C07F7/18 , C07F7/08
摘要： 본 발명은 폴리이미드 전구체용 반응성 단량체 및 이를 이용한 폴리이미드 전구체에 관한 것으로서, 보다 상세하게는 벤젠고리에 에폭시기, 실란기, 및 아크릴기로 이루어진 군에서 선택된 2종 또는 3종의 치환기를 포함하는 폴리이미드 전구체용 반응성 단량체 및 이를 이용한 폴리이미드 전구체를 제공한다. 본 발명에 따른 상기 반응성 단량체를 이용하여 얻어진 신규 폴리이미드 전구체는 모든 기재와의 접착력이 향상될 뿐만 아니라 소량 사용으로도 물성저하가 없으며 충분한 접착력을 나타낼 수 있다.
폴리이미드 전구체, 반응성 단량체, 접착력

3. 发明授权

KR101775138B1 반응성 단량체, 이의 제조방법 및 이로부터 얻어진포지티브형 감광성 폴리이미드 전구체 有权
公开(公告)号：KR101775138B1
公开(公告)日：2017-09-05
申请号：KR1020080052413
申请日：2008-06-04
申请人： 주식회사 동진쎄미켐
发明人： 최성묵 , 최중근 , 최진욱
IPC分类号： G03F7/039 , G03F7/037
摘要： 본발명은반응성단량체, 이의제조방법및 이로부터얻어진포지티브형감광성폴리이미드전구체에관한것으로, 보다상세하게는아크릴기, 에폭시기및 나프토퀴논디아지드술포닐기를갖는반응성단량체, 이의제조방법, 및이로부터얻어진잔막율이향상된포지티브형감광성폴리이미드전구체에관한것이다. 본발명에따른반응성단량체를이용하여포지티브형감광성폴리이미드전구체를제조하면나프토퀴논디아지드술포닐화합물을단순혼합한것보다잔막율을크게향상시킬수 있으며, 폴리이미드전구체구조에제한없이원하는구조의포지티브형감광성폴리이미드전구체를용이하게제조할수 있다.

4. 发明公开

KR1020100009110A 폴리이미드 전구체용 반응성 단량체 및 이를 이용한네가티브형 감광성 폴리이미드 전구체 有权
标题翻译：聚酰亚胺前体的反应性单体和使用它的负型型光敏聚酰亚胺前体
公开(公告)号：KR1020100009110A
公开(公告)日：2010-01-27
申请号：KR1020080069827
申请日：2008-07-18
申请人： 주식회사 동진쎄미켐
发明人： 최성묵 , 최중근 , 최진욱
IPC分类号： C07C37/16 , C07C39/18 , C08G73/10
摘要： PURPOSE: A reactive monomer for a polyimide precursor is provided to easily prepare a high-sensitivity negative-type photosensitive polyimide precursor through a simple process. CONSTITUTION: A method for manufacturing a reactive monomer for a polyimide precursor represented by chemical formula 1 comprises the steps of: reacting a compound represented by chemical formula 2 with a compound represented by chemical formula 3: R1-X3; and reacting the reactant with a compound represented by chemical formula 4: R2-OH.
摘要翻译：目的：提供用于聚酰亚胺前体的反应性单体以通过简单的方法容易地制备高灵敏度负型光敏聚酰亚胺前体。构成：由化学式1表示的聚酰亚胺前体反应性单体的制造方法，其特征在于，使化学式2表示的化合物与化学式3表示的化合物反应：R1-X3，并使反应物与化学式4表示的化合物反应：R2-OH。

5. 发明公开

KR1020090126370A 반응성 단량체, 이의 제조방법 및 이로부터 얻어진포지티브형 감광성 폴리이미드 전구체 有权
标题翻译：反应性单体，其制备方法和阳离子型光敏聚酰亚胺前体
公开(公告)号：KR1020090126370A
公开(公告)日：2009-12-09
申请号：KR1020080052413
申请日：2008-06-04
申请人： 주식회사 동진쎄미켐
发明人： 최성묵 , 최중근 , 최진욱
IPC分类号： G03F7/039 , G03F7/037
CPC分类号： G03F7/039 , C08G73/1017 , C08L79/08 , G03F7/0226 , G03F7/0233 , G03F7/0392 , G03F7/105 , H01L2924/01019
摘要： PURPOSE: A method for manufacturing a reactive monomer, and the reactive monomer manufactured by the method are provided to improve residual film rate remarkably and to allow a positive photosensitive polyimide precursor of the desired structure to be prepared easily. CONSTITUTION: A method for manufacturing a reactive monomer represented by the formula 1 comprises the steps of reacting a compound represented by the formula 2 with a compound represented by R1-OH; and reacting the obtained product with a compound represented by R2-X2 and a compound represented by R3-X3, wherein R1 is an aliphatic group of the carbon number 3 ~ 20 or a monovalent organic group containing at least one aromatic unsaturated double bond; R2 is a monovalent organic group containing at least one epoxy group of the carbon number 2 ~ 20; R3 is a 1,2-naphthoquinonediazide-4- sulfonyl group or a 1,2-naphthoquinonediazide-5-sulfonyl group; X1 and X2 are independently Cl or Br; and X3 is Cl.
摘要翻译：目的：提供制造反应性单体的方法和通过该方法制备的反应性单体，以显着提高残留膜速率，并且容易地制备所需结构的正型光敏聚酰亚胺前体。构成：由式1表示的反应性单体的制造方法包括使式2表示的化合物与由R 1 -OH表示的化合物反应的工序; 并使所得产物与由R 2 -X 2表示的化合物和由R3-X3表示的化合物反应，其中R 1为碳数3〜20的脂族基团或含有至少一个芳族不饱和双键的一价有机基团; R2是含有至少一个碳原子数2〜20的环氧基的一价有机基团; R3是1,2-萘醌二叠氮化物-4-磺酰基或1,2-萘醌二叠氮化物-5-磺酰基; X1和X2独立地为Cl或Br; 而X3是Cl。

6. 发明公开

KR1020090072379A 폴리이미드 전구체용 반응성 단량체 및 이를 이용한폴리이미드 전구체 有权
标题翻译：聚酰亚胺前体的反应性单体和使用它的聚酰亚胺前体
公开(公告)号：KR1020090072379A
公开(公告)日：2009-07-02
申请号：KR1020070140472
申请日：2007-12-28
申请人： 주식회사 동진쎄미켐
发明人： 최성묵 , 최중근 , 최진욱
IPC分类号： C07F7/18 , C07F7/08
CPC分类号： C07F7/08
摘要： A reactive monomer for polyimide precursor is provided to improve adhesiveness with a substrate even in a small amount by inducing unsaturated double bond. A reactive monomer for polyimide precursor is denoted by the chemical formula 1. A method for manufacturing the reactive monomer for polyimide precursor comprises: a step of reacting a compound of the chemical formula 3 with a compound of the chemical formula 2; and a step of reacting the reacted product with compounds of the chemical formulas 4 and 5. In the chemical formulas 2, 3, 4, and 5, X1 and X2 is each Cl or Br. The compound of the chemical formula 3 is one or more selected a group comprising N-(hydroxymethly)methacrylamide, 2-hydroxypropyl-2-(methacryloyloxy)ethyl phthalate, 4-hydroxybutyl acrylate, N-(hydroxymethyl)methacrylamide, 2-hydroxyethylmethacrylate, N-(2-hydroxyethyl)methacrylamide and 2-hydroxypropyl acrylamide. The compound of the chemical formula 4 is one or more groups comprising bromomethyl trimethylsilane, allyl bromo dimethyl silane, chloro dimethyl phenyl silane, chloromethyl trimethylsilane, butyl dimethyl chlorosilane, chloro dimethyl isopropyl silane, chloro dimethyl ethylsilane, allyl chloromethyl dimethyl silane, 4- bromophenoxy trimethylsilane, 3- chloropropylethoxysilane and 3- chloropropyltrimethoxysilane.
摘要翻译：提供用于聚酰亚胺前体的反应性单体，以通过诱导不饱和双键来提高与基材的粘附性，即使是少量。用于聚酰亚胺前体的反应性单体由化学式1表示。一种制备聚酰亚胺前体反应性单体的方法包括：使化学式3的化合物与化学式2的化合物反应的步骤; 和使反应产物与化学式4和5的化合物反应的步骤。在化学式2,3,4和5中，X1和X2分别为Cl或Br。化学式3的化合物是选自包括N-（羟基甲基）甲基丙烯酰胺，2-羟丙基-2-（甲基丙烯酰氧基）乙基邻苯二甲酸酯，4-羟基丁基丙烯酸酯，N-（羟甲基）甲基丙烯酰胺，甲基丙烯酸2-羟基乙酯， N-（2-羟乙基）甲基丙烯酰胺和2-羟丙基丙烯酰胺。化学式4的化合物是一种或多种包括溴甲基三甲基硅烷，烯丙基溴二甲基硅烷，氯代二甲基苯基硅烷，氯甲基三甲基硅烷，丁基二甲基氯硅烷，氯代二甲基异丙基硅烷，氯代二甲基乙基硅烷，烯丙基氯甲基二甲基硅烷，4-溴苯氧基三甲基硅烷，3-氯丙基乙氧基硅烷和3-氯丙基三甲氧基硅烷。

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