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    • 1. 发明公开
    • 광분해 고도산화공정을 이용한 금속막의 연마 장치 및 방법
    • 使用光催化高级氧化工艺抛光金属层的装置和方法
    • KR1020140022653A
    • 2014-02-25
    • KR1020120089064
    • 2012-08-14
    • 주식회사 동진쎄미켐
    • 임진혁박종대최정민
    • H01L21/304
    • H01L21/3212B24B37/04B24B57/02
    • The present invention discloses a device and a method for mechanically polishing a metal film using a photolysis oxidation process. The metal film polishing process comprises a step of generating an OH radical by irradiating chemical-mechanical polishing slurry with ultraviolet ray including ozone (O3); a step of making the OH radical-generated chemical-mechanical polishing slurry composition come in contact with a substrate with a metal film; and a step of polishing the metal film by moving the metal film, which is oxidized by the OH radical, along a polishing pad in which the OH radical is generated by the ultraviolet ray after the ozone reacts with the water of the chemical-mechanical polishing slurry. [Reference numerals] (AA) Step of salting washed radish in salt water; (BB) Step of dehydrating the salted radish, followed by mixing with sub-ingredients; (CC) Step of preparing a red beet dongchimi liquid
    • 本发明公开了一种使用光解氧化法机械研磨金属膜的装置和方法。 金属膜抛光方法包括通过用包括臭氧(O 3)在内的紫外线照射化学机械抛光浆液而产生OH自由基的步骤; 使OH自由基产生的化学机械抛光浆料组合物与金属膜接触的步骤; 以及通过在臭氧与化学机械抛光的水反应后沿着通过紫外线产生OH自由基的抛光垫移动由OH自由基氧化的金属膜来抛光金属膜的步骤 泥浆。 (附图标记)(AA)盐水中洗涤萝卜盐水的步骤; (BB)将咸萝卜脱水,然后与次成分混合; (CC)准备红甜菜东芝液的步骤
    • 3. 发明公开
    • 생촉매 페록시다아제를 포함하는 텅스텐 연마 조성물
    • 含有生物化学过氧化物的硫化钨抛光组合物
    • KR1020110036294A
    • 2011-04-07
    • KR1020090093877
    • 2009-10-01
    • 주식회사 동진쎄미켐
    • 박혜정임진혁박종대공현구
    • C09K3/14
    • C09G1/02C09K3/1409C09K3/1454H01L21/30625
    • PURPOSE: A tungsten polishing composition is provided to ensure stable polishing rate while not generating Fe ions(Fe3+) and to prevent defects and erosion generated on a tungsten wafer by biocatalizer peroxidase as a catalyst. CONSTITUTION: A tungsten polishing composition comprises a peroxidase biocatalyst, abrasive and oxidizer. The peroxidase is selected from the group consisting of horseradish peroxidase, coprinus peroxidase, and glutathion peroxidase. The peroxidase is included in the amount of 0.0001~1.0 weight%. The abrasive is selected from the group consisting of γ-alumina, α-alumina, fumed silica, colloidal silica, ceria, and their mixture.
    • 目的:提供钨抛光组合物以确保稳定的抛光速率,同时不产生Fe离子(Fe3 +),并防止生物催化剂过氧化物酶作为催化剂在钨晶片上产生的缺陷和侵蚀。 构成:钨抛光组合物包含过氧化物酶生物催化剂,磨料和氧化剂。 过氧化物酶选自辣根过氧化物酶,香菇过氧化物酶和谷胱甘肽过氧化物酶。 过氧化物酶的含量为0.0001〜1.0重量%。 研磨剂选自γ-氧化铝,α-氧化铝,热解二氧化硅,胶体二氧化硅,二氧化铈及其混合物。