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1. 发明公开

KR1020120054242A 포토레지스트 조성물 有权
标题翻译：光电组合物
公开(公告)号：KR1020120054242A
公开(公告)日：2012-05-30
申请号：KR1020100115517
申请日：2010-11-19
申请人： 주식회사 동진쎄미켐
发明人： 김승기 , 변자훈 , 김병욱 , 김동민 , 이원영 , 제갈은 , 박주경 , 주상일 , 함선미 , 이두연 , 박일규 , 정기화 , 김경호 , 홍우성
IPC分类号： G03F7/022 , G03F7/004 , H01L21/027
CPC分类号： G03F7/022 , G03F7/004 , G03F7/0045 , H01L21/027 , H01L21/0271
摘要： PURPOSE: A photoresist composition and a method for forming patterns using the same are provided to prevent the generation of coating stains and to improve the uniformity of coating. CONSTITUTION: A photoresist composition includes 5-30 weight% of novolak resin, 2-10 weight% of diazide-based photo-sensitive compound, 1-70 weight% of co-solvent represented by chemical formula 1, and remaining amount of an organic solvent. In chemical formula 1, R1 is a hydrogen element or an alkyl group with 1 to 10 linear or branched carbon elements; R2 is an alkyl group or allyl group with 1 to 10 linear or branched carbon elements. The co-solvent represented by chemical formula 1 is one selected from a group including dimethyl-2-methylketoglutarate, dimethyl adipate, dimethyl glutarate, dimethyl succinate, diisobutyl adipate, diisobutyl glutarate, and diisobutyl succinate.
摘要翻译：目的：提供光致抗蚀剂组合物和使用其形成图案的方法，以防止涂层污渍的产生并提高涂层的均匀性。构成：光致抗蚀剂组合物包括5-30重量％的酚醛清漆树脂，2-10重量％的二叠氮基光敏化合物，1-70重量％的由化学式1表示的助溶剂和剩余量的有机溶剂。在化学式1中，R 1是氢元素或具有1至10个直链或支链碳元素的烷基; R2是具有1至10个直链或支链碳元素的烷基或烯丙基。由化学式1表示的共溶剂是选自包括二甲基-2-甲基酮戊二酸酯，己二酸二甲酯，戊二酸二甲酯，琥珀酸二甲酯，己二酸二异丁酯，戊二酸二异丁酯和琥珀酸二异丁酯的基团。

2. 发明公开

KR1020120054241A 포토레지스트 조성물 无效
标题翻译：光电组合物
公开(公告)号：KR1020120054241A
公开(公告)日：2012-05-30
申请号：KR1020100115516
申请日：2010-11-19
申请人： 주식회사 동진쎄미켐
发明人： 김승기 , 변자훈 , 김병욱 , 김동민 , 이원영 , 제갈은 , 박주경 , 주상일 , 함선미 , 이두연 , 박일규 , 정기화 , 김경호 , 홍우성
IPC分类号： G03F7/022 , G03F7/40
CPC分类号： G03F7/0236 , C08G8/08 , G03F7/0048 , G03F7/0752 , G03F7/168 , G03F7/425
摘要： PURPOSE: A photoresist composition and a method for forming patterns using the same are provided to improve resolution and to reduce the width of wiring by minimizing the etching bias of an active layer at industrial field. CONSTITUTION: A photoresist composition includes 5-30 weight% of novolak resin, 2-10 weight% of diazide-based photo-sensitive compounds, 0.1-6 weight% of mercapto compounds, and remaining amount of organic solvent. The mercapto compounds are represented by chemical formula 1 or 2. In chemical formula 1 or 2, R1 is an alkyl group or allyl group with 1 to 20 linear or branched carbon elements. The mercapto compound represented by chemical formula 1 is 2-mercaptoethanol. The mercapto compound represented by chemical formula 2 is 3-mercaptopropionate. The novolak resin is the mixture of two or more compounds.
摘要翻译：目的：提供光致抗蚀剂组合物和使用其形成图案的方法，以通过最小化工业领域的活性层的蚀刻偏压来提高分辨率和减小布线的宽度。构成：光致抗蚀剂组合物包括5-30重量％的酚醛清漆树脂，2-10重量％的二叠氮基光敏化合物，0.1-6重量％的巯基化合物和剩余量的有机溶剂。巯基化合物由化学式1或2表示。在化学式1或2中，R 1是具有1至20个直链或支链碳元素的烷基或烯丙基。由化学式1表示的巯基化合物是2-巯基乙醇。由化学式2表示的巯基化合物是3-巯基丙酸酯。酚醛清漆树脂是两种或更多种化合物的混合物。

3. 发明公开

KR1020120138578A 포토레지스트 조성물 无效
标题翻译：光电组合物
公开(公告)号：KR1020120138578A
公开(公告)日：2012-12-26
申请号：KR1020110058155
申请日：2011-06-15
申请人： 주식회사 동진쎄미켐
发明人： 제갈은 , 김동민 , 이원영 , 김승기 , 변자훈 , 김병욱 , 박주경 , 주상일 , 함선미 , 이두연 , 박일규 , 정기화 , 김경호 , 홍우성
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： G03F7/0223 , G03F7/0226 , H01L21/0273 , H01L21/0274
摘要： PURPOSE: A photoresist composition is provided to improve the dissolution of a polymer resin, and the resolution, the development contrast, and the photosensitivity of a photoresist film by using a glutaraldehyde-based novolak resin. CONSTITUTION: A photoresist composition includes 5-30 weight% of a novolak resin, 2-10 weight% of a diazide-based photosensitive compound, 0.1-10 weight% of a sensitivity enhancer, and remaining amount of an organic solvent. The novolak resin is the condensation polymer of a phenol compound and glutaraldehyde, and the weight average molecular weight of the novolak resin is in a range between 2,000 and 20,000. In the novolak resin, 2-50 parts by weight of the glutaraldehyde are used based on 100 parts by weight of the phenol compound. [Reference numerals] (AA) Embodiment 1; (BB) Embodiment 2; (CC) Embodiment 3; (DD) Comparative Embodiment 1; (EE) H/B = Skip; (FF) H/B = 130°C; (GG) H/B = 135°C
摘要翻译：目的：提供光致抗蚀剂组合物以通过使用戊二醛基酚醛清漆树脂来改善聚合物树脂的溶解性，以及光刻胶膜的分辨率，显影对比度和光敏性。构成：光致抗蚀剂组合物包括5-30重量％的酚醛清漆树脂，2-10重量％的二叠氮基感光性化合物，0.1-10重量％的灵敏度增强剂和剩余量的有机溶剂。酚醛清漆树脂是酚化合物和戊二醛的缩聚物，酚醛清漆树脂的重均分子量在2,000和20,000之间的范围内。在酚醛清漆树脂中，基于100重量份的酚化合物，使用2-50重量份的戊二醛。（附图标记）（AA）实施例1; （BB）实施例2; （CC）实施例3; （DD）比较实施例1; （EE）H / B =跳过; （FF）H / B = 130℃; （GG）H / B = 135℃

4. 发明公开

KR1020140106995A 포토레지스트 조성물 및 그를 이용한 표시 장치의 제조 방법 审中-实审
标题翻译：使用其的显示装置的光电组合物和制造方法
公开(公告)号：KR1020140106995A
公开(公告)日：2014-09-04
申请号：KR1020130021421
申请日：2013-02-27
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 박귀현 , 홍필순 , 주진호 , 김태균 , 변진수 , 김동민 , 김승기 , 이두연
IPC分类号： G03F7/004 , G03F7/028 , G03F7/008 , G02F1/13
CPC分类号： G03F7/0085 , G03F7/0007 , G03F7/0048 , G03F7/022 , G03F7/0236 , G03F7/20 , G03F7/30 , H01L21/312 , G03F7/0045 , G02F1/13 , G02F1/1303 , G03F7/004 , G03F7/008 , G03F7/028
摘要： A photoresist composition, according to an embodiment of the present invention, comprises a binder resin including novolak resin shown in the chemical formula 1 below; a diazide-based photosensitive initiator; and solvents, wherein the solvents include a base solvent and an auxiliary solvent. The base solvent is propylene glycol monomethyl etheracetate (PGMEA), and the auxiliary solvent consists of dimethyl-2-methylglutarate (DMMGA) and ethyl beta-ethoxypropionate (EEP). [Chemical formula 1] In chemical formula 1, R1 to R9 is a hydrogen atom or alkyl groups, a is an integer of 0 to 10, b is an integer of 0 to 100, and c is an integer of 1 to 10.
摘要翻译：根据本发明的实施方案的光致抗蚀剂组合物包含粘合剂树脂，其包含下述化学式1所示的酚醛清漆树脂; 二叠氮基感光引发剂; 和溶剂，其中所述溶剂包括碱性溶剂和辅助溶剂。基础溶剂是丙二醇单甲醚乙酸酯（PGMEA），辅助溶剂由二甲基-2-甲基戊二酸（DMMGA）和β-乙氧基丙酸乙酯（EEP）组成。 [化学式1]在化学式1中，R 1〜R 9为氢原子或烷基，a为0〜10的整数，b为0〜100的整数，c为1〜10的整数。

5. 发明授权

KR102058651B1 포토레지스트 조성물 및 그를 이용한 표시 장치의 제조 방법 有权
公开(公告)号：KR102058651B1
公开(公告)日：2019-12-24
申请号：KR1020130021421
申请日：2013-02-27
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 박귀현 , 홍필순 , 주진호 , 김태균 , 변진수 , 김동민 , 김승기 , 이두연
IPC分类号： G03F7/004 , G03F7/028 , G03F7/008 , G02F1/13

6. 发明授权

KR101737567B1 포토레지스트 조성물 有权
标题翻译：光刻胶组成
公开(公告)号：KR101737567B1
公开(公告)日：2017-05-18
申请号：KR1020100115517
申请日：2010-11-19
申请人： 주식회사 동진쎄미켐
发明人： 김승기 , 변자훈 , 김병욱 , 김동민 , 이원영 , 제갈은 , 박주경 , 주상일 , 함선미 , 이두연 , 박일규 , 정기화 , 김경호 , 홍우성
IPC分类号： G03F7/022 , G03F7/004 , H01L21/027
摘要： 본발명은포토레지스트조성물에관한것으로, 보다상세하게는 (a) 노볼락수지 5 ~ 30 중량%, (b) 디아지드계감광성화합물 2 ~10 중량%, (c) 디알킬에테르계공용매 1 내지 70 중량%, 및 (d) 유기용매잔량을포함하여진공건조시역페이퍼상이되지않으며도포균일도가우수하고도포얼룩을방지할수 있는포토레지스트조성물을제공한다.
摘要翻译：更具体地说，本发明涉及一种光刻胶组合物，它含有（a）5至30％（重量）的酚醛清漆树脂，（b）2至10％（重量）的二叠氮化物光敏化合物，（c）（d）残留量的有机溶剂，光致抗蚀剂组合物的涂布均匀性优异，可以防止涂布污染。

7. 发明公开

KR1020170029285A 구리막용 포토레지스트 조성물 审中-实审
标题翻译：铜层的光电组合物
公开(公告)号：KR1020170029285A
公开(公告)日：2017-03-15
申请号：KR1020150126435
申请日：2015-09-07
申请人： 주식회사 동진쎄미켐
发明人： 김봉진 , 김동민 , 이원영 , 제갈은 , 김승기 , 이두연 , 김경호 , 이용호 , 박주경 , 김상영 , 이성근 , 이성환 , 심재민 , 이정진
IPC分类号： G03F7/022 , G03F7/023 , G03F7/00
摘要： 본발명은구리막용포토레지스트조성물에관한것이다. 보다구체적으로상기포토레지스트조성물은특정구조의티아디아졸계화합물을소정의함량범위로포함하여, 기존대비구리막기판에서의식각성능을향상시킴으로써기판과의접착력및 회로선폭균일도를동시에개선할수 있는구리막용포토레지스트조성물이제공된다.

8. 发明公开

KR1020130076550A 고해상도 고잔막률 포토레지스트 조성물 审中-实审
标题翻译：具有高分辨率和高残留率的光电组合物
公开(公告)号：KR1020130076550A
公开(公告)日：2013-07-08
申请号：KR1020110145178
申请日：2011-12-28
申请人： 주식회사 동진쎄미켐
发明人： 김승기 , 홍우성 , 김봉진 , 김병욱 , 김동민 , 이원영 , 제갈은 , 변자훈 , 주상일 , 함선미 , 이두연 , 박일규 , 김경호 , 유미란 , 박주경
IPC分类号： G03F7/022 , G03F7/004
CPC分类号： G03F7/022 , G03F7/004 , G03F7/0045 , G03F7/20 , G03F7/202
摘要： PURPOSE: A photoresist composition is provided to indicate the high residual film rate and high definition, to use in industrial sites, and to enhance productivity because of reduced time in mass production. CONSTITUTION: A photoresist composition comprises novolak [novolak] resin of 5-30 weight%, the first diazide [diazide] group photo sensitive compound including the compound represented by the chemical formula 1 of 2-10 weight% and residual organic solvent. In the chemical formula 1., the R1, the R2 and R3 are respectively 2- diazo -1- naphthol -5- sulfonyl [2-diazo-1-naphthol-5-sulfonyl], and hydrogen or a C1-5 alkyl group, one of R1, R2 and R3 is 2- diazo -1- naphthol -5- sulfonyl at least. The N is the fixed number of 1-4. The novolak resin comprises 'novolak resin with the weight ratio of the paracresol [p-cresol] and metacresol [m-cresol] of 2:8-8:2'. [Reference numerals] (AA) Pattern size; (BB) Implementation example 1; (CC) Implementation example 2; (DD) Comparison example 1; (EE) Limiting resolution
摘要翻译：目的：提供光致抗蚀剂组合物，以表示在工业现场使用的高残留膜率和高清晰度，并且由于缩短了大量生产的时间而提高了生产率。构成：光致抗蚀剂组合物包含5-30重量％的酚醛清漆[酚醛清漆]树脂，包含化学式1表示的化合物2-10重量％的第一重氮化物[二叠氮基]光敏化合物和残留的有机溶剂。在化学式1中，R1，R2和R3分别为2-重氮-1-萘酚-5-磺酰基[2-重氮-1-萘酚-5-磺酰基]，和氢或C 1-5烷基至少R 1，R 2和R 3中的一个是2-重氮-1-萘酚-5-磺酰基。 N是1-4的固定数。酚醛清漆树脂包括具有对甲酚[对甲酚]和间甲酚[间甲酚]的重量比为2：8-8：2'的酚醛清漆树脂。（附图标记）（AA）图案尺寸; （BB）实施例1; （CC）实施示例2; （DD）比较例1; （EE）限制分辨率

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