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1. 发明公开

KR1020080104480A 감마 곡선 조절기 无效
标题翻译：伽马曲线控制器
公开(公告)号：KR1020080104480A
公开(公告)日：2008-12-03
申请号：KR1020070051319
申请日：2007-05-28
申请人： 인하대학교 산학협력단
发明人： 원태영 , 이정복 , 이완인
IPC分类号： G02F1/13 , G02F1/133 , G09G3/36
摘要： A gamma curve controller is provided to improve the display quality by automatically controlling and maintaining gamma curve regularly. A gamma curve controller shows the brightness of the liquid crystal panel in terms of the chosen level of number. A penetration characteristic curve according to the voltage of the liquid crystal pixel is extracted. A gamma curve controls the contrast level according to the characteristic curve. The brightness is regulated according to the gamma curve value.
摘要翻译：提供伽马曲线控制器，通过定期自动控制和维护伽马曲线来提高显示质量。伽马曲线控制器根据所选择的数量级别显示液晶面板的亮度。提取根据液晶像素的电压的穿透特性曲线。伽马曲线根据特征曲线控制对比度。亮度根据伽马曲线值进行调节。

2. 发明公开

KR1020080094186A 박막 트랜지스터 액정 패널의 전기적 특성 분석을 위한이미지 시뮬레이션 방법 无效
标题翻译：一种用于TFT-LCD电气特性分析的图像模拟方法
公开(公告)号：KR1020080094186A
公开(公告)日：2008-10-23
申请号：KR1020070038297
申请日：2007-04-19
申请人： 인하대학교 산학협력단
发明人： 원태영 , 이정복 , 박순열 , 조범구
IPC分类号： G02F1/133
CPC分类号： G09G3/006 , G09G3/3614 , G09G2320/0223 , G09G2320/0247
摘要： An image simulation method for analyzing the electrical characteristic of a TFT-LCD panel is provided to optimize parameters such as the drain, gate, and source of a transistor and the length, width, and thickness of gate and data lines and perform computer simulation for the frame, dot, column inversion driving of an LCD driving method to consider the electrical characteristic of the TFT-LCD panel in transmitting a video signal, thereby solving a problem caused by RC-delay in transmitting the video signal. In an image simulation algorithm, pixels of a 3D(Three-Dimensional) structure are embodied using TechWiz LCD, 3D liquid crystal simulator(S101). Resistance and capacitance is extracted to make a unit-pixel equation circuit(S102). Simulation is performed for the electrical characteristic of a TFT(Thin Film Transistor)-LCD panel to extract a gamma curve and a voltage-transmittance curve(S106,S107).
摘要翻译：提供了一种用于分析TFT-LCD面板的电气特性的图像模拟方法，以优化诸如晶体管的漏极，栅极和源极以及栅极和数据线的长度，宽度和厚度等参数，并执行计算机模拟在驱动视频信号时考虑TFT-LCD面板的电气特性的LCD驱动方法的帧，点，列反转驱动，从而解决在发送视频信号时由RC延迟引起的问题。在图像模拟算法中，使用TechWiz LCD，3D液晶模拟器（S101）来体现3D（三维）结构的像素。提取电阻和电容以形成单位像素方程电路（S102）。对TFT（薄膜晶体管）-LCD面板的电气特性进行模拟以提取伽马曲线和电压透过率曲线（S106，S107）。

3. 发明公开

KR1020080075244A 마이크로 펌프 유동 전산 모사 해석기 无效
标题翻译：微泵流量分析仪
公开(公告)号：KR1020080075244A
公开(公告)日：2008-08-18
申请号：KR1020070014124
申请日：2007-02-12
申请人： 인하대학교 산학협력단
发明人： 원태영 , 이정복 , 김병환 , 신형순
IPC分类号： G06F17/50 , G06F9/455
CPC分类号： G06F17/50 , F04B19/006 , G01F1/8445 , G06F17/11
摘要： A device for simulating and analyzing a flow of a micro-pump is provided to adjust a micro flow precisely and analyze a velocity field related to the flow of the micro-pump in a complex shape by using an FVM(Finite Volume Method) for measuring performance of the micro-pump. An automatic grid generator generates grid and a boundary shape according to an inner shape of the micro-pump by using a non-orthogonal arrangement grid system for using a numerical analysis method such as an FVM. A flow of the micro-pump is analyzed by using the FVM based on a Navier-Stokes equation and a slip boundary condition.
摘要翻译：提供了一种用于模拟和分析微型泵的流量的装置，用于精确地调节微流量，并通过使用用于测量的FVM（有限体积法）来分析与微型泵的流动相关的复杂形状的速度场微型泵的性能。自动网格发生器通过使用非正交布置网格系统来使用诸如FVM的数值分析方法，根据微型泵的内部形状生成网格和边界形状。通过使用基于Navier-Stokes方程和滑移边界条件的FVM分析微型泵的流量。

4. 发明公开

KR1020080097705A 리소그래피 시뮬레이터 无效
标题翻译：算术模拟器
公开(公告)号：KR1020080097705A
公开(公告)日：2008-11-06
申请号：KR1020070042885
申请日：2007-05-03
申请人： 인하대학교 산학협력단
发明人： 원태영 , 신우정 , 양승수 , 이정복 , 오혜근
IPC分类号： H01L21/027
CPC分类号： H01L21/0274 , G03F7/705
摘要： The lithography simulator is provided to perform the complicated process according to the chemically amplified resist which is the deep ultraviolet resist. The integration lithography simulator builds the same environment with the same language. Each light, and electron beam, X ray lithography simulators are under one GUI environment. It made possible for the same graphic process is possible for being treated by making the same data.
摘要翻译：提供光刻模拟器以根据作为深紫外线抗蚀剂的化学放大抗蚀剂进行复杂的工艺。集成光刻模拟器使用相同的语言构建相同的环境。每个光和电子束，X射线光刻模拟器都在一个GUI环境下。通过制作相同的数据可以使相同的图形处理成为可能。

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