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1. 发明公开

KR1020060026934A 레티클을 보호하기 위해 2개 파트 커버를 사용하는 시스템및 방법 有权
标题翻译：使用两个部件盖子保护一个内容的系统和方法
公开(公告)号：KR1020060026934A
公开(公告)日：2006-03-24
申请号：KR1020060019943
申请日：2006-03-02
申请人： 에이에스엠엘 홀딩 엔.브이.
发明人： 델푸에르토,산티아고 , 루프스트라,에릭알. , 마사,안드레 , 키스,두아네피. , 알리칸,압둘라 , 올슨,우드로우제이. , 페로체,요나단에이치.
IPC分类号： H01L21/027 , B82Y30/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135 , B82Y30/00 , G03F7/70733 , G03F7/70916
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

2. 发明授权

KR100730676B1 레티클을 보호하기 위해 2개 파트 커버를 사용하는 시스템및 방법 有权
标题翻译：使用两个部件盖子保护一个内容的系统和方法
公开(公告)号：KR100730676B1
公开(公告)日：2007-06-21
申请号：KR1020060019943
申请日：2006-03-02
申请人： 에이에스엠엘 홀딩 엔.브이.
发明人： 델푸에르토,산티아고 , 루프스트라,에릭알. , 마사,안드레 , 키스,두아네피. , 알리칸,압둘라 , 올슨,우드로우제이. , 페로체,요나단에이치.
IPC分类号： H01L21/027 , B82Y30/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

3. 发明授权

KR100868744B1 레티클을 보호하기 위해 2개 파트 커버 및 박스를 사용하는시스템 有权
标题翻译：使用两个部件盖和一个箱子进行保护的系统和方法
公开(公告)号：KR100868744B1
公开(公告)日：2008-11-13
申请号：KR1020070018542
申请日：2007-02-23
申请人： 에이에스엠엘 홀딩 엔.브이.
发明人： 델푸에르토,산티아고 , 루프스트라,에릭알. , 마사,안드레 , 키스,두아네피. , 알리칸,압둘라 , 올슨,우드로우제이. , 페로체,요나단에이치.
IPC分类号： H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： 마스크가 공기로 운반되는 파티클에 의한 오염되는 것을 방지하기 위한 시스템 및 방법을 제공한다. 이 시스템 및 방법은, 2개 파트 커버에 고착된 레티클을 제공한다. 2개 파트 커버는 오염물로부터 레티클을 보호하는데 사용되는 탈착가능한 보호 장치를 포함한다. 이 커버는 리소그래피 시스템을 통해 대기 영역으로부터 진공 영역으로 커버를 이송하는데 사용될 수 있는 포드(pod) 또는 박스내에 수용될 수 있다. 진공 영역내에 있는 동안, 탈착가능한 커버는 레티클 상의 패턴이 웨이퍼 상에 형성될 수 있는 노광 공정 동안 이동될 수 있다.
로드록, 디포더, 마스크 수용부, 리드

4. 发明公开

KR1020070030253A 레티클을 보호하기 위해 2개 파트 커버 및 박스를 사용하는시스템 有权
标题翻译：使用两个部件盖和一个箱子进行保护的系统和方法
公开(公告)号：KR1020070030253A
公开(公告)日：2007-03-15
申请号：KR1020070018542
申请日：2007-02-23
申请人： 에이에스엠엘 홀딩 엔.브이.
发明人： 델푸에르토,산티아고 , 루프스트라,에릭알. , 마사,안드레 , 키스,두아네피. , 알리칸,압둘라 , 올슨,우드로우제이. , 페로체,요나단에이치.
IPC分类号： H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and a method are provided to protect a reticle from contaminants without the degradation of qualities of an EUV(Extremely Ultra Violet) beam by using a two part cover and a box. A system includes a cover(102) for protecting a reticle(1). The cover is composed of a frame and a panel. The frame(2) is used for connecting the cover with the reticle. The frame is capable of storing partially the reticle. The panel(3) is used for making a predetermined light access directly the reticle under an exposure process. The panel is capable of moving away from the reticle in the exposure process. The cover further includes a robot gripper.
摘要翻译：提供了一种系统和方法，以通过使用两部分覆盖物和盒子来保护掩模版免受污染物的侵害，而不会降低EUV（极紫外）光束的质量。系统包括用于保护掩模版（1）的盖（102）。盖子由一个框架和一个面板组成。框架（2）用于将盖与掩模版连接。该框架能够部分地存储掩模版。面板（3）用于在曝光过程中使预定的光直接进入掩模版。面板在曝光过程中能够远离标线。盖子还包括机器人夹持器。

5. 发明公开

KR1020040002437A 레티클을 보호하기 위해 2개 파트 커버를 사용하는 시스템및 방법 无效
标题翻译：使用两个部件盖的系统保护条款及其方法
公开(公告)号：KR1020040002437A
公开(公告)日：2004-01-07
申请号：KR1020030011231
申请日：2003-02-22
申请人： 에이에스엠엘 홀딩 엔.브이.
发明人： 델푸에르토,산티아고 , 루프스트라,에릭알. , 마사,안드레 , 키스,두아네피. , 알리칸,압둘라 , 올슨,우드로우제이 , 페로체,요나단에이치.
IPC分类号： G03F1/62 , G03F7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： PURPOSE: A system using two part covers for protecting a reticle, its method, a gas-tight box and a loadlock are provided, to prevent a mask from being contaminated by airborne particles without deterioration of the quality of EUV light passing through the system. CONSTITUTION: The system(100) comprises a reticle(1); and a cover which is connected with the reticle for protecting the reticle and comprises a frame(2) and a detachable panel(3) moving to allow light to be accessed directly to the reticle during exposure process. Preferably, the system comprises further a robot gripper(4) moving the cover and the reticle. Also the system comprises a mask having a front face and a back face; and a detachable cover covering the front face of the mask, wherein the cover comprises a plane plate which has a first face toward the mask and a second face leaving the mask and has a size equal to the front face of the mask; a spacer which is projected from the first face of the plane plate, maintains the distance from the mask and the cover, and is connected with the plane plate; and a mask locator which is projected from the first face of the plane plate, seals the mask inside the cover and is connected with the plane plate.
摘要翻译：目的：提供一种使用两部分保护掩模版的系统，其方法，气密盒和装载锁，以防止掩模被空气传播的颗粒污染，而不会降低通过系统的EUV光的质量。构成：系统（100）包括掩模（1）; 以及与掩模版连接以保护掩模版的盖，并且包括框架（2）和移动的可拆卸面板（3），以允许光在曝光过程期间直接访问掩模版。优选地，该系统还包括移动盖和掩模版的机器人夹持器（4）。此外，该系统包括具有正面和背面的面罩; 以及覆盖所述面罩的前表面的可拆卸盖，其中所述盖包括具有朝向所述面罩的第一面的平板和离开所述面罩的第二面，并且具有与所述面罩的前表面相同的尺寸; 从平板的第一面突出的间隔件保持与掩模和盖的距离，并与平板连接; 以及从平板的第一面突出的掩模定位器，将掩模密封在盖内并与平板连接。

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