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    • 5. 发明公开
    • 가스 유동 확산기
    • 气体流动扩散器
    • KR1020080086361A
    • 2008-09-25
    • KR1020080025360
    • 2008-03-19
    • 어플라이드 머티어리얼스, 인코포레이티드
    • 브릴하트,폴호프만,다니엘제이.카두치,제임스디.죠우,지아오핑밀러,매튜엘.
    • H01L21/02H01L21/3065
    • C23C16/45565C23C16/45502H01J37/3244H01J37/32449H01L21/67069Y10T137/85938
    • A gas flow diffuser is provided to enable compensation for conductance or other chamber attributes that cause asymmetrical processing. A vacuum processing chamber comprises a chamber body(110), a substrate support(116), a pumping port, and a gas distribution assembly. The chamber body has an interior volume(178). The substrate support is disposed in the interior volume. The pumping port is disposed below a plane of a substrate supporting surface of the substrate support, wherein a location of the pumping port and geometry of the interior volume have a configuration that produces an asymmetrical processing result on a substrate(114) disposed on the substrate supporting surface of the substrate support. The gas distribution assembly is positioned above the plane of the substrate supporting surface of the substrate support, wherein a configuration of the gas distribution assembly is selected to tune asymmetry for the processing result caused by the location of the pumping port and geometry of the interior volume.
    • 提供气流扩散器以能够补偿导致不对称处理的电导或其它室属性。 真空处理室包括室主体(110),基板支撑件(116),泵送端口和气体分配组件。 腔体具有内部容积(178)。 衬底支撑件设置在内部容积中。 泵送端口设置在衬底支撑表面的平面的下方,其中泵送端口的位置和内部空间的几何形状具有在设置在衬底上的衬底(114)上产生不对称处理结果的构造 支撑表面的基板支撑。 气体分配组件位于衬底支撑表面的平面之上,其中选择气体分配组件的配置来调节由泵送端口的位置和内部体积的几何形状引起的处理结果的不对称性 。