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    • 1. 发明公开
    • 방사선 검사 장치, 방사선 검사 방법, 및 촬상 조건 산출 장치
    • 辐射检查装置,辐射检查方法和图像拾取条件计算装置
    • KR1020120083219A
    • 2012-07-25
    • KR1020120002391
    • 2012-01-09
    • 야마하하쓰도키 가부시키가이샤
    • 스즈키요시쿠니
    • G01N23/04G01B15/04
    • G01N23/04G01B15/04G01N23/046G01N2223/20G01N2223/419G01N2223/6113
    • PURPOSE: A radiation inspecting device, a radiation inspecting method, and a photographing condition calculating device are provided to reduce the numbers of a photographing by controlling the numbers of photographing conditions required for obtaining tomographic images of an object. CONSTITUTION: A radiation inspecting devicomprises a radiation source, a supporting member, a radiation photographing member, and a controlling member(100). The controlling member sets a plurality of photographing conditions required for obtaining tomographic image information of a second domain from member arrangement information indicating the arrangement of each member consisting an object in an inspection target range. The controlling member photographs a penetration phase of the object under various photographing conditions set while changing a position relation of the radiation source and the object and obtains the graphic image information in the second domain from the photographing result. The controlling member obtains the tomographic image information within an inspection target range by estimating the tomographic image information of the first domain from the member arrangement information of the object.
    • 目的:提供辐射检查装置,放射线检查方法和摄影条件计算装置,以通过控制获得物体的断层图像所需的拍摄条件的数量来减少摄影次数。 构成:辐射检查装置设有辐射源,支撑构件,辐射摄影构件和控制构件(100)。 控制部件从构成对象的检查对象范围内的各构件的配置的构件配置信息构成为获得第二域的断层图像信息所需的多个拍摄条件。 控制构件在改变放射源和物体的位置关系的同时,在设定的各种拍摄条件下拍摄物体的穿透阶段,并从拍摄结果获得第二域中的图形图像信息。 控制构件通过从对象的构件配置信息中估计第一域的断层图像信息,在检查对象范围内获取断层图像信息。
    • 3. 发明授权
    • 기판 처리 장치
    • 基板处理设备
    • KR101471900B1
    • 2014-12-11
    • KR1020130036318
    • 2013-04-03
    • 야마하하쓰도키 가부시키가이샤
    • 스즈키요시쿠니
    • H05K13/04H05K13/02
    • 기판처리장치는기판반송방향으로기판을반송함과아울러기판처리를위하여상기기판을위치결정하는반송수단과, 상기반송수단에의해위치결정된상기기판의이면에대하여상기기판반송방향에있어서공통되는지지영역에서접촉하는복수개의백업부재가배치되는베이스부와, 상기기판반송수단에의해위치결정된상기기판의표면에대하여상기지지영역을포함하는처리실행영역에서상기기판처리를실행하는처리실행수단과, 상기기판처리를받는상기기판의이면에접촉하는상기백업부재를상기베이스부에배치된상기복수개의백업부재중에서스위칭함으로써상기지지영역에서상기기판의이면에상기백업부재가접촉하는위치를상기지지영역에서의상기기판의이면의상태에따라제어하는스위칭수단을구비한다.
    • 一个常见的支撑区域是在基片传送方向相对于定位在由转印在基板的背面是指,转印装置,用于在衬底将基板定位于井基板处理并且还输送到基片传输方向撞击基板处理 多个备用构件的具有装置,其设置,在包括相对于定位在由基板传送所述衬底的所述表面上的支撑区域的处理执行区域的基部以及执行装置,用于执行衬底处理的处理,在其接触 其中,在与通过切换所述多个备份错过设置在支撑区的基部在在支撑区中的位置接收到该基板处理所述衬底的所述后表面接触的支撑构件,其中在与所述基板的后表面接触的支撑构件 以及开关装置,用于根据基板背面的状态进行控制。
    • 7. 发明公开
    • 기판 처리 장치
    • 基板加工设备
    • KR1020140039958A
    • 2014-04-02
    • KR1020130036318
    • 2013-04-03
    • 야마하하쓰도키 가부시키가이샤
    • 스즈키요시쿠니
    • H05K13/04H05K13/02
    • A substrate processing device includes a returning unit returning a substrate in a substrate return direction and determining a position of the substrate to process it; a base part on which a plurality of backup members touching each other in a common support area are placed in the substrate return direction in regards to the rear surface of the substrate determined by the return unit; a processing executing unit executing substrate processing in a processing execution area including the support area in regards to a surface of the substrate determined by the substrate returning unit; and a switching unit controlling a position of the support area in which the backup members touch the rear surface according to a state of the rear surface of the substrate in the support area by switching a backup member touching the rear surface of the substrate to the backup members placed on the base part. [Reference numerals] (AA) Rear (-Y); (BB) Front (+Y)
    • 基板处理装置包括返回单元,使基板沿基板返回方向返回,并确定基板的位置以进行处理; 相对于由返回单元确定的基板的后表面,在基板返回方向上放置有在共同的支撑区域中彼此接触的多个支撑构件的基部; 处理执行单元,在包括由所述基板返回单元确定的所述基板的表面的所述支撑区域的处理执行区域中执行基板处理; 以及开关单元,其通过将接触到所述基板的后表面的支撑构件切换到所述支撑区域来控制支撑区域的位置,所述支撑区域的位置根据所述支撑区域中的所述基板的背面的状态而接触所述后表面 会员放在基座上。 (标号)(AA)后(-Y); (BB)前(+ Y)