专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

KR100414540B1 초음파처리장치 및 이를 사용한 전자부품의 제조방법 失效
标题翻译： 초음파처리장치및이를사용한전자부품의제조방초
公开(公告)号：KR100414540B1
公开(公告)日：2004-01-07
申请号：KR1020000077445
申请日：2000-12-16
申请人： 샤프 가부시키가이샤
发明人： 고바야시가즈키 , 오노히토시 , 타구사야스노브 , 히키다토모미 , 마이다유이치
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , B08B3/123 , G03F7/428 , H05K3/0085 , H05K3/26 , Y10S134/902
摘要： To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region. The foregoing arrangement causes ultrasonic-projected regions of the ultrasonic oscillation elements to partly overlap each other on a surface of the glass substrate when the glass substrate is transported by transport rollers in the transport direction, thereby enabling ultrasonic projection over the complete entirety of the ultrasonic processing target region.
摘要翻译：本发明提供一种超声波处理装置，该超声波处理装置能够利用超声波振动元件将超声波均匀地投射到整个超声波处理对象区域，从而能够有效地执行清洁操作，抗蚀剂剥离操作等，所述超声波振动元件的宽度小于处理对象物的超声波加工对象部位，以及使用该装置的电子部件的制造方法，多个超声波振动元件配置成在玻璃基板的输送方向和玻璃基板的宽度方向并且通过将所述超声波振荡元件投影到垂直于玻璃基板传送方向的平面而获得的投影图形成宽度超过超声波处理目标区域的宽度的单个带状区域。根据上述结构，通过输送辊在输送方向上输送玻璃基板时，超声波振动元件的超声波投射区域在玻璃基板的表面上一部分重叠，能够超声波投射到整个超声波处理目标区域。

2. 发明公开

KR1020010082586A 초음파처리장치 및 이를 사용한 전자부품의 제조방법 失效
标题翻译：超声波处理装置和电子部件制造方法
公开(公告)号：KR1020010082586A
公开(公告)日：2001-08-30
申请号：KR1020000077445
申请日：2000-12-16
申请人： 샤프 가부시키가이샤
发明人： 고바야시가즈키 , 오노히토시 , 타구사야스노브 , 히키다토모미 , 마이다유이치
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , B08B3/123 , G03F7/428 , H05K3/0085 , H05K3/26 , Y10S134/902
摘要： PURPOSE: An ultrasonic processing device and an electronic parts fabrication method using the same are provided to effectively carry out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the a large region by means of vibrating elements each having a size smaller than a region to be subjected to ultrasonic, as well as to provide an electronic parts fabrication method using the foregoing device. CONSTITUTION: The ultrasonic processing device includes a plurality of vibrating elements(13) for generating ultrasonic; and moving means(15) for moving processing object in a predetermined direction relatively with respect to the vibrating elements(13), wherein regions to which the vibrating elements(13) project ultrasonic are ultrasonic-projected regions each having a predetermined width in a width direction that is substantially orthogonal to the predetermined direction, and a whole arrangement of the plurality of vibrating elements(13) extend in the predetermined direction and in the width direction; and by moving the processing object relatively in the predetermined direction, ultrasonic-projected regions of the vibrating elements(13) are caused to cover an ultrasonic processing target region of the processing object, so that ultrasonic should be projected to a complete entirety of the ultrasonic processing target region.
摘要翻译：目的：提供一种超声波处理装置及使用该超声波处理装置的电子部件制造方法，以通过振动元件在整个大区域上均匀地突出超声波来有效地执行清洁操作，抗剥离操作等每个具有小于要进行超声波的区域的尺寸，并且提供使用上述装置的电子部件制造方法。构成：超声波处理装置包括多个用于产生超声波的振动元件（13）以及用于相对于所述振动元件（13）沿预定方向移动处理对象的移动装置（15），其中所述振动元件（13）突出超声波的区域是每个具有预定宽度宽度的超声波投影区域大致与预定方向正交的方向，并且多个振动元件（13）的整体布置在预定方向和宽度方向上延伸; 并且通过相对地沿着预定方向移动处理对象，使振动元件（13）的超声波投影区域覆盖处理对象的超声波处理目标区域，使得超声波应该投影到整个超声波加工目标区域。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式