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    • 6. 发明公开
    • 다출력 전원공급장치
    • 多输出电源装置
    • KR1020080110455A
    • 2008-12-18
    • KR1020080014913
    • 2008-02-19
    • 삼성전자주식회사
    • 정지훈
    • H02M3/28
    • H02M3/33561H02M3/33507Y10T307/297Y10T307/406Y10T307/414Y10T307/422Y10T307/707Y10T307/832Y10T307/852
    • A power supply apparatus for multi output including feedback circuit and feedback compensation circuit is provided to steadily control a power source outputted to a different output circuit by compensating a voltage value error of a feedback circuit in case of blocking an output about at least one among multi output circuits. A power supply apparatus for multi output comprises a first power switch(10), a first switch controller(12), a transformer(14), a first ~ a N output circuits(16, 18), a second power switch(20), a feedback circuit(28), and a feedback compensation circuit(100). The first power switch switches a power supply. The first switch controller controls the first power switch. The transformer transforms a power source provided from the first power switch. The first ~ the N output circuit is connected to a secondary side of the transformer. The second power switch switches a power source outputted from one circuit among the first ~ the N output circuits. The feedback circuit returns an output power source of the first ~ the N output circuit and the second switch controller controlling the second power switch. The feedback compensation circuit complementarily performs a switching operation with the second power switch, and compensates a resistance value of the feedback circuit.
    • 提供一种用于多输出的电源装置,包括反馈电路和反馈补偿电路,用于通过补偿反馈电路的电压值误差来稳定地控制输出到不同输出电路的电源,以防止在多个 输出电路。 一种用于多输出的电源装置包括第一电源开关(10),第一开关控制器(12),变压器(14),第一至第N输出电路(16,18),第二电源开关(20) ,反馈电路(28)和反馈补偿电路(100)。 第一个电源开关切换电源。 第一个开关控制器控制第一个电源开关。 变压器变换从第一电源开关提供的电源。 第一〜N输出电路连接到变压器的次级侧。 第二电源开关切换从第一〜N个输出电路中的一个电路输出的电源。 反馈电路返回第一〜第N输出电路的输出电源和控制第二电源开关的第二开关控制器。 反馈补偿电路与第二电源开关互补地进行开关动作,补偿反馈电路的电阻值。
    • 7. 发明公开
    • 반도체장치 이온주입설비의 질량분석장치
    • 半导体器件离子植入装置的质量分析仪
    • KR1020020089593A
    • 2002-11-30
    • KR1020010028264
    • 2001-05-23
    • 삼성전자주식회사
    • 정지훈
    • H01L21/265
    • PURPOSE: A mass analysis apparatus of semiconductor ion implanter equipment is provided to prevent thermal deformation or thermal crack due to transmitted heat by forming a liner with the same material as a chamber. CONSTITUTION: A magnet(32) is installed on an upper portion and a lower portion of a chamber(30) in order to form magnetic field. The magnet(32) is used for determining a traveling path of ion beams. A liner(40) is installed on an upper face and a lower face of an inner wall of the chamber(30) in order to prevent contamination of the chamber(30). The liner(40) is formed with aluminium which is used as a raw material of the chamber(30). The thickness of the liner(40) is 1.5 to 2.2mm. The thickness of the liner(40) is determined by considering the thickness of a surface of the liner(40) removed in a liner cleaning process.
    • 目的:提供半导体离子注入机设备的质量分析装置,通过形成与腔室相同材料的衬垫来防止热变形或热裂纹。 构成:为了形成磁场,将磁体(32)安装在室(30)的上部和下部。 磁体(32)用于确定离子束的行进路径。 衬套(40)安装在腔室(30)的内​​壁的上表面和下表面上,以防止腔室(30)的污染。 衬套(40)形成有用作室(30)的原料的铝。 衬套(40)的厚度为1.5至2.2mm。 衬垫(40)的厚度通过考虑在衬垫清洁过程中去除的衬垫(40)的表面的厚度来确定。