专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

KR101372448B1 진공 및 가압을 이용한 잔류가스 및 이물질 제거장치 有权
标题翻译：真空和压缩装置用于残余气体和去除污染物
公开(公告)号：KR101372448B1
公开(公告)日：2014-03-11
申请号：KR1020130011998
申请日：2013-02-01
申请人： 나노세미콘(주)
发明人： 유정호
IPC分类号： H01L21/02
CPC分类号： H01L21/67034 , B08B5/00 , F16L55/07 , G05D7/00
摘要： The present invention relates to a device for removing residual gas and impurities using vacuum and pressurization and, more specifically, to a device for removing the residual gas and the impurities using vacuum and pressurization capable of filling nitride gas into the FOUP at high pressure or repeatedly maintaining the inside of the FOUP in a vacuum condition and efficiently removing the residual gas and impurities inside the FOUP. The present invention includes a vacuum pump for discharging the nitride gas and impurities in a processing chamber by being connected to a nitride supplying part where the nitride gas is stored, and to a supplying pipe connected to the nitride supplying part, by being connected to the processing chamber where the FOUP, which is transferring a wafer, is transferred through the discharging pipe.
摘要翻译：本发明涉及一种使用真空加压除去残留气体和杂质的装置，更具体地说，涉及一种利用真空和加压除去残留气体和杂质的装置，能够将氮化物气体以高压或高反应地填充到FOUP中在真空条件下保持FOUP的内部并有效地除去FOUP内的残留气体和杂质。本发明包括一个真空泵，用于通过连接到氮化物供应部分与氮化物供应部分连接的氮化物供应部分连接到与氮化物供应部分相连接的氮化物气体和处理室中的杂质，处理室，其中传送晶片的FOUP通过排出管转移。

72. 发明授权

KR101284585B1 반도체 장치 제조 설비 및 그의 제어 방법 有权
标题翻译：半导体器件制造设备及其控制方法
公开(公告)号：KR101284585B1
公开(公告)日：2013-07-11
申请号：KR1020130006416
申请日：2013-01-21
申请人： 주식회사 썬닉스
发明人： 김재민 , 김재현 , 이정호 , 이상신 , 박규성 , 박근배
IPC分类号： H01L21/02
CPC分类号： H01L21/67098 , F16L55/07 , G05D7/06 , G05D23/19
摘要： PURPOSE: A semiconductor manufacturing apparatus device and a control method thereof are provided to prevent raw materials from being fixed by constantly maintaining a temperature in a vaporizer and vaporing normally the raw materials inputted to the vaporizer. CONSTITUTION: A raw material supply unit (100) supplies raw materials to a vaporizer (200) connected through a first pipe (410). The vaporizer is composed of a nozzle (210), a vaporization chamber (220), a heater (230), and a lattice plate (240). A processing chamber (300) is connected to the vaporizer through a second pipe (420). A measuring unit (500) measures the weight of the raw material supply unit at preset intervals. A control unit (600) produces the rate of change of the raw materials according to the time based on the measured weight of the raw material supply unit. [Reference numerals] (100) Raw material supply unit; (500) Measuring unit; (600) Control unit
摘要翻译：目的：提供半导体制造装置及其控制方法，以通过不断保持蒸发器中的温度并通常将输入到蒸发器的原料蒸发而防止原料固定。构成：原料供给单元（100）将原料供给到通过第一管（410）连接的蒸发器（200）。蒸发器由喷嘴（210），蒸发室（220），加热器（230）和格板（240）组成。处理室（300）通过第二管（420）连接到蒸发器。测量单元（500）以预设的间隔测量原料供应单元的重量。控制单元（600）基于原料供给单元的测量重量，根据时间生成原材料的变化率。（附图标记）（100）原料供给单元; （500）测量单元; （600）控制单元

73. 发明公开

KR1020130077286A 히터 유닛 및 이를 포함하는 기판 처리 장치 有权
标题翻译：加热器单元和底板处理装置
公开(公告)号：KR1020130077286A
公开(公告)日：2013-07-09
申请号：KR1020110145914
申请日：2011-12-29
申请人： (주)티티에스
发明人： 김경민
IPC分类号： H01L21/02
CPC分类号： H01L21/67098 , F16L53/30 , F16L55/07 , H01L21/67034
摘要： PURPOSE: A heater unit and a substrate processing apparatus having the same are provided to draw out a heating element from a pipe by performing a process for separating a body from the pipe, thereby simplifying a process drawing out the heating element from the pipe. CONSTITUTION: A body (311b) has an internal space connected to a pipe (310a). The body is connected to one end of the pipe. The body is attached to or detached from the pipe. A heating element (313b) is installed on the body. The heating element is extended from the inner part of the body to the inner part of the pipe.
摘要翻译：目的：提供一种加热器单元和具有该加热器单元的基板处理设备，用于通过执行用于从管中分离主体的处理从管中抽出加热元件，从而简化了从管中抽出加热元件的处理。构成：主体（311b）具有连接到管道（310a）的内部空间。主体连接到管道的一端。身体与管道相连或分离。加热元件（313b）安装在本体上。加热元件从主体的内部延伸到管的内部。

74. 发明公开

KR1020130035140A 케미컬 확산 방지 에어커튼 시스템 无效
标题翻译：用于防止化学品扩散的空气幕系统
公开(公告)号：KR1020130035140A
公开(公告)日：2013-04-08
申请号：KR1020110099417
申请日：2011-09-29
申请人： (주)해피글로벌솔루션 , 윤해근
发明人： 윤해근 , 박헌수 , 박효근
IPC分类号： H01L21/02
CPC分类号： H01L21/02 , B05B1/005 , F16L55/07 , F24F9/00
摘要： PURPOSE: An air curtain system for preventing the diffusion of the chemical is provided to facilitate an installation process by arranging an air inhalation unit and an air spray unit in parallel. CONSTITUTION: An air spray unit(10) is mounted on the upper side of a door frame in a processing chamber and prevents the circulation of air between the inner side and the outer side of the processing chamber. The processing chamber generates an organic chemical element mixed with the air. An air inhalation unit(20) is mounted on the lower side of the door frame in the processing chamber and reduces air pressure in the processing chamber. [Reference numerals] (AA) Primary barrier film; (BB) Secondary barrier film;
摘要翻译：目的：提供一种用于防止化学物质扩散的气幕系统，以便通过并排布置空气吸入单元和空气喷雾装置来实现安装过程。构成：在处理室中的门框的上侧安装有空气喷射单元（10），并且防止处理室的内侧和外侧之间的空气循环。处理室产生与空气混合的有机化学元素。空气吸入单元（20）安装在处理室中的门框的下侧，并且减小处理室中的空气压力。（附图标记）（AA）主要阻挡膜; （BB）二次阻隔膜;

75. 发明授权

KR101246052B1 이미지 센서의 이물 제거용 블로잉 시스템 有权
标题翻译：用于去除图像传感器上的颗粒的吹扫系统
公开(公告)号：KR101246052B1
公开(公告)日：2013-03-26
申请号：KR1020120091636
申请日：2012-08-22
申请人： (주)씨온테크
发明人： 김영진
IPC分类号： H01L21/02 , H01L27/14
CPC分类号： B08B5/00 , B01D46/42 , F16L55/07 , H01L27/14
摘要： PURPOSE: A blowing system for removing dust particles on an image sensor is provided to cut down personnel expenses. CONSTITUTION: A blower cleaning unit(150) is arranged in a dust removal region. The blower cleaning unit performs a dust removal process on an image sensor. A holder tray unit(160) is detachably combined with the blower cleaning unit. The holder tray unit picks up image sensors by using vacuum pressure and delivers the image sensors to the blower cleaning unit. A unit transfer moves the holder tray unit.
摘要翻译：目的：减少图像传感器上的灰尘颗粒吹扫系统，以减少人员费用。构成：在除尘区域设置鼓风机清洁单元（150）。鼓风机清洁单元对图像传感器执行除尘处理。托架托架单元（160）可拆卸地与鼓风机清洁单元组合。保持架托盘单元通过使用真空压力拾取图像传感器，并将图像传感器传送到鼓风机清洁单元。单元传送移动托架托盘单元。

76. 发明公开

KR1020130028239A 배기가스 개더링 장치 有权
标题翻译：用于排气的收集装置
公开(公告)号：KR1020130028239A
公开(公告)日：2013-03-19
申请号：KR1020110091635
申请日：2011-09-09
申请人： 홍정의 , (주)제이오션
发明人： 홍정의
IPC分类号： H01L21/02
CPC分类号： H01L21/67098 , F16L53/30 , F16L55/07 , H01L21/67034
摘要： PURPOSE: A gathering apparatus for exhaust gas is provided to reduce a total length of the gathering apparatus. CONSTITUTION: A heating unit(200) has a heat treatment part(210) of a double pipe structure. A housing(100) surrounds the heat treatment part of a heating unit. The heat treatment part includes an inner container(220) and an outer container(230). The inner container provides a first heating pipe. The outer container provides the second heating pipe.
摘要翻译：目的：提供废气收集装置以减少采集装置的总长度。构成：加热单元（200）具有双管结构的热处理部（210）。壳体（100）围绕加热单元的热处理部分。热处理部包括内容器（220）和外容器（230）。内容器提供第一加热管。外容器提供第二加热管。

77. 发明公开

KR1020130010712A 배기 시스템 有权
标题翻译：排气装置
公开(公告)号：KR1020130010712A
公开(公告)日：2013-01-29
申请号：KR1020110071520
申请日：2011-07-19
申请人： (주)티티에스
发明人： 고성근
IPC分类号： H01L21/02
CPC分类号： H01L21/67098 , F16L53/30 , F16L55/07
摘要： PURPOSE: An exhaust system is provided to reduce time of inputting or outputting a heater by removing a vacuum release process when the heater is inputted or outputted. CONSTITUTION: A pipe body(310) has various shapes with an inner space. A separation pipe(321) has an additional inner space separated from an inner space of the pipe body. An opening and closing unit(330) opens or closes a first open part(310a) of the pipe body and a second open part of the separation pipe. A thermal diffusion member(322) is installed along the outer side of the separation tube. A heater(323) heats the separation pipe, the thermal diffusion member, and the pipe body.
摘要翻译：目的：提供一种排气系统，通过在加热器输入或输出时，通过去除真空释放过程来减少输入或输出加热器的时间。构成：管体（310）具有各种具有内部空间的形状。分离管321具有与管体的内部空间分离的附加内部空间。打开和关闭单元（330）打开或关闭管体的第一开口部分（310a）和分离管道的第二开放部分。沿着分离管的外侧安装热扩散构件（322）。加热器（323）加热分离管，热扩散构件和管体。

78. 发明公开

KR1020120090722A 긴 강관(PVC관, 주철관)에 구비하는 관로세척장치 无效
标题翻译：管道清洁设备配备的长管道
公开(公告)号：KR1020120090722A
公开(公告)日：2012-08-17
申请号：KR1020110011683
申请日：2011-02-08
申请人： 김도경
发明人： 김도경
IPC分类号： F16L55/07 , F16L55/00 , B08B9/027 , F16L23/02
CPC分类号： B08B9/0325 , B08B2209/027 , F16L23/0283 , F16L23/032 , F16L55/07
摘要： PURPOSE: A pipeline cleaning device installed at long steel pipes provided to recognize foreign materials by installing a magnifying glass between the communicating pipes of the lower portion of a pig pipe flange cover. CONSTITUTION: A pipeline cleaning device installed at long steel pipes(10) comprises a pig pipe flange(12), a pig pipe flange cover(13), a conical reducer, a monitoring device flange cover(17), a communicating pipe, and a communicating pipe cap. The pig pipe flange and the pig pipe flange cover are formed in the upper portion of a rectangular cone-shaped pipe(11). A circular hole is formed to penetrate through the center portion of the monitoring device flange cover. The conical reducer is formed in the upper portion of the pig pipe flange cover. The communicating pipe cap is formed in the lower portion of the communicating pipe. A hole is formed to penetrate the center portion of the communicating pipe.
摘要翻译：目的：安装在长钢管上的管道清理装置，用于通过在猪管法兰盖的下部的连通管之间安装放大镜来识别异物。构成：安装在长钢管（10）上的管道清洗装置包括猪管法兰（12），猪管法兰盖（13），锥形减速器，监控装置法兰盖（17），连通管和连通管帽。猪管法兰和猪管法兰盖形成在矩形锥形管（11）的上部。形成贯通监视装置凸缘盖的中心部的圆形孔。锥形减速器形成在猪管法兰盖的上部。连通管帽形成在连通管的下部。形成贯通连通管的中心部的孔。

79. 发明公开

KR1020120077512A 기판 처리 장치 有权
标题翻译：用于处理衬底的排气构件和装置
公开(公告)号：KR1020120077512A
公开(公告)日：2012-07-10
申请号：KR1020100139487
申请日：2010-12-30
申请人： 세메스 주식회사
发明人： 송준호 , 이장희
IPC分类号： H01L21/205 , H01L21/02
CPC分类号： H01L21/205 , F16K1/12 , F16L55/07 , G01K7/00
摘要： PURPOSE: An exhaust member and a substrate processing apparatus are provided to regularly control the flux of a processed object exhausted from a plurality of exhaust pipes by controlling the opening and closing of an on/off valve of the exhaust pipe. CONSTITUTION: A substrate support member is installed within a processing chamber and supports a substrate. A gas supply member supplies process gas to the substrate. An exhaust member(500) discharges a processed object within the processing chamber. The exhaust member includes an exhaust ring(510), a plurality of exhaust pipes(520), a temperature sensor installed at the exhaust pipe, and an on/off valve installed at the exhaust pipe. The exhaust ring surrounds the outer side of the substrate support member while being spaced and includes a plurality of exhaust holes. The plurality of exhaust pipes is combined with the lower part of the exhaust ring.
摘要翻译：目的：提供排气构件和基板处理装置，通过控制排气管的开关阀的打开和关闭来定期地控制从多个排气管排出的处理物体的通量。构成：衬底支撑构件安装在处理室内并支撑衬底。气体供给构件向基板供给处理气体。排气构件（500）将处理室内的被处理物体排出。排气构件包括排气环（510），多个排气管（520），安装在排气管处的温度传感器和安装在排气管处的开/关阀。排气环围绕基板支撑构件的外侧隔开并且包括多个排气孔。多个排气管与排气环的下部组合。

80. 发明公开

KR1020120070747A 가스혼합배관 失效
标题翻译：气体混合管
公开(公告)号：KR1020120070747A
公开(公告)日：2012-07-02
申请号：KR1020100132186
申请日：2010-12-22
申请人： 인베니아 주식회사
发明人： 이창엽 , 이재무
IPC分类号： H01L21/02
CPC分类号： B01F3/02 , B01F15/00123 , F16L55/07 , G05D7/00
摘要： PURPOSE: A gas mixing pipe is provided to efficiently mix different kinds of gas entering within the gas mixing pipe by inducing turbulence generation within the pipe by changing an inner diameter of a gas mixing line or bending or rotating a flow path. CONSTITUTION: A first gas inflow line(111) and a second gas inflow line(121) are respectively connected to a first gas storage(112) and a second gas storage(122). MFCs(Mass Flow Controller)(113,123) are installed in the first and second gas inflow lines to control a gas supply amount. The MFC controls a gas mixing rate by removing an amount of gas flowing in each gas inflow line. A gas mixing line(130) mixes different kinds of gas while being connected to the first and second gas inflow lines. A connector(131) is arranged at one end portion of the gas mixing line.
摘要翻译：目的：提供一种气体混合管，通过改变气体混合管线的内径或弯曲或旋转流路来有效地混合进入气体混合管内的不同种类的气体，从而在管内产生湍流。构成：第一气体流入管线（111）和第二气体流入管线（121）分别连接到第一气体储存器（112）和第二气体储存器（122）。 MFC（质量流量控制器）（113,123）安装在第一和第二气体流入管线中，以控制气体供给量。 MFC通过去除在每个气体流入管线中流动的气体量来控制气体混合速率。气体混合管线（130）在连接到第一和第二气体流入管线的同时混合不同种类的气体。连接器（131）布置在气体混合管线的一个端部处。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式