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71. 发明公开

KR1020080076102A 시각장애인을 위한 화상형성장치 및 화상형성장치의화상형성방법 无效
标题翻译：图像形成装置的图像形成装置和图像形成装置的图像形成方法
公开(公告)号：KR1020080076102A
公开(公告)日：2008-08-20
申请号：KR1020070015591
申请日：2007-02-14
申请人： 삼성전자주식회사
发明人： 김홍석 , 박종우
IPC分类号： G03G15/00 , G06F3/12
CPC分类号： H04N1/00405 , H04N1/00488 , H04N2201/0094
摘要： An image forming apparatus for visually impaired people and an image forming method of the apparatus are provided to convert sound switched information contained in the document into sound data and to output the sound data for allowing the people to check the contents of the document and to shorten the time for searching the image data. A fax transmission process of an image forming apparatus comprises the steps of; receiving a fax number(S110), scanning documents and generating image data(S111), judging whether a sound attached signal for visually impaired people is inputted(S112), converting sound switched information contained in the document into sound data and outputting the sound data(S113), inputting whether the image data is transferred(S116), transferring the image data to a fax receiving device(S117), and displaying a transferred result of the image data(S118).
摘要翻译：用于视觉障碍者的图像形成装置和该装置的图像形成方法被提供以将包含在文档中的声音切换信息转换成声音数据并输出声音数据，以允许人们检查文档的内容并缩短搜索图像数据的时间。图像形成装置的传真发送处理包括以下步骤：接收传真号码（S110），扫描文件并生成图像数据（S111），判断是否输入了视觉障碍者的声音附加信号（S112），将包含在文档中的声音切换信息转换为声音数据并输出声音数据（S113），输入图像数据是否被传送（S116），将图像数据传送到传真接收装置（S117），并显示图像数据的传送结果（S118）。

72. 发明授权

KR100718836B1 불휘발성 메모리 장치의 게이트 구조물 및 이의 제조 방법 失效
标题翻译：非易失性存储器件的门结构及其制造方法
公开(公告)号：KR100718836B1
公开(公告)日：2007-05-16
申请号：KR1020050063580
申请日：2005-07-14
申请人： 삼성전자주식회사
发明人： 노진태 , 황기현 , 김진균 , 양상렬 , 김홍석
IPC分类号： H01L27/115
摘要： 불휘발성 메모리 장치의 게이트 구조물 및 이의 제조 방법에서, 터널 산화막 상에 형성되는 플로팅 게이트는 서로 전기적으로 절연되는 다수의 영역들로 이루어진다. 다수의 영역은 플로팅 게이트와 접하는 제1 영역 및 플로팅 게이트와 접하지 않는 제2 영역으로 구분된다. 상기 플로팅 게이트를 형성하기 위해서 산화물로 코팅되고 서로 이격되는 도전성 그레인들을 형성하기 위한 공정을 적어도 한번 수행한다. 본 발명에 따르면 다수의 영역들 중 일부가 터널 산화막의 아래에 형성된 기판과 전기적으로 연결되더라도 나머지 영역들을 사용하여 캐리어 저장소로서 역할을 할 수 있기 때문에 플로팅 게이트의 전기적 신뢰도를 높일 수 있다.

73. 发明公开

KR1020070032833A 불휘발성 메모리 장치의 제조방법 无效
标题翻译：制造非易失性存储器件的方法
公开(公告)号：KR1020070032833A
公开(公告)日：2007-03-23
申请号：KR1020050087173
申请日：2005-09-20
申请人： 삼성전자주식회사
发明人： 김홍석 , 양상렬 , 황기현 , 노진태 , 안재영 , 김진균 , 이성해 , 이은호
IPC分类号： H01L21/8247 , H01L27/115
CPC分类号： H01L27/11521 , H01L21/67069 , H01L21/76224
摘要： A method for manufacturing a nonvolatile memory apparatus is provided to facilitate deposition of a dielectric and a control gate electrode layer by expanding an interval between floating gate electrodes, and an inner width thereof. An isolation layer(108) is formed on a substrate(100) to define an active region(104) and a field region on the substrate. A tunnel oxide layer(112) is formed on a surface of the substrate of the active region. A sacrificial layer pattern(120) having an opening unit is formed. The opening unit exposes the tunnel oxide layer and the substrate of the field region. A conductive layer(124) is successively formed on a surface of the tunnel oxide layer, a sidewall of the opening unit, and a surface of the sacrificial layer pattern. The opening unit where the conductive layer is formed is fully gap-filled to form a gap-fill layer(128) consisting of an HDP-CVD oxide layer, USG, BPSG, or SOG. The conductive layer and the gap-fill layer are planarized when the surface of the sacrificial layer pattern is exposed to form a preliminary conductive layer pattern. The preliminary conductive layer pattern is connected to both edges of the first conductive layer pattern in a body and has a second conductive layer pattern extended to a vertical direction. The sacrificial layer pattern and the part of the planarized gap-fill layer are firstly etched to expose the second conductive layer pattern of the preliminary conductive layer pattern. The part of the second conductive layer pattern of the exposed preliminary conductive layer pattern is secondly etched by using the first etched sacrificial layer pattern and the gap-fill layer as etching masks. The first etched gap-fill layer is removed and a part of the first etched sacrificial layer pattern is thirdly etched. The third etched sacrificial layer pattern is removed at the same time the part of the first conductive pattern of the second etched preliminary conductive layer pattern is fourthly etched to form a completed conductive pattern.
摘要翻译：提供一种用于制造非易失性存储装置的方法，以便通过扩大浮置栅电极之间的间隔及其内部宽度来促进电介质和控制栅电极层的沉积。隔离层（108）形成在衬底（100）上以在衬底上限定有源区（104）和场区。隧道氧化物层（112）形成在有源区的衬底的表面上。形成具有开口单元的牺牲层图案（120）。开口单元暴露隧道氧化物层和场区域的衬底。导电层（124）依次形成在隧道氧化物层的表面，开口单元的侧壁和牺牲层图案的表面上。形成导电层的开口单元被完全间隙填充以形成由HDP-CVD氧化物层，USG，BPSG或SOG组成的间隙填充层（128）。当牺牲层图案的表面暴露以形成初步导电层图案时，导电层和间隙填充层被平坦化。初级导电层图案被连接到主体中的第一导电层图案的两个边缘，并且具有向垂直方向延伸的第二导电层图案。首先蚀刻牺牲层图案和平坦化间隙填充层的一部分以暴露初步导电层图案的第二导电层图案。通过使用第一蚀刻牺牲层图案和间隙填充层作为蚀刻掩模，第二蚀刻暴露的初级导电层图案的第二导电层图案的部分。去除第一蚀刻间隙填充层，并且第一蚀刻牺牲层图案的一部分被第三蚀刻。同时去除第三蚀刻牺牲层图案，同时第二蚀刻初步导电层图案的第一导电图案的部分被第四次蚀刻以形成完整的导电图案。

74. 发明公开

KR1020070014410A 불휘발성 메모리 장치의 제조방법 无效
标题翻译：制造非易失性存储器件的方法
公开(公告)号：KR1020070014410A
公开(公告)日：2007-02-01
申请号：KR1020050069027
申请日：2005-07-28
申请人： 삼성전자주식회사
发明人： 김홍석 , 황기현 , 노진태 , 안재영 , 김진균 , 이은호 , 양상렬
IPC分类号： H01L27/115
CPC分类号： H01L29/66825 , H01L21/28273 , H01L21/823468 , H01L29/42324
摘要： A method for fabricating an NVM(non-volatile memory) device is provided to prevent a tunnel oxide layer from being deteriorated by depositing a silicon oxide layer on a gate spacer while the silicon oxide layer is not exposed to hydrogen atmosphere. A cell gate(110) in which a tunnel oxide layer(102), a floating gate(104), an interlayer dielectric(106) and a control gate(108) are sequentially stacked is formed on a semiconductor substrate(100). A stack process using SiCl4 gas and N2O gas is performed to continuously form a silicon oxide layer(114) on the sidewall and the upper surface of the cell gate and the upper surface of the semiconductor substrate. A heat treatment is performed in an atmosphere of D2. The silicon oxide layer is anisotropically etched to form a gate spacer made of a silicon oxide layer on the sidewall of the cell gate.
摘要翻译：提供了一种用于制造NVM（非易失性存储器）器件的方法，以防止在氧化硅层不暴露于氢气氛的同时，在栅极间隔物上沉积氧化硅层，从而恶化隧道氧化物层。其中隧道氧化物层（102），浮动栅极（104），层间电介质（106）和控制栅极（108）依次层叠的单元栅极（110）形成在半导体衬底（100）上。执行使用SiCl 4气体和N 2 O气体的堆叠工艺，以在电池栅极的侧壁和上表面以及半导体衬底的上表面上连续形成氧化硅层（114）。在D2的气氛中进行热处理。氧化硅层被各向异性地蚀刻以在电池栅极的侧壁上形成由氧化硅层制成的栅极间隔物。

75. 发明公开

KR1020070002235A 반도체 소자의 콘택홀 형성 방법 无效
标题翻译：在半导体器件中形成接触孔的方法
公开(公告)号：KR1020070002235A
公开(公告)日：2007-01-05
申请号：KR1020050057652
申请日：2005-06-30
申请人： 삼성전자주식회사
发明人： 김진균 , 황기현 , 노진태 , 안재영 , 김홍석
IPC分类号： H01L21/28
CPC分类号： H01L21/76897 , H01L21/31111 , H01L21/823468
摘要： A method for forming a contact hole of a semiconductor device is provided to reduce contact resistance by increasing a contact area between a conductive material and a semiconductor substrate using an enlarged lower portion of the contact hole. Conductive patterns are formed on a substrate(100). A first thin film made of a first material and a second thin film made of a second material are sequentially deposited on the resultant structure. A spacer structure composed of first and second spacers(116a,118a) is formed at both sidewalls of each conductive pattern by performing an anisotropic etching process on the first and second thin film. An interlayer dielectric is formed thereon. A pre-contact hole for exposing the spacer structure to the outside is formed on the resultant structure by etching selectively the interlayer dielectric. An enlarged contact hole(128) is completed by etching partially the exposed portion of the spacer structure.
摘要翻译：提供一种用于形成半导体器件的接触孔的方法，通过使用接触孔的较大下部增加导电材料和半导体衬底之间的接触面积来降低接触电阻。导电图案形成在基板（100）上。由第一材料制成的第一薄膜和由第二材料制成的第二薄膜依次沉积在所得结构上。通过对第一和第二薄膜进行各向异性蚀刻处理，在每个导电图案的两个侧壁处形成由第一和第二间隔物（116a，118a）构成的间隔结构。在其上形成层间电介质。通过选择性地蚀刻层间电介质，在所得结构上形成用于将间隔结构暴露于外部的预接触孔。扩大的接触孔（128）通过部分蚀刻间隔结构的暴露部分来完成。

76. 发明公开

KR1020050101587A 오버레이 측정방법 无效
标题翻译：覆盖测量方法
公开(公告)号：KR1020050101587A
公开(公告)日：2005-10-25
申请号：KR1020040026503
申请日：2004-04-19
申请人： 삼성전자주식회사
发明人： 김홍석
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , H01L22/12
摘要： 하부패턴층과 상부패턴층간의 미스 얼라인먼트를 측정하는 오버레이 측정방법에 관한 것이다. 소정의 단위 공정들을 수행하여 형성된 제1 오버레이 마크와 제2 오버레이 마크가 위치한 미스 얼라인먼트 사이트들에서 측정할 미스 얼라인먼트 사이트를 지정한다. 이어서, 상기 지정된 미스 얼라인먼트 사이트에서 상기 제1 오버레이 마크와 제2 오버레이 마크 사이의 미스 얼라인먼트를 측정한다. 이어서, 상기 측정된 미스 얼라인먼트 데이터들로부터 다중 회귀 방정식을 이용하여 NCE(Non Correctable Error)와 미스 얼라인 파라미터를 분석하여 이루어지는 것이 특징이다. 이로써, NCE의 유형의 구분과 정도변화를 실질적으로 파악할 수 있게 되어 미스 얼라인의 발생 유형에 대한 정도변화를 실시간으로 분석하여 오버레이 관리를 향상시킬 수 있다..

77. 发明公开

KR1020030065654A 티브이 프로그램의 프로덕트 정보 제공 및 구매 방법과 그시스템 无效
标题翻译：提供电视节目和购买产品的产品信息的方法和系统
公开(公告)号：KR1020030065654A
公开(公告)日：2003-08-09
申请号：KR1020020005363
申请日：2002-01-30
申请人： 삼성전자주식회사
发明人： 김홍석
IPC分类号： H04N21/472 , G06Q30/06
CPC分类号： H04N21/2542 , H04N21/232 , H04N21/237 , H04N21/4622 , H04N21/4722 , H04N21/47815
摘要： PURPOSE: A method and system for providing product information of a TV program and purchasing products are provided to allow a viewer to be easily supplied with information about products and to purchase the products while watching TV. CONSTITUTION: A product information database that stores information related with at least one product of each broadcasting program is constructed. When a signal of requesting at least one product information is received from a viewer through a mobile communication network(301), information related with a corresponding product is read from the database(303). The information related with the corresponding product is provided to the viewer(306). The product information is transmitted to the viewer through one of the Internet or mobile communication network.
摘要翻译：目的：提供用于提供电视节目和购买产品的产品信息的方法和系统，以便观众容易地提供有关产品的信息并在观看电视时购买产品。构成：构建存储与每个广播节目的至少一个产品相关的信息的产品信息数据库。当通过移动通信网络（301）从观众接收到请求至少一个产品信息的信号时，从数据库（303）读取与对应产品相关的信息。将与相应产品相关的信息提供给观看者（306）。产品信息通过互联网或移动通信网络中的一个传送给观众。

78. 发明公开

KR1020030043108A 포토리소그래피 공정의 얼라인 계측방법 有权
标题翻译：光刻过程的对准测量方法
公开(公告)号：KR1020030043108A
公开(公告)日：2003-06-02
申请号：KR1020010074098
申请日：2001-11-27
申请人： 삼성전자주식회사
发明人： 김홍석
IPC分类号： H01L21/027
CPC分类号： G03F7/705 , G03F7/70633
摘要： PURPOSE: An align measuring method of a photolithography process is provided to easily decide whether the process has to be kept progressing or not by informing the rate of process failure. CONSTITUTION: The overlay state of each pattern image lithographed on each short region is measured(ST104). The number of short regions that is determined to be overlay failure is decided by confirming the misalign quantity of each short region(ST110). The number of short regions is calculated against the total number of short regions by using a percentage method(ST112). Whether the process has to be progressed again or not, is decided by comparing the resultant value of the percentage method with a predetermined value(ST114).
摘要翻译：目的：提供光刻工艺的对准测量方法，以便通过告知过程失败的速率来容易地决定过程是否必须保持进行。构成：测量在每个短区域上平版印刷的每个图案图像的覆盖状态（ST104）。通过确认每个短区域的不对准量来确定确定为覆盖故障的短区域的数量（ST110）。通过使用百分比法（ST112），针对短区域的总数量计算短路区域的数量。通过将百分比法的结果值与预定值进行比较来决定是否再次进行处理（ST114）。

79. 发明公开

KR1020030030367A ２－ＷＡＹｐａｇｅｒ망을 이용한 양방향 무선 서비스시스템 및 방법 无效
标题翻译：双向无线电服务系统和使用双路PAGER网络的方法
公开(公告)号：KR1020030030367A
公开(公告)日：2003-04-18
申请号：KR1020010062358
申请日：2001-10-10
申请人： 삼성전자주식회사
发明人： 노숙경 , 정용상 , 김홍석
IPC分类号： H04W84/02
摘要： PURPOSE: A bi-directional radio service system and method using a 2-way pager network are provided to increase a profit of an ISP/CP through expansion of paid users by discriminating paid service users and constructing a data communication environment, and create a new profit of an ISP by making a PCMCIA user and a communication network provider to share a communication service use fee. CONSTITUTION: A user has an information processor(302) in which a bi-directional radio interface card formed as a PCMCIA card is installed, through which the user is connected to a radio network provided by a radio network provider(304). The information processor can be a computer, a notebook computer, a PDA(Personal Data Assistance) or a Web pad. The radio network can be a 2-Way pager network. The user is connected to an ISP(306) such as DAUM or MSN through the radio network to use a service such as E-mail or IM(chatting). The ISP(306) provides the service such as E-mail or IM(chatting) with fee or for free, and makes a profit for the use of the paid service. The radio network provider(304) makes a profit from the network use fee.
摘要翻译：目的：提供一种使用双向寻呼机网络的双向无线电业务系统和方法，通过区分有偿服务用户和构建数据通信环境，通过扩大付费用户来增加ISP / CP的利润，并创建新的通过使PCMCIA用户和通信网络提供商共享通信服务使用费，ISP的利润。构成：用户具有信息处理器（302），其中安装了形成为PCMCIA卡的双向无线电接口卡，通过该信息处理器将用户连接到由无线电网络提供商（304）提供的无线电网络。信息处理器可以是计算机，笔记本电脑，PDA（个人数据协助）或网页。无线网络可以是双向寻呼机网络。用户通过无线电网络与诸如DAUM或MSN的ISP（306）连接以使用诸如电子邮件或IM（聊天）的服务。 ISP（306）提供诸如电子邮件或即时消息（聊天）等服务，免费提供，并为使用付费服务赚取利润。无线电网络提供商（304）从网络使用费中获利。

80. 发明公开

KR1020030000108A 네트워크 상에서의 주소록 통합 관리 서비스 시스템 및 방법 无效
标题翻译：网络集成地址簿管理服务的系统与方法
公开(公告)号：KR1020030000108A
公开(公告)日：2003-01-06
申请号：KR1020010035762
申请日：2001-06-22
申请人： 삼성전자주식회사
发明人： 김홍석
IPC分类号： G06Q50/00
摘要： PURPOSE: A system and a method for an integrated address book management service on the network are provided to integrally manage an electronic business card and an address book between terminals using a wire/wireless communication network. CONSTITUTION: An integrated address management server comprises a control module(210), a database(220) and a communication module(230). The control module(210) integrally manages the electronic business card and the address book by using an instant messenger application on the network through the control of the database(220) and the communication module(230). The control module(210) comprises an electronic business card generating module(210-1), an electronic business card transmission control module(210-2) and an electronic business card receiving control module(210-3). The database(220) stores the electronic business card information, the address book information and an IP address of a user computer connected to the Internet. The communication module(230) includes a hardware and a software to transmit/receive the information of the electronic business card and the address book with the terminal connected to the Internet.
摘要翻译：目的：提供一种用于网络上集成地址簿管理服务的系统和方法，以使用有线/无线通信网络在终端之间整合电子名片和地址簿。构成：集成的地址管理服务器包括控制模块（210），数据库（220）和通信模块（230）。控制模块（210）通过数据库（220）和通信模块（230）的控制，通过使用网络上的即时消息应用程序来一体地管理电子名片和地址簿。控制模块（210）包括电子名片生成模块（210-1），电子名片传输控制模块（210-2）和电子商务卡接收控制模块（210-3）。数据库（220）存储电子名片信息，地址簿信息和连接到互联网的用户计算机的IP地址。通信模块（230）包括硬件和软件，用于发送/接收与互联网连接的终端的电子名片和地址簿的信息。

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