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31. 发明授权

KR101691157B1 나노임프린트용 스탬프 제조방법 有权
标题翻译：制造纳米压印印花的方法
公开(公告)号：KR101691157B1
公开(公告)日：2017-01-02
申请号：KR1020100128624
申请日：2010-12-15
申请人： 삼성전자주식회사
发明人： 이병규 , 이두현 , 고웅
IPC分类号： H01L21/027
CPC分类号： B41C1/02 , B29C33/3842 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
摘要： 나노임프린트용스탬프제조방법이개시된다. 개시된나노임프린트용스탬프제조방법은, 패턴이형성된마스터기판과, 식각장벽층이형성된스탬프기판사이에포토레지스트를도포하는단계와, 상기스탬프기판에대해서상기마스터기판을압착하여포토레지스트패턴을형성하는단계와, 상기포토레지스트패턴을이용하여상기식각장벽층을식각하여하드마스크를형성하는단계와, 상기하드마스크를사용하여상기스탬프기판을식각하는단계를포함한다.
摘要翻译：提供制造纳米压印印模的方法。该方法可以包括在母板的表面上形成图案，在印模基板的表面上沉积蚀刻阻挡层，在主基板和印模基板的一个表面上涂覆光致抗蚀剂，在其上具有蚀刻阻挡层形成光刻胶图案，通过将母版基板压靠在印模基板上，通过使用光致抗蚀剂图案蚀刻蚀刻阻挡层来形成硬掩模，并使用硬掩模作为蚀刻掩模蚀刻印模基板。

32. 发明公开

KR1020160043453A 전류저항층을 포함하는 포토컨덕터를 가진 엑스선 검출기 审中-实审
标题翻译：具有包括电流电阻层的光电子器件的X射线探测器
公开(公告)号：KR1020160043453A
公开(公告)日：2016-04-21
申请号：KR1020140137854
申请日：2014-10-13
申请人： 삼성전자주식회사
发明人： 이병규 , 이두현 , 박재철
IPC分类号： G01T1/24 , H01L31/04
CPC分类号： G01T1/247 , G01T1/24 , H01L27/14634 , H01L27/14636 , H01L27/14676
摘要： 전류저항층을포함하는포토컨덕터를가진엑스선검출기가개시된다. 개시된엑스선검출기는기판상에배치된복수의픽셀전극과, 상기복수의픽셀전극을덮는포토컨덕터와, 상기포토컨덕터상의공통전극을포함한다. 상기포토컨덕터는적어도 2개의포토컨덕터층과상기적어도 2개의포토컨덕터층사이의전류흐름을감소시키는전류저항층을포함한다.
摘要翻译：公开了一种具有包括电流电阻层的光电导体以提高X射线检测效率的X射线检测器。 X射线检测器包括：设置在基板上的像素电极; 覆盖像素电极的光电导体; 和光电导体上的公共电极。光电导体包括至少两个感光体层和电流电阻层，其降低至少两个光电导体层之间的电流。

33. 发明公开

KR1020160042697A 유기-무기 복합 박막 및 그 제조 방법 审中-实审
标题翻译：有机和无机复合膜及其制造方法
公开(公告)号：KR1020160042697A
公开(公告)日：2016-04-20
申请号：KR1020140136961
申请日：2014-10-10
申请人： 삼성전자주식회사
发明人： 이두현 , 이병규 , 김선일 , 박재철 , 이동욱 , 이창범
IPC分类号： C08J7/04 , C08L29/14 , C08K3/16 , H01L31/115
CPC分类号： G01T1/244 , G01T1/24 , H01B1/02 , H01L27/14676
摘要： 유기-무기복합박막및 그제조방법이제공된다. 개시된유기-무기복합박막은무기물파우더및 유기고분자바인더를포함하는페이스트를이용하여스크린프린팅공정에의하여형성된박막에대해, 가압공정및 가열공정을실시하하여형성될수 있다. 이러한박막의유기고분자바인더는열가소성수지로형성될수 있다. 상기가압공정은가압공정은 50kgf/cm~ 2000 kgf/cm범위에서실시될 수있으며, 상기가열공정은유기고분자파우더의유리전이온도또는그 이상의온도범위에서실시될수 있다.
摘要翻译：提供一种有机 - 无机复合薄膜及其制造方法。所公开的有机 - 无机复合薄膜可以通过使用含有无机粉末和有机聚合物粘合剂的糊剂通过丝网印刷法形成的薄膜加压和加热来制造。这种薄膜的有机聚合物粘合剂可以加工成热塑性树脂，加压过程在50-2000kgf / cm ^ 2的范围内进行，而加热过程在玻璃化转变温度有机聚合物粉末或超过温度。

34. 发明公开

KR1020120079734A 나노임프린트용 스탬프 제조방법 无效
标题翻译： NANO-IMPRINT印花印花方法
公开(公告)号：KR1020120079734A
公开(公告)日：2012-07-13
申请号：KR1020110001090
申请日：2011-01-05
申请人： 삼성전자주식회사
发明人： 이두현 , 이병규 , 고웅
IPC分类号： B29C33/38 , B29C59/02 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： PURPOSE: A method for manufacturing a stamp for nano-imprints is provided to precisely manufacture stamps by performing at least two imprint processes using the stamp with more than a 20mm pattern width. CONSTITUTION: A method for manufacturing a stamp for nano-imprints is as follows. A first resist layer is formed on a stamp substrate(110). The imprint processes is performed by an imprint stamp having a first pattern. A first resist pattern(122) is formed by transferring the first pattern to a first resist layer. A second resist layer covering the first resist pattern is formed on the stamp substrate. A second resist pattern(142) is formed on the second resist layer by transferring the first pattern. A third resist pattern is formed by etching the first resist pattern. The third resist pattern is used as a mask, and the stamp substrate is etched.
摘要翻译：目的：提供一种用于制造纳米压印印模的方法，以通过使用具有大于20mm图案宽度的印模执行至少两个压印处理来精确地制造印章。构成：用于制造纳米印记印模的方法如下。在印模基板（110）上形成第一抗蚀剂层。印记处理由具有第一图案的印记印模执行。第一抗蚀剂图案（122）通过将第一图案转印到第一抗蚀剂层而形成。覆盖第一抗蚀剂图案的第二抗蚀剂层形成在印模基板上。通过转移第一图案在第二抗蚀剂层上形成第二抗蚀剂图案（142）。通过蚀刻第一抗蚀剂图案形成第三抗蚀剂图案。将第三抗蚀剂图案用作掩模，并且印模基板被蚀刻。

35. 发明公开

KR1020120067170A 나노임프린트용 스탬프 제조방법 有权
标题翻译：制造NANOIMPRINT印花的方法
公开(公告)号：KR1020120067170A
公开(公告)日：2012-06-25
申请号：KR1020100128624
申请日：2010-12-15
申请人： 삼성전자주식회사
发明人： 이병규 , 이두현 , 고웅
IPC分类号： H01L21/027
CPC分类号： B41C1/02 , B29C33/3842 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015 , H01L21/0274
摘要： PURPOSE: A stamp manufacturing method for nanoimprint is provided to form a minute pattern of a nano structure on a stamp since the stamp is manufactured by a nanoimprint process by using a master board on which a pattern of a nano structure is formed. CONSTITUTION: A pattern is formed on one side of a master board. An etch barrier layer(132) is evaporated on one side of a stamp substrate(130). Photoresist is applied onto one surface of either one side of the master board or the etch barrier layer. A photoresist pattern(142) formed out of the photoresist is formed on the stamp substrate. A hard mask is formed by etching the etch barrier layer.
摘要翻译：目的：提供一种用于纳米压印的印模制造方法，以在印模上形成纳米结构的微小图案，因为印模是通过使用其上形成有纳米结构图案的母板通过纳米压印工艺制造的。构成：在主板的一侧形成图案。蚀刻阻挡层（132）在印模衬底（130）的一侧被蒸发。将光刻胶施加到主板或蚀刻阻挡层的任一侧的一个表面上。在印模基板上形成由光致抗蚀剂形成的光致抗蚀剂图案（142）。通过蚀刻蚀刻阻挡层形成硬掩模。

36. 发明公开

KR1020120020012A 유기-무기 복합체 및 이로부터 제조된 나노임프린트용 스탬프 无效
标题翻译：有机无机混合材料和印花从其制造的纳米薄膜
公开(公告)号：KR1020120020012A
公开(公告)日：2012-03-07
申请号：KR1020100083706
申请日：2010-08-27
申请人： 삼성전자주식회사
发明人： 이두현 , 이병규 , 고웅
IPC分类号： C08G83/00 , C08G77/04 , C01B33/113 , B29C59/02
CPC分类号： C08G79/00
摘要： PURPOSE: An organic-inorganic composite is provide to have high elasticity, self-release ability, and relatively low viscosity, thereby manufacturing a stamp for nanoimprint with micro patterns having excellent physical properties. CONSTITUTION: An organic-inorganic composite comprises backbone material, release material, and a photo initiator. The backbone material consists of inorganic material. At least one of the release material and the photoinitiator consists of organic material. The inorganic material of the backbone material is a compound containing at least one selected from a group consisting of Si, In, Zn, Al and Ti. A stamp for nanoimprint(S1) comprises a micro unevenness part(20a) formed of the organic-inorganic composite, and a support plate(200) supporting the micro unevenness part.
摘要翻译：目的：提供有机 - 无机复合材料具有高弹性，自释放能力和相对低的粘度，从而制造具有优异物理性能的微图案的纳米压印印模。构成：有机 - 无机复合材料包括骨架材料，剥离材料和光引发剂。骨架材料由无机材料组成。释放材料和光引发剂中的至少一种由有机材料组成。骨架材料的无机材料是含有选自Si，In，Zn，Al和Ti中的至少一种的化合物。纳米压印印模（S1）包括由有机 - 无机复合材料形成的微不平坦部分（20a）和支撑微不平坦部分的支撑板（200）。

37. 发明授权

KR101058014B1 분류 재생을 위한 디지털 촬영 장치의 제어 방법, 및 이방법을 채용한 디지털 촬영 장치 有权
公开(公告)号：KR101058014B1
公开(公告)日：2011-08-19
申请号：KR1020040082559
申请日：2004-10-15
申请人： 삼성전자주식회사
发明人： 이병규 , 윤병훈 , 김지홍 , 김윤철
IPC分类号： H04N5/225
CPC分类号： H04N5/772 , H04N5/765 , H04N5/907 , H04N9/8047 , H04N9/8205
摘要： 본 발명에 따른 방법은, 촬영 모드에서 촬영 동작에 의하여 얻어진 사용자 파일들을 저장 매체에 저장하고, 저장 매체에 저장되어 있는 사용자 파일들을 재생 모드에서 재생하는 디지털 촬영 장치의 제어 방법으로서, 재생 모드에서, 사용자 파일들의 이름들(상기 각각의 사용자 파일의 이름은 문자들 및 숫자들의 조합으로 이루어짐)에 포함되어 있는 특정 위치의 문자를 사용자에 의하여 선택된 특정 표시문자로 변경하는 단계 및 재생 모드에서, 선택된 특정 표시문자를 포함한 이름들에 상응하는 사용자 파일들만을 디지털 촬영 장치의 디스플레이 패널에 디스플레이하는 단계를 포함한다.

38. 发明公开

KR1020080054804A 저항을 이용한 나노임프린트 리소그래피용 스탬프 정렬방법 및 그 장치 无效
标题翻译：使用电阻的纳米压印法的印章覆盖方法及其设备
公开(公告)号：KR1020080054804A
公开(公告)日：2008-06-19
申请号：KR1020060127385
申请日：2006-12-13
申请人： 삼성전자주식회사
发明人： 이병규 , 이명복 , 손진승 , 이두현 , 조은형 , 김해성
IPC分类号： H01L21/027 , B82Y40/00
CPC分类号： G03F7/0002 , G03F9/7042 , B82Y40/00 , G03F7/70633
摘要： An apparatus and a method for aligning a stamp for nano imprint lithography using resistance are provided to align not only the stamp of transparent material but the stamp of opaque material by using the stamp for nano imprint lithography. After loading a substrate and a stamp in which a resistance alignment key having a resistor and a resistance measuring outlet mark which changes resistance values according to the contact location with the resistance alignment key, are inserted respectively, a first alignment process is performed(S130). The electric resistance is measured by contacting the stamp with the substrate(S150). An optimized alignment location is set according to the measured resistance value(S160). An exposure process is performed on the aligned stamp and the substrate(S170). The stamp and the substrate are unloaded(S180).
摘要翻译：提供使用电阻对准用于纳米压印光刻的印模的装置和方法，以通过使用用于纳米压印光刻的印模来不仅对准透明材料的印模，而且使不透明材料的印模对准。在分别插入基板和印模后，分别插入具有电阻器的电阻对准键和根据与电阻对准键的接触位置改变电阻值的电阻测量插座标记的印模，进行第一对准处理（S130）。通过使印模与基板接触来测量电阻（S150）。根据测得的电阻值设定优化的对准位置（S160）。在对准的印模和基板上进行曝光处理（S170）。邮票和基板卸载（S180）。

39. 发明授权

KR100831049B1 나노임프린트 리소그래피용 솔벤트 가용성 스탬프의 제조방법 有权
标题翻译：用于纳米印刷图的溶剂溶胶印刷机及其制造方法
公开(公告)号：KR100831049B1
公开(公告)日：2008-05-21
申请号：KR1020060132164
申请日：2006-12-21
申请人： 삼성전자주식회사
发明人： 이병규 , 이명복 , 손진승 , 이두현 , 조은형 , 김해성
IPC分类号： H01L21/027 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , B29C59/02
摘要： A method of manufacturing a solvent-soluble stamp for nano imprint lithography is provided to copy a plurality of stamps in large quantities by using one substrate. A method of manufacturing a solvent-soluble stamp for nano imprint lithography includes the following steps: coating the upper surface of a substrate with resist and patterning the resist through a lithography process; etching the substrate by using the patterned resist; depositing the polymer(30) which has the form of solvent-soluble resin on the resultant object; physically separating the polymer on which pattern of the substrate is transferred; depositing a metal layer(40) on a upper surface of the separated polymer pattern; depositing metal on a upper surface of the resultant object; and solving the resultant object in solvent to remove the polymer.
摘要翻译：提供一种制造用于纳米压印光刻的溶剂可溶性印模的方法，以通过使用一个基板大量复制多个印记。制造用于纳米压印光刻的溶剂可溶性印模的方法包括以下步骤：用抗蚀剂涂覆基板的上表面并通过光刻工艺对抗蚀剂进行图案化; 通过使用图案化的抗蚀剂蚀刻衬底; 将具有溶剂可溶性树脂形式的聚合物（30）沉积在所得物体上; 物理分离转移了基板图案的聚合物; 在分离的聚合物图案的上表面上沉积金属层（40）; 在所得物体的上表面上沉积金属; 并在溶剂中溶解所得物以除去聚合物。

40. 发明公开

KR1020080040430A 패턴화된 자기 기록 매체 有权
标题翻译：图形磁记录媒体
公开(公告)号：KR1020080040430A
公开(公告)日：2008-05-08
申请号：KR1020060108391
申请日：2006-11-03
申请人： 삼성전자주식회사
发明人： 임지경 , 손진승 , 이병규
IPC分类号： G11B5/82 , G11B5/74 , G11B5/84 , G11B5/66
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/02 , G11B5/66 , G11B5/667 , G11B5/7325 , G11B5/743 , G11B5/746 , G11B5/855 , G11B2005/0005 , G11B2005/0029
摘要： A patterned magnetic recording medium is provided to reduce switching field distribution of the pattern magnetic recording medium by reducing magnetic interaction between adjacent magnetic recording layers, thereby increasing recording reliability and data stability. A patterned magnetic recording medium(200) includes a plurality of magnetic recording layers arranged at regular intervals on a substrate(20). Each magnetic recording layer comprises a first ferromagnetic layer(2a), a unit of suppressing magnetic interaction between recording layers, and a second ferromagnetic layer(2b), that are successively piled, wherein the unit is a soft magnetic layer(6). A non-magnetic layer(250) is sandwiched between the first ferromagnetic layer and the soft magnetic layer, and the soft magnetic layer and the second ferromagnetic layer.
摘要翻译：提供图案化的磁记录介质以通过减少相邻磁记录层之间的磁相互作用来减少图案磁记录介质的切换场分布，从而提高记录可靠性和数据稳定性。图案化磁记录介质（200）包括在基板（20）上以规则间隔布置的多个磁记录层。每个磁记录层包括第一铁磁层（2a），一个抑制记录层之间磁性相互作用的单元，以及连续堆叠的第二铁磁层（2b），其中该单元是软磁层（6）。非磁性层（250）夹在第一铁磁层和软磁层之间，以及软磁层和第二铁磁层之间。

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