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11. 发明公开

KR1020120076288A 액정 배향제, 이를 이용하여 제조한 액정 배향막 및 상기 액정 배향막을 포함하는 액정표시소자 有权
标题翻译：液晶对准代理，使用其制造的液晶对准膜和包括液晶对准膜的液晶显示装置
公开(公告)号：KR1020120076288A
公开(公告)日：2012-07-09
申请号：KR1020110063963
申请日：2011-06-29
申请人： 제일모직주식회사
发明人： 양재덕 , 김은하 , 신명엽 , 유용식 , 조국표 , 최정곤
IPC分类号： C08L79/08 , C08G73/10 , C09K19/56 , G02F1/1337
摘要： PURPOSE: A liquid crystal alignment agent is provided to improve stability of an alignment film through the improvement of photo reactivity, and to minimize influence by residual double bonds. CONSTITUTION: A liquid crystal alignment agent comprises a polymer selected from a group consisting of a polyamic acid comprising a repeating unit in chemical formula 1, a polyimide comprising a repeating unit in chemical formula 2, and combinations thereof. In chemical formula 1 and 2, X^1 and X^2 are respectively and independently a tetravalent organic group derived from cycloaliphatic acid dianhydride or aromatic acid dianhydride, and Y^1 and Y^2 are respectively divalent organic group derived from diamine comprising chemical formula 3.
摘要翻译：目的：提供液晶取向剂，以通过提高光反应性来改善取向膜的稳定性，并使残留双键的影响最小化。构成：液晶取向剂包括选自由化学式1中的重复单元构成的聚酰胺酸的聚合物，包含化学式2中的重复单元的聚酰亚胺及其组合。在化学式1和2中，X 1和X 2分别独立地为衍生自脂环族酸二酐或芳族酸二酐的四价有机基团，Y 1和Y 2分别为二价有机基团，二胺包括化学式公式3。

12. 发明公开

KR1020110076492A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020110076492A
公开(公告)日：2011-07-06
申请号：KR1020090133229
申请日：2009-12-29
申请人： 제일모직주식회사
发明人： 이정우 , 유용식 , 조현용 , 정지영 , 정두영 , 이종화 , 정민국 , 차명환 , 전환승
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , G03F7/0755
摘要： PURPOSE: A positive type photo-sensitive resin composition, a photo-sensitive resin film using the same, a semiconductor device including the same are provided to minimize the thickness reduction of the film by maximizing the dissolution suppressive effect of a non-exposing part. CONSTITUTION: A positive type photo-sensitive resin composition includes a resin precursor, a dissolution controlling agent, an acid generator, a silane-based compound, and a solvent. The resin precursor is selected from a polybenzoxazole precursor, polyamic acid, or the combination of the same. The polarity of the dissolution controlling agent is between 1 and 4D, and the boiling point of the dissolution controlling agent is between 210 and 400 degrees Celsius. The polybenzoxazole precursor includes a repeating unit which is represented by chemical formula 1 or both repeating units represented by the chemical formula 1 and chemical formula 2. In the chemical formula 1 and 2, the X1 is an aromatic organic group or tetravalent to hexavalent aliphatic organic group. The Y1 and the Y2 are identical or different and are respectively aromatic organic groups or bivalent to hexavalent aliphatic organic groups. The X2 is an aromatic organic group, bivalent to hexavalent aliphatic organic group, bivalent to hexavalent alicyclic organic group, or an organic group represented by chemical formula 3.
摘要翻译：目的：提供一种正型感光树脂组合物，使用其的感光树脂膜，包括该光敏树脂膜的半导体器件，以使非曝光部分的溶解抑制效果最大化来最小化膜的厚度减小。构成：正型感光树脂组合物包括树脂前体，溶解控制剂，酸产生剂，硅烷类化合物和溶剂。树脂前体选自聚苯并恶唑前体，聚酰胺酸或其组合。溶解控制剂的极性在1和4D之间，溶解控制剂的沸点在210-400℃之间。聚苯并恶唑前体包括由化学式1表示的重复单元或由化学式1和化学式2表示的两个重复单元。在化学式1和2中，X1是芳族有机基团或四价至六价脂族有机基团组。 Y1和Y2相同或不同，分别为芳族有机基团或二价至六价脂族有机基团。 X 2为芳香族有机基团，二价至六价脂肪族有机基团，二价至六价脂环族有机基团或由化学式3表示的有机基团。

13. 发明公开

KR1020110065889A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020110065889A
公开(公告)日：2011-06-16
申请号：KR1020090122574
申请日：2009-12-10
申请人： 제일모직주식회사
发明人： 유용식 , 이정우 , 조현용 , 정지영 , 정민국 , 전환승 , 김정현 , 차명환
IPC分类号： G03F7/039 , G03F7/022
CPC分类号： G03F7/039 , C08L77/06 , C08L79/08 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0392 , G03F7/0757
摘要： PURPOSE: A positive photosensitive resin composition, a photosensitive resin film produced therefrom, and an electronic component for a semi-conductor including thereof are provided to obtain a micro pattern with the excellent heat resistance and the high-sensitivity. CONSTITUTION: A positive photosensitive resin composition contains a polyamide polymer marked with chemical formula 1, a esterified quinonediazide compound, a crown ether compound, and a solvent. In the chemical formula 1, X1 and X2 are divalent~tetravalent organic radicals. Y1 and Y2 are divalent~hexavalent organic radicals. E1 and E3 are remainders selected from the group consisting of hydrogen, carboxylic anhydride, mono carboxylic acid, or their active derivatives.
摘要翻译：目的：提供正型感光性树脂组合物，由其制造的感光性树脂膜和包含其的半导体用电子部件，以获得耐热性和高灵敏度的微图案。构成：正型感光性树脂组合物含有用化学式1标记的聚酰胺聚合物，酯化醌二叠氮化合物，冠醚化合物和溶剂。在化学式1中，X 1和X 2是二价〜四价有机基团。 Y1和Y2是二价〜六价有机基团。 E1和E3是选自氢，羧酸酐，单羧酸或其活性衍生物的残基。

14. 发明授权

KR101015859B1 포지티브형 감광성 수지 조성물 有权
标题翻译：正型感光树脂组合物
公开(公告)号：KR101015859B1
公开(公告)日：2011-02-23
申请号：KR1020080098202
申请日：2008-10-07
申请人： 제일모직주식회사
发明人： 정지영 , 정두영 , 유용식 , 조현용 , 정민국 , 이종화 , 이길성 , 차명환
IPC分类号： G03F7/039
摘要： 본 발명은 포지티브형 감광성 수지 조성물에 관한 것으로서, 이 포지티브형 감광성 수지 조성물은 (A) 하기 화학식 1로 표시되는 반복단위를 갖는 폴리벤조옥사졸 전구체; (B) 감광성 디아조퀴논 화합물; (C) 실란 화합물; (D) 용해조절제; 및 (E) 용매를 포함하며, 상기 용해조절제는 지환족 알코올 화합물, 지환족 고리를 포함하는 방향족 알코올 화합물 및 이들의 조합으로 이루어진 군에서 선택되는 화합물이다.
[화학식 1]

(상기 화학식 1에서, 각 치환기의 정의는 명세서에 정의된 것과 동일하다.)
본 발명의 포지티브형 감광성 수지 조성물은 막 수축율을 현저히 낮출 수 있으며, 고감도, 고해상도, 양호한 패턴 형상, 및 우수한 잔여물 제거성을 나타낸다.
포지티브형, 감광성 폴리벤조옥사졸 전구체, 용해조절제, 열중합 가교제, 알칼리 수용액, 반도체 장치
摘要翻译：本发明聚苯并恶唑前体具有由下述通式表示的重复单元（1），以正型感光性树脂组合物（A）涉及一种正型感光性树脂组合物; （B）光敏重氮醌化合物; （C）硅烷化合物; （D）溶解调节剂; 和（E）包含溶剂，其中，所述溶解控制剂是选自脂环族醇化合物，脂环族，芳族醇化合物，包括一个环，以及它们的组合组成的组中的化合物。

15. 发明公开

KR1020110002754A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020110002754A
公开(公告)日：2011-01-10
申请号：KR1020090060395
申请日：2009-07-02
申请人： 제일모직주식회사
发明人： 정두영 , 조현용 , 정지영 , 이정우 , 이종화 , 김영훈 , 정민국 , 유용식 , 전환승
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , C07C205/42 , C08G73/14 , C08L79/08 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/031
摘要： PURPOSE: A positive type photosensitive resin composition is provided to obtain excellent sensitivity, resolution pattern formation, residual film rate and excellent residue elimination. CONSTITUTION: A positive type photosensitive resin composition includes (A) a hydroxy group-containing alkali soluble resin, (B) an onium salt compound represented by chemical formula 1, and (C) a solvent. In chemical formula 1, R1 is substituted or unsubstituted C16-C32 aromatic organic group; R2 and R3 are independently substituted or unsubstituted aromatic organic group; X^+ is monovalent cation of elements of Group 16 or 17; Y^- is monovalent anion; a is an integer of 1-3; and b and c are an integer of 0-2.
摘要翻译：目的：提供正型感光性树脂组合物，以获得优异的灵敏度，分辨率图案形成，残留膜率和优异的残留物消除。构成：正型感光性树脂组合物包含（A）含羟基的碱溶性树脂，（B）由化学式1表示的鎓盐化合物和（C）溶剂。在化学式1中，R 1是取代或未取代的C 16 -C 32芳族有机基团; R2和R3独立地是取代或未取代的芳族有机基团; X ^ +是第16或17族元素的单价阳离子; Y ^ - 是一价阴离子; a为1-3的整数; b和c为0-2的整数。

16. 发明公开

KR1020100110580A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020100110580A
公开(公告)日：2010-10-13
申请号：KR1020090028992
申请日：2009-04-03
申请人： 제일모직주식회사
发明人： 정두영 , 조현용 , 정지영 , 정민국 , 이종화 , 유용식 , 이길성
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0226 , G03F7/023 , G03F7/0233 , G03F7/0236 , G03F7/0757 , G03F7/105
摘要： PURPOSE: A positive photosensitive resin composition, a photosensitive resin film, and a semiconductor device using thereof are provided to secure the excellent sensitivity, resolution, and a residue elimination property of the composition. CONSTITUTION: A positive photosensitive resin composition includes a recurring unit marked with chemical formula 1, a polybenzoxazole precursor including a functional group induced from a substituted or non-substituted monoamine compound, a photosensitive diazoquinone compound, a silane compound, a phenolic compound, and a solvent. In the chemical formula 1, X is either an aromatic organo group or a tetravalent~hexavalent aliphatic organic group.
摘要翻译：目的：提供正型感光性树脂组合物，感光性树脂膜和使用其的半导体装置，以确保组合物的优异的灵敏度，分辨率和残留物消除性。构成：正型感光性树脂组合物包括标记有化学式1的重复单元，包含由取代或未取代的单胺化合物引发的官能团的聚苯并恶唑前体，感光性重氮醌化合物，硅烷化合物，酚类化合物和溶剂。在化学式1中，X是芳族有机基团或四价〜六价脂族有机基团。

17. 发明公开

KR1020100080344A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020100080344A
公开(公告)日：2010-07-08
申请号：KR1020090106661
申请日：2009-11-05
申请人： 제일모직주식회사
发明人： 조현용 , 정두영 , 이종화 , 정지영 , 정민국 , 유용식 , 이길성
IPC分类号： G03F7/039 , G03F7/075 , G03F7/016
CPC分类号： G03F7/039 , C08L79/08 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0392
摘要： PURPOSE: A positive photosensitive resin composition, a photosensitive resin film using the same, and a semiconductor device using the film are provided to have excellent sensitivity and high resolution in a process for forming a pattern at a temperature below 200°C and to obtain excellent mechanical properties through a crosslink bond of a crosslinking agent and a polybenzoxazole in thermal hardening of 300°C or greater. CONSTITUTION: A positive photosensitive resin composition includes: a repeating unit which is marked as a chemical formula 1 or a chemical formula 2; a polybenzoxazole precursor having a thermal polymerizable functional group on the terminal of the precursor; a photosensitive diazoquinone compound, a silane compound, a phenolic compound; a crosslinking agent having the thermal polymerizable functional group; and a solvent.
摘要翻译：目的：提供正型感光性树脂组合物，使用该感光性树脂组合物的感光性树脂膜和使用该膜的半导体装置，在200℃以下的图案形成工序中，具有优异的灵敏度和高分辨率，通过交联剂和聚苯并恶唑的交联键在300℃以上的热硬化中的机械性能。构成：正型感光性树脂组合物包括：标记为化学式1或化学式2的重复单元; 在前体的末端具有热聚合性官能团的聚苯并恶唑前体; 光敏重氮醌化合物，硅烷化合物，酚类化合物; 具有热聚合性官能团的交联剂; 和溶剂。

18. 发明公开

KR1020100080343A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020100080343A
公开(公告)日：2010-07-08
申请号：KR1020090106634
申请日：2009-11-05
申请人： 제일모직주식회사
发明人： 조현용 , 정두영 , 이종화 , 정지영 , 정민국 , 유용식 , 이길성
IPC分类号： G03F7/039 , G03F7/075 , G03F7/016
CPC分类号： G03F7/039 , C08L79/08 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0392 , G03F7/105
摘要： PURPOSE: A positive photosensitive resin composition, a photosensitive resin film using the same, and a semiconductor device including the film are provided to enable a cold hardening at a low temperature of 250°C-300°C due to a thermal hardening functional group of a polybenzoxazole polymer terminal and to form a pattern having high sensitivity and high resolution. CONSTITUTION: A positive photosensitive resin composition comprises: a repeating unit which is marked as a chemical formula 1 or a chemical formula 2; a polybenzoxazole precursor having a thermal polymerizable function group which is indueced from a monoamine compound having a carbon-carbon double bond; a photosensitive diazoquinone compound; a silane compound; a phenolic compound, and a solvent. In the chemical formula 1 and 2, X1 is an aromatic organic group or an alicyclic organic group.
摘要翻译：目的：提供正型感光性树脂组合物，使用该感光性树脂组合物的感光性树脂膜和包含该膜的半导体装置，由于能够在250℃〜300℃的低温下进行冷硬化，聚苯并恶唑聚合物末端并形成具有高灵敏度和高分辨率的图案。构成：正型感光性树脂组合物包含：标记为化学式1或化学式2的重复单元; 具有由具有碳 - 碳双键的单胺化合物诱导的热聚合性官能团的聚苯并恶唑前体; 光敏重氮醌化合物; 硅烷化合物酚类化合物和溶剂。在化学式1和2中，X 1是芳族有机基团或脂环族有机基团。

19. 发明公开

KR1020100052358A 포지티브형 감광성 수지 조성물 有权
标题翻译：正性感光树脂组合物
公开(公告)号：KR1020100052358A
公开(公告)日：2010-05-19
申请号：KR1020080111329
申请日：2008-11-10
申请人： 제일모직주식회사
发明人： 정지영 , 정민국 , 정두영 , 조현용 , 유용식 , 이종화 , 이길성
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , C08L79/08 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/037 , G03F7/0392 , G03F7/105
摘要： PURPOSE: A positive photosensitive resin composition is provided to secure the high-sensitivity and high definition of the composition, to improve he residue elimination property, and to maintain the balance of a solid content of the composition. CONSTITUTION: A positive photosensitive resin composition contains a polybenzoxazole precursor including a recurring unit marked as chemical formula 1, a photosensitive diazoquinone compound, a silane compound, a phenol compound and a solvent. In the chemical formula 1, X1 refers to an aromatic organic group or a quadrivalent-hexavalent aliphatic organic group. X2 refers to the aromatic organic group. Y1 and Y2 are the aromatic organic group or a divalent-hexavalent aliphatic organic group, respectively.
摘要翻译：目的：提供正型感光性树脂组合物以确保组合物的高灵敏度和高分辨率，以提高其残留物消除性能，并保持组合物的固体含量的平衡。构成：正型感光性树脂组合物含有包含标记为化学式1的重复单元的聚苯并恶唑前体，感光性重氮醌化合物，硅烷化合物，酚化合物和溶剂。在化学式1中，X1表示芳族有机基团或四价六价脂肪族有机基团。 X2是指芳族有机基团。 Y1和Y2分别是芳族有机基团或二价 - 六价脂族有机基团。

20. 发明公开

KR1020100036115A 포지티브형 감광성 수지 조성물 有权
标题翻译：正性感光树脂组合物
公开(公告)号：KR1020100036115A
公开(公告)日：2010-04-07
申请号：KR1020080095575
申请日：2008-09-29
申请人： 제일모직주식회사
发明人： 정두영 , 정지영 , 정민국 , 조현용 , 이종화 , 유용식 , 차명환 , 이길성
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , C08L79/08 , G03C1/61 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0392 , G03F7/105
摘要： PURPOSE: A positive photosensitive resin composition is provided to obtain sensitivity improvement effect by increasing development at an exposure part, and to ensure good patterns and excellent resolution. CONSTITUTION: A positive photosensitive resin composition comprises (A) a polybenzoxazole precursor which has a repeating unit represented by chemical formula 1 and a terminal functional group which is converted into a thermopolymerizable functional group during heat curing, (B) a photosensitive diazoquinone compound, (C) a silane compound, (D) a phenol compound, and (E) a solvent.
摘要翻译：目的：提供正型感光性树脂组合物，以通过增加曝光部分的显影来获得灵敏度提高效果，并确保良好的图案和优异的分辨率。构成：正型感光性树脂组合物含有（A）具有化学式1表示的重复单元的聚苯并恶唑前体和在热固化时转化为可热聚合官能团的末端官能团，（B）感光性重氮醌化合物（ C）硅烷化合物，（D）酚化合物和（E）溶剂。

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