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    • 2. 发明公开
    • 탄소 웨이퍼를 사용한 접촉식 발광다이오드 및 그 제조 방법
    • 使用碳粉的接触LED及其制造方法
    • KR1020120073508A
    • 2012-07-05
    • KR1020100135295
    • 2010-12-27
    • 동국대학교 산학협력단
    • 조학동강태원이상욱겐나디파닌
    • H01L33/02
    • PURPOSE: A contact type light emitting diode using a carbon wafer and a manufacturing method thereof are provided to improve productivity by preventing interface defects in a heterogeneous growth process of a semiconductor nano rod. CONSTITUTION: A transparent substrate(10) is made of transparent materials. A nano rod layer(30) is made of mono-atomic single crystal semiconductor and polyatomic single crystal compound semiconductor. The nano rod layer includes a plurality of semiconductor nano rods grown on the carbon wafer. A transparent electrode layer(20) is contacted with the semiconductor nano rod layer doped with a first polarity. A transparent semiconductor layer(21) is formed on the transparent electrode layer.
    • 目的:提供一种使用碳晶片的接触型发光二极管及其制造方法,以通过防止半导体纳米棒的异质生长工艺中的界面缺陷来提高生产率。 构成:透明基材(10)由透明材料制成。 纳米棒层(30)由单原子单晶半导体和多原子单晶化合物半导体制成。 纳米棒层包括在碳晶片上生长的多个半导体纳米棒。 透明电极层(20)与掺杂有第一极性的半导体纳米棒层接触。 在透明电极层上形成透明半导体层(21)。
    • 4. 发明公开
    • 절연체층 상에 그래핀 박막을 형성하는 방법 및 이를 이용하여 생성한 그래핀 박막
    • 在绝缘体层上形成石墨膜的方法及其形成的石墨
    • KR1020130067653A
    • 2013-06-25
    • KR1020110134440
    • 2011-12-14
    • 동국대학교 산학협력단
    • 이상욱강태원이승주전희창마이피헝겐나디파닌
    • C01B31/02H01B17/62G03C1/74
    • C01B32/184G03C1/74H01B17/62
    • PURPOSE: A forming method of a graphene thin film on an insulator layer, and a graphene thin film thereof are provided to minimize a patterning process of a graphene thin film, and to form a graphene thin film directly on an insulator, thereby omitting a process of moving a graphene to other insulator layer by etching a metal substrate or a metal catalyst layer. CONSTITUTION: A forming method of a graphene thin film on an insulator layer comprises the steps of: forming a photosensitizer on a metal layer in a state an insulator layer is formed on a substrate and a metal layer is formed on the insulator layer (100); forming a photosensitizer pattern by exposing and developing the photosensitizer layer (110); heating the photosensitizer pattern (120); and forming a graphene between the metal layer and the insulator layer by carbon atoms comprising the photosensitizer pattern which is penetrated through the metal layer as a result of the heating in the previous step. [Reference numerals] (100) Forming a photosensitizer on a metal layer in a state an insulator layer is formed on a substrate and a metal layer is formed on the insulator layer; (110) Forming a photosensitizer pattern by exposing and developing the photosensitizer layer; (120) Heating the photosensitizer pattern; (130) Forming a graphene between the metal layer and the insulator layer by carbon atoms comprising the photosensitizer pattern which is penetrated through the metal layer; (AA) Start; (BB) End
    • 目的:提供绝缘体层上的石墨烯薄膜的形成方法及其石墨烯薄膜,以最小化石墨烯薄膜的图案化工艺,并直接在绝缘体上形成石墨烯薄膜,从而省略了工艺 通过蚀刻金属基板或金属催化剂层将石墨烯移动到其它绝缘体层。 构成:在绝缘体层上形成石墨烯薄膜的方法包括以下步骤:在绝缘体层(100)上形成绝缘体层的状态下在金属层上形成光敏剂,并在金属层上形成金属层, ; 通过曝光和显影光敏剂层(110)形成光敏剂图案; 加热光敏剂图案(120); 并且通过碳原子在金属层和绝缘体层之间形成石墨烯,所述碳原子是由于在前一步骤中的加热而穿透金属层的光敏剂图案。 (附图标记)(100)在基板上形成绝缘体层的状态的金属层上形成光敏剂,在绝缘体层上形成金属层; (110)通过曝光和显影光敏剂层形成光敏剂图案; (120)加热光敏剂图案; (130)通过包含穿过金属层的光敏剂图案的碳原子在金属层和绝缘体层之间形成石墨烯; (AA)开始; (BB)结束
    • 6. 发明公开
    • 산화아연 나노로드, 금속 수송 증착법을 이용한 산화아연 나노로드 제조 방법 및 장치, 그 산화아연 나노로드를 이용한 전계 발광 디스플레이 나노로드 제조 방법
    • ZNO NANOROD,ZNO NANOROD生长方法和金属运输沉积装置,以及使用ZNO NANOROD制造现场排放显示的方法
    • KR1020120074901A
    • 2012-07-06
    • KR1020100136885
    • 2010-12-28
    • 동국대학교 산학협력단
    • 조학동이상욱겐나디파닌강태원
    • B82B3/00B82B1/00
    • B82Y30/00C30B23/00C30B23/007C30B29/16C30B29/605
    • PURPOSE: A zinc oxide nanorod, a manufacturing method and apparatus of zinc oxide nanorod using a metal, a manufacturing method of electro-luminescent display nanorod using the zinc oxide nanorod are provided to vaporize nanorod and nanowire having uniform length by growing the zinc oxide nanorod and the nanowire on the substrate at relatively low temperature. CONSTITUTION: A zinc oxide nanorod, a manufacturing apparatus of zinc oxide nanorod comprises a lateral furnace(101), a heater(110), carrier gas feeding parts(132,133) and an oxygen implanting part(131). A manufacturing method of the zinc oxide nanorods using transport deposition comprises the following steps: placing zinc metal in area-source within the furnace and placing growth substrates(121) in the growth region within the furnace; making the zinc metal into powder by heating inside the furnace and vaporizing the zinc metal; moving the powder state zinc metal to the growth region by using carrier gas provided to the furnace; and reacting oxygen gas which is directly inserted in the growth region with the molecular state zinc metal on the growth substrate.
    • 目的:一种氧化锌纳米棒,使用金属的氧化锌纳米棒的制造方法和装置,提供使用氧化锌纳米棒的电致发光显示纳米棒的制造方法,通过生长氧化锌纳米棒,蒸发具有均匀长度的纳米棒和纳米线 并在相对较低的温度下在衬底上形成纳米线。 构成:氧化锌纳米棒的制造装置包括侧炉(101),加热器(110),载气供给部(132,133)和氧注入部(131)。 使用运输沉积的氧化锌纳米棒的制造方法包括以下步骤:将区域源中的锌金属放置在炉内并将生长衬底(121)放置在炉内的生长区域中; 通过在炉内加热并使锌金属蒸发而使锌金属成粉末; 通过使用提供给炉子的载气将粉状态的金属锌移动到生长区; 并且将生长区域中直接插入的氧气与分子状态的锌金属反应在生长基板上。