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    • 7. 发明专利
    • Photosensitive resin composition
    • 感光树脂组合物
    • JP2014137429A
    • 2014-07-28
    • JP2013005013
    • 2013-01-15
    • Sumitomo Bakelite Co Ltd住友ベークライト株式会社
    • IKEDA TAKAOTAGASHIRA NOBUOIMAMURA YUJIONISHI OSAMU
    • G03F7/023C08F232/00G03F7/004G03F7/032
    • PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in solvent resistance.SOLUTION: The photosensitive resin composition comprises a polymer, a crosslinking agent and a photosensitive material. A film is formed from the photosensitive resin composition by a spin coating process and then baked on a hot plate at 100°C for 120 seconds; and the obtained layer is exposed to UV rays with energy of 300 mJ/cmand then baked in an oven at 230°C for 60 minutes to obtain a first film. The film thickness of the first film is denoted by a first film thickness. The first film is immersed in N-methylpyrrolidone at 23°C for 10 minutes. The film thickness of thus treated film is denoted by a second film thickness. The film thicknesses satisfies [{(second film thickness)-(first film thickness)}/(first film thickness)]×100≤5.
    • 要解决的问题:提供耐溶剂性优异的感光性树脂组合物。解决方案:感光性树脂组合物包含聚合物,交联剂和感光材料。 通过旋涂法由感光性树脂组合物形成膜,然后在100℃的热板上烘烤120秒; 将获得的层暴露于能量为300mJ / cm的紫外线,然后在230℃的烘箱中烘烤60分钟,得到第一膜。 第一膜的膜厚由第一膜厚表示。 将第一膜在23℃下浸渍在N-甲基吡咯烷酮中10分钟。 由此处理的膜的膜厚由第二膜厚表示。 膜厚满足[{(第二膜厚) - (第一膜厚))/(第一膜厚)]×100≤5。
    • 10. 发明专利
    • Radiation-sensitive resin composition, interlayer insulator film for display device and formation method thereof
    • 辐射敏感性树脂组合物,用于显示装置的层间绝缘膜及其形成方法
    • JP2013242540A
    • 2013-12-05
    • JP2013081631
    • 2013-04-09
    • Jsr CorpJsr株式会社
    • ICHINOHE DAIGOYASHIRO TAKAOTAZAKI TAICHIMATSUMURA SHINJI
    • G03F7/039C08F232/00G02F1/1333G03F7/004H01L21/027
    • PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming an insulator film such as an interlayer insulator film for a display element or the like, excellent in transparency, heat-resistance, hardness, etching resistance and low water absorption, having high sensitivity, and with a smaller change amount in film thickness at an unexposed portion, and to provide an interlayer insulator film for a display element formed from the radiation-sensitive resin composition, and a manufacturing method thereof.SOLUTION: The radiation-sensitive resin composition includes: [A] a polymer component including, in an identical or different polymer, a structural unit (I) derived from a cyclic olefin monomer having an acid-dissociative group, and a structural unit (II) different from the structural unit (I) and having a polymerizable group; and [B] a radiation-sensitive acid generating body including a radiation sensitive acid generator. The structural unit (I) of the polymer component [A] may include a structural unit expressed by a formula (1) below.
    • 要解决的问题:为了提供能够形成绝缘膜的辐射敏感性树脂组合物,例如透明性,耐热性,硬度,耐蚀刻性和低吸水性等显示元件等的层间绝缘膜, 具有高灵敏度,并且在未曝光部分具有较小的膜厚变化量,并且提供由该辐射敏感性树脂组合物形成的显示元件的层间绝缘膜及其制造方法。解决方案:辐射敏感 树脂组合物包括:[A]聚合物组分,其包含相同或不同聚合物中衍生自具有酸解离基团的环状烯烃单体的结构单元(I)和不同于结构单元的结构单元(II) (I)并具有可聚合基团; 和[B]包含辐射敏感酸产生剂的辐射敏感性酸产生体。 聚合物组分[A]的结构单元(I)可以包括由下式(1)表示的结构单元。