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    • 8. 发明专利
    • Flaw inspection device
    • FLAW检查设备
    • JP2007248086A
    • 2007-09-27
    • JP2006068479
    • 2006-03-14
    • Hitachi High-Technologies Corp株式会社日立ハイテクノロジーズ
    • CHIKAMATSU SHUICHINOGUCHI MINORUAIKO KENJI
    • G01N21/956G02B21/00H01L21/66
    • G01N21/9501G01N21/94G01N2021/8822G01N2201/1211G01N2201/1218
    • PROBLEM TO BE SOLVED: To solve the problem that the depth of a focus becomes shallow because a fine flaw detection sensitivity is enhanced by raising a detection magnification in a flaw inspection device, an image forming position is shifted by environmental fluctuations and flaw detection sensitivity becomes unstable.
      SOLUTION: The flaw inspection device is equipped with an XY stage loaded with a substrate to be inspected to perform scanning in a predetermined direction and a mechanism for correcting the change of an image forming position with respect to a change in temperature and atmospheric pressure in order to hold an image forming state to the best state in a system for obliquely illuminating the flaw on the substrate to be inspected to detect the same by the detection optical system arranged above the substrate to be inspected.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 解决问题:为了解决由于通过提高探伤装置中的检测倍率而提高精细的探伤灵敏度而使焦点的深度变浅的问题,图像形成位置由于环境波动和缺陷而偏移 检测灵敏度变得不稳定。 解决方案:瑕疵检查装置配备有载置有要检查的基板的XY台,以沿预定方向进行扫描,以及用于校正图像形成位置相对于温度和大气变化的变化的机构 压力,以便在用于倾斜照射待检查的基板上的缺陷的系统中将图像形成状态保持在最佳状态,以通过布置在要检查的基板上方的检测光学系统检测图像形成状态。 版权所有(C)2007,JPO&INPIT