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    • 4. 发明专利
    • Method for epitaxial growth of magnesia spinel in vapor phase and apparatus for epitaxial growth in vapor phase
    • 蒸汽相中磁珠生长的方法和蒸汽相中外延生长的装置
    • JPS5926999A
    • 1984-02-13
    • JP13605182
    • 1982-08-04
    • Nec Corp
    • MIKAMI MASAOIGARASHI CHIYUUJI
    • H01L27/00C30B25/00C30B25/02C30B25/14C30B29/26H01L21/205H01L21/365H01L21/86
    • C30B25/02C30B29/26
    • PURPOSE:To grow a magnesia spinel film of good crystallinity and uniformity epitaxially on a substrate, by feeding AlCl3 and MgCl2 gas formed in two raw material chambers to a growth chamber, and reacting the gases with CO2. CONSTITUTION:A raw material chamber 11 having the second raw material chamber 13 on the opened side of the first raw material chamber 12 is connected to a growth chamber 14 through a division plate 15. Aluminum is introduced into a boat 20, and MgCl2 is introduced into a boat 21. The boats 20 and 21 are placed in the respective raw material chambers 12 and 13. HCl gas and N2 gases are introduced from the first pipe 16 into the raw material chamber 12, and N2 gas is introduced from the second pipe 17 into the raw material chamber 13. Substrates 23 are placed on a holder 22 in the growth chamber 14, and the respective gases of CO2, H2 and N2 are introduced from the third pipe 18. AlCl3 formed in the raw material chamber 11 by heating and MgCl2 gas are transferred through a bypass pipe 19 to the growth chamber 14 and reacted with CO2 to form MgO.Al2O3. Thus, the aimed magnesia spinel is epitaxially grown on the substrates 23.
    • 目的:通过将在两个原料室中形成的AlCl 3和MgCl 2气体进料到生长室,并将气体与二氧化碳反应,在衬底上外延生长具有良好结晶度和均匀性的氧化镁尖晶石膜。 构成:在第一原料室12的开放侧具有第二原料室13的原料室11通过分隔板15与生长室14连接。将铝引入舟皿20中,引入MgCl 2 将船20和21放置在各个原料室12和13中。将HCl气体和N 2气体从第一管16引入原料室12中,并且从第二管道 衬底23被放置在生长室14中的保持器22上,并且将CO 2,H 2和N 2的各种气体从通过加热形成在原料室11中的第三管道18导入。 并且MgCl 2气体通过旁通管19转移到生长室14中并与CO 2反应形成MgO.Al 2 O 3。 因此,目标氧化镁尖晶石在衬底23上外延生长。
    • 8. 发明专利
    • Method for crystal growth
    • 晶体生长方法
    • JPS5954690A
    • 1984-03-29
    • JP16278382
    • 1982-09-18
    • Sony Corp
    • YORIZUMI MINEOTAMURA HIDEMASAMAKINO YOSHIMI
    • H01F1/34C30B13/00C30B13/24C30B29/22
    • C30B13/24C30B13/00C30B29/16C30B29/26
    • PURPOSE: To obtain a high-quality crystal without forming foreign materials on the crystal surface and preventing the surface oxidation, by using a mixture of inert gas and oxygen having a specific concentration as the atmospheric gas in the growth of the crystal, and cooling the crystal at a specific crystal temperature while substituting the atmospheric gas with an inert gas.
      CONSTITUTION: A desired crystal is grown by heating and melting the raw material 7 for the crystal growth by the direct heating e.g. with infrared radiation 12. In the above process, a mixture of oxygen gas and an inert gas having a partial pressure ratio of oxygen of ≤50% is used as an atmospheric gas. The temperature of the crystal 13 during growth in the growth apparatus 1 is maintained at ≥1,000°C, and the grown crystal is cooled by at least partially substituting the atmosphere with an inert gas before or around the completion of the growth or is cooled in a substituted atmosphere to obtain a ferrite.
      COPYRIGHT: (C)1984,JPO&Japio
    • 目的:通过在晶体生长中使用具有特定浓度的惰性气体和氧气作为气氛气体的混合物,在晶体表面上形成异物并防止表面氧化,从而获得高质量的晶体, 晶体,同时用惰性气体代替气氛气体。 构成:通过直接加热使原料7加热和熔化晶体生长而生长所需的晶体,例如 使用红外辐射12.在上述方法中,将氧气和氧气分压比<= 50%的惰性气体的混合物用作气氛气体。 生长装置1中生长期间的晶体13的温度保持在> = 1000℃,并且在生长完成之前或周围至少部分地用惰性气体代替气氛来冷却生长的晶体,或者是 在取代气氛下冷却,得到铁素体。