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    • 2. 发明专利
    • Sensor device
    • 传感器设备
    • JP2013180345A
    • 2013-09-12
    • JP2012043380
    • 2012-02-29
    • Omron Corpオムロン株式会社
    • KASAI TAKASHI
    • B81B3/00H01L29/84H04R19/04
    • B81B7/0058B81B7/0064B81B2201/0257B81B2201/0292B81B2207/115B81C1/00246H04R1/04H04R1/06H04R19/005H04R19/04H04R31/006
    • PROBLEM TO BE SOLVED: To further surely protect a circuit from being contaminated or a disturbed from the outside in a sensor device having a monolithic structure in which a sensor and the circuit are integrally formed.SOLUTION: A sensor 33 is provided at the central part of the upper surface of a semiconductor substrate 32 such as an Si substrate. Additionally, a circuit 34 is provided on the upper surface of the semiconductor substrate 32 so as to encircle the sensor 33. The upper surface of the circuit 34 is covered by an insulating coating layer 45 formed of SiO. Furthermore, a protective film 41 of the sensor 33 also extends to the circuit 34 and covers the upper part of the circuit 34 from above the insulating coating layer 45. Moreover, almost the whole of the upper part of the circuit 34 is covered with a metal protective film 46 formed on the protective film 41.
    • 要解决的问题:为了进一步确保电路在具有整体式结构的传感器装置中被外部污染或受到干扰,传感器和电路一体形成。传感器33设置在中央部分 的诸如Si衬底的半导体衬底32的上表面。 此外,电路34设置在半导体基板32的上表面上以围绕传感器33.电路34的上表面被由SiO形成的绝缘涂层45覆盖。 此外,传感器33的保护膜41也延伸到电路34并从绝缘涂层45的上方覆盖电路34的上部。此外,电路34的整个上部几乎覆盖有 金属保护膜46形成在保护膜41上。