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    • 6. 发明专利
    • Method for preparing porous silica precursor coating liquid
    • 制备多孔二氧化硅前驱涂层液的方法
    • JP2013121892A
    • 2013-06-20
    • JP2011270960
    • 2011-12-12
    • Ulvac Japan Ltd株式会社アルバック
    • YAMAZAKI TAKAHISAHIRAKAWA MASAAKIMURAKAMI HIROHIKO
    • C01B33/12
    • PROBLEM TO BE SOLVED: To provide a porous silica precursor coating liquid enabling to obtain a porous silica membrane, enabling to reduce membrane shrinkage occurring at firing, having 2.4 or less relative permittivity, and excellent in chemical resistance.SOLUTION: The preparation method of the porous silica precursor coating liquid to be used to form the porous silica membrane comprises: dissolving a first trialkoxysilane having an alkyl group or a polymer thereof, tetraalkoxysilane or a polymer thereof, and a second trialkoxysilane having an aryl group or a polymer thereof in a solvent together with a surfactant; hydrolyzing and dehydrocondensing this in the presence of a catalyst. The ratio of the first trialkoxysilane or the polymer thereof is set as 50-95 mol%, the ratio of the tetraalkoxysilane or the polymer thereof is set as 5-40 mol% and the ratio of the second trialkoxysilane or the polymer thereof is set as 1-20 mol%, each to total of the alkoxysilane or the polymer thereof in terms of Si atom.
    • 要解决的问题:提供一种能够获得多孔二氧化硅膜的多孔二氧化硅前体涂布液,能够减少焙烧时发生的膜收缩,相对介电常数为2.4以下,耐化学性优异。 解决方案:用于形成多孔二氧化硅膜的多孔二氧化硅前体涂布液的制备方法包括:溶解具有烷基的第一三烷氧基硅烷或其聚合物,四烷氧基硅烷或其聚合物,以及第二三烷氧基硅烷,其具有 芳基或其聚合物在溶剂中与表面活性剂一起使用; 在催化剂存在下水解和脱水缩合。 第一三烷氧基硅烷或其聚合物的比例设定为50-95摩尔%,四烷氧基硅烷或其聚合物的比例设定为5-40摩尔%,将第二三烷氧基硅烷或其聚合物的比例设定为 1-20摩尔%,以Si原子换算为烷氧基硅烷或其聚合物。 版权所有(C)2013,JPO&INPIT
    • 7. 发明专利
    • Electrode structure, manufacturing method of electrode structure and electro-optical element
    • 电极结构,电极结构和电光元件的制造方法
    • JP2013025296A
    • 2013-02-04
    • JP2011163206
    • 2011-07-26
    • Ulvac Japan Ltd株式会社アルバックTokyo Univ Of Science学校法人東京理科大学
    • KANAI SHOTAMURAKAMI HIROHIKOOKAMURA SOICHIRONAKAJIMA TAKAFUMI
    • G02F1/295G02B26/08
    • PROBLEM TO BE SOLVED: To provide an electrode structure capable of simply and accurately measuring the electrical characteristics of a functional organic material, a manufacturing method of the electrode structure and an electro-optical element using the manufacturing method.SOLUTION: The electrode structure of the present invention includes: a first electrode layer; an organic layer; and a second electrode layer. The organic layer formed on the first electrode layer has: a first resin region of which a height from the first electrode layer is a first height; and a second resin region of which the height from the first electrode layer is a second height less than the first height. The second electrode layer has: a first electrode region formed on the first resin region of the organic layer; and a second electrode region formed on the second resin region of the organic layer so as to be separated from the first electrode region.
    • 要解决的问题:提供能够简单且精确地测量功能性有机材料的电特性的电极结构,电极结构的制造方法和使用该制造方法的电光元件。 解决方案:本发明的电极结构包括:第一电极层; 有机层; 和第二电极层。 形成在第一电极层上的有机层具有:与第一电极层的高度为第一高度的第一树脂区域; 以及第二树脂区域,其中来自第一电极层的高度是比第一高度小的第二高度。 第二电极层具有形成在有机层的第一树脂区域上的第一电极区域; 以及形成在所述有机层的所述第二树脂区域上以与所述第一电极区域分离的第二电极区域。 版权所有(C)2013,JPO&INPIT
    • 8. 发明专利
    • Bonding method of substrate and method of manufacturing laminate substrate
    • 基板的接合方法和制造层压基板的方法
    • JP2012146709A
    • 2012-08-02
    • JP2011001558
    • 2011-01-06
    • Ulvac Japan Ltd株式会社アルバック
    • ISHIKAWA MICHIOTOYODA SATOSHIMURAKAMI HIROHIKOIRIKURA HAGANE
    • H01L21/02H01L25/065H01L25/07H01L25/18H01L27/00H01L27/10
    • H01L2924/0002H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a bonding method of substrates capable of rigid bonding while suppressing warpage when a plurality of substrates are bonded.SOLUTION: The bonding method of substrates includes a first underlying layer formation step for forming a first underlying layer 35a on the surface of a first substrate Sa, a second underlying layer formation step for forming a second underlying layer 35b on the surface of a second substrate Sb, a first monomer deposition step for depositing a first monomer 13a on the first underlying layer 35a formed on the surface of a first substrate Sa, a second monomer deposition step for depositing a second monomer 13b which reacts on the first monomer 13a to form a polymer on the second underlying layer 35b formed on the surface of the second substrate Sb, and a polymer formation step for bonding the first substrate Sa and the second substrate Sb by mounting the first substrate Sa and the second substrate Sb so that the surfaces, where the monomer is deposited, face each other, and bringing the first monomer 13a and the second monomer 13b into contact with each other thereby forming a polymer by reaction.
    • 要解决的问题:提供一种当粘合多个基板时能够抑制翘曲的能够进行刚性接合的基板的接合方法。 解决方案:衬底的接合方法包括用于在第一衬底Sa的表面上形成第一底层35a的第一下层形成步骤,用于在第一衬底Sa的表面上形成第二下层35b的第二下层形成步骤 第二基板Sb,用于在第一基板Sa的表面上形成的第一下层35a上沉积第一单体13a的第一单体沉积步骤,用于沉积在第一单体13a上反应的第二单体13b的第二单体沉积步骤 在形成在第二基板Sb的表面上的第二下层35b上形成聚合物,以及通过安装第一基板Sa和第二基板Sb来接合第一基板Sa和第二基板Sb的聚合物形成步骤, 其中单体沉积的表面彼此面对,并使第一单体13a和第二单体13b彼此接触,从而形成聚合物 通过反应。 版权所有(C)2012,JPO&INPIT
    • 9. 发明专利
    • Remote plasma cvd machine
    • 远程等离子体CVD机
    • JP2010209429A
    • 2010-09-24
    • JP2009058539
    • 2009-03-11
    • Ulvac Japan Ltd株式会社アルバック
    • NAKANO MINAOMURAKAMI HIROHIKO
    • C23C16/50C23C16/44H01L21/31
    • PROBLEM TO BE SOLVED: To provide a remote plasma CVD machine which can feed a raw material gas for growing a CNT (Carbon Nano-Tube) in vapor phase to a substrate at a fixed flow rate, and is excellent in maintainability.
      SOLUTION: The remote plasma CVD machine M is provided with: a chamber body 1a opened to the upper part having a substrate stage 3 mounted with the substrate S to be treated; a cover body 1b mounted at the opening of the upper face of the chamber body freely attachably/detachably; a plasma generation means 7 generating plasma at the inside of the chamber body; and a planar shielding member 8c with a plurality of through-holes provided at the upper part of the substrate in such a manner that the substrate on the substrate stage is not exposed to the plasma. The peripheral part at the lower face of the cover body is provided with a plurality of supporting members 8a saggingly provided at intervals in the circumferential direction, and supporting frames 8b connected to the lower edge parts of the supporting members, and the peripheral part of the shielding member is mounted in such a manner that the thermal expansion or thermal shrinkage of the shielding member is allowable to the supporting frame.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种远程等离子体CVD机器,其能够以固定流量将用于将气相的CNT(碳纳米管)生长的原料气体供给到基板,并且维护性优异。 解决方案:远程等离子体CVD机器M具有:开口于上部的室主体1a,具有安装有要处理的基板S的基板台3; 盖主体1b,其自由地安装在所述室主体的上表面的开口处; 等离子体产生装置7,在室主体的内部产生等离子体; 以及具有设置在基板的上部的多个通孔的平面屏蔽构件8c,使得基板载台上的基板不暴露于等离子体。 盖体下表面的周边部分设置有沿周向间隔地下垂设置的多个支撑构件8a,以及连接到支撑构件的下边缘部分的支撑框架8b,以及支撑构件8a的周边部分 屏蔽构件以这样的方式安装,使得屏蔽构件的热膨胀或热收缩可以被支撑框架允许。 版权所有(C)2010,JPO&INPIT
    • 10. 发明专利
    • Method for producing exhaust gas catalyst by using coaxial vacuum arc vapor deposition source
    • 使用同轴真空蒸气沉积源生产排气催化剂的方法
    • JP2010142699A
    • 2010-07-01
    • JP2008320327
    • 2008-12-16
    • Kumamoto UnivUlvac Japan Ltd国立大学法人 熊本大学株式会社アルバック
    • MACHIDA MASATOAGAWA YOSHIAKITSUKAHARA NAOKIMURAKAMI HIROHIKO
    • B01J37/02B01D53/94B01J23/63C23C14/14C23C14/24F01N3/10F01N3/28
    • PROBLEM TO BE SOLVED: To provide method for depositing a nanoparticle of an exhaust gas catalyst, and a method for producing the exhaust gas catalyst. SOLUTION: A pulse voltage is impressed between a trigger electrode 13 and a cathode 12 in a vacuum atmosphere by using a coaxial vacuum arc vapor deposition source 1 to generate trigger discharge. A capacitor and a DC power source are connected to each of the cathode 12 and an anode 11, and a DC discharge voltage of 60-100 V is impressed while keeping the capacitance of the capacitor within 360-1,080 μF to induce arc discharge intermittently. Charged particles of a catalytic metal to be produced are supplied to/vapor-deposited on the surface of a carrier being alumina powder or other alumina powder, in which an oxide of a metal consisting of zirconium or lanthanoid is mixed, to obtain the catalyst consisting of the catalytic metal nanoparticle-deposited carrier. COPYRIGHT: (C)2010,JPO&INPIT
    • 待解决的问题:提供沉积废气催化剂的纳米颗粒的方法,以及废气催化剂的制造方法。 解决方案:通过使用同轴真空电弧气相沉积源1在真空气氛中在触发电极13和阴极12之间施加脉冲电压以产生触发放电。 将电容器和直流电源连接到阴极12和阳极11中的每一个,并且施加60-100V的直流放电电压,同时将电容器的电容保持在360-1,080μF内以间歇地引起电弧放电。 将要生产的催化金属的带电粒子供应至/蒸镀在氧化铝粉末或其它氧化铝粉末的载体的表面上,其中由锆或镧系元素组成的金属的氧化物混合,得到催化剂组成 的催化金属纳米颗粒沉积载体。 版权所有(C)2010,JPO&INPIT