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1. 发明专利

JP2001271163A MAGNETIC NEUTRAL LOOP DISCHARGE SPUTTERING SYSTEM 失效
公开(公告)号：JP2001271163A
公开(公告)日：2001-10-02
申请号：JP2000084760
申请日：2000-03-24
申请人： ULVAC CORP
发明人： MURAOKA KATSUNORI , UCHINO KIICHIRO , SEI RETSUBUN , UCHIDA TAIJIROU , HAYASHI TOSHIO , ITO MASAHIRO
IPC分类号： C23C14/35 , H01L21/203 , H01L21/285
摘要： PROBLEM TO BE SOLVED: To provide a sputtering system using a capacitively coupled type of a new NLD(neutral loop discharge) plasma. SOLUTION: The sputtering system is provided with sputter electrodes constituted in such a way that a plurality of pairs of magnetic field generator on the same the line as one of magnetic force, coaxially arranged across a sputtering target, are provided; the directions of the adjacent line of magnetic force, are set to be opposite to each other; and a magnetic field zero line is formed in a direction perpendicular to the surface of the sputtering target midway between the adjacent pairs of the magnetic field generator.

2. 发明专利

JPH0963792A MAGNETIC NEUTRAL BEAM DISCHARGING PLASMA SOURCE 失效
公开(公告)号：JPH0963792A
公开(公告)日：1997-03-07
申请号：JP21796795
申请日：1995-08-25
申请人： ULVAC CORP
发明人： MURAOKA KATSUNORI , UCHINO KIICHIRO , UCHIDA TAIJIROU , ITO MASAHIRO
IPC分类号： H05H1/46 , C23C16/50 , C23F4/00 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To easily form a compact plasma source for discharging magnetic neutral beam, and to facilitate the observation of plasma condition by providing a part of a magnetic field generating means and an electric field generating means in the upper surface side or the lower surface side of a vacuum chamber. SOLUTION: A first and a second magnetic field generating coils 2, 3 are provided outside of a vacuum chamber 1 in the same axis with a space, and a third magnetic field generating coil 4 is arranged outside of a bottom part of the vacuum chamber 1, and the current in the predetermined direction is flowed in these coils so as to form an annular magnetic neutral beam 5. A quartz plate 6 is horizontally provided in the vacuum chamber 1, and a high frequency coil 8 is fitted to the lower side thereof, and a strong electric field is generated by the coil 8 along the neutral beam 5. Gas is led from a gas lead-in port 9, and plasma is generated along the neutral beam 5. Furthermore, a window part 10 for observing the plasma condition is provided in the side wall of the vacuum chamber 1, and laser beam enters the inside of the chamber through this window part 10, and electron density and temperature are measured by the laser Thomson scattering so as to control the plasma.

3. 发明专利

JPH0894475A GAS PRESSURE MEASURING APPARATUS EMPLOYING LIGHT SCATTERING 失效
公开(公告)号：JPH0894475A
公开(公告)日：1996-04-12
申请号：JP23173294
申请日：1994-09-27
申请人： UNIV KYUSHU , ULVAC CORP
发明人： MURAOKA KATSUNORI , UCHINO KIICHIRO
IPC分类号： G01L21/00 , G01L9/00 , G01N21/47
摘要： PURPOSE: To realize highly accurate noncontact measurement of the gas pressure or the density of gas particle by detecting a laser light scattered by a gas. CONSTITUTION: An enclosed measuring vessel 2 has an opening 4 for introducing a gas and when it is fixed to the outside of a vacuum vessel 1 through the flange thereof, the pressure is equalized in the vacuum vessel 1 and the measuring vessel 2. A laser light 7 from a semiconductor laser light source 6 is collimated through a collimating lens 8 and introduced through an incident window 3 into the measuring vessel 2. Consequently, neutral particles in the laser light 7 is subjected to Rayleigh scattering by the gas. Since the number of Rayleigh scattered photons is proportional to the density of gas particle, the density of particle is determined by measuring the scattered photons. The scattered light is condensed through a condenser lens 12 disposed oppositely to the introduction window 5 and converted through a detector 13 into an electric signal. The electric signal is fed through a current/voltage conversion circuit 18 to a computer 14 where the signal is accumulated.

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