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1. 发明专利

JPH07122183A MANUFACTURE OF SHADOW MASK 失效
公开(公告)号：JPH07122183A
公开(公告)日：1995-05-12
申请号：JP27032893
申请日：1993-10-28
申请人： TOPPAN PRINTING CO LTD
发明人： WATANABE HIROKI , SHIRAKAWA KAZUO
IPC分类号： C23F1/00 , H01J9/14
摘要： PURPOSE:To improve the heat resistance and etching resistance of a resist film by the temperature rise of an etchant by forming a second etching resist film by use of an aqueous etching resist agent and a crosslinking hardening agent. CONSTITUTION:After first etching resist films 2 are formed on both surfaces of a metal base 1, a pattern exposure 3 for forming a shadow mask hole part 8 is carried out on the films 2 followed by development. Resist patterns 2a are provided in the parts other than the opposed parts corresponding to the part 8 on both surfaces of the base 1, an etchant is sprayed onto both surfaces of the base 1, and a first etching is carried out to form pattern recessed parts 4 in the part corresponding to the part 8 on both surfaces of the base 1. An aqueous etching resist agent is applied to the base 1 surface including the part 4 from above the pattern 2a, and a crosslinking reinforcing agent 5 is applied thereon to form a second etching resist film 6. Thus, the part 8 improved in form precision can be formed, and the heat resistance and etching resistance of the resist film can be also improved.

2. 发明专利

JPH0252256B2 失效
公开(公告)号：JPH0252256B2
公开(公告)日：1990-11-13
申请号：JP21509781
申请日：1981-12-28
申请人： TOPPAN PRINTING CO LTD
发明人： SAWADA YOSHIKATSU , SHIRAKAWA KAZUO , SUGIURA TAKEO
IPC分类号： C08K3/00 , C08L89/00 , C08L89/04 , G02B5/20 , G03C1/66 , G03F7/016 , G03F7/021 , G03F7/038 , G03F7/04

3. 发明专利

JPH0237581B2 失效
公开(公告)号：JPH0237581B2
公开(公告)日：1990-08-24
申请号：JP21234181
申请日：1981-12-29
申请人： TOPPAN PRINTING CO LTD
发明人： SHIRAKAWA KAZUO , SAWADA YOSHIKATSU , SUGIURA TAKEO
IPC分类号： G02B1/04 , G02B5/20 , G03F7/105 , G03F7/38 , H01L31/0216 , H04N9/07

4. 发明专利

JPH01175148A SHADOW MASK 失效
公开(公告)号：JPH01175148A
公开(公告)日：1989-07-11
申请号：JP33219387
申请日：1987-12-28
申请人： TOPPAN PRINTING CO LTD
发明人： SHIRAKAWA KAZUO
IPC分类号： H01J29/07
摘要： PURPOSE:To eliminate distortion and obtain a good-quality screen by forming the opening shape on the large hole side located on the display side of each hole into a shape protruded arc-wise outwardly for at least one or more end sections of long sides. CONSTITUTION:To prevent an electron beam with an angle from being cut off, the opening shape on the large hole side of a shadow mask is formed in a shape protruded arc-wise outwardly at both ends or one end of both long sides of a rectangle. A through hole having a large hole diameter and protruded arc-wise outwardly at both ends of both long sides is formed, with the thickness on the large hole side: 0.25mm, slot length L1: 700mm, main slot width S1: 0.19mm, large hole diameter R: 0.50mm, distance S'' to the top: 0.1mm, vertical distance L' of protruded section: 0.1mm. Many through holes are aligned at the vertical distance M1: 0.825mm and the horizontal distance M2: 0.95mm to obtain the shadow mask, and an electron beam shape shown in the figure can be obtained.

5. 发明专利

JPS5779905A Color filter and its production 失效
标题翻译：彩色滤光片及其制作
公开(公告)号：JPS5779905A
公开(公告)日：1982-05-19
申请号：JP15640980
申请日：1980-11-06
申请人： Toppan Printing Co Ltd
发明人： SHIRAKAWA KAZUO , SAWADA YOSHIKATSU , SUGIURA TAKEO
IPC分类号： G02B5/20 , G03F7/00 , H04N5/335 , H04N9/07
CPC分类号： G03F7/0007
摘要： PURPOSE:To obtain a superior color film which has no mixed colors, and has an approximately flat surface by forming recesses of a stripe shape in a pattern shape on a transparent substrate, packing a coloring resin layer in the recesses, and forming a light shielding layer with the projecting parts other than the receses as boundary parts. CONSTITUTION:A film of metal or the like is formed on, for example, a transparent glass substrate 2, and a light shielding layer 1 of an arbitrary pattern such as stripe is formed thereon by a photoetching method. Thence, the substrate 2 is etched to form recesses 3, after which a photosensitive resin which is dyeable is coated over the entire surface of the substrate 2, and ultraviolet rays are irradiated from the substrate 2 side and are developed to form the 1st resin layer 4. The 2nd photoresist 7 is then coated and a glass mask 8 having a metallic vapor-deposited film of a prescribed pattern is placed thereon, is exposed 9, and is developed to dye 10 the 1st color by leaving the color-fast parts 7. Thence, the mask 7 is removed, fresh resist and a mask are placed, and the 2nd color 14 and further the 3rd color 18 are dyed in the same manner as mentioned above, whereby the color filter is completed.
摘要翻译：目的：通过在透明基板上形成图案形状的条纹状的凹部，在凹部中填充着色树脂层，得到不具有混色的优异的彩色胶片，并具有大致平坦的表面，并形成遮光性层以外的突出部分作为边界部分。构成：在例如透明玻璃基板2上形成金属等的膜，通过光刻法在其上形成任意图案如条纹的遮光层1。然后，对基板2进行蚀刻以形成凹部3，然后将可染色的感光性树脂涂布在基板2的整个表面上，并从基板2侧照射紫外线，并显影以形成第一树脂层然后涂覆第二光致抗蚀剂7，并且将具有规定图案的金属蒸镀膜的玻璃掩模8放置在其上，暴露9，并通过留下防色部7而显影为染色10第一色然后，去除掩模7，放置新鲜的抗蚀剂和掩模，并且以与上述相同的方式染色第二色14和第三色18，由此完成滤色器。

6. 发明专利

JPS5480745A METHOD OF TREATING HARD FILM OF AQUEOUS SOLUBLE PHOTORESIST 失效
公开(公告)号：JPS5480745A
公开(公告)日：1979-06-27
申请号：JP14912377
申请日：1977-12-12
申请人： TOPPAN PRINTING CO LTD
发明人： SHIRAKAWA KAZUO , WATABIKI HIDEKAZU , AMANO TAKAHISA
IPC分类号： G03F7/00 , B41C1/00 , G03F7/40

7. 发明专利

JP2000036248A RESIST HOLE MONITORING DEVICE 失效
公开(公告)号：JP2000036248A
公开(公告)日：2000-02-02
申请号：JP20219598
申请日：1998-07-16
申请人： TOPPAN PRINTING CO LTD
发明人： AKIYAMA YUKIO , KOJIMA HIROSHI , SHIRAKAWA KAZUO
IPC分类号： H01J9/42 , H01J9/14
摘要： PROBLEM TO BE SOLVED: To facilitate the control of the shapes and sizes of holes after an etching process by arithmetically processing image data obtained by photographing a shadow mask and recording and displaying the features of the sizes and shapes of the holes of a resist layer. SOLUTION: A shadow mask steel plate 1 after a development process is transferred, a position detection means 2 detects an observation region 1a reaching a photographing position (a), and a photographing start signal is sent to a photographing means 5. While the photographing position (a) is illuminated by ultraviolet illumination light L1 of an ultraviolet illumination light irradiation means 3, and reflected and scattered light Lr of visible light Lf and ultraviolet light is emitted from a resist layer part caused by a fluorescent emission phenomenon, reflected and scattered light Lr2 of ultraviolet light is emitted from a part formed only from a steel plate. A spectral means 7 cuts the reflected and scattered light Lr, Lr2 and sends the light Lf to an image formation means 4, and it is photographed by the photographing means 5 by using the photographing start signal, expanded by the image formation means 4, and processed as data by an arithmetical processing means 6, and the sizes and shapes of the holes of a resist layer in the observation region 1a of the steel plate 1 are operated and recorded and used for the setting of etching process conditions and the like.

8. 发明专利

JPH07272622A MANUFACTURE OF PLATE HAVING EXTRA FINE PERFORATION 失效
公开(公告)号：JPH07272622A
公开(公告)日：1995-10-20
申请号：JP6414194
申请日：1994-03-31
申请人： TOPPAN PRINTING CO LTD
发明人： SHIRAKAWA KAZUO , UEDA RYUJI
IPC分类号： H01J9/14
摘要： PURPOSE:To provide an extra fine perforation having no crossing point of projected etching lines by forming a corrosion resistant protection layer after forming a layer for enhancing the function of etching solution in such state as in contact with the solution. CONSTITUTION:Regarding the manufacture of a plate having extra fine perforations for a shadow mask, a layer 60 for enhancing the function of etching solution is laid on the bottom surface of a formed hemispherical recess 50 in such state as in contact with the solution. Thereafter, a corrosion resistant protection layer 40 is formed. At a subsequent process where the exposed section 21 of a sheet metal 10 is etched to form the recess 51 of a fine perforation 21 penetrating the recess 50, an etching action is enhanced more than other sections with the layer 60 for enhancing the function of the solution, when the penetration process is over. As a result, the etching process of the sheet metal 10 on the bottom surface of the recess 50 progresses laterally along the lower side of the layer 40, and extra fine perforations 50 and 51 free from the intersection of projected etching lines are thereby provided.

9. 发明专利

JPS6114483B2 JPS6114483B2 - 失效
公开(公告)号：JPS6114483B2
公开(公告)日：1986-04-18
申请号：JP18575081
申请日：1981-11-18
申请人： Toppan Printing Co Ltd
发明人： SHIRAKAWA KAZUO , HOSHI HISAO , SAWADA YOSHIKATSU
IPC分类号： G02B5/20 , G02F1/133 , G02F1/1335 , H01L27/14 , H04N9/04 , H04N9/07
CPC分类号： H04N9/04

10. 发明专利

JPS58115433A WATER-SOLUBLE PHOTOSENSITIVE MATERIAL 失效
公开(公告)号：JPS58115433A
公开(公告)日：1983-07-09
申请号：JP21509781
申请日：1981-12-28
申请人： TOPPAN PRINTING CO LTD
发明人： SAWADA YOSHIKATSU , SHIRAKAWA KAZUO , SUGIURA TAKEO
IPC分类号： C08K3/00 , C08L89/00 , C08L89/04 , G02B5/20 , G03C1/66 , G03F7/016 , G03F7/021 , G03F7/038 , G03F7/04
摘要： PURPOSE:To obtain uniformity of film thickness, high resolution, and high contrast, by using a cattle bone collagen hydrolyzate specified in weight average mol.wt. and dispersion degree in a high mol.wt. range, and a photo-crosslinkable photosensitive agent. CONSTITUTION:A water-soluble photosensitive material consists of a cattle bone collagen hydrolyzate and a photosensitive agent for photo-crosslinking with said hydrolyzate by irradiation of an active light, such as bichromate or diazonium salt. Said hydrolyzate has 10,000-50,000 weight average mol.wt.,

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