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1. 发明专利

JP2014186272A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2014186272A
公开(公告)日：2014-10-02
申请号：JP2013062887
申请日：2013-03-25
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： NAKAMURA TAKESHI , TANNO KAZUISHI , KAWAKAMI AKINARI , MORI YOSHITAKA
IPC分类号： G03F7/039 , C08F20/54 , G03F7/004
CPC分类号： G03F7/038 , C07C381/12 , C08F20/52 , C08F220/24 , C08F220/56 , G03F7/0045 , G03F7/0397
摘要： PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with reduced roughness can be formed while maintaining good sensitivity.SOLUTION: The resist composition comprises a polymeric compound having a partial structure expressed by general formula (a0-r-1) and a structural unit expressed by general formula (a0-1). In formula (a0-r-1), Yrepresents a divalent connecting group; Rand Rexclude a fluorine atom and represent a group having 0 to 20 carbon atoms, and one of Rand Rcan form a ring with Y; m represents an integer of 1 or more; and Mrepresents an organic cation having a valence of m. In formula (a0-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Yarepresents a single bond or a divalent connecting group; and Xrepresents a sulfur atom or an oxygen atom.
摘要翻译：要解决的问题：提供一种抗蚀剂组合物，由此可以形成具有降低的粗糙度的抗蚀剂图案，同时保持良好的灵敏度。溶胶：抗蚀剂组合物包含具有由通式（a0-r-1）表示的部分结构的聚合化合物，和由通式（a0-1）表示的结构单元。在式（a0-r-1）中，Y表示二价连接基团; 兰德包含一个氟原子，代表一个有0到20个碳原子的基团，兰德兰格之一与Y形成一个环; m表示1以上的整数，并且M表示具有m价的有机阳离子。在式（a0-1）中，R表示氢原子，烷基或卤代烷基; Yarepresent一个单键或二价连接基团; X表示硫原子或氧原子。

2. 发明专利

JP2010277043A Positive resist composition and method of forming resist pattern 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：JP2010277043A
公开(公告)日：2010-12-09
申请号：JP2009132311
申请日：2009-06-01
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MORI YOSHITAKA , NAMITO TOSHIAKI
IPC分类号： G03F7/004 , C08F20/28 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition in which generation of defects is suppressed, and a method of forming a resist pattern. SOLUTION: The positive resist composition includes: a base component; an acid-generator component; a fluorine-containing polymer (F1) comprising a structural unit (F-1) represented by the general formula (F-1) or a specific amount of a fluorine-containing copolymer (F2) including: the structural unit (F-1); and at least one structural unit selected from a group consisting of a structural unit (F-2) derived from an acrylic ester containing an acid dissociable dissolution inhibiting group, and a structural unit (F-3) represented by the general formula (F-3). COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供抑制缺陷产生的正性抗蚀剂组合物和形成抗蚀剂图案的方法。正型抗蚀剂组合物包括：基础组分; 酸发生剂组分; 包含由通式（F-1）表示的结构单元（F-1）或特定量的含氟共聚物（F2）的含氟聚合物（F1），其包含：结构单元（F-1） ; 和选自由含有酸解离抑制基团的丙烯酸酯衍生的结构单元（F-2）和由通式（F-3）表示的结构单元（F-3）的至少一种结构单元， 3）。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010211072A Positive resist composition, method for forming resist pattern, and polymer compound 有权
标题翻译：阳离子组合物，形成耐蚀图案的方法和聚合物化合物
公开(公告)号：JP2010211072A
公开(公告)日：2010-09-24
申请号：JP2009058736
申请日：2009-03-11
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MORI YOSHITAKA
IPC分类号： G03F7/039 , C08F220/38 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition which does not produce scums during formation of a resist pattern and showing proper matching with a substrate, to provide a polymer compound which is to be used as a base material for the positive resist composition, and to provide a method for forming a resist pattern. SOLUTION: The positive resist composition contains a base component (A), exhibiting increase in solubility with an alkali developing solution by the action of an acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit, including a carboxyl group, a structural unit including a cyclic group including -SO 2 - in the cyclic skeleton thereof, and a structural unit derived from an acrylate which includes an acid-dissociable dissolution-inhibiting group. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种正型抗蚀剂组合物，其在形成抗蚀剂图案期间不产生浮渣并显示与基材的适当匹配，以提供用作阳性的基材的高分子化合物抗蚀剂组合物，并提供形成抗蚀剂图案的方法。解决方案：正性抗蚀剂组合物含有碱成分（A），其通过酸的作用显示出与碱性显影液的溶解性增加，其中，基础成分（A）含有具有结构包含羧基的单元，包括其环状骨架中包含-SO 2 SB 2的环状基团的结构单元，以及衍生自包含酸解离溶解抑制基团的丙烯酸酯的结构单元。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2010170054A Positive resist composition, resist pattern forming method, and polymeric compound 有权
标题翻译：阳极电阻组合物，电阻图案形成方法和聚合物
公开(公告)号：JP2010170054A
公开(公告)日：2010-08-05
申请号：JP2009014711
申请日：2009-01-26
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , MORI YOSHITAKA , HIRANO ISAO , TSUCHIYA JUNICHI , NITO TAKEHITO , HIRANO TOMOYUKI , DAZAI NAOHIRO , MATSUMIYA YU , SHIONO HIROHISA
IPC分类号： G03F7/039 , C08F220/38 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition for forming a resist pattern of good profile with small LWR, and matching well with a substrate, and a polymeric compound which is utilizable as a base material of the positive resist composition, and also to provide a resist pattern forming method.
SOLUTION: The positive resist composition contains a base component (A) which exhibits increased solubility in an alkali developer under the action of an acid. The base component (A) contains a polymeric compound (A1) having: a constitutional unit (a0) derived from a specific acrylic ester containing in a side chain an aliphatic hydrocarbon group having a carboxyl group at a terminal; a constitutional unit (a5) derived from a specific acrylic ester having in a side chain an aliphatic hydrocarbon group to which a cyclic group having -SO
2 - in its ring skeleton bonds by ester bond formation; and a constitutional unit (a1) derived from an acrylic ester having an acid-dissociable, dissolution-inhibiting group.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于形成具有小LWR的良好轮廓的抗蚀剂图案并与基底良好匹配的正性抗蚀剂组合物和可用作正性抗蚀剂组合物的基材的聚合物，并且还提供抗蚀剂图案形成方法。解决方案：正性抗蚀剂组合物含有在酸性作用下在碱性显影剂中表现出增加的溶解度的碱性组分（A）。基础成分（A）含有具有以下成分的高分子化合物（A1）：由侧链含有末端具有羧基的脂肪族烃基的特定丙烯酸酯衍生的结构单元（a0）衍生自具有-SO 2 SB 2的环状基团的脂肪族烃基的具有侧链的特定丙烯酸酯的结构单元（a5）通过酯键形成而键合; 和由具有酸解离性，溶解抑制基团的丙烯酸酯衍生的结构单元（a1）。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2013210609A Positive photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal 有权
标题翻译：阳性光电组合物，光电陶瓷层压板，生产光电子图案的方法和生产连接端子的方法
公开(公告)号：JP2013210609A
公开(公告)日：2013-10-10
申请号：JP2013008683
申请日：2013-01-21
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU TAKAHIRO , WASHIO YASUSHI , KUROIWA YASUSHI , MORI YOSHITAKA , UTSUMI YOSHIYUKI
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0042 , G03F7/0045 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a positive photoresist composition, from which a photoresist pattern can be formed, when a photoresist pattern for forming a connecting terminal such as a bump and a metal post is formed by using a positive photoresist composition, the pattern having a non-resist portion in which the width of the bottom (at the surface side of a support body) is larger than the width of the top (at the surface side of the photoresist layer), and to provide a photoresist laminate, a method for producing a photoresist pattern and a method for producing a connecting terminal by using the above composition.SOLUTION: The positive photoresist composition comprises: an acid generator (A) that generates an acid by irradiation with actinic rays or radiation; and a resin (B) that shows increase in the solubility with an alkali by an action of an acid, and an organic solvent (S). An alkali metal salt (C) is added to the positive photoresist composition.
摘要翻译：要解决的问题：为了提供可以形成光致抗蚀剂图案的正性光致抗蚀剂组合物，当通过使用正性光致抗蚀剂组合物形成用于形成诸如凸块和金属柱的连接端子的光致抗蚀剂图案时，该图案具有底部（在支撑体的表面侧）的宽度大于顶部的宽度（在光致抗蚀剂层的表面侧）的非抗蚀部分，并且提供光致抗蚀剂层压体，方法用于制造光致抗蚀剂图案的方法和通过使用上述组合物制造连接端子的方法。解决方案：正性光致抗蚀剂组合物包括：通过用光化射线或辐射照射产生酸的酸产生剂（A）和通过酸的作用显示与碱的溶解度增加的树脂（B）和有机溶剂（S）。向正性光致抗蚀剂组合物中加入碱金属盐（C）。

6. 发明专利

JP2013166960A Compound and polymer compound 有权
标题翻译：化合物和聚合物化合物
公开(公告)号：JP2013166960A
公开(公告)日：2013-08-29
申请号：JP2013098612
申请日：2013-05-08
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , DAZAI NAOHIRO , FURUYA SANAE , HIRANO TOMOYUKI , MORI YOSHITAKA
IPC分类号： C08F20/26 , C07C69/675 , C08F12/14 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition suitable for immersion exposure, a method of forming a resist pattern using the same, and a fluorine-containing compound useful for an additive used in the same.SOLUTION: A compound is represented by general formula (c-1-1) or (c-1-2). In the formula: R is a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X is a specific organic group having no acid dissociable moiety; Ais an aromatic cyclic group which may have a substituent; Xis a single bond or a divalent bonding group; and Ris an organic group having a fluorine atom.
摘要翻译：要解决的问题：提供适用于浸渍曝光的抗蚀剂组合物，使用其制备抗蚀剂图案的方法和用于其中的添加剂的含氟化合物。溶液：化合物由通式（c-1-1）或（c-1-2）。式中R为氢原子，低级烷基或卤代低级烷基; X是没有酸解离部分的特定有机基团; A是可以具有取代基的芳族环状基团; X是单键或二价键合基团; R是具有氟原子的有机基团。

7. 发明专利

JP2012255170A Fluorine-containing compound 有权
标题翻译：含氟化合物
公开(公告)号：JP2012255170A
公开(公告)日：2012-12-27
申请号：JP2012194236
申请日：2012-09-04
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： FURUYA SANAE , MORI YOSHITAKA , DAZAI NAOHIRO , TAKASU RYOICHI , HIRANO TOMOYUKI
IPC分类号： C08F20/22 , C07C69/63 , C08F12/22
摘要： PROBLEM TO BE SOLVED: To provide a new fluorine-containing compound useful as an additive for a resist composition for immersion exposure.SOLUTION: The fluorine-containing compound is represented by general formula (C-1). The fluorine-containing compound is a polymeric compound having a structural unit obtained by cleavage of an ethylenic double bond of the fluorine-containing compound. In the formula, Q is a group obtained by removing a hydrogen atom from a monovalent hydrophilic group, Ris an organic group having a substituent containing a polymerizable group and an aromatic cyclic group optionally containing a fluorine atom, in which the polymerizable group is a group containing an ethylenic unsaturated double bond, Ris a group represented by -R-R. Ris an unsubstituted 1-9C alkylene group, Ris a 1-9C fluorine substituted alkyl group. In proviso, the sum of the carbon atom of the groups Rand Ris ≤10.
摘要翻译：要解决的问题：提供可用作浸渍曝光用抗蚀剂组合物的添加剂的新的含氟化合物。解决方案：含氟化合物由通式（C-1）表示。含氟化合物是具有通过裂解含氟化合物的烯属双键而获得的结构单元的聚合物。在该式中，Q是通过从一价亲水基团除去氢原子获得的基团，R 2是具有含有可聚合基团和芳族环状基团的取代基的有机基团任选地含有其中可聚合基团是含有烯属不饱和双键的基团的氟原子，R 3 是由-R 41 -R 42 。 41 是未取代的1-9C亚烷基，R 14是氟取代的烷基。条件是，基团R 41 和R 42 的碳原子之和≤10。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2010164712A Resist composition, resist pattern forming method, high molecular compound, and compound 有权
标题翻译：耐蚀组合物，耐光图案形成方法，高分子化合物和化合物
公开(公告)号：JP2010164712A
公开(公告)日：2010-07-29
申请号：JP2009006006
申请日：2009-01-14
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： DAZAI NAOHIRO , SHIONO HIROHISA , HIRANO TOMOYUKI , MATSUMIYA YU , TAKAGI DAICHI , MORI YOSHITAKA , TSUCHIYA JUNICHI
IPC分类号： G03F7/039 , C08F20/38 , G03F7/004 , H01L21/027
CPC分类号： C07D493/18 , C07D327/04 , C08F20/38 , C08F220/38 , C08F2220/283 , C08F2220/382 , G03F7/0382 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： PROBLEM TO BE SOLVED: To provide a new high molecular compound as a substrate component of a resist composition, a monomer thereof, a resist composition containing the high molecular compound, and a resist pattern forming method using the same. SOLUTION: The resist composition comprises a substrate component (A) of which solubility in an alkali developing solution changes by the action of an acid, and an acid forming agent component (B), wherein the substrate component (A) includes a high molecular compound (A0) having a constitutional unit (a0) represented by a (meth)acrylic derivative unit having an ester group including a cyclic group containing a sulfonyl group in a cyclic skeleton, in a side chain. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供新的高分子化合物作为抗蚀剂组合物的基材组分，其单体，含有高分子化合物的抗蚀剂组合物和使用其的抗蚀剂图案形成方法。解决方案：抗蚀剂组合物包括其中在碱性显影溶液中的溶解度由酸的作用而变化的底物组分（A）和酸形成剂组分（B），其中所述底物组分（A）包含在侧链中具有由具有在环状骨架中含有磺酰基的环状基团的（甲基）丙烯酸衍生物单元表示的结构单元（a0）的高分子化合物（A0）。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2010039142A Resist pattern forming method 有权
标题翻译：电阻图案形成方法
公开(公告)号：JP2010039142A
公开(公告)日：2010-02-18
申请号：JP2008201280
申请日：2008-08-04
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , NAKAMURA TAKESHI , MORI YOSHITAKA , FURUYA SANAE , SHIONO HIROHISA , HIRANO TOMOYUKI , DAZAI NAOHIRO
IPC分类号： G03F7/039 , C08F220/18 , C08F220/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To form a resist pattern having an excellent shape. SOLUTION: A resist pattern forming method includes steps of: forming a resist film on a support by using a positive resist composition; exposing the resist film, performing post-exposure bake of the resist film at ≤80°C; and alkali-developing the resist film to form a resist pattern. The positive resist composition contains a base component (A) of which the solubility in an alkali developer increases under the action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the proportion of constitutional units having an acid-dissociable dissolution inhibiting group to all constitutional units constituting the base component (A) is 55-80 mol%. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：形成具有优异形状的抗蚀剂图案。解决方案：抗蚀剂图案形成方法包括以下步骤：通过使用正性抗蚀剂组合物在支撑体上形成抗蚀剂膜; 曝光抗蚀剂膜，在≤80℃下对抗蚀剂膜进行曝光后烘烤; 并对抗蚀剂膜进行碱显影以形成抗蚀剂图案。正型抗蚀剂组合物含有碱性成分（A），其在碱性显影剂中的溶解度在酸的作用下增加，以及在曝光时产生酸的酸产生剂组分（B），其中具有构成基础组分（A）的所有结构单元的酸解离溶解抑制基团为55-80摩尔％。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2009265332A Positive resist composition, resist pattern forming method, and polymer compound 有权
标题翻译：阳离子组合物，电阻图案形成方法和聚合物化合物
公开(公告)号：JP2009265332A
公开(公告)日：2009-11-12
申请号：JP2008114190
申请日：2008-04-24
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , NAKAMURA TAKESHI , MORI YOSHITAKA , FURUYA SANAE , SHIONO HIROHISA , HIRANO TOMOYUKI , DAZAI NAOHIRO
IPC分类号： G03F7/039 , C08F220/26 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/111
摘要： PROBLEM TO BE SOLVED: To provide: a novel polymer compound; a positive resist composition containing the polymer compound; and a resist pattern forming method using the positive resist composition. SOLUTION: The positive resist composition contains a base material component (A) of increasing solubility in an alkali developing liquid by an action of an acid, and an acid-generator component (B). The base material component (A) contains a polymer compound (A1) having a constitutive unit expressed by general formula (a0-1) and a constitutive unit expressed by general formula (a0-2), wherein: in the general formula (a0-1), R 1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group, R 8 represents a divalent bonding group, and R 7 represents an acid-dissociable dissolution inhibiting group; and in the general formula (a0-2), R 3 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group, R 4 represents a ≥3C or more branched alkyl group, R 5 and R 6 each independently represents an alkyl group, and R 5 is bonded to R 6 to form a cyclic group. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供：新型高分子化合物; 含有高分子化合物的正性抗蚀剂组合物; 以及使用正型抗蚀剂组合物的抗蚀剂图案形成方法。解决方案：正型抗蚀剂组合物含有通过酸作用在碱性显影液中增加溶解度的基材成分（A）和酸发生剂成分（B）。基材成分（A）含有具有由通式（a0-1）表示的构成单元的高分子化合物（A1）和由通式（a0-2）表示的构成单元，其中：在通式（a0- 1）中，R 1表示氢原子，低级烷基或卤代低级烷基，R SP 8表示二价键合基，R / SP>表示酸解离溶解抑制基团; 在通式（a0-2）中，R“3”表示氢原子，低级烷基或卤代低级烷基，R“4”表示≥3C或更多的支链烷基，R“SP”5和R“SP”6各自独立地表示烷基，并且R 5和R 6连接在R 6上， / SP>以形成环状基团。版权所有（C）2010，JPO＆INPIT

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