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1. 发明专利

JP2014071216A Resist composition, method for forming resist pattern, and polymeric compound 有权
标题翻译：耐蚀组合物，形成耐火图案的方法和聚合物
公开(公告)号：JP2014071216A
公开(公告)日：2014-04-21
申请号：JP2012216226
申请日：2012-09-28
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , HORI YOICHI
IPC分类号： G03F7/039 , C08F220/36 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition, a method for forming a resist pattern and a polymeric compound which exhibit excellent lithographic characteristics.SOLUTION: The resist composition generates an acid by exposure and shows changes in the solubility with a developing solution by an action of the acid. The composition comprises a base component (A) that shows changes in the solubility with a developing solution by an action of an acid; and the base component (A) includes a polymeric compound (A1) having the following structural units and a softening point of 130°C or higher. The structural units are: a structural unit (a0) derived from a monomer exhibiting a retention time shorter than that of β-(methacryloyl)oxy-γ-butyrolactone with analyzing by high performance liquid chromatography (HPLC) using a reversed phase column; and a structural unit (a1) including an acid decomposable group that shows increase in the polarity by an action of an acid.
摘要翻译：要解决的问题：提供抗蚀剂组合物，形成抗蚀剂图案和聚合化合物的方法，其表现出优异的平版印刷特性。溶胶：抗蚀剂组合物通过曝光产生酸，并通过曝光显示出与显影液的溶解度变化酸的作用该组合物包含通过酸的作用显示出与显影液的溶解度变化的碱成分（A）碱成分（A）含有具有以下结构单元且软化点为130℃以上的高分子化合物（A1）。结构单元是：使用反相柱通过高效液相色谱法（HPLC）分析得到的保留时间短于（b） - （甲基丙烯酰）氧-γ-丁内酯的单体的结构单元（a0）和包含通过酸的作用显示极性增加的酸分解基团的结构单元（a1）。

2. 发明专利

JP2013166960A Compound and polymer compound 有权
标题翻译：化合物和聚合物化合物
公开(公告)号：JP2013166960A
公开(公告)日：2013-08-29
申请号：JP2013098612
申请日：2013-05-08
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , DAZAI NAOHIRO , FURUYA SANAE , HIRANO TOMOYUKI , MORI YOSHITAKA
IPC分类号： C08F20/26 , C07C69/675 , C08F12/14 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition suitable for immersion exposure, a method of forming a resist pattern using the same, and a fluorine-containing compound useful for an additive used in the same.SOLUTION: A compound is represented by general formula (c-1-1) or (c-1-2). In the formula: R is a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X is a specific organic group having no acid dissociable moiety; Ais an aromatic cyclic group which may have a substituent; Xis a single bond or a divalent bonding group; and Ris an organic group having a fluorine atom.
摘要翻译：要解决的问题：提供适用于浸渍曝光的抗蚀剂组合物，使用其制备抗蚀剂图案的方法和用于其中的添加剂的含氟化合物。溶液：化合物由通式（c-1-1）或（c-1-2）。式中R为氢原子，低级烷基或卤代低级烷基; X是没有酸解离部分的特定有机基团; A是可以具有取代基的芳族环状基团; X是单键或二价键合基团; R是具有氟原子的有机基团。

3. 发明专利

JP2012230236A Resist composition and method for forming resist pattern 审中-公开
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2012230236A
公开(公告)日：2012-11-22
申请号：JP2011098191
申请日：2011-04-26
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , IRIE MAKIKO
IPC分类号： G03F7/039 , C08F20/28 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern excellent in lithographic characteristics and a resist pattern profile and having high sensitivity can be formed, and to provide a method for forming the resist pattern.SOLUTION: The resist composition contains: a base component (A) whose solubility with a developing solution changes by an action of an acid, the component having a structural unit expressed by the formula (a5-1) and structural units (a1) derived from at least two kinds of acrylates showing a difference of 1 to 50 kJ/mol in activation energy for decomposing an acid; and an acid generator component (B) generating an acid by exposure.
摘要翻译：要解决的问题：提供可以形成抗蚀剂图案的形成方法，从而可以形成具有优异的光刻特性和抗蚀剂图案轮廓并具有高灵敏度的抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物包含：其显影溶液与酸的作用变化的基础组分（A），具有由式（a5-1）表示的结构单元的组分和结构单元（a1 ）衍生自在分解酸的活化能中显示1〜50kJ / mol的差异的至少两种丙烯酸酯; 和通过曝光产生酸的酸产生剂组分（B）。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2012220782A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2012220782A
公开(公告)日：2012-11-12
申请号：JP2011087550
申请日：2011-04-11
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , TSUCHIYA JUNICHI , TAKAGI DAICHI
IPC分类号： G03F7/039 , C08F220/28 , C08F220/38 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern, by which a resist pattern in a good shape with high sensitivity can be formed.SOLUTION: There is provided a resist composition including: a polymer compound (A1) having a constitutional unit composed of a (meth)acrylate whose polarity is increased by an action of an acid, a (meth)acrylate unit including a -SO- containing cyclic group, and a (meth)acrylate unit represented by general formula (a5-1); and a component (B) that generates an acid by exposure.
摘要翻译：要解决的问题：提供一种抗蚀剂组合物和形成抗蚀剂图案的方法，由此可以形成具有高灵敏度的良好形状的抗蚀剂图案。解决方案：提供一种抗蚀剂组合物，其包含：具有由（甲基）丙烯酸酯构成的结构单元的高分子化合物（A1），其极性通过酸的作用而增加，（甲基）丙烯酸酯单元包括：含有环状基团的通式（a5-1）表示的（甲基）丙烯酸酯单元; 和通过曝光产生酸的成分（B）。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2012168504A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2012168504A
公开(公告)日：2012-09-06
申请号：JP2011240487
申请日：2011-11-01
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUMADA SHINJI , ZENSEI SATOSHI , ARAI MASATOSHI , SHIONO HIROHISA
IPC分类号： G03F7/004 , C08F220/30 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a resist composition having excellent lithographic characteristics and adhesiveness and reducing scum, and to provide a method for forming a resist pattern using the resist composition.SOLUTION: The resist composition comprises: a base component, which exhibits changes in the solubility with a developing solution under an action of an acid and can be used for lithography using light in a wavelength region of 193 nm or shorter as an exposure light source; an acid generator component generating an acid by exposure; and a polymeric compound having a structural unit expressed by general formula (c0). In the composition, the content proportion of the polymeric compound is less than 25 parts by mass relative to 100 parts by mass of the base component. In the formula, Rrepresents an organic group having one or more primary or secondary alcoholic hydroxyl groups or a chain-like tertiary alcoholic hydroxyl group.
摘要翻译：要解决的问题：提供具有优异的平版印刷特性和粘合性并减少浮渣的抗蚀剂组合物，并提供使用该抗蚀剂组合物形成抗蚀剂图案的方法。抗蚀剂组合物包含：碱成分，其在酸的作用下显影溶液的溶解度变化，并可用于使用波长193nm以下的光作为曝光的光刻法光源; 通过暴露产生酸的酸发生剂组分; 和具有由通式（c0）表示的结构单元的高分子化合物。在组合物中，相对于100质量份的基础成分，高分子化合物的含有比例小于25质量份。在该式中，R 1表示具有一个或多个伯醇或仲醇羟基或链状叔醇羟基的有机基团。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2012087143A Compound 有权
标题翻译：复合
公开(公告)号：JP2012087143A
公开(公告)日：2012-05-10
申请号：JP2012002180
申请日：2012-01-10
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , HIRAYAMA HIROSHI , HANEDA HIDEO
IPC分类号： C07C69/712 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a compound usable for preparing a resist composition.SOLUTION: The compound is expressed by formula (A-1).
摘要翻译：要解决的问题：提供可用于制备抗蚀剂组合物的化合物。化合物由式（A-1）表示。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2012022258A Positive resist composition and resist pattern formation method 审中-公开
标题翻译：积极抗性组合和抗性模式形成方法
公开(公告)号：JP2012022258A
公开(公告)日：2012-02-02
申请号：JP2010161865
申请日：2010-07-16
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIONO HIROHISA , SUZUKI KENTA
IPC分类号： G03F7/039 , C08F20/38 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition having excellent lithography characteristics and pattern shapes and to provide a resist pattern formation method.SOLUTION: The positive resist composition contains a compound (A) containing an acid-dissociable, dissolution-suppressing group and a compound (H) having a cyclic group including -SO- and no acid-dissociable, dissolution-suppressing group, and contains no acid generating agent component other than the compound (A) and the compound (H). Preferably the compound (H) is a compound that contains a group represented by a general formula (3-1). (In the formula (3-1), A' represents an alkylene group having a carbon number of 1 to 5 that may contain an oxygen atom or an sulfur atom, an oxygen atom, or a sulfur atom, 'a' represents an integer of 0 to 2, Rrepresents an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxy group, -COOR'', -OC(=O)R'', a hydroxyalkyl group, or a cyano group, and R'' represents a hydrogen atom or an alkyl group.)
摘要翻译：要解决的问题：提供具有优异的光刻特性和图案形状的正性抗蚀剂组合物，并提供抗蚀剂图案形成方法。解决方案：正型抗蚀剂组合物含有含有酸解离的溶解抑制基团的化合物（A）和具有-SO - SB POS =“POST”> 2 - 并且没有酸解离的溶解抑制基团，并且不含化合物（A）和化合物（H）以外的酸产生剂成分。优选地，化合物（H）是含有由通式（3-1）表示的基团的化合物。（式（3-1）中，A'表示可以含有氧原子或硫原子，氧原子或硫原子的碳原子数为1〜5的亚烷基，'a'表示为0〜2，R“表示烷基，烷氧基，卤代烷基，羟基，-COOR”，-OC（= O）R' ，羟基烷基或氰基，R“表示氢原子或烷基。）版权所有（C）2012，JPO＆INPIT

8. 发明专利

JP2011141382A Positive resist composition, resist pattern forming method, high molecular compound 有权
标题翻译：高分子化合物的阳离子组成，电阻形成方法
公开(公告)号：JP2011141382A
公开(公告)日：2011-07-21
申请号：JP2010001324
申请日：2010-01-06
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： TAKAGI DAICHI , SHIONO HIROHISA , HIRANO TOMOYUKI , DAZAI NAOHIRO
IPC分类号： G03F7/039 , C08F220/38 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide new high molecular compound useful as a base material component of positive resist composition, compound useful as a monomer of this high molecular compound, positive resist composition containing the high molecular compound, and a resist pattern forming method using the positive resist composition.
SOLUTION: This positive resist composition includes a base material component (A) where the solubility to alkali developing solution is increased by action of acid and an acid generator component (B) for generating acid by exposure. The base material component (A) contains a resin component (A1) having at least two specific structural units.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供用作正性抗蚀剂组合物的基材成分的新的高分子化合物，可用作该高分子化合物的单体的化合物，含有高分子化合物的正性抗蚀剂组合物和形成抗蚀剂图案的抗蚀剂图案方法使用正性抗蚀剂组合物。解决方案：该正型抗蚀剂组合物包括通过酸的作用增加对碱性显影液的溶解度和通过曝光产生酸的酸产生剂组分（B）的基础成分（A）。基材成分（A）含有具有至少两个特定结构单元的树脂成分（A1）。版权所有（C）2011，JPO＆INPIT

9. 发明专利

JP2011141332A Positive resist composition and resist pattern forming method 有权
标题翻译：积极抵抗组合和阻力图形成方法
公开(公告)号：JP2011141332A
公开(公告)日：2011-07-21
申请号：JP2010000662
申请日：2010-01-05
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HIRANO TOMOYUKI , SHIONO HIROHISA , ARAI MASATOSHI
IPC分类号： G03F7/039 , C08F220/22 , C08F220/38 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/38 , C08F2220/281 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in lithography characteristics and pattern shape, and to provide a resist pattern forming method.
SOLUTION: The positive resist composition comprises a base component (A) whose solubility in an alkali developer increases by the action of an acid, an acid generator component (B) which generates an acid upon exposure, and a fluorine-containing polymer compound (C') which generates an acid upon exposure, wherein the base component (A) is a resin component having a structural unit derived from an acrylic ester having an acid-dissociable dissolution inhibiting group, and wherein the fluorine-containing polymer compound (C') has a structural unit which generates an acid upon exposure and a fluorine-containing acrylic ester structural unit.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供光刻特性和图案形状优异的正性抗蚀剂组合物，并提供抗蚀剂图案形成方法。解决方案：正型抗蚀剂组合物包括其碱显影剂的溶解度随酸的作用增加的碱组分（A），暴露时产生酸的酸产生剂组分（B）和含氟聚合物在曝光时产生酸的化合物（C'），其中所述基础组分（A）是具有衍生自具有酸解离溶解抑制基团的丙烯酸酯的结构单元的树脂组分，并且其中所述含氟聚合物化合物 C'）具有在曝光时产生酸的结构单元和含氟丙烯酸酯结构单元。版权所有（C）2011，JPO＆INPIT

10. 发明专利

JP2010204187A Positive resist composition, method for forming resist pattern, and polymer compound 有权
标题翻译：阳离子组合物，形成耐蚀图案的方法和聚合物化合物
公开(公告)号：JP2010204187A
公开(公告)日：2010-09-16
申请号：JP2009046888
申请日：2009-02-27
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MATSUMIYA YU , DAZAI NAOHIRO , HIRANO TOMOYUKI , SHIONO HIROHISA
IPC分类号： G03F7/039 , C08F220/38 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polymer compound useful as a base component of a positive resist composition, to provide a positive resist composition containing the polymer compound, and to provide a method for forming a resist pattern using the positive resist composition. SOLUTION: The positive resist composition contains a polymer compound that has a structural unit containing a cyclic group having -SO 2 - in the cyclic skeleton, a structural unit containing a fluorine atom, and a structural unit which is different from the above structural units and is derived from an acrylate containing an acid-dissociable dissolution inhibiting group. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用作正性抗蚀剂组合物的基础组分的聚合物化合物，以提供含有该高分子化合物的正性抗蚀剂组合物，并提供一种使用正性抗蚀剂组合物形成抗蚀剂图案的方法。解决方案：正性抗蚀剂组合物包含在环状骨架中含有具有-SO 2 SB 2 - 的环状基团的结构单元的高分子化合物，含有氟原子的结构单元和结构单元单元，其与上述结构单元不同，并且衍生自含有酸解离溶解抑制基团的丙烯酸酯。版权所有（C）2010，JPO＆INPIT

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