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1. 发明专利

JP2012216722A Substrate intermediate, substrate and through via electrode formation method 有权
标题翻译：基板中间层，基板和通过电极形成方法
公开(公告)号：JP2012216722A
公开(公告)日：2012-11-08
申请号：JP2011082084
申请日：2011-04-01
申请人： Kansai Univ , Tanaka Kikinzoku Kogyo Kk , 学校法人関西大学 , 田中貴金属工業株式会社
发明人： NIIMIYABARA SHOZO , INOUE FUMIHIRO , YANAI JUNICHI , NAKAMURA NORIAKI
IPC分类号： H01L21/3205 , C23C18/28 , C23C18/34 , H01L21/288 , H01L21/768 , H01L23/522
摘要： PROBLEM TO BE SOLVED: To manufacture a barrier layer uniformly with a high adhesion not at a high treatment temperature and at low cost when forming a through via electrode.SOLUTION: A through via electrode formation method comprises: forming a self-assembled monomolecular film 24 on an inner peripheral surface of a through via electrode formation hole 12 having a high aspect ratio and formed in a thickness direction of a silicon substrate 10; making the self-assembled monomolecular film absorb metal nanoparticles 14 in a high density to form a barrier layer by electroless plating by using the metal nanoparticles 14 as a catalyst; forming a seed layer on the barrier layer by electroless plating; and subsequently depositing a through via electrode material by electrolytic plating to fill the hole 12 to form a through via electrode.
摘要翻译：要解决的问题：在形成通孔电极时，以高处理温度和低成本地以高粘合力均匀地制造阻挡层。解决方案：通孔形成方法包括：在具有高纵横比的通孔电极形成孔12的内周面上形成自组装单分子膜24，并在硅衬底10的厚度方向上形成 ; 使得自组装单分子膜以高密度吸收金属纳米粒子14，通过使用金属纳米粒子14作为催化剂，通过化学镀来形成阻挡层; 通过化学镀在阻挡层上形成种子层; 随后通过电解电镀沉积通孔电极材料以填充孔12以形成通孔电极。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2014070245A Method for treating substrate carrying catalyst particles for plating treatment 有权
标题翻译：用于处理用于镀层处理的载体催化剂颗粒的方法
公开(公告)号：JP2014070245A
公开(公告)日：2014-04-21
申请号：JP2012216580
申请日：2012-09-28
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社 , Kansai Univ , 学校法人関西大学
发明人： NAKAMURA NORIAKI , YANAI JUNICHI , KUBO HITOSHI , OSHIMA YUSUKE , ISHIKAWA TOMOKO , NIIMIYABARA SHOZO , INOUE FUMIHIRO
IPC分类号： C23C18/16 , B01J23/44 , B01J37/02 , C23C18/18
CPC分类号： H05K3/422 , C23C18/1893 , C23C18/208 , C23C18/2086 , C23C18/30 , C23C18/34 , H05K3/387 , H05K3/389 , H05K3/426
摘要： PROBLEM TO BE SOLVED: To provide a substrate treating method for carrying metal micro-particles to form a plated layer on a circuit pattern or a TSV in various substrates so that finer treatment than the prior art can be made to form a stable plated layer.SOLUTION: A substrate treating method for bringing a substrate and a colloidal solution containing metal particles into contact so as to carry metal particles to become a catalyst for forming a plated layer on the substrate, wherein the colloidal solution contains metal particles of Pd having a particle diameter of 0.6 nm to 4.0 nm, an interface distance of a (111) plane of 2.254 Å or more. This substrate surface before treated is enabled to enhance the binding power of Pd particles by forming an organic layer such as SAM.
摘要翻译：要解决的问题：提供一种用于承载金属微粒以在各种基板上的电路图案或TSV上形成镀层的基板处理方法，从而可以制造比现有技术更精细的处理以形成稳定的镀层。解决方案：一种基板处理方法，用于使基板和含有金属颗粒的胶体溶液接触以携带金属颗粒，以成为在基板上形成镀层的催化剂，其中胶体溶液含有具有颗粒的Pd的金属颗粒直径为0.6nm至4.0nm，（111）面的界面距离为2.254以上。处理前的该基板表面能够通过形成诸如SAM的有机层来增强Pd颗粒的结合力。

3. 发明专利

JP2006212464A Metal catalyst and production method for metal catalyst 审中-公开
标题翻译：金属催化剂和金属催化剂的生产方法
公开(公告)号：JP2006212464A
公开(公告)日：2006-08-17
申请号：JP2005024725
申请日：2005-02-01
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： OKAMOTO KOJI , YANAI JUNICHI
IPC分类号： B01J23/44 , B01D53/94 , B01J23/63 , B01J37/08
摘要： PROBLEM TO BE SOLVED: To provide a catalyst sufficiently excellent in activity and durability even if an amount of metal carried is made to equal to or smaller than that of the conventional one, and its production method. SOLUTION: In the metal catalyst, a carrier comprising a porous body carries one kind or more of metals as catalyst particles. The carrier carries the catalyst particles having a cluster size of 1-10 mm comprising one kind or more of metal obtained by adsorbing a solution of one kind or more of metal salts and a an organic substance to the carrier and heating and calcinating them. At this time, the organic substance is preferably a water-soluble organic compound such as monovalent alcohol, polyvalent alcohol, a monomer, a dimer, a trimer and a polymer of polyvalent alcohol, a water-soluble polymer compound, monosaccharide, disaccharide, polysaccharide, carbohydrate, carboxylic acids and its salt and a surfactant. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：即使所携带的金属的量等于或小于常规的催化剂，也能提供足够优异的活性和耐久性的催化剂及其制备方法。解决方案：在金属催化剂中，包含多孔体的载体携带一种或多种金属作为催化剂颗粒。载体携带具有1-10mm的簇尺寸的催化剂颗粒，其包含一种或多种金属，其通过将一种或多种金属盐和有机物质的溶液吸附到载体上并加热和煅烧而获得。此时，有机物优选为一价醇，多元醇，单体，二聚体，三聚体和多元醇的聚合物等水溶性有机化合物，水溶性高分子化合物，单糖，二糖，多糖类，碳水化合物，羧酸及其盐和表面活性剂。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2013163830A Colloidal solution of metal, and method of producing the same 有权
标题翻译：金属的胶体溶液及其制造方法
公开(公告)号：JP2013163830A
公开(公告)日：2013-08-22
申请号：JP2012025990
申请日：2012-02-09
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： OSHIMA YUSUKE , KUBO HITOSHI , ISHIKAWA TOMOKO , NAKAMURA NORIAKI , YANAI JUNICHI , TSUCHIYA TAKETERU , TAKAHASHI HIROAKI , TAKANEZAWA GOKI , INOUE KENICHI , KATO SHUNSUKE , SHIRAISHI HIROKAZU
IPC分类号： B22F9/24 , B01D61/14 , B01J13/00 , B82Y30/00 , B82Y40/00
CPC分类号： B01J31/30 , B01D61/145 , B01J13/0039 , B01J13/0043 , B01J31/26 , B01J31/28 , B22F1/0062 , B22F9/24 , B22F2001/0092 , B82Y30/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide a colloidal solution of metal having stability, in which particularly the compositional change over time of colloidal particles resulting from dissolving of metal ions thereinto is suppressed, and to provide a method of producing the same.SOLUTION: A colloidal solution of metal includes: colloidal particles comprised of metal particles comprising at least one or more metal and of a protective agent binding to the metal particles; and a solvent, i.e., a dispersant of the colloidal particles, wherein a chloride ion concentration per 1 mass% of the metal concentration is not higher than 25 ppm, and a nitrate ion concentration per 1 mass% of the metal concentration is not higher than 7500 ppm. By controlling the amount of the protective agent for the colloidal particles, the adsorption capacity thereof can be enhanced. It is preferable that the protective agent is bound to the metal particles in an amount 0.2 to 2.5 times as much as the mass of the metal particles.
摘要翻译：要解决的问题：提供一种具有稳定性的金属的胶体溶液，其中特别地抑制了由金属离子溶解而产生的胶体颗粒随时间的组成变化，并提供其制备方法。溶液：胶体金属溶液包括：由包含至少一种或多种金属和与金属颗粒结合的保护剂的金属颗粒组成的胶体颗粒; 和溶剂，即胶体粒子的分散剂，其中，每1质量％金属浓度的氯离子浓度不高于25ppm，并且每1质量％的金属浓度的硝酸根离子浓度不高于 7500 ppm。通过控制胶体颗粒的保护剂的量，可以提高其吸附能力。保护剂优选与金属粒子的质量相比为0.2〜2.5倍的金属粒子结合。

5. 发明专利

JP2013027811A Hydrogen combustion catalyst 有权
标题翻译：氢燃烧催化剂
公开(公告)号：JP2013027811A
公开(公告)日：2013-02-07
申请号：JP2011164889
申请日：2011-07-28
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： KUBO HITOSHI , YANAI JUNICHI , NOGUCHI HIROSHI , OSHIMA YUSUKE
IPC分类号： B01J23/652 , B01D53/86
CPC分类号： B01D53/8671 , B01D2255/20715 , B01D2255/20776 , B01D2255/9202 , B01D2255/9205 , B01D2255/9207 , B01D2257/108 , B01D2258/02 , B01J21/066 , B01J23/6527 , B01J35/006 , B01J35/1014 , B01J35/1061 , B01J37/0215
摘要： PROBLEM TO BE SOLVED: To provide a catalyst suitable for burning hydrogen in exhaust gas in a hydrogen production plant, a hydrogen atmosphere furnace or the like.SOLUTION: There is provided the hydrogen combustion catalyst in which a wash coat layer comprises zirconia and tungsten oxide, and the zirconia is essentially composed of monoclinic zirconia, and further, which includes at least one of cubic zirconia and tetragonal zirconia. The catalyst has sufficient catalytic activity even at low temperature and can keep the activity even when it is used for a long period of time.
摘要翻译：要解决的问题：提供一种适于在氢气生产设备，氢气气氛炉等中的废气中燃烧氢的催化剂。解决方案：提供氢气燃烧催化剂，其中洗涤涂层包含氧化锆和氧化钨，氧化锆基本上由单斜晶氧化锆组成，并且还包括立方氧化锆和四方晶氧化锆中的至少一种。即使在低温下催化剂也具有足够的催化活性，即使长时间使用也能保持活性。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2009228067A Colloidal solution of platinum and production process therefor 有权
标题翻译：白蛋白的胶体溶液及其制备方法
公开(公告)号：JP2009228067A
公开(公告)日：2009-10-08
申请号：JP2008075305
申请日：2008-03-24
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： NOGUCHI HIROSHI , YANAI JUNICHI
IPC分类号： B22F9/24 , A23L29/00 , A61K8/02 , A61K8/19 , A61Q19/08 , B01J23/42 , B01J37/16
摘要： PROBLEM TO BE SOLVED: To provide a colloidal solution of platinum, which does not contain a protective agent, hardly causes coagulation or precipitation even if the concentration is high, and shows superior long-period stability. SOLUTION: The colloidal solution of platinum comprises a platinum colloid comprising platinum particles and a solvent of water or a mixture solvent including water and an organic solvent, and does not contain the protective agent, wherein the platinum content in the colloidal solution of platinum is 300 to 20,000 ppm, the pH is 5.0 to 12.0 and the electrical conductivity is 100 mS/m or less. The colloidal solution of platinum can be produced by reducing platinum ions in a platinum salt solution to form the platinum particles, but the production process needs to include the steps of: adjusting the pH of and the concentration of dissolved oxygen in the platinum salt solution before the reduction step; and ultrafiltrating the colloidal solution of platinum obtained after the reduction step to adjust the electrical conductivity and the pH. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供不含保护剂的铂的胶体溶液，即使浓度高，也难以凝结或沉淀，并且显示出优异的长周期稳定性。解决方案：铂的胶体溶液包含含有铂颗粒的铂胶体和水的溶剂或包含水和有机溶剂的混合溶剂，并且不含保护剂，其中胶体溶液中的铂含量铂为300〜20000ppm，pH为5.0〜12.0，导电率为100mS / m以下。铂的胶体溶液可以通过还原铂盐溶液中的铂离子形成铂颗粒来生产，但生产过程需要包括以下步骤：调节铂盐溶液中的溶解氧的pH值和浓度，还原步骤; 并且在还原步骤之后超滤出获得的铂的胶体溶液以调节电导率和pH。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2008094728A Organic ruthenium compound for chemical vapor deposition and chemical vapor deposition method using the organic ruthenium compound 有权
标题翻译：用于化学蒸气沉积的有机钌化合物和使用有机钌化合物的化学气相沉积方法
公开(公告)号：JP2008094728A
公开(公告)日：2008-04-24
申请号：JP2006275215
申请日：2006-10-06
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： YANAI JUNICHI , SAITO MASAYUKI , ISHIDA MINORU
IPC分类号： C07F15/00 , C23C16/18 , H01L21/28 , H01L21/285
CPC分类号： C07F15/0046 , C07F17/02 , C23C16/18 , H01L21/28556
摘要： PROBLEM TO BE SOLVED: To provide an organoruthenium compound for chemical vapor deposition, which does not require the coexistence of oxygen conventionally used as a reactant gas, is liquid at ordinary temperature, and is excellent in handleability and recyclability.
SOLUTION: This organoruthenium compound is represented by the chemical formula [R
1 to R
6 which are substituents of the arene group are each H or an alkyl; the total carbon number (R
1 +R
2 +R
3 +R
4 +R
5 +R
6 ) of R
1 to R
6 is ≤6], and is used for producing a ruthenium thin film or a ruthenium compound thin film by a chemical vapor deposition method, and in which an arene group and norbornadiene are coordinated to ruthenium.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：为了提供不需要常规用作反应气体的氧气的化学气相沉积的有机钌化合物，在常温下为液体，并且处理性和可回收性优异。解决方案：该有机钌化合物由芳族基团的取代基分别为H或烷基的化学式[R SB = 1 / SB]至R SB 6表示。总碳数（R 1 + R 2 R SB 3 + R SB 4 + R SB 至R SB 6的 + R 6 ≤6]，用于制备钌薄膜或钌化合物薄膜，其中芳族基团和降冰片二烯与钌配位。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2003064019A Raw material compound for cvd, method for producing the same and cvd process for iridium or iridium compound thin film 有权
标题翻译：用于CVD的原材料化合物，其制备方法和用于制备IR或IR化合物薄膜的CVD方法
公开(公告)号：JP2003064019A
公开(公告)日：2003-03-05
申请号：JP2001252825
申请日：2001-08-23
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： SAMUE TAKEMOTO , YANAI JUNICHI
IPC分类号： C07C49/92 , C07C45/77 , C07C45/79 , C07C45/80 , C07C45/82 , C07F15/00 , C23C16/18
摘要： PROBLEM TO BE SOLVED: To provide an iridium compound for the raw material of CVD to produce iridium or an iridium compound thin film that melts at a low temperature, is in liquid state at room temperature, can be stably vaporized and is useful as a raw material for CVD giving iridium oxide thin film and provide a method of producing the same.
SOLUTION: Relating to a starting compound for CVD mainly including organoiridium compound, the organoiridium compound for CVD is typified by tris(2,4-octanedionato)iridium. In a particularly preferred embodiment, only the trans-isomer of tris(2,4-cotane-dionato)iridium is used as a starting substance.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了提供用于CVD原料的铱化合物以产生在室温下熔融的铱或铱化合物薄膜，在室温下处于液态，可以稳定蒸发并用作原料提供氧化铱薄膜的CVD材料，并提供其制造方法。解决方案：关于主要包括有机铱化合物的CVD的起始化合物，用于CVD的有机铱化合物以三（2,4-辛二酮）铱为代表。在一个特别优选的实施方案中，仅使用三（2,4-甲二胺）铱的反式异构体作为起始物质。

9. 发明专利

JP2003055294A Raw material for cvd and method for producing the same and method for chemical vapor deposition of ruthenium or ruthenium compound thin film 审中-公开
标题翻译：用于CVD的原料及其制造方法及其制备方法用于化学蒸气沉积的钌或钌复合薄膜
公开(公告)号：JP2003055294A
公开(公告)日：2003-02-26
申请号：JP2001243927
申请日：2001-08-10
申请人： Tanaka Kikinzoku Kogyo Kk , 田中貴金属工業株式会社
发明人： SAITO MASAYUKI , YANAI JUNICHI , OKAMOTO KOJI , SUZUKI HIROAKI
IPC分类号： C07C45/79 , C07C49/92 , C07F15/00 , C23C16/18 , H01L21/02 , H01L21/28 , H01L21/285
CPC分类号： C07C49/92 , C23C16/18 , H01L28/65
摘要： PROBLEM TO BE SOLVED: To provide a raw material compound which contains an organic ruthenium compound as a main component, is used for CVD, has a low melting point and excellent solubility in organic solvents, and can form thin films having good homology, and to provide a method for producing the same.
SOLUTION: This raw material compound which contains the organic ruthenium compound as a main component and is used for CVD is characterized in that the organic ruthenium compound comprises only either one of the cis and trans isomers of tris(2,4-octadionato)ruthenium(III) represented by the formula. The method for producing the raw material compound which comprises only the cis isomer or trans isomer and is used for CVD is characterized by comprising a process for allowing an alumina-containing adsorbent to adsorb the tris(2,4- octadionato)ruthenium(III) produced by an arbitrary method, a process for bringing the adsorbent into contact with the first solvent to elute the trans isomer, and further a process for bringing the adsorbent into contact with the second solvent having larger polarity than that of the first solvent to elute the cis isomer.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了提供含有有机钌化合物作为主要成分的原料化合物，用于CVD，具有低熔点和在有机溶剂中的优异溶解性，并且可以形成具有良好同源性的薄膜，并且提供其制造方法。解决方案：含有有机钌化合物作为主要成分并用于CVD的原料化合物的特征在于有机钌化合物仅包含三（2,4-辛二酸）钌的顺式和反式异构体中的任一种（ III）。用于生产仅含顺式异构体或反式异构体并用于CVD的原料化合物的方法的特征在于包括使含氧化铝的吸附剂吸附三（2,4-辛二酸）钌（III）通过任意方法制造的方法，使吸附剂与第一溶剂接触以洗脱反式异构体的方法，以及进一步使吸附剂与第二溶剂接触的方法，该第二溶剂的极性大于第一溶剂的极性，以洗脱顺式异构体。

10. 发明专利

JP2015004123A 銀粒子の製造方法有权
标题翻译：银粒生产方法
公开(公告)号：JP2015004123A
公开(公告)日：2015-01-08
申请号：JP2013263595
申请日：2013-12-20
申请人：田中貴金属工業株式会社 , Tanaka Kikinzoku Kogyo Kk
发明人： KUBO HITOSHI , MAKITA YUICHI , OSHIMA YUSUKE , MATSUDA HIDEKAZU , NAKAMURA NORIAKI , YANAI JUNICHI
IPC分类号： B22F9/30
CPC分类号： B22F1/0018 , B22F1/00 , B22F9/30
摘要：【課題】本発明は、銀粒子の製造方法について、粒径の揃ったものとしつつ、大きさを十数nm〜百数十nmの範囲内で制御できる銀粒子の製造方法を提供する。【解決手段】本発明は、熱分解性を有する銀化合物とアミンとを混合して前駆体である銀−アミン錯体を製造し、前記前駆体を含む反応系を加熱することで銀粒子を製造する方法であって、加熱前、反応系の水分含有量は、前記銀化合物100重量部に対して30〜100重量部である銀粒子の製造方法に関する。本発明によれば、粒径を制御しつつ、均一な銀粒子を製造することができる。【選択図】図2
摘要翻译：要解决的问题：提供一种银颗粒的制造方法，通过该方法可以将粒径标准化，同时可以将尺寸控制在十几纳米到几十纳米的范围内。解决方案：本发明本发明涉及通过混合可热分解的银化合物和胺以制备作为前体的银 - 胺络合物的银颗粒的制备方法，然后加热包含前体的反应体系，其中反应体系中的水分含量加热前为30-100 pts.wt。基于100重量的银化合物。根据本发明，可以控制粒径并产生均匀的银颗粒。

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