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    • 8. 发明专利
    • Pattern layout method and device for liquid crystal display device, and medium with pattern layout program stored therein
    • 用于液晶显示装置的图形布局方法和装置,以及存储有图案布局程序的介质
    • JP2003316850A
    • 2003-11-07
    • JP2002124598
    • 2002-04-25
    • Toshiba Corp株式会社東芝
    • IZUKI YOSHIHARU
    • G02F1/13G06F17/50
    • PROBLEM TO BE SOLVED: To provide a pattern layout device for a liquid display device capable of performing a precise liquid crystal device pattern layout in a short time.
      SOLUTION: The signal waveform of the electric signal of a liquid crystal pattern layout is drawn in conformation to the liquid crystal pattern layout. A coordinate is extracted from the drawn signal waveform, and the electric signal is converted to a form of signal waveform usable in a liquid crystal circuit simulator by the conversion from the extracted coordinate to time and potential. The electric signal converted to the form of signal waveform usable in the liquid circuit simulator is stored in relation to the liquid crystal pattern layout. Since the liquid crystal pattern layout can be matched to the electric signal, the pattern layout can be designed in a short time without almost making a mistake.
      COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供一种能够在短时间内执行精确的液晶装置图案布局的液晶显示装置的图案布局装置。 解决方案:液晶图案布局的电信号的信号波形以液晶图案布局的形式绘制。 从绘制的信号波形中提取坐标,并且通过从提取的坐标到时间和电位的转换,将电信号转换为可用于液晶电路模拟器中的信号波形的形式。 转换成可用于液体循环模拟器的信号波形形式的电信号相对于液晶图形布局存储。 由于液晶图案布局可以与电信号匹配,因此可以在短时间内设计图案布局,而几乎不会出错。 版权所有(C)2004,JPO
    • 9. 发明专利
    • Method and apparatus for pattern layout and medium with pattern layout program stored therein
    • 具有图案格局的方法和装置及其与存储的图案布局程序的介质
    • JP2002367890A
    • 2002-12-20
    • JP2001171676
    • 2001-06-06
    • Toshiba Corp株式会社東芝
    • IZUKI YOSHIHARU
    • G03F1/68G03F1/70H01L21/027G03F1/08
    • PROBLEM TO BE SOLVED: To provide a pattern layout method wherein the enhancement of design accuracy, shortening of a designing period, and reduction of design error are made possible by creating an exposure pattern to be transferred onto a substrate by exposure.
      SOLUTION: Part of each reticle pattern 15 which does not overlap a light shielding band pattern 16 is extracted, and an exposure pattern 23 to be transferred onto a substrate by an aligner is created. If there is such a defect that the light shielding band pattern 16 overlaps a reticle pattern 15, that can be immediately detected from the exposure pattern 23. Thus, the enhancement of design accuracy, shortening of a designing period, and reduction of design error are possible.
      COPYRIGHT: (C)2003,JPO
    • 要解决的问题:为了提供一种图案布局方法,其中通过产生通过曝光转印到基板上的曝光图案,可以实现提高设计精度,缩短设计周期和减少设计误差。 解决方案:提取不与遮光带图案16重叠的每个掩模版图案15的一部分,并且产生通过对准器转印到基板上的曝光图案23。 如果存在遮光带图案16与掩模版图案15重叠的缺陷,则可以从曝光图案23立即检测。因此,设计精度的提高,设计周期的缩短和设计误差的减少是 可能。