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1. 发明专利

JP2002137904A REFORMING CATALYST PROTECTING APPARATUS FOR STEAM REFORMER 失效
公开(公告)号：JP2002137904A
公开(公告)日：2002-05-14
申请号：JP2000326493
申请日：2000-10-26
申请人： TOKYO GAS CO LTD , MITSUBISHI KAKOKI KK , TOKYO GAS CHEMICALS CO LTD
发明人： TAKAHASHI TORU , KOBAYASHI YUJI , KATO HIDEHARU , KUSAKA RYOHEI , NAKAMURA KENICHI , AIDA KOJI
IPC分类号： C01B3/38 , B01J19/00 , B01J33/00
摘要： PROBLEM TO BE SOLVED: To provide an apparatus which protects a reforming catalyst led from carbon deposition in a steam reformer for a hydrocarbon gas in such unusual conditions as a failure of power or a water supply pump. SOLUTION: An apparatus, protecting a reforming catalyst in a seam reformer for a hydrocarbon gas, is installed as an attachment of the steam reformer. The apparatus is equipped with an emergency water-injection tank, being installed at an upper part of the reformer and connected to a water supply pump.

2. 发明专利

JP2002355521A METHOD OF CONTROLLING FLOW RATE OF OFFGAS IN FOUR TOWER- TYPE PRESSURE-SWING ADSORPTION EQUIPMENT FOR PURIFYING HYDROGEN 失效
公开(公告)号：JP2002355521A
公开(公告)日：2002-12-10
申请号：JP2001164527
申请日：2001-05-31
申请人： TOKYO GAS CO LTD , TOKYO GAS CHEMICALS CO LTD , MITSUBISHI KAKOKI KK
发明人： FURUTA HIROTAKA , TAKAHASHI TORU , NAKAMURA KENICHI , AIDA KOJI , KUSAKA RYOHEI , KAMAKURA YUKIHIRO , MORIGUCHI KUMIKO , MIYAJIMA HIDEKI
IPC分类号： B01D53/04 , C01B3/56
摘要： PROBLEM TO BE SOLVED: To suppress the fluctuation of the inner pressure of an offgas storage tank in a four tower-type pressure-swing adsorption equipment for purifying hydrogen and to prevent lowering of the performance of the pressure-swing adsorption equipment. SOLUTION: In the four tower-type pressure-swing adsorption equipment for purifying hydrogen, having the offgas storage tank, a method of controlling the flow rate of offgas at the time of the blowdown process in each adsorption tank is characterized in that the opening degree of a valve provided on the upstream side from the offgas storage tank is opened in stages or linearly.

3. 发明专利

JP2002355522A METHOD OF CONTROLLING PRESSURE OF OFFGAS FROM OFFGAS TANK IN FOUR TOWER-TYPE PSA EQUIPMENT FOR PURIFYING HYDROGEN 失效
公开(公告)号：JP2002355522A
公开(公告)日：2002-12-10
申请号：JP2001164607
申请日：2001-05-31
申请人： TOKYO GAS CO LTD , TOKYO GAS CHEMICALS CO LTD , MITSUBISHI KAKOKI KK
发明人： FURUTA HIROTAKA , TAKAHASHI TORU , NAKAMURA KENICHI , AIDA KOJI , KUSAKA RYOHEI , KAMAKURA YUKIHIRO , MORIGUCHI KUMIKO , MIYAJIMA HIDEKI
IPC分类号： B01D53/04 , C01B3/56
摘要： PROBLEM TO BE SOLVED: To suppress the fluctuation of the inner pressure of an offgas tank and to stabilize the combustion state of a burner when the offgas is supplied as a fuel of the combustion part of a reformer, in a four tower-type pressure- swing adsorption(PSA) equipment for purifying hydrogen. SOLUTION: The method of controlling the pressure of offgas from the offgas tanke is characterized in that, when offgas of the offgas tank provided in the four tower-type PSA equipment for purifying hydrogen is supplied to the burner of the reformer for hydrogen production, the pressure of the offgas from the offgas tank is controlled by increasing or lowering the opening degree of a valve for controlling the flow rate of the offgas with a predetermined small degree while setting the minimum pressure at which the pressure of the offgas becomes minimum as a standard, which valve is provided on the downstream side from the offgas tank.

4. 发明专利

JP2002355519A METHOD OF STABLY OPERATING FOUR TOWER-TYPE PRESSURE- SWING ADSORPTION EQUIPMENT FOR HYDROGEN PURIFICATION 失效
公开(公告)号：JP2002355519A
公开(公告)日：2002-12-10
申请号：JP2001164655
申请日：2001-05-31
申请人： TOKYO GAS CO LTD , TOKYO GAS CHEMICALS CO LTD , MITSUBISHI KAKOKI KK
发明人： FURUTA HIROTAKA , TAKAHASHI TORU , NAKAMURA KENICHI , AIDA KOJI , KUSAKA RYOHEI , KAMAKURA YUKIHIRO , MORIGUCHI KUMIKO , MIYAJIMA HIDEKI
IPC分类号： B01D53/04
摘要： PROBLEM TO BE SOLVED: To stabilize the flow rate of product gas, the purity of product hydrogen and the recovery rate of the product hydrogen corresponding to the temperature of the outside air environment in wintertime, summertime or the like in a four-tower-type pressure-swing adsorption equipment for hydrogen purification. SOLUTION: The method of stably operating the four tower-type pressure- swing adsorption equipment for hydrogen purification is characterized in that, by measuring and detecting the temperature of the product hydrogen gas, and then changing the cycle time according to the measured value, the flow amount of the product gas, the purity of the product hydrogen and the recovery rate of the product hydrogen can be stabilized.

5. 发明专利

JP2002355520A FLOW RATE CONTROL PRESSURIZATION METHOD FOR FOUR TOWER- TYPE PRESSURE-SWING ADSORPTION EQUIPMENT FOR PURIFYING HYDROGEN 失效
公开(公告)号：JP2002355520A
公开(公告)日：2002-12-10
申请号：JP2001165923
申请日：2001-05-31
申请人： TOKYO GAS CO LTD , TOKYO GAS CHEMICALS CO LTD , MITSUBISHI KAKOKI KK
发明人： FURUTA HIROTAKA , TAKAHASHI TORU , NAKAMURA KENICHI , AIDA KOJI , KUSAKA RYOHEI , KAMAKURA YUKIHIRO , MORIGUCHI KUMIKO , MIYAJIMA HIDEKI
IPC分类号： B01D53/04 , H01M8/06
摘要： PROBLEM TO BE SOLVED: To increase the pressure to a target value of the pressure in pressurization process of each adsorption tower and suppress the fluctuation of the amount of product hydrogen without depending on factors, such as the temperature of the outside air environment in wintertime, summertime, daytime or nighttime in a four tower-type pressure-swing adsorption equipment for purifying hydrogen. SOLUTION: A flow rate control pressurization method for the four-tower-type pressure-swing adsorption apparatus for purifying hydrogen is characterized in that, by monitoring as needed the pressure in the adsorption tower in a hydrogen pressurizing process while controlling the flow rate of pressurization hydrogen according to the preset value of the flow rate of hydrogen, and correcting little by little the preset value of the flow rate of hydrogen when the pressure in the adsorption tower is increased to a predetermined adsorption pressure while using a portion of the product hydrogen, the pressure is increased to the predetermined pressure and the fluctuation of the amount of the product hydrogen can be suppressed without depending on the factors such as the temperature of the outside air.

6. 发明专利

JP2004092985A Exhaust gas treatment apparatus 审中-公开
公开(公告)号：JP2004092985A
公开(公告)日：2004-03-25
申请号：JP2002253739
申请日：2002-08-30
申请人： Koike Sanso Kogyo Co Ltd , Tokyo Gas Chemicals Co Ltd , Tokyo Gas Co Ltd , 小池酸素工業株式会社 , 東京ガスケミカル株式会社 , 東京瓦斯株式会社
发明人： KOIKE YASUO , BOKU HEISHO , KIN HEITETSU , NAKAMURA KENICHI , SUGIHARA KENICHI , SEO ATSUKO
IPC分类号： F23G5/44 , B01D53/46 , B01D53/68 , B01D53/70 , F23G5/46 , F23G7/06 , F23J15/06 , H01L21/205
CPC分类号： Y02C20/30 , Y02E20/363 , Y02P70/605
摘要： PROBLEM TO BE SOLVED: To lower the temperature of the exhaust gas generated during the manufacturing process of semiconductor without requiring a large amount of cooling air. SOLUTION: The treatment apparatus A has a combustion chamber 1, a secondary air inlet hole 9, a combustion exhaust gas discharge path 4 and a heat exchanger 5 provided near the combustion chamber 1. The combustion exhaust gas discharge path 4 is connected to a supply port of the heat exchanger 5, and the combustion chamber 1 and the heat exchanger 5 are housed in a storage container 6. The combustion chamber 1 has a closed end, on the side of which an exhaust gas supply path 2 and a burner 3 are arranged. The burner 3 raises the temperature of the exhaust gas supplied into the combustion chamber 1 to decompose or burn it, and the heat exchanger 5 lowers the temperature of the gas with the air taken in from the secondary air inlet hole 9 to discharge it. COPYRIGHT: (C)2004,JPO

7. 发明专利

JP2003202108A FLAME-RETARDANT SUBSTANCE DECOMPOSITION BURNER 审中-公开
公开(公告)号：JP2003202108A
公开(公告)日：2003-07-18
申请号：JP2002003375
申请日：2002-01-10
申请人： TOKYO GAS CO LTD , TOKYO GAS CHEMICALS CO LTD , KOIKE SANSO KOGYO KK
发明人： SEO ATSUKO , FUJISAKI WATARU , AMANO TOSHIJI , NAKAMURA KENICHI , SUGIHARA KENICHI , BOKU HEISHO , KIN HEITETSU
IPC分类号： F23G7/06
摘要： PROBLEM TO BE SOLVED: To provide a flame-retardant substance decomposition burner capable of thermally decomposing a substance with high thermal decomposition with efficiency of 99% or more such as CF4, using a simple structure. SOLUTION: A flame-retardant substance containing gas introducing nozzle 40 structured so as to jet flame-retardant substance containing gas, is disposed on one end of a casing 2. A plurality of oxidizers and fuel blowing nozzles 50 are disposed in a concentric circle manner. The fuel blowing nozzles 50 are mounted with the axial line inclined so that each jetting flames f may converge at almost the same points on the center line L of a tubular body 2. COPYRIGHT: (C)2003,JPO

8. 发明专利

JP2004123402A Device and method for gas filling of sealed double glazed glass 审中-公开
公开(公告)号：JP2004123402A
公开(公告)日：2004-04-22
申请号：JP2002285805
申请日：2002-09-30
申请人： Tokyo Gas Chemicals Co Ltd , 東京ガスケミカル株式会社
发明人： NAKAMURA KENICHI , SUGIHARA KENICHI
IPC分类号： C03C27/06
摘要： PROBLEM TO BE SOLVED: To improve a yield of gas at the time of gas filling to a gas filling layer of sealed double glazed glass.
SOLUTION: The gas filling device 1 for the sealed double glazed glass 50 has a gas feeding piping 10 for feeding the filling gas, a gas feeding source 11, gas discharge piping 20 for discharging the gas, an oxygen concentration measuring means 21 for measuring the oxygen concentration in the discharged gas, opening/closing valves V13, V21-V23 and flow rate control means 13, 23, which are provided in the gas feeding piping 10 and the gas discharge piping 20, respectively, a gas separating/recovering means 24 for separating and recovering a filling gas component from the discharge gas in which the filling gas and air are contained in a mixed state, a recovered gas flow-back means 30 for flowing back the recovered filling gas to the gas feeding piping 10, and a control means 40 for controlling the operation conditions of the gas separating/recovering means, each valve, and the flow rate control means 13, 23 according to the oxygen concentration. In the apparatus 1, the filling gas is filled from a gas filling port 53 of the sealed double glazed glass 50, air in the gas filling layer 52 is discharged from a gas discharge port 54 while being replaced with the filling gas, and the filling gas is filled in the gas filling layer.
COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2002293581A DEVICE AND METHOD FOR GAS FILLING OF DOUBLE LAYERED GLASS 失效
公开(公告)号：JP2002293581A
公开(公告)日：2002-10-09
申请号：JP2001093280
申请日：2001-03-28
申请人： TOKYO GAS CHEMICALS CO LTD
发明人： SUGIHARA KENICHI , NAKAMURA KENICHI
IPC分类号： C03C27/06
摘要： PROBLEM TO BE SOLVED: To improve an yield of gas at the time of gas filling to a gas filling layer of double layered glass. SOLUTION: The gas filling device for the double layered glass is constituted of a vacuum chamber 1 accommodating the double layered glass 7 having the gas filling layer 73, a gas discharging pipe 14 from the gas filling layer 73 of the double layered glass accommodated in a space 13, a filling gas feeding pipe 15, an internal space gas discharging pipe 16, an internal space gas feeding pipe 17 feeding gas, a vacuum pomp 31 evacuating the internal space and the gas filling layer 73 connected with the gas discharging pipe 14 and the gas discharging pipe 16, a 1st pressure detecting means 91 detecting internal pressure of the gas filling layer 73, a 2nd pressure detecting means 92 detecting the internal pressure of the internal space 13, a flow control device 54 controlling flow of filling gas, flow controlling valve 95 controlling internal space feeding gas, a differential pressure signal generating means 93 generating from the pressure difference between detecting values of the pressure detecting means 91 and 92, and a flow control unit 94 controlling in a direction so as to cancel the difference based on the differential signal.

10. 发明专利

JP2008164632A Temperature compensating method, temperature compensating circuit using same, sensor, and water heater 审中-公开
标题翻译：温度补偿方法，使用温度补偿电路，传感器和水加热器
公开(公告)号：JP2008164632A
公开(公告)日：2008-07-17
申请号：JP2008057662
申请日：2008-03-07
申请人： Omron Corp , Tokyo Gas Co Ltd , オムロン株式会社 , 東京瓦斯株式会社
发明人： NAKAMURA KENICHI , KONDA NORIHIRO , KONDO MASATO , SHIGEOKA TAKUJI , EDA AKITO , NOZOE SATOSHI , BINGO HIDEYUKI , KINOSHITA MASAHIRO , SASAKI AKIRA
IPC分类号： G01F1/696 , G01F15/02 , G01P5/12
摘要： PROBLEM TO BE SOLVED: To make an appropriate temperature compensation even when the ambient temperature of a thermosensitive element and the ambient temperature of processing means (processing circuit) that performs a process for a temperature compensation of the thermosensitive element change independently of each other. SOLUTION: While making a temperature compensation of a thermosensitive element 1 in accordance with information on the temperature of a detection target, a temperature compensating method also makes a temperature compensation of processing means in accordance with information on the temperature thereof, the processing means performing a process for a temperature compensation of the thermosensitive element 1 and performing desired detection on the detection target, (the processing means including a differential amplifier 7, for example). The processing means preferably has thermosensitive elements R9 and R2 for adjusting the offset and/or gain of the processing means. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：即使当热敏元件的环境温度和执行用于热敏元件的温度补偿的处理的处理装置（处理电路）的环境温度独立于每一个而变化时也进行适当的温度补偿其他。解决方案：在根据关于检测对象的温度的信息进行热敏元件1的温度补偿的同时，温度补偿方法还根据关于其温度的信息对处理装置进行温度补偿，处理意味着执行用于热敏元件1的温度补偿的处理并且对检测对象进行期望的检测（例如，包括差分放大器7的处理装置）。处理装置优选地具有用于调节处理装置的偏移和/或增益的热敏元件R9和R2。版权所有（C）2008，JPO＆INPIT

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