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1. 发明专利

JP2587629B2 失效
公开(公告)号：JP2587629B2
公开(公告)日：1997-03-05
申请号：JP2130387
申请日：1987-01-31
申请人： TOKYO EREKUTORON KK , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J37/32 , H01L21/302

2. 发明专利

JP2913131B2 失效
公开(公告)号：JP2913131B2
公开(公告)日：1999-06-28
申请号：JP19753192
申请日：1992-06-30
申请人： TOKYO EREKUTORON KK
发明人： IMAHASHI KAZUNARI , ISHII NOBUO
IPC分类号： C23F4/00 , H01L21/302 , H01L21/3065

3. 发明专利

JP2920852B2 失效
公开(公告)号：JP2920852B2
公开(公告)日：1999-07-19
申请号：JP16342491
申请日：1991-06-10
申请人： TOKYO EREKUTORON KK
发明人： IMAHASHI KAZUNARI , ISHII NOBUO
IPC分类号： C23F4/00 , H01L21/205 , H01L21/302 , H01L21/3065

4. 发明专利

JPS63190299A PLASMA APPARATUS 失效
公开(公告)号：JPS63190299A
公开(公告)日：1988-08-05
申请号：JP2130387
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J37/32 , H01L21/302

5. 发明专利

JPS63190300A PLASMA APPARATUS 失效
公开(公告)号：JPS63190300A
公开(公告)日：1988-08-05
申请号：JP2130487
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J37/32 , H05H1/48

6. 发明专利

JPS63190229A ELECTRON BEAM-EXCITED ION SOURCE 失效
公开(公告)号：JPS63190229A
公开(公告)日：1988-08-05
申请号：JP2130287
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J27/20 , H01J37/08
摘要： PURPOSE:To efficiently generate a large quantity of ions and obtain an ion beam with low energy and a large current by providing an ion generation chamber, a means radiating an electron beam to generate ions, and a means forming the multi-pole magnetic field in the chamber. CONSTITUTION:An anode 2 made of a Mo thin plate disk arranged with many small through holes 2b, 3b except on the periphery and an accelerating electrode 3 are arranged at a fixed distance in an enclosed container 1. A cathode tube 4 made of Ta with a through hole 5 is arranged on a side wall 1a facing the electrode 2. A conductive plate with a narrow path 6 (fine hole) is inserted between the electrodes 4 and 2, and the most portion of the anode 2 side is covered with an insulating material 7. Ar is introduced through the electrode 4, and the discharge voltage 8 is applied across the electrodes 4 and 2 to generate plasma. The electrode 3 extracts and accelerates electrons and feeds them into a chamber 10. Many permanent magnets 10a with different polarity at adjacent positions are arranged on the conductor wall of the chamber 10 having the same potential as the electrode 3, As gas is fed, the introduced electron beam collides with As molecules to generate dense plasma, which is enclosed by the magnets 10a and extracted through slits 11, 12.

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