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1. 发明专利

JPS63190229A ELECTRON BEAM-EXCITED ION SOURCE 失效
公开(公告)号：JPS63190229A
公开(公告)日：1988-08-05
申请号：JP2130287
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J27/20 , H01J37/08
摘要： PURPOSE:To efficiently generate a large quantity of ions and obtain an ion beam with low energy and a large current by providing an ion generation chamber, a means radiating an electron beam to generate ions, and a means forming the multi-pole magnetic field in the chamber. CONSTITUTION:An anode 2 made of a Mo thin plate disk arranged with many small through holes 2b, 3b except on the periphery and an accelerating electrode 3 are arranged at a fixed distance in an enclosed container 1. A cathode tube 4 made of Ta with a through hole 5 is arranged on a side wall 1a facing the electrode 2. A conductive plate with a narrow path 6 (fine hole) is inserted between the electrodes 4 and 2, and the most portion of the anode 2 side is covered with an insulating material 7. Ar is introduced through the electrode 4, and the discharge voltage 8 is applied across the electrodes 4 and 2 to generate plasma. The electrode 3 extracts and accelerates electrons and feeds them into a chamber 10. Many permanent magnets 10a with different polarity at adjacent positions are arranged on the conductor wall of the chamber 10 having the same potential as the electrode 3, As gas is fed, the introduced electron beam collides with As molecules to generate dense plasma, which is enclosed by the magnets 10a and extracted through slits 11, 12.

2. 发明专利

JPH01176631A ELECTRON BEAM EXCITING ION SOURCE 失效
公开(公告)号：JPH01176631A
公开(公告)日：1989-07-13
申请号：JP33216687
申请日：1987-12-30
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , NANBA SUSUMU , KOSHIISHI AKIRA , MATSUDO MASAHIKO , KAWAMURA GOHEI , TAKAYAMA NAOKI
IPC分类号： H01J27/20 , H01J37/08
摘要： PURPOSE:To make it possible to obtain an electron current density similar to that obtained with an electron beam-excited ion source of the conventional plasma discharge type without the cathode being sputtered and worn, by generating electrons by means of a thermoelectron generating means consisting of an electron emitting substance and a means for heating the substance. CONSTITUTION:In an electron emitting substance holding section 5 is held barium oxide strontium 6 for example as an electron emitting substance. The electron emitting substance holding section 5 is closed with an electron acceleration cathode 7 made for example of porous tungsten plate or the like to constitute a thermoelectron generating device 8. Thermoelectrons are generated with the thermoelectron generating device 8 which heats the barium oxide strontium 6 by means of a heater 1. Since a closed container 2 holding the heater 1 is of a high vacuum, no plasma is produced in the vicinity of the heater 1, and there is no possibility of this heater 1 being sputtered and worn with plasma cation.

3. 发明专利

JPS63190299A PLASMA APPARATUS 失效
公开(公告)号：JPS63190299A
公开(公告)日：1988-08-05
申请号：JP2130387
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J37/32 , H01L21/302

4. 发明专利

JPS62278736A ELECTRON BEAM EXCITED ION SOURCE 失效
公开(公告)号：JPS62278736A
公开(公告)日：1987-12-03
申请号：JP12196786
申请日：1986-05-27
申请人： RIKAGAKU KENKYUSHO , TOKYO ELECTRON LTD
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , NANBA SUSUMU , TAKAYAMA NAOKI
IPC分类号： H01J27/08 , H01J27/20 , H01J37/08 , H05H7/08
摘要： PURPOSE:To aim at simplification and miniaturization in a system structure, by installing a narrow path between a cathode and an anode, and installing an evacuation port in only the more downstream side than an ion drawing out electrode. CONSTITUTION:A narrow path 4 of minute conductance is installed between a cylindrical anode 1 and a porous anode 2. At a lower stage of this anode 2, there are provided with a electron beam accelerating electrode 6 and ion drawing out electrodes 7 and 7'. And, an evacuation port 10 exhausting gas inside the system is installed only the downstream side of these ion drawing out electrodes 7 and 7'. When the inside of the system is decompressed via the exhaust port 10, each part so far intercepted by the narrow path 4 comes to the desired vacuum value. Therefore, necessity for installing an opening for exhausting between the narrow path 4 and these drawing out electrodes 7 and 7' is no longer required, so that a system construction becomes simplified and, what is more, miniaturization and low-unit cost of production can be well promoted.

5. 发明专利

JPH01176633A ELECTRON BEAM-EXCITING ION SOURCE 失效
公开(公告)号：JPH01176633A
公开(公告)日：1989-07-13
申请号：JP33216887
申请日：1987-12-30
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , NANBA SUSUMU , MATSUDO MASAHIKO , KOSHIISHI AKIRA , KAWAMURA GOHEI , TAKAYAMA NAOKI
IPC分类号： H01J27/20 , H01J37/08
摘要： PURPOSE:To make it possible to form uniform plasma of a large diameter in an ion generating area by making an ion beam produced with an ion generating device a diffused flow. CONSTITUTION:Outside a closed container 1 is disposed an annularly formed hollow-core coil 8. Between an orifice 4 of the closed container 1 and an anode 5 is disposed a layer consisting of a material of a high permeability, for example an iron layer 9, so as to surround the circumference of the container 1. The magnetic field formed by energizing the hollow-core coil 8 in the closed container 1 runs as shown with dotted line in the drawing to expand in the direction of the iron layer 9 inside the iron layer 9, namely in the direction of the rim or the closed container 1, and runs approximately linearly in other parts. Since electrons are deflected in this electron generating area to expand in the direction of the rim of the electron generating area and uniformly enter an ion generating area where ions are generated, it is possible to form uniform plasma of a large diameter in the ion generating area.

6. 发明专利

JPS63221540A ELECTRON BEAM EXCITING ION SOURCE 失效
公开(公告)号：JPS63221540A
公开(公告)日：1988-09-14
申请号：JP5339187
申请日：1987-03-09
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H7/08 , H01J27/20
摘要： PURPOSE:To obtain an electron beam exciting ion source with the large current density, long life, and low power consumption quantity by making the diameter of through holes 0.65mm or less when electrons are extracted from a plasma generation region by the voltage of an electrode with many through holes. CONSTITUTION:Discharge gas is guided into a chamber 1 through the through hole 4 of a cathode electrode 5, a glow discharge is generated across the electrode 5 and an anode electrode 2 to form plasma. Next, electrons extracted from the plasma by an electron beam accelerating electrode 3 collide with arsenic gas in an ion generating chamber 10 to generate plasma, which is extracted by a plasma ion extracting electrode 11. In this constitution, through holes (b) with a diameter of 0.5-0.6mm capable of extracting an electron beam most efficiently are arranged with a pitch of 0.7-1.0mm. As a result, a large quantity of the electron beam can be extracted without impairing the durability of these electrodes, the current can be reduced, thus the life of the electrode 5 is extended, and the power consumption can be reduced.

7. 发明专利

JPH01176634A ELECTRON BEAM-EXCITING ION SOURCE 失效
公开(公告)号：JPH01176634A
公开(公告)日：1989-07-13
申请号：JP33216987
申请日：1987-12-30
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , NANBA SUSUMU , KOSHIISHI AKIRA , MATSUDO MASAHIKO , KAWAMURA GOHEI , TAKAYAMA NAOKI
IPC分类号： H01J27/20 , H01J37/08
摘要： PURPOSE:To increase ion current density, shorten processing time and increase throughput by accelerating electrons with a single perforated electrode having a multiplicity of electron passage holes and disposed at a boundary area between an electron generating are and an ion generating area. CONSTITUTION:It is constituted such that a single porous electrode 5 having a multiplicity of electron passage holes 5a is disposed at a boundary area between an electron generating area 8 and an ion generating area 9 to accelerate electrons by applying a voltage to a container 7a. In an ion beam-excited ion source for example, the area between a cathode 2 and an anode 5 is made to be the electron generating area while the area between the anode 5 and an ion draw-out slit 7 is made to be the ion generating area 9 where electrons are accelerated to produce ions. This constitution enables to increase ion current density, shorten processing time, and increase throughput.

8. 发明专利

JPH01176632A ELECTRON BEAM-EXCITING ION SOURCE 失效
公开(公告)号：JPH01176632A
公开(公告)日：1989-07-13
申请号：JP33216787
申请日：1987-12-30
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , NANBA SUSUMU , KAWAMURA GOHEI , KOSHIISHI AKIRA , MATSUDO MASAHIKO , TAKAYAMA NAOKI
IPC分类号： H01J27/20 , H01J37/08
摘要： PURPOSE:To increase the throughput with a reduced processing time by arranging a reaction gas supply port for supplying the reaction gas to an ion generating area in the vicinity of a side end portion of an electron generating area of the ion generating area. CONSTITUTION:The area between a cathode 2 and an anode 5 is made to be an electron generating area while the area between the anode 5 and an ion drawing out slit 7 is made to be an ion generating area 9 where the electrons generated in the electron generating area are accelerated and ionized by irradiating to a reaction gas. Further, a reaction gas supply port 10 is disposed at the side end portion of the electron generating area 8 of the ion generating area 9. This constitution enables to obtain a high ion current density, to reduce the time required for ion implantation, and to increase throughput.

9. 发明专利

JPS63190300A PLASMA APPARATUS 失效
公开(公告)号：JPS63190300A
公开(公告)日：1988-08-05
申请号：JP2130487
申请日：1987-01-31
申请人： TOKYO ELECTRON LTD , RIKAGAKU KENKYUSHO
发明人： ISHII NOBUO , TAKAYAMA NAOKI , KAWAMURA GOHEI , HARA TAMIO , HAMAGAKI MANABU , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： H05H1/24 , H01J37/32 , H05H1/48

10. 发明专利

JP2724461B2 失效
公开(公告)号：JP2724461B2
公开(公告)日：1998-03-09
申请号：JP33216987
申请日：1987-12-30
申请人： TOKYO EREKUTORON KK , RIKAGAKU KENKYUSHO
发明人： HARA TAMIO , HAMAGAKI MANABU , AOYANAGI KATSUNOBU , NANBA SUSUMU , KOSHIISHI AKIRA , MATSUDO MASAHIKO , KAWAMURA GOHEI , TAKAYAMA NAOKI
IPC分类号： H01J27/20 , H01J37/08

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