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1. 发明专利

JP2009186594A Vacuum stage device and electron beam irradiation device 审中-公开
标题翻译：真空级装置和电子束辐射装置
公开(公告)号：JP2009186594A
公开(公告)日：2009-08-20
申请号：JP2008024215
申请日：2008-02-04
申请人： Sony Corp , ソニー株式会社
发明人： TAKASHIMIZU TORU , AKI YUICHI , MIURA YOSHIHISA
IPC分类号： G03F7/20 , G11B7/26 , H01J37/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a vacuum stage device that can be inexpensively configured with high accuracy.
SOLUTION: The vacuum stage device has a stage 11, an air spindle 4 rotating the stage 11, and a box 20 storing the air spindle 4, all in a vacuum chamber 1, and a sliding shaft 3 having a circular cross section and moving the stage 11 in one axial direction, which is disposed as extending from the inside of the vacuum chamber 1 to the outside, wherein the sliding shaft 3 extended from the box 20 to both sides to the outside of the vacuum chamber 1 along a straight line gives a unit structure, and only one unit structure is provided in the stage device. The stage device is provided with a rotation regulating mechanism 40 configured to regulate rotation of the sliding shaft 3 of the vacuum stage device and as well as to float by static pressure with respect to the floor.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供可以以高精度廉价地构造的真空级装置。
解决方案：真空级装置具有级11，将工作台11旋转的空气心轴4和存储空气心轴4的箱体20全部放置在真空室1中，以及具有圆形截面的滑动轴3 并且沿一个轴向移动台架11，该轴向方向被设置为从真空室1的内部延伸到外部，其中滑动轴3沿着一个从壳体20延伸到两侧到达真空室1的外部直线给出了一个单元结构，在平台设备中仅提供一个单元结构。舞台装置设置有旋转调节机构40，其被配置为调节真空级装置的滑动轴3的旋转并且相对于地板通过静态压力浮动。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2006122989A Laser beam machining apparatus 有权
标题翻译：激光加工设备
公开(公告)号：JP2006122989A
公开(公告)日：2006-05-18
申请号：JP2004317089
申请日：2004-10-29
申请人： Sony Corp , ソニー株式会社
发明人： KAWABE HIDEO , KOSHIISHI AKIRA , AKI YUICHI , MIURA YOSHIHISA
IPC分类号： B23K26/14 , B23K26/12
摘要： PROBLEM TO BE SOLVED: To provide a laser beam machining apparatus capable of suppressing deposition of dust of evaporated substance of a member to be irradiated with laser beams from an irradiated portion of the member, a molten stuff scattering from a vicinity of the irradiated portion thereof or the like due to re-deposition on the member. SOLUTION: In the laser beam machining apparatus 1 comprising a pulse laser beam source 2, a local machining head 3 having a transparent aperture 38 with pulse laser beams L introduced therefrom, and a supporting stand 4 of a member 5 having irradiated portions by the pulse laser beams L, while the local machining head 3 is connected to exhaust means 32a and 32b to adjust the pressure and the air flow in a space formed between the supporting stand 4 and the local machining head 3, and a local exhaust means 34 to adjust the pressure and the air flow in a local exhaust unit 37 close to the transparent aperture and the irradiated portion, an aperture 39 of the local machining head 3 facing the irradiated portion to regulate the local exhaust unit 37 is selected to be substantially perfect circle having the minor diameter of ≤2 mm. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决问题的方案为了提供一种激光束加工装置，其能够抑制来自被照射部分的激光束照射的部件的蒸发物质的灰尘沉积，照射部分等，由于重新沉积在构件上。解决方案：在包括脉冲激光束源2的激光束加工设备1中，具有从其引入的脉冲激光束L的具有透明孔38的局部加工头3和具有辐射部分的部件5的支撑架4 通过脉冲激光束L，而局部加工头3连接到排气装置32a和32b，以调节在支撑台4和局部加工头3之间形成的空间中的压力和空气流，以及局部排气装置 34，以调节靠近透明孔和照射部分的局部排气单元37中的压力和空气流，局部加工头3的面对照射部分以调节局部排气单元37的孔39被选择为基本上小圆直径≤2mm的圆形。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005352302A Electron beam irradiating apparatus 审中-公开
标题翻译：电子束辐射装置
公开(公告)号：JP2005352302A
公开(公告)日：2005-12-22
申请号：JP2004174473
申请日：2004-06-11
申请人： Sony Corp , ソニー株式会社
发明人： MIURA YOSHIHISA , AKI YUICHI
IPC分类号： G21K5/04 , G03F7/20 , G11B7/26 , G21K5/10 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To realize an inexpensive feeding mechanism and a rotating mechanism (gas bearing) in vacuum with high accuracy in a simple configuration, to eliminate limitation for minimizing a work distance and to obtain high resolution.
SOLUTION: In an electron beam irradiating apparatus, a sliding mechanism has a static pressure floating function to allow a sliding shaft 3 to float by feeding compressed air to a gas bearing part 2 and a differential evacuating function in a plurality of stages to evacuate the compressed air for floating so as to stepwisely increase the vacuum degree. A spindle mechanism mounts an air spindle 4 controlling the rotating mechanism on the slide shaft 3 in a vacuum chamber 1, and has a static pressure floating function to allow an air spindle 4 to float by feeding compressed air to the gas bearing part and a differential evacuating function in a plurality of stages to evacuate the compressed air for floating so as to stepwisely increase the vacuum degree.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了在简单的结构中以高精度实现廉价的进料机构和旋转机构（气体轴承），消除了使工作距离最小化和获得高分辨率的限制。解决方案：在电子束照射装置中，滑动机构具有静压浮动功能，以允许滑动轴3通过将压缩空气供给到气体支承部件2和将多个排气功能分级到多个阶段而浮动，抽空压缩空气浮动，逐步增加真空度。主轴机构将真空室1中的旋转机构的旋转机构安装在滑动轴3上，具有静压浮动功能，通过将空气主轴4送入气体轴承部分而使空气浮起，在多级中排气功能，以抽空压缩空气进行浮动，以逐步增加真空度。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2004349645A Liquid-immersed differential liquid-drainage static-pressure floating pad, master-disk exposure apparatus, and method of exposure using liquid-immersed differential liquid-drainage 审中-公开
公开(公告)号：JP2004349645A
公开(公告)日：2004-12-09
申请号：JP2003148040
申请日：2003-05-26
申请人： Sony Corp , ソニー株式会社
发明人： AKI YUICHI
IPC分类号： G03F7/20 , G11B7/26 , H01L21/027
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To increase numerical aperture of a lens by using a liquid-immersed objective lens and to prevent the liquid from scattering to surroundings.
SOLUTION: The liquid-immersed differential liquid-drainage static-pressure floating pad 3 comprises: a feeding part 16 capable of feeding a liquid to a periphery of a liquid-immersed part 7 of the liquid-immersed objective lens 9 via a compressed gas from a positive pressure part 17; a liquid-drainage part 14 capable of draining the liquid by sucking the liquid through a plurality of annular sucking grooves 5, 6 by the suction with a compressed gas from a negative pressure part 18; and a control part 19 with which the liquid-immersed objective lens 9 is movable in a direction perpendicular to a master disk 10 by an actuator 21 such that a radiating laser beam is confirmed to be focused on the master disk 10 by a detecting mechanism 20 for the reflective laser beam from the master disk. By the constitution as such, the refractive index in the working distance between the objective lens and the irradiated object is raised to be higher than 1 since the liquid-immersed lens is constituted without liquid leakage by using the differential liquid-drainage static-pressure floating pad, and therefore, high-density exposure is carried out since a smaller spot than in atmospheric air is realized.
COPYRIGHT: (C)2005,JPO&NCIPI

5. 发明专利

JP2004221386A Inspection and measurement device and inspection and measurement method of particulate semiconductor 审中-公开
公开(公告)号：JP2004221386A
公开(公告)日：2004-08-05
申请号：JP2003008025
申请日：2003-01-16
申请人： Sony Corp , ソニー株式会社
发明人： OKAWACHI HIROKI , HATTORI TADASHI , TAKAYAMA MASATO , FUJITA HIRONORI , AKI YUICHI , TAKEDA MINORU
IPC分类号： H01L21/66 , H01J37/16 , H01J37/18 , H01J37/28 , H01L21/027 , H01L21/50 , H01L21/68 , H01L21/683 , H01L23/52
摘要： PROBLEM TO BE SOLVED: To provide an inspection and measurement device of a particulate semiconductor and an inspection and measurement method of the particulate semiconductor in which a spherical semiconductor can be held in non-contact separating the vacuum space of a specific gap without using a large-scaled clean room. SOLUTION: The inspection and measurement device 100 of the particulate semiconductor comprises a local vacuum mechanism 5 for holding a particular semiconductor 3 in non-contact separating the vacuum space of the specific gap. The local vacuum mechanism 5 is constituted of a curved surface 15 recessed in the surface of a block body 22 to oppose an external plane of the particular semiconductor 3, an electron beam path perforated in the block body 22 to open to the curved surface 15, an exhaust port 19 provided in the curved surface 15 in its circumferential direction about the electron beam path, and an admission port 21 provided outside the exhaust port 19 in its circumferential direction about the electron beam path. COPYRIGHT: (C)2004,JPO&NCIPI

6. 发明专利

JP2006003148A Detection part with channel part communicating with reservoir part, and substrate for bioassay 审中-公开
标题翻译：检测部分与通道部分与储存部分通信，生物传播基础
公开(公告)号：JP2006003148A
公开(公告)日：2006-01-05
申请号：JP2004178104
申请日：2004-06-16
申请人： Sony Corp , ソニー株式会社
发明人： TAKEDA MINORU , FURUKI MOTOHIRO , DATE TATSUMI , AKI YUICHI , TAKASHIMIZU TORU , MAMINE TAKAYOSHI
IPC分类号： G01N33/53 , C12M1/00 , C12M1/34 , C12N15/09 , G01N37/00
摘要： PROBLEM TO BE SOLVED: To speed up interaction in a channel part that is a field of the interaction between substances. SOLUTION: This detection part has: a reservoir part R storing or holding a medium M; the channel part C that is the field between the substances progressing inside the medium sent from the reservoir part R, communicating with the reservoir part R; an outside air communication part A communicating with the channel part C; and counter electrodes E 1 -E 2 oppositely disposed such that the counter electrodes E 1 -E 2 face the channel part C, capable of applying an electric field to the medium M inside the channel part C. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：加速作为物质之间相互作用领域的通道部分的相互作用。
解决方案：该检测部具有：存储或保持介质M的储存部R; 通道部分C是从与储存部分R连通的从储存器部分R发送的介质内的物质之间的场; 与通道部C连通的外部空气连通部A; 和相对设置的相对电极E -E 2 使得相对电极E -E 2 面向通道部分C，能够向通道部分C内部的介质M施加电场。C.版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2005174972A Laser cvd device 有权
标题翻译：激光CVD装置
公开(公告)号：JP2005174972A
公开(公告)日：2005-06-30
申请号：JP2003408540
申请日：2003-12-08
申请人： Sony Corp , ソニー株式会社
发明人： NADA NAOJI , KAWABE HIDEO , AKI YUICHI , MIURA YOSHIHISA
IPC分类号： C23C16/48 , H01L21/285 , H01L21/3205
摘要： PROBLEM TO BE SOLVED: To provide a laser CVD device widening the range of the quantity of a partial film forming section floated.
SOLUTION: A TFT substrate 10 is irradiated through a window 41 for the partial film forming section 40 by laser beams LB from a laser beam source 30, and supplied with a raw material gas G1 for forming a film. The partial film forming section 40 is floated to the TFT substrate 10 by a gas G2 for a floating blown off from a first ventilator 61 for a first floating mechanism 60 or a second ventilator 71 for a second floating mechanism 70. The flow rates of the gas G2 for the floating passed through the first ventilator 61 and the second ventilator 71 are adjusted by making the void ratio of a porous material, which constitutes these ventilator 61 and 71, differ in the first floating mechanism 60 and the second floating mechanism 70, which floats the partial film forming section 40 within a range of different floating quantities D. The floating quantity D of the partial film forming section 40 is changed largely by changing over the mechanisms 60 and 70.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供激光CVD装置，其扩大漂浮的部分成膜部分的量的范围。解决方案：通过来自激光束源30的激光束LB通过用于部分成膜部分40的窗口41照射TFT基板10，并且提供有用于形成膜的原料气体G1。部分成膜部40通过用于第一浮动机构60的第一通气机61或第二浮动机构70的第二通风机71的用于浮起的浮动气体G2浮起到TFT基板10。通过使构成这些通风机61和71的多孔材料的空隙率在第一浮动机构60和第二浮动机构70中不同而调节通过第一通风机61和第二通风机71的浮动气体G2，其在不同浮动量D的范围内漂浮部分成膜部分40.部分成膜部分40的浮动量D通过改变机构60和70而大大改变。版权所有（C）2005， JPO＆NCIPI

8. 发明专利

JP2005171272A Laser cvd apparatus 审中-公开
标题翻译：激光CVD装置
公开(公告)号：JP2005171272A
公开(公告)日：2005-06-30
申请号：JP2003408539
申请日：2003-12-08
申请人： Sony Corp , ソニー株式会社
发明人： KAWABE HIDEO , NADA NAOJI , AKI YUICHI , MIURA YOSHIHISA
IPC分类号： C23C16/48
摘要： PROBLEM TO BE SOLVED: To provide a laser CVD apparatus for forming a good-quality film on a substrate by preventing the variation of the distance between a local film-forming part and a substrate.
SOLUTION: This laser CVD apparatus comprises a mounting table 20 for supporting a TFT substrate 10; a laser source 30 for emitting a laser beam LB so as to irradiate the TFT substrate 10 through the aperture 41 of a local film-forming part 40; a source gas outlet 53 for sucking and exhausting a source gas G1 which is used for forming a film, and is supplied toward a position to be irradiated with the laser beam LB; a levitating mechanism 60 for levitating the local film-forming part 40 with respect to the TFT substrate 10, by spouting a levitating gas G2 toward the TFT substrate 10 from a spouting part 61; and the outlet 62 for sucking the levitating gas G2. Thereby, the apparatus levitates the local film-forming part 40 by a levitation height D in response to a camber or the variation in a thickness of the TFT substrate 10, and prevents the distance between the TFT substrate 10 and the local film-formed part 40 from varying.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于通过防止局部膜形成部分和基底之间的距离的变化来在基板上形成优质膜的激光CVD装置。解决方案：该激光CVD装置包括用于支撑TFT基板10的安装台20; 用于发射激光束LB以便通过局部成膜部分40的孔41照射TFT基板10的激光源30; 源气体出口53，用于吸取和排出用于形成膜的源气体G1，并被供给到被照射激光束LB的位置; 悬浮机构60，用于通过从喷射部61向玻璃基板10喷射悬浮气体G2，使局部成膜部40相对于TFT基板10悬浮; 和用于吸入浮选气体G2的出口62。因此，该装置通过悬浮高度D响应于外倾或TFT基板10的厚度的变化而悬浮局部成膜部40，并且防止TFT基板10与局部膜形成部分之间的距离 40从不同的。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2004327303A Electrode ring and electron microscope equipped with same 有权
公开(公告)号：JP2004327303A
公开(公告)日：2004-11-18
申请号：JP2003122038
申请日：2003-04-25
申请人： Sony Corp , ソニー株式会社
发明人： OKAWACHI HIROKI , MUTO KOICHI , TAKAYAMA MASATO , AKI YUICHI , TAKEDA MINORU
IPC分类号： H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an electrode ring in which the extraction efficiency of secondary electrons emitted from a test piece is improved, and provide an electron microscope having the same.
SOLUTION: The electrode ring 1 is constructed of an insulating tube 2 having a hollow part 6, an electrode membrane 3 for voltage impression which is formed on the end face opposed to the test piece with a fine gap and has an equal potential to the test piece, a grounding electrode membrane 4 which is formed and grounded on the other end face, and a resistance membrane 11 which is formed on the inner face of the hollow part 6 and connects between the electrode membrane 3 for voltage impression and the grounding electrode membrane 4.
COPYRIGHT: (C)2005,JPO&NCIPI

10. 发明专利

JP2004279163A Substrate inspection device and its substrate inspection method 审中-公开
公开(公告)号：JP2004279163A
公开(公告)日：2004-10-07
申请号：JP2003069656
申请日：2003-03-14
申请人： Sony Corp , ソニー株式会社
发明人： MUTO KOICHI , AKI YUICHI
IPC分类号： G01N23/225 , H01J37/18 , H01J37/28 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To obtain a substrate inspection device for extremely inexpensively inspecting the pass/fail of a substrate to be inspected by using a local vacuum technique, and to provide its substrate inspection method. SOLUTION: In the substrate inspection device 10A, a local vacuum chamber section 50 is mounted in the lower portion of a main chamber section 30, a slit-like opening 51 is provided at the center of an elliptic disk body 52, a differential vacuum means 53 is provided at the periphery, further a static pressure floating means 60 is provided at the periphery, air is jetted to the surface of a substrate electrode P to be inspected in the atmosphere from the static pressure floating means 60, the local vacuum chamber section 50 is slightly floated, air is sucked from the differential vacuum means 53 and the opening 51, and the inside of the main chamber section 30 and the local vacuum chamber section 50 is maintained at a high vacuum. COPYRIGHT: (C)2005,JPO&NCIPI

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