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1. 发明专利

JPS6178801A Production of substituted silylpropyl group-containing cellulose derivative 失效
标题翻译：取代的含硅烷基的含有纤维素衍生物的生产
公开(公告)号：JPS6178801A
公开(公告)日：1986-04-22
申请号：JP20010084
申请日：1984-09-25
申请人： Shin Etsu Chem Co Ltd
发明人： TAKAMIZAWA MINORU , CHIBA TORU , YAMAMOTO AKIRA , MARUYAMA KAZUMASA , NAGURA SHIGEHIRO
IPC分类号： C08B15/05 , C09D101/08 , C09J101/00
摘要： PURPOSE: To obtain a cellulose derivative having a film-forming property, toughness, gas permeability and excellent electrical properties, by effecting an addition reaction between an alkylcellulose derivative and a specified organosilicon compound.
CONSTITUTION: A substituted silylpropyl group-containing cellulose derivative of formula II is obtained by effecting an addition reaction between an alkylcellulose derivative of formula I and an organosilicon compound having at least one ≡ SiH bond in the molecule. In formula I, Cell is a residue of cellulose or its derivative. In formula II, R
1 , R
2 and R
3 are each a 1W8C monovalent hydrocarbon, 1W8C monovalent halohydrocarbon, 1W4C alkoxy or organosiloxy group, including the case where two of R
1 WR
3 may be combined to form a cyclic organosiloxy group. In the above reaction, the purpose compound can be obtained quantitatively by adding chloroplatinic acid, rhodium catalyst or the like to the reaction system as a catalyst for promoting the reaction and adding an organosilicon compound thereto while heating the mixture to 40°C or higher.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：通过在烷基纤维素衍生物和规定的有机硅化合物之间进行加成反应，得到具有成膜性，韧性，透气性和优异的电性能的纤维素衍生物。构成：通过在分子中实现式I的烷基纤维素衍生物与具有至少一个相同SiH键的有机硅化合物之间的加成反应，得到式II的取代的含甲硅烷基丙基的纤维素衍生物。在式I中，Cell是纤维素或其衍生物的残基。在式II中，R 1，R 2和R 3各自为1-8价单价烃，1-8C一价卤代烃，1-4C烷氧基或有机甲硅烷氧基，包括R 1， > -R 3可以结合形成环状有机基甲硅烷氧基。在上述反应中，通过向反应体系中加入氯铂酸，铑催化剂等作为促进反应的催化剂并加入有机硅化合物，同时将混合物加热至40℃或更高，可定量获得目标化合物。

2. 发明专利

JPS5947424A Manufacture of carbon-silicon carbide composite fiber 失效
标题翻译：碳化硅复合纤维的制造
公开(公告)号：JPS5947424A
公开(公告)日：1984-03-17
申请号：JP15705982
申请日：1982-09-09
申请人： Shin Etsu Chem Co Ltd
发明人： ENDOU MORINOBU , TAKAMIZAWA MINORU , MOTOMIYA TATSUHIKO , KOBAYASHI YASUSHI
IPC分类号： D01F8/18 , D01F9/10
摘要： PURPOSE: To obtain the titled fiber having excellent high-temperature oxidation resistance, at a low cost, by the vapor-phase thermal decomposition of a hydrocarbon compound and a specific silicon compound in a hot reaction zone containing fine particles of a metal (compound) as a seed catalyst.
CONSTITUTION: The objective fiber can be manufactured by the vapor-phase thermal decomposition of (A) a hydrocarbon compound such as methane and (B) an organosilicon compound free from SiX bond (X is halogen or O) in the molecule, in a hot reaction zone containing fine particle of a metal such as Cu, Ag, etc. or its compound as a seed catalyst. The component (A) is preferably a saturated or unsaturated hydrocarbon compound having a boiling point of ≤250°C, and the component (B) is preferably a compound having one or more Si-H bonds in the molecule.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了获得具有优异的高温抗氧化性的标题纤维，以低成本，通过在含有金属（化合物）的微粒的热反应区中的烃化合物和特定的硅化合物的气相热分解，作为种子催化剂。构成：目标纤维可以通过（A）烃化合物如甲烷和（B）在分子中不含SiX键（X是卤素或O）的有机硅化合物的气相热分解制备，在热的反应区含有金属如Cu，Ag等微粒或其化合物作为种子催化剂。组分（A）优选是沸点<= 250℃的饱和或不饱和烃化合物，组分（B）优选是分子中具有一个或多个Si-H键的化合物。

3. 发明专利

JPS5735526A Preparation of organopolysiloxane 失效
标题翻译：有机硅氧烷的制备
公开(公告)号：JPS5735526A
公开(公告)日：1982-02-26
申请号：JP11148580
申请日：1980-08-13
申请人： Shin Etsu Chem Co Ltd
发明人： TAKAMIZAWA MINORU , INOUE KACHIO , ICHINOHE SEIJI
IPC分类号： C07F7/08 , C07C7/08 , C07F7/18
摘要： PURPOSE: To obtain the titled substance with its terminal groups blocked with trimethylsilyl groups in high purity, in high yield, and at low cost, by subjecting a trimethylsilanol- or OH-containing organopolysiloxane and a Cl-containing organic silicon compound to a reaction through removal of hydrochloric acid.
CONSTITUTION: A compound shown by the formula I (R is hydrocarbon group; l is positive integer ≤4) synthesized from trimethylsilanol or trimethylsilanol and organodichlorosilane as starting mterials and a compound shown by the formula II (where c is 1, a=b=3, m=1W4; when c is 2, a=b=1, m=0) are subjected to a reaction through removal of hydrochloric acid, to give a compound shown by the formula III (n is positive integer of 1W9). The reaction is carried out at -50W 120°C, a trapping agent (e.g., triethylamine) for hydrochloric acid, organic solvent, etc. may be used.
USE: Lubricant, antifoaming agent, parting agent, additive for coating compound, and polish.
COPYRIGHT: (C)1982,JPO&Japio
摘要翻译：目的：通过使三甲基硅烷醇或含OH的有机聚硅氧烷和含Cl的有机硅化合物进行反应，得到其端基以高纯度，高产率和低成本的三甲基甲硅烷基封端的标题物质去除盐酸。构成：由三甲基硅烷醇或三甲基硅烷醇和有机二氯硅烷作为起始原料合成的由式I表示的化合物（R为烃基; l为正整数，= 4）和式II所示的化合物（其中c为1，a = b = 3，m = 1-4;当c为2时，a = b = 1，m = 0）通过除去盐酸进行反应，得到式III所示的化合物（n为正整数 1-9）。反应在-50〜120℃进行，可以使用盐酸的捕获剂（例如三乙胺），有机溶剂等。用途：润滑剂，消泡剂，脱模剂，涂料添加剂和抛光剂。

4. 发明专利

JPS5734559A Lithographic plate and its manufacture 失效
标题翻译：平板及其制造
公开(公告)号：JPS5734559A
公开(公告)日：1982-02-24
申请号：JP11004880
申请日：1980-08-11
申请人： Dainippon Printing Co Ltd , Shin Etsu Chem Co Ltd
发明人： AKATA MASANORI , TAKEMATSU HIDEKI , TAKAMIZAWA MINORU , INOUE KACHIO
IPC分类号： G03F7/09 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/075
CPC分类号： G03F7/0752 , B41C2210/16
摘要： PURPOSE:To obtain a waterless lithographic plate with superior printing resistance by laying a cured organopolysiloxane film layer on a substrate, adding a metal to the film patternwise, and forming a resin layer having an affinity for ink on the metal-contg. film to give a printing area. CONSTITUTION:A cured organopolysiloxane film layer 2 is laid on a support 1 such as an Al plate, and on the layer 2 a protective layer 3 such as a photosensitive resin layer is formed patternwise. After subjecting the layer 3 to plasma, corona or flame treatment to enhance the suitability to the application of a metal-contg. compound in the next process, a soln. of the compound such as Cu or Zn (complex) salt of ionrg. or org. acid is applied to the layer 3 and heat treated to form a metal- contg. cured organopolysiloxane film 2'. A resin layer 4 having an affinity for ink, e.g. a layer of a thermosetting resin such as epoxy resin or a thermoplastic resin such as a methacrylate polymer is then formed on the whole surface of the layers 2, 2', 3, and the layer 3 and the layer 4 part on the layer 3 are removed to form a printing area 4 and a nonprinting area 2.
摘要翻译：目的：通过在基材上铺设固化的有机聚硅氧烷薄膜层来获得具有优异耐印刷性的无水平版印刷板，以图案方式向薄膜中加入金属，并在金属层上形成对墨水具有亲和性的树脂层。电影给打印区域。构成：将固化的有机聚硅氧烷膜层2放置在诸如Al板的载体1上，在层2上形成图案形式的保护层3，例如感光性树脂层。在对层3进行等离子体，电晕或火焰处理以增强适用于金属接合之后。复合在下一个过程中，一个soln。的化合物如离子的Cu或Zn（络合物）盐。或组织。将酸施加到层3上并进行热处理以形成金属层。固化的有机聚硅氧烷膜2'。对油墨具有亲和性的树脂层4，例如然后在层2,2'，3的整个表面上形成诸如环氧树脂或热塑性树脂如甲基丙烯酸酯聚合物的热固性树脂层，并且层3上的层3和层4的部分是去除以形成打印区域4和非打印区域2。

5. 发明专利

JPS5724945A Lithographic printing plate and its preparation 失效
标题翻译：立体印刷板及其制备
公开(公告)号：JPS5724945A
公开(公告)日：1982-02-09
申请号：JP9959780
申请日：1980-07-21
申请人： Dainippon Printing Co Ltd , Shin Etsu Chem Co Ltd
发明人： AKATA MASANORI , TAKEMATSU HIDEKI , TAKAMIZAWA MINORU , INOUE KACHIO
IPC分类号： G03F7/09 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/075
CPC分类号： G03F7/0752
摘要： PURPOSE:To obtain a lithographic printing plate having high resolution and printing resistance, and not requiring dampening water, by using an organopolysiloxane hardenable film layer as a nonimage line region and an organopolysiloxane hardenable film layer treated with a metal-containing compound as an image line region. CONSTITUTION:A 2-50mum thick organopolysiloxane film layer 2 is formed on one side of a base 1. A protective layer 3 of a photosensitive resin layer is patternwise formed on the layer 2. A solution containing a metal-containing compound is coated on the layer and subjected to heat treatment after drying, resulting in reacting the organopolysiloxane hardenable film layer in the part not covered with the protective layer 3 with the metal-containing compound to produce the metal-containing organopolysiloxane hardenable layer 2'. Then, the protective layer 3 is removed. Prior to coating the metal-compound-containing solution, plasma treatment, corona treatment, or the like is carried out on the nonprotected part of the hardenable layer as a pretreatment for enhancing its coating property.
摘要翻译：目的：通过使用有机聚硅氧烷可硬化膜层作为非图像线区域和用含金属的化合物作为图像线处理的有机聚硅氧烷可硬化膜层，获得具有高分辨率和耐印刷性，并且不需要润版水的平版印刷版地区。构成：在基体1的一侧上形成2-50μm厚的有机聚硅氧烷膜层2.感光性树脂层的保护层3以图案形成在层2上。含有含金属的化合物的溶液被涂布在并在干燥后进行热处理，使得未被保护层3覆盖的部分中的有机聚硅氧烷可硬化膜层与含金属的化合物反应，生成含金属的有机聚硅氧烷可硬化层2'。然后，去除保护层3。在涂覆含金属化合物的溶液之前，在可硬化层的未保护部分上进行等离子体处理，电晕处理等作为用于提高其涂覆性能的预处理。

6. 发明专利

JPS6178402A Separation of organic liquid mixture 失效
标题翻译：有机液体混合物的分离
公开(公告)号：JPS6178402A
公开(公告)日：1986-04-22
申请号：JP19837384
申请日：1984-09-21
申请人： Shin Etsu Chem Co Ltd
发明人： NAGURA SHIGEHIRO , TAKAMIZAWA MINORU , YAMAMOTO AKIRA
IPC分类号： B01D61/36 , B01D71/44 , D01F6/00 , D01F6/26
CPC分类号： B01D61/362 , B01D63/02 , B01D71/44
摘要： PURPOSE: To stably separate an org. liquid mixture for a long period of time by a mambrane having high strength and high permeability, in a pervaporation method, by using a polymer membrane comprising a polymer containing a silyl group represented by a specific formula.
CONSTITUTION: One or more of a silicon atom-containing substituted acetylene compound such as 1-methyl-2-(1',1',3',3'-tetramethyl-1',3'-disilane-butyl)-a-cetylene is polymerized in an org. solvent such as toluene in the presence of a polymerization catalyst such as TaCl
5 to prepare a silyl group-containing polymer having one or more of a constitutional unit represented by formula 1 (wherein R
1 is a hydrogen atom or a lower alkyl group and R
2 , R
3 and R
4 are independently an atom or group selected from a hydrogen atom, an 1W8C monovalent hydrocarbon group or a silicon atom-containing monovalent org. group). A polymer solution, which prepared by dissolving said polymer or a polymer mixture of said polymer and polytrimethylsilane in a solvent such as toluene, is molded by a casting film-forming method to obtain a polymer membrane. A water/ ethanol liquid mixture is separated by pervaporation using this membrane.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：稳定分离组织。通过使用包含含有由特定式表示的甲硅烷基的聚合物的聚合物膜，通过渗透蒸发法，通过具有高强度和高渗透性的马氏体，长时间地混合液体混合物。构成：一个或多个含硅原子的取代的乙炔化合物如1-甲基-2-（1'，1'，3'，3'-四甲基-1'，3'-乙硅烷基 - 丁基）-α- 亚乙基在组织中聚合。溶剂如甲苯在诸如TaCl 5的聚合催化剂存在下反应，制备具有一个或多个由式1表示的结构单元的甲硅烷基的聚合物（其中R 1是氢原子或低级烷基，和 R 2，R 3和R 4独立地是选自氢原子，1-8C单价烃基或含硅原子的一价基团的原子或基团）。通过将所述聚合物或所述聚合物和聚三甲基硅烷的聚合物混合物溶解在溶剂如甲苯中制备的聚合物溶液通过流延膜形成方法成型，以获得聚合物膜。使用该膜通过渗透蒸发分离水/乙醇液体混合物。

7. 发明专利

JPS6135803A Composite hollow yarn 失效
标题翻译：复合中空纱
公开(公告)号：JPS6135803A
公开(公告)日：1986-02-20
申请号：JP15596884
申请日：1984-07-26
申请人： Shin Etsu Chem Co Ltd
发明人： TAKAMIZAWA MINORU , YAMAMOTO AKIRA , NAGURA SHIGEHIRO
IPC分类号： B01D53/22 , B01D69/08 , B01D69/12 , B01D71/44 , D01F6/00 , D01F6/26
CPC分类号： B01D69/08 , B01D69/12 , B01D71/44 , Y10T428/2935 , Y10T428/2962 , Y10T428/2965 , Y10T428/2967 , Y10T428/2969 , Y10T428/2975
摘要： PURPOSE:To provide a composite hollow yarn having high heat resistance, humidity resistance and mechanical strength, excellent in lightfastness and useful as a gas separation membrane, by coating a porous hollow yarn base material with a silicon-containing substituted polyacetylene compound. CONSTITUTION:A silicon-containing substituted acetylene compound being a monomer such as methyltrisilylacetylene is polymerized in the presence of a polymerization catalyst such as TaCl5 in a solvent such as toluene to form a polymer which is, in turn, precipitated by methanol to be recovered in a purified state. A porous hollow yarn base material comprising polysulfone is immersed in a solution of thus obtained polymer having a structural unit, which is represented by formula (wherein R is a hydrogen atom or a lower alkyl group such as a methyl group, an ethyl group, a propyl group or butyl group and R , R and R may be same or different and a hydrogen or an 1-8C monovalent hydrocarbon group), in a solvent such as pentane and dried to obtain a composite hollow yarn having a coating film. If a composition consisting of the silicon-containing substituted polyacetylene compound represented by the formula and a polytrimethylvinylsilane compound with a wt. average MW of 1X10 or more is used as a coating layer, composite hollow yarn improved in light resistance is obtained.
摘要翻译：目的：通过用含硅取代的聚乙炔化合物涂覆多孔中空丝基材，提供耐热性，耐湿性和机械强度高，耐光性优异，作为气体分离膜有用的复合中空丝。构成：在诸如甲基三甲苯基乙炔的单体中的含硅取代的乙炔化合物在诸如TaCl 5的聚合催化剂存在下在溶剂如甲苯中聚合，形成聚合物，然后由甲醇沉淀以回收纯化状态。将包含聚砜的多孔中空丝基材浸渍在由此得到的具有结构单元的聚合物的溶液中，所述结构单元由式（其中R 1是氢原子或低级烷基如甲基，乙基基团，丙基或丁基，R 2，R 3和R 4可以相同或不同，氢或1-8C单价烃基）在溶剂如戊烷中干燥至得到具有涂膜的复合中空丝。如果由下式表示的含硅取代的聚乙炔化合物和重量比的聚三甲基乙烯基硅烷化合物组成的组合物，使用1×10 5以上的平均MW为涂层，得到耐光性提高的复合中空丝。

8. 发明专利

JPS59165468A Manufacture of window frame material for solar battery 失效
标题翻译：用于太阳能电池的窗框材料的制造
公开(公告)号：JPS59165468A
公开(公告)日：1984-09-18
申请号：JP3947183
申请日：1983-03-10
申请人： Shin Etsu Chem Co Ltd
发明人： TAKAMIZAWA MINORU , KOBAYASHI YASUSHI , HAYASHIDA AKIRA , SHIMIZU TAKAAKI
IPC分类号： H01L31/04 , H01L31/20
CPC分类号： H01L31/204 , Y02E10/50 , Y02P70/521
摘要： PURPOSE:To obtain a high quality amorphous SiXC1-X film by using an amorphous carbided silicon represented by a formula SiXC1-X obtained by a plasma CVD method of organic silicon compound having identicalSiH bond in a molecule for at least one of a P type layer and an N type layer of an amorphous silicon photoelectric element. CONSTITUTION:A transparent electrode 2 such as SnO2 is bonded onto a substrate substance (glass plate or the like) 1, an amorphous carbided silicon layer 5 represented by a formula SiXC1-X of P type or N type is deposited by a plasma vapor phase depositing method in the necessary thickness on an organic silicon compound having at least one identicalSiH bond in a molecule and the prescribed doping material, an amorphous silicon layer 4 and further an amorphous silicon layer 5 having a doping material as N type or P type layer or an amorphous SiXC1-X layer are further provided by a plasma vapor phase depositing method thereon, and aluminum electrodes 6 are eventually ohmically contacted to manufacture a photoelectric element. The value of (x) in the above formula is 0.2-0.8, and preferably 0.3-0.7.
摘要翻译：目的：通过使用由分子中具有相同SiH键的有机硅化合物通过等离子体CVD法获得的由式SiXC1-X表示的非晶碳化硅，以获得高质量的非晶SiXC1-X膜，用于P型层和非晶硅光电元件的N型层。构成：将诸如SnO 2的透明电极2结合到基板物质（玻璃板等）1上，通过等离子体气相沉积由P型或N型的式SiXC1-X表示的非晶碳化硅层5 在分子中具有至少一个相同的SiH键的有机硅化合物和规定的掺杂材料，非晶硅层4和另外具有掺杂材料的非晶硅层5作为N型或P型层或者通过其上的等离子体气相沉积方法进一步提供非晶SiXC1-X层，并且铝电极6最终被欧姆接触以制造光电元件。上述式中（x）的值为0.2〜0.8，优选为0.3〜0.7。

9. 发明专利

JPS5939708A Manufacture of fine silicon carbide powder 失效
标题翻译：精细碳化硅粉末的制造
公开(公告)号：JPS5939708A
公开(公告)日：1984-03-05
申请号：JP14734282
申请日：1982-08-25
申请人： Shin Etsu Chem Co Ltd
发明人： ENDOU MORINOBU , TAKAMIZAWA MINORU , MOTOMIYA TATSUHIKO , KOBAYASHI YASUSHI
IPC分类号： C01B31/36
CPC分类号： C01B32/956 , C01P2002/72 , C01P2002/82 , C01P2004/62 , C01P2006/60
摘要： PURPOSE: To form finely powdered SiC of high purity by thermally decomposing an organosilicon compound having an SiH bond and no SiX (X is halogen or O) bond in a vapor phase.
CONSTITUTION: An organosilicon compound having ≥1 SiH bond and no SiX (X is halogen or O) bond in the molecule such as a compound represented by formula I , II or III is introduced into a reaction zone heated to ≥1,000°C under nearly ordinary pressure, and the compound is thermally decomposed in the zone. At this time, a non-oxidative gas such as H
2 , N
2 , He or Ar is used as a carrier gas for the compound. The desired SiC can be obtd. easily in a high yield.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：通过在气相中热分解具有SiH键和SiX（X是卤素或O）键的有机硅化合物，形成高纯度的精细粉末状SiC。构成：将分子中具有> = 1个SiH键且没有SiX（X为卤素或O）键的有机硅化合物引入到加热至> = 1000度的反应区域中，例如由式I，II或III表示的化合物。在几乎常压下，化合物在该区域中热分解。此时，使用诸如H 2，N 2，He或Ar的非氧化性气体作为化合物的载气。可以看到所需的SiC。容易高收益。

10. 发明专利

JPS599220A Production of silicon carbide whisker 失效
标题翻译：生产硅碳化钨
公开(公告)号：JPS599220A
公开(公告)日：1984-01-18
申请号：JP11368982
申请日：1982-06-30
申请人： Shin Etsu Chem Co Ltd
发明人： ENDOU MORINOBU , TAKAMIZAWA MINORU , MOTOMIYA TATSUHIKO , KOBAYASHI YASUSHI
IPC分类号： C01B31/36 , C04B35/571 , C30B25/00 , D01F9/10
CPC分类号： D01F9/10 , C04B35/571 , C30B25/005 , C30B29/36
摘要： PURPOSE: The vapor-phase pyrolysis of a specific organosilicon compound in the heated reaction zone in the presence of a seed catalyst of metallic or metal compound fine particles forms long, fiber-like whiskers suitable for use in reinforcement of metallic or resin composite material.
CONSTITUTION: The vapor-phase pyrolysis of an organosilicon compound containing no SiX bonds (X is halogen, oxygen), preferably having one or more H-Si bonds is effected in the heated reaction zone in the presence of a seed catalyst of metallic or metal compound fine particles to produce the objective whiskers mainly consisting of silicon carbide. The above heated reaction zone is preferably set to 700W1,450°C in temperature. The metal is preferably an element of group I b, Va or VIII in the periodic table.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：在金属或金属化合物细颗粒的种子催化剂存在下，加热反应区中特定有机硅化合物的气相热解形成长的纤维状晶须，适用于金属或树脂复合材料的增强。构成：在金属或金属的种子催化剂的存在下，在加热的反应区中进行优选含有一个或多个H-Si键的不含SiX键的有机硅化合物（X为卤素，氧）的气相热解复合细颗粒以产生主要由碳化硅组成的客观晶须。上述加热的反应区优选设定为700-1,450摄氏度的温度。该金属优选为元素周期表中I b，Va或VIII族的元素。

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