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1. 发明专利

JP2009076917A Particle discharging unit and substrate transfer equipment including the same 有权
标题翻译：颗粒排放单元和基板传送设备，包括它们
公开(公告)号：JP2009076917A
公开(公告)日：2009-04-09
申请号：JP2008241477
申请日：2008-09-19
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： AHN YOUNG-KI , JEONG JAE-JEONG , SUNG BO-RAM-CHAN , KOO KYO-WOOG
IPC分类号： H01L21/677
CPC分类号： B08B5/00 , H01L21/67017
摘要： PROBLEM TO BE SOLVED: To provide a unit to discharge particles and substrate transfer equipment that includes the unit.
SOLUTION: A barrier is provided in the vertical direction within a housing to divide the internal space of the housing into a first space and a second space. A pressure-generating member divides the first space into an upper space and a lower space, wherein it moves vertically in the first space so that a positive pressure and a negative pressure are generated alternately in the upper and lower spaces. A substrate support member is arranged movable in the second space supports and transfers a substrate. A plurality of gates are provided on the sidewall and barrier of the housing, and they are opened/closed by the positive pressure and negative pressure for discharging particles to the external space from the second pace via the first space.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于排放包括该单元的颗粒和基板输送设备的单元。解决方案：在壳体内沿垂直方向设置屏障，以将壳体的内部空间分成第一空间和第二空间。压力产生部件将第一空间分成上部空间和下部空间，其中其在第一空间中垂直移动，使得在上部空间和下部空间中交替地产生正压力和负压。衬底支撑构件被布置成可在第二空间支撑件中移动并且传送衬底。多个门设置在壳体的侧壁和屏障上，并且它们通过正压和负压打开/关闭，用于经由第一空间从第二步骤将颗粒排放到外部空间。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2007189232A Substrate processing apparatus 有权
标题翻译：基板加工设备
公开(公告)号：JP2007189232A
公开(公告)日：2007-07-26
申请号：JP2007004777
申请日：2007-01-12
申请人： Semes Co Ltd , セメス株式会社
发明人： KOO KYO-WOOG , KIM JEONG-MIN
IPC分类号： H01L21/306 , G03F7/30 , H01L21/304
CPC分类号： H01L21/67051 , H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for performing processes using a plurality of process liquids in sequence.
SOLUTION: The apparatus is equipped with a process liquid recovering container for recovering process liquids. It also comprises an exhaust member for separating and exhausting the contamination gas generated as processes advance.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种依次使用多种处理液进行处理的装置。解决方案：该装置装备有用于回收工艺液体的工艺液回收容器。它还包括用于分离和排出随着过程进行而产生的污染气体的排气构件。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2008072118A Substrate drying apparatus using supercritical fluid, substrate treatment apparatus provided with the same, and substrate treatment method 有权
标题翻译：使用超临界流体的基板干燥装置，与其同时提供的基板处理装置和基板处理方法
公开(公告)号：JP2008072118A
公开(公告)日：2008-03-27
申请号：JP2007236255
申请日：2007-09-12
申请人： Semes Co Ltd , セメス株式会社
发明人： CHO CHUNG-KUN , KOO KYO-WOOG
IPC分类号： H01L21/304 , F26B3/04
CPC分类号： H01L21/67034
摘要： PROBLEM TO BE SOLVED: To provide a substrate drying apparatus capable of effectively carrying out the drying treatment of a substrate without generating any watermark, and achieving stable operation and improvement in production efficiency and an yield, and to provide a substrate treatment apparatus provided with the same and a substrate treatment method. SOLUTION: The substrate drying apparatus includes a chamber, a treatment room which constitutes a part of the chamber and in which a substrate is dried by supplying a supercritical fluid to the substrate, and a high-pressure room which constitutes the other part of the chamber, and pressurizes the treatment room to the critical pressure of the supercritical fluid or higher. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够有效地进行基板的干燥处理而不产生任何水印的基板干燥装置，并且实现稳定的操作和提高生产效率和产量，以及提供基板处理装置提供相同的基板处理方法。解决方案：基板干燥装置包括：室，构成室的一部分的处理室，其中通过向基板供给超临界流体使基板干燥;以及构成另一部分的高压室并且将处理室加压至超临界流体的临界压力或更高。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008060578A Equipment and method for processing substrate 有权
标题翻译：用于处理基板的设备和方法
公开(公告)号：JP2008060578A
公开(公告)日：2008-03-13
申请号：JP2007223636
申请日：2007-08-30
申请人： Semes Co Ltd , セメス株式会社
发明人： KIM HYUN-JONG , KOO KYO-WOOG , CHO CHUNG-KUN
IPC分类号： H01L21/304 , F26B5/04 , F26B5/08 , F26B5/14 , F26B21/14
CPC分类号： H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide substrate processing equipment for cleaning and drying a substrate by supplying a plurality of kinds of chemicals or gases to the substrate.
SOLUTION: The substrate processing equipment comprises a substrate support member, having a chuck for placing a substrate, a lower chamber 120 opening upward and formed to wrap the periphery of the chuck, an upper chamber 130 for opening or closing the upper portion of the lower chamber so that the drying process for the substrate progresses under a state isolated from the outside, and a nozzle member 180 installed in the upper chamber and spraying a fluid directly to the substrate, under a state where the upper chamber is closing the upper portion of the lower chamber. The substrate processing equipment having such an arrangement provides effects such as increase in the drying efficiency of the entire substrate, shielding of external smearing, prevention of oxide film, and the like.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供用于通过向基板供给多种化学物质或气体来清洗和干燥基板的基板处理设备。解决方案：基板处理设备包括具有用于放置基板的卡盘的基板支撑构件，向上开口并形成以包围卡盘的周边的下腔室120，用于打开或关闭上部的上部腔室使得基板的干燥过程在与外部隔离的状态下进行，并且在上部室正在关闭的状态下，安装在上部室中并将流体直接喷射到基板的喷嘴构件180 下室的上部。具有这种布置的基板处理设备提供诸如增加整个基板的干燥效率，屏蔽外部涂抹，防止氧化膜等的效果。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2008135750A Spin head and substrate treating equipment equipped with spin head 审中-公开
标题翻译：旋转头和衬底处理设备配有旋转头
公开(公告)号：JP2008135750A
公开(公告)日：2008-06-12
申请号：JP2007305384
申请日：2007-11-27
申请人： Semes Co Ltd , セメス株式会社
发明人： CHOI JUNG BONG , KOO KYO-WOOG , CHO CHUNG-KUN , CHOI KI HOON , KIM JU-WON
IPC分类号： H01L21/683 , H01L21/304
CPC分类号： H01L21/68728 , H01L21/68742
摘要： PROBLEM TO BE SOLVED: To provide a spin-head which supports and rotates a substrate during processing operations, and also to provide an apparatus which equips the spin-head and performs processing on a substrate. SOLUTION: A spin-head for supporting and rotating a substrate during processing operations, comprises: a rotatable body; a chucking and dechucking means having plural chucking pins, all of which are arranged in a ring-like pattern around the center of the upper surface of the body, and perform chucking or dechucking on parts of the edge of a substrate; and a driving unit which turns the chucking pins at a predetermined angle so that contact points between every chucking pin and the substrate can be selectively changed during processing operations, wherein the driving unit includes an up/down driving unit which is movable up and down, and a motion converting unit which converts the up-and-down motion of the driving unit to the rotating motion of the chucking pins. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在加工操作期间支撑和旋转衬底的旋转头，并且还提供一种装配自旋头并在衬底上进行加工的设备。解决方案：一种用于在加工操作期间支撑和旋转衬底的旋转头，包括：可旋转体; 具有多个夹紧销的夹紧和脱扣装置，其全部以身体的上表面的中心为中心布置成环状图案，并且对基板的边缘部分进行夹紧或脱扣; 以及驱动单元，其以预定角度转动夹紧销，使得可以在处理操作期间选择性地改变每个夹紧销和基板之间的接触点，其中驱动单元包括可上下移动的上/下驱动单元，以及运动转换单元，其将驱动单元的上下运动转换成卡盘销的旋转运动。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2008072115A Chucking member and spin head, and chucking method using the same 有权
标题翻译：切割会员和旋转头，以及使用其的切割方法
公开(公告)号：JP2008072115A
公开(公告)日：2008-03-27
申请号：JP2007235338
申请日：2007-09-11
申请人： Semes Co Ltd , セメス株式会社
发明人： CHO JUNG KEUN , KOO KYO-WOOG , SUNG BO RAM CHAN
IPC分类号： H01L21/683 , B05C11/08 , H01L21/304 , H01L21/306
CPC分类号： B23B31/1269 , B23B2265/12 , H01L21/68728 , Y10T279/18
摘要： PROBLEM TO BE SOLVED: To provide a chucking member which chucks a substrate. SOLUTION: This chucking member is provided with a chuck pin which chucks the side of the substrate, and is decentered from the center of rotation. The chuck pin formed in a streamline shape includes a first front end located at the front end, and a first back end located at the back end to the flow of air stream generated by the rotation of the substrate. The first front end is provided with a first tip portion, and the first back end has a round shape. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种夹持基板的夹紧构件。解决方案：该夹持构件设置有夹持基板侧面并且从旋转中心偏心的卡盘销。形成为流线形状的卡盘销包括位于前端的第一前端和位于后端的第一后端，该第一后端与由基底旋转产生的气流形成。第一前端设置有第一末端部分，第一后端部具有圆形。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2008022010A Substrate treatment device and substrate treatment method 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2008022010A
公开(公告)日：2008-01-31
申请号：JP2007183069
申请日：2007-07-12
申请人： Semes Co Ltd , セメス株式会社
发明人： KOO KYO-WOOG , CHO CHUNG-KUN , SUNG BO RAM CHAN
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , H01L21/67028 , H01L21/67034
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment device that cleans and dries a substrate by supplying a plurality of chemical solutions and gases on the substrate.
SOLUTION: A substrate treatment device 100 is characterized by including a substrate support mechanism 110 having a chuck on which a substrate is placed, a lower chamber 120 the upper part of which is opened and arranged so as to surround the periphery of the chuck, an upper chamber 130 that opens/closes the upper part of the lower chamber 120 so that a drying process of a substrate is advanced in a state of being isolated from outside, and an indirect injection nozzle 140 installed at an edge of the upper chamber 130 and which injects a dry fluid toward the center of the upper chamber so that the dry fluid is indirectly injected to the substrate. A substrate cleaning device with such a configuration is capable of obtaining effects such as increase in the drying efficiency of a substrate, shut-off of outside contamination, prevention of oxide film, etc.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：提供一种通过在基板上供给多种化学溶液和气体来清洗和干燥基板的基板处理装置。解决方案：基板处理装置100的特征在于包括：基板支撑机构110，其具有其上放置有基板的卡盘;下部室120，其上部被打开并且布置成围绕其的周边卡盘，打开/关闭下部室120的上部的上部室130，使得在与外部隔离的状态下进行基板的干燥处理，以及安装在上部的边缘的间接喷嘴140 腔室130，并且将干燥流体朝着上部腔室的中心喷射，使得干燥的流体被间接地注入基底。具有这种结构的基板清洁装置能够获得诸如提高基板的干燥效率，切断外部污染物，防止氧化膜等的效果。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007335868A Substrate processing device and substrate processing method 审中-公开
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2007335868A
公开(公告)日：2007-12-27
申请号：JP2007153919
申请日：2007-06-11
申请人： Semes Co Ltd , セメス株式会社
发明人： PARK KEUN YOUNG , KOO KYO-WOOG
IPC分类号： H01L21/304 , F26B5/04 , F26B5/08 , F26B9/06 , F26B11/08 , F26B21/14
CPC分类号： H01L21/67748 , B08B3/02 , H01L21/67034 , H01L21/67751
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing device for cleaning and drying a substrate by supplying a plurality of chemical liquids or gases on the substrate. SOLUTION: The substrate processing device includes a substrate support mechanism having a chuck on which a substrate is placed, a first nozzle unit that ejects a fluid for drying onto the top surface of the substrate, a lower cover the top part of which is opened and which has a shape that surrounds the periphery of the chuck, and an upper cover that opens/closes the top part of the lower cover so that the drying process of the substrate is carried out, in a state of being isolated from outside. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于通过在基板上供应多种化学液体或气体来清洁和干燥基板的基板处理装置。解决方案：基板处理装置包括具有卡盘的基板支撑机构，基板被放置在基板上，第一喷嘴单元，其将用于干燥的流体喷射到基板的顶表面上;下盖，其顶部的顶部被打开并且具有围绕卡盘周边的形状，以及上盖，其在与外部隔离的状态下打开/关闭下盖的顶部，从而进行基板的干燥处理。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2006332642A Substrate cleaning/drying apparatus and method 有权
标题翻译：基板清洁/干燥装置和方法
公开(公告)号：JP2006332642A
公开(公告)日：2006-12-07
申请号：JP2006129659
申请日：2006-05-08
申请人： Semes Co Ltd , セメス株式会社
发明人： CHO CHUNG-KUN , YOON CHANG-RO , KOO KYO-WOOG
IPC分类号： H01L21/304
CPC分类号： H01L21/67028
摘要： PROBLEM TO BE SOLVED: To provide a cleaning/drying apparatus and method of depositing a substrate such as a semiconductor wafer and a glass substrate for LCD in a cleaning fluid such as a chemical solution and a rinsing fluid to clean it, and then drying it.
SOLUTION: A cleaning/drying apparatus of the present invention has: a cleaning chamber storing a cleaning fluid and discharging the cleaning fluid from the lower part at the same time; and a process chamber including a drying chamber arranged at the upper part of the cleaning chamber. The inside of this process chamber can possess an exhausting part of forcibly exhausting the gas provided inside the drying chamber. The exhausting part is arranged between the cleaning chamber and the drying chamber to forcibly exhaust the gas in such a manner that the air current in the drying chamber flows from the top to the bottom. The substrate cleaning/drying apparatus with such constitution supplies a drying gas from the upper part of the drying chamber to forcibly exhaust the gas from the lower part of the substrate, and vertical air current is formed inside the drying chamber. Thereby, this apparatus has an advantage of not only forming uniform laminar flow over the surface of the substrate but also enhancing drying efficiency by permitting quick exhaust.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种清洗/干燥装置和方法，用于将诸如半导体晶片和LCD的玻璃基板的基板沉积在诸如化学溶液和冲洗流体的清洁流体中以将其清洁，以及然后干燥。解决方案：本发明的清洗/干燥装置具有：清洗室，储存清洗液并同时从下部排出清洗液; 以及处理室，其包括布置在清洁室的上部的干燥室。该处理室的内部可以具有强制排出设置在干燥室内部的气体的排气部分。排气部分设置在清洁室和干燥室之间，以使得干燥室中的气流从顶部流到底部强制排出气体。具有这种结构的基板清洗/干燥装置从干燥室的上部供给干燥气体，以强制地从基板的下部排出气体，并且在干燥室内形成垂直气流。因此，该装置不仅在基板的表面上形成均匀的层流，而且通过允许快速排气来提高干燥效率。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2009094521A Chemical liquid supply device 有权
标题翻译：化学液体供应装置
公开(公告)号：JP2009094521A
公开(公告)日：2009-04-30
申请号：JP2008263656
申请日：2008-10-10
申请人： Semes Co Ltd , 株式会社細美事
发明人： KIM SI-EUN , KOO KYO-WOOG , PARK KEUN-YOUNG
IPC分类号： H01L21/304
CPC分类号： H01L21/6708
摘要： PROBLEM TO BE SOLVED: To provide a chemical liquid supply device with increased process efficiency by reducing waiting time for changing a nozzle, and can supply a plurality of chemical liquid simultaneously.
SOLUTION: The chemical liquid supply device has a nozzle cover 12 for containing a plurality of nozzles 110a, 110b, and 110c which are respectively movable to and fro. The nozzle cover has an open side so that nozzles are free to enter or out, while the chemical liquid supply device has a nozzle operation member 130 for actuating nozzles to and fro.
COPYRIGHT: (C)2009,JPO&INPIT

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