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1. 发明专利

JP2006043698A Method and system for fabricating filter structure 审中-公开
标题翻译：制造滤波器结构的方法和系统
公开(公告)号：JP2006043698A
公开(公告)日：2006-02-16
申请号：JP2005207472
申请日：2005-07-15
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： CHO CHANG-MIN , HWANG JUNG-SUNG , HAM DONG-SEOK , KIM HA-NA
IPC分类号： B01D39/00 , B01D39/14 , B01D39/16 , B01D39/20
CPC分类号： B01D39/083 , B01D39/086 , B01D39/12 , B01D2239/0407 , B01D2239/0478 , B01D2239/083 , B01J20/3223 , Y10T156/10
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for fabricating a filter structure. SOLUTION: The method for fabricating the filter structure comprises preparing a filtering net having mesh patterns, injecting an adhesive on the filtering net, and adhering refining materials to the filtering net coated with the adhesive. Here, the adhesive is injected to have a smaller size than an interval of the mesh patterns. The system for fabricating the filter structure comprises a filtering net, a filtering net transfer device for transferring the filtering net, and an adhesive injection device for injecting an adhesive solution on the filtering net. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于制造过滤器结构的方法和系统。解决方案：制造过滤器结构的方法包括制备具有网状图案的过滤网，在过滤网上注入粘合剂，并将精炼材料粘附到涂覆有粘合剂的过滤网上。这里，粘合剂被注入以具有比网状图案的间隔更小的尺寸。用于制造过滤器结构的系统包括过滤网，用于转移过滤网的过滤网转移装置，以及用于在过滤网上注入粘合剂溶液的粘合剂注入装置。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006017450A Grating panel, and clean room system including grating panel 审中-公开
标题翻译：磨砂面板和清洁室系统，包括磨砂面板
公开(公告)号：JP2006017450A
公开(公告)日：2006-01-19
申请号：JP2005182546
申请日：2005-06-22
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： HWANG JUNG-SUNG , CHO CHANG-MIN , YANG JAE-HYUN , CHON SANG-MOON , KIN SAIHO
IPC分类号： F24F7/06 , F24F13/08
CPC分类号： F24F13/068 , F24F3/161
摘要： PROBLEM TO BE SOLVED: To provide a grating panel and a clean room system including the grating panel.
SOLUTION: The grating panel 130 forming the floor surface of the clean room minimizes turbulent flow to improve the air exhaust rate. The grating panel 130 includes a base plate 132 having a plurality of perforations 134. Each perforation 134 includes an inflow section 136 into which air is made to flow and an exhaust section 138 from which air is made to flow. The cross section of the inflow section 136 reduces as it goes to the exhaust section. The cross section of the exhaust section 138 reduces as it goes to the inflow section.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供包括光栅面板的格栅面板和洁净室系统。解决方案：形成洁净室的地板表面的格栅板130将湍流最小化，以提高排气速率。格栅板130包括具有多个穿孔134的基板132.每个穿孔134包括使空气流动的流入部分136和使空气从其流动的排气部分138。流入部分136的横截面随着排放部分而减小。排气部138的横截面随着流入部而减少。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2008175393A Vibration control pedestal and its installation method 审中-公开
标题翻译：振动控制及其安装方法
公开(公告)号：JP2008175393A
公开(公告)日：2008-07-31
申请号：JP2008010912
申请日：2008-01-21
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： KIM SEOK-YOUN , HWANG JUNG-SUNG , LEE HO-YOUNG , KWUN DO-HYUN , HEO JUNG-SHIK
IPC分类号： F16F15/02 , H01L21/02
CPC分类号： F16F15/02 , H01L21/6719
摘要： PROBLEM TO BE SOLVED: To provide a vibration control pedestal for a semiconductor device and its installation method, which facilitates installation while reducing vibration and particles and allowing assembly and disassembly.
SOLUTION: The vibration control pedestal includes a device support body comprising at least two device support cells. A cell connecting unit penetrates the side faces of the device support cells so that the device support cells are connected to each other. A bottom part structure is provided in the lower part of the device support body to support the device support body. The installation method of the vibration control pedestal includes reducing particles carried out by vibration and air while moving the semiconductor device from one vibration control pedestal to the other vibration control pedestal.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于半导体器件的振动控制基座及其安装方法，其有利于安装，同时减少振动和颗粒并允许组装和拆卸。解决方案：振动控制基座包括装置支撑体，其包括至少两个装置支撑单元。单元连接单元穿透设备支撑单元的侧面，使得设备支撑单元彼此连接。底部结构设置在装置支撑体的下部以支撑装置支撑体。振动控制基座的安装方法包括在将半导体器件从一个振动控制基座移动到另一个振动控制基座的同时，通过振动和空气进行的还原颗粒。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008166817A Evacuation device, evacuation method and semiconductor manufacturing apparatus having evacuation device 审中-公开
标题翻译：排气装置，排气方法和具有排气装置的半导体制造装置
公开(公告)号：JP2008166817A
公开(公告)日：2008-07-17
申请号：JP2007339616
申请日：2007-12-28
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： KIM MOON-JEONG , AHN KANG-HO , KANG SUCK-HOON , RI SAIEI , SAI SAIKO , HWANG JUNG-SUNG
IPC分类号： H01L21/02
CPC分类号： F24F11/72 , F24F2110/40
摘要： PROBLEM TO BE SOLVED: To provide an evacuation device that prevents significant variations in the pressure, in a processing chamber due to the fluctuations in the atmospheric pressure. SOLUTION: According to the present invention, an evacuation device comprises a main evacuation line 100, a sub evacuation line 200, and a flap 320 for adjusting the aperture rate of an outlet for allowing fluid to flow from the sub evacuation line 200 to the main evacuation line 100. The fluid is adjusted through the main evacuation line 100 and the sub evacuation line 200, and the flap adjusts the aperture rate of the sub evacuation line in a power-off manner due to the fluctuation of the atmospheric pressure. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种排气装置，其能够防止由于大气压力的波动引起的处理室中的压力的显着变化。解决方案：根据本发明，排气装置包括主排空管线100，副排空管线200和用于调节出口的开口率的挡板320，用于允许流体从副排空管线200流出通过主排气管线100和副排气管线200调节流体，并且由于大气压力的波动，挡板以断电方式调节副排空管线的开口率。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2006019726A Wafer transport system and in-system pressure adjustment method 审中-公开
标题翻译： WAFER运输系统和系统内压力调整方法
公开(公告)号：JP2006019726A
公开(公告)日：2006-01-19
申请号：JP2005182539
申请日：2005-06-22
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： LEE SOO-WOONG , CHOI HYUNG-SEOK , HWANG JUNG-SUNG , CHOI SUNG-HWAN
IPC分类号： H01L21/677 , B65G49/00 , F24F7/06
摘要： PROBLEM TO BE SOLVED: To provide a wafer transport system that can decrease electric power consumption and eliminate nano-sized particles, and a method for adjusting pressure in the system. SOLUTION: A wafer transport system 40 includes a load port 100 for housing a wafer container 20, a housing 200 connected with the load port 100, a wafer transport 280 for transporting a wafer between the wafer container 20 and the housing 200, a wafer container sensor 330 for sense the presence of the wafer container 20 on the load port 100, a variable-speed fan 322 located in the first part of the housing 200, a variable exhaust unit 340 located in the second part facing the first part in the housing 200 which can change the evacuation rate of air evacuated from the housing 200, and a controller 360 that can operate the variable-speed fan 322 and the variable exhaust unit 340 in a variety manner, based on signals received from the wafer container sensor 330. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供可以降低电力消耗并消除纳米尺寸颗粒的晶片传送系统，以及用于调节系统中的压力的方法。解决方案：晶片传送系统40包括用于容纳晶片容器20的负载端口100，与负载端口100连接的壳体200，用于在晶片容器20和壳体200之间输送晶片的晶片传送器280，用于感测负载端口100上的晶片容器20的存在的晶片容器传感器330，位于壳体200的第一部分中的变速风扇322，位于与第一部分相对的第二部分中的可变排气单元340 在能够改变从壳体200排出的空气的排出速度的壳体200中，以及能够以各种方式操作变速风扇322和可变排气单元340的控制器360，其基于从晶片容器传感器330.版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2004228576A Substrate processing apparatus 审中-公开
公开(公告)号：JP2004228576A
公开(公告)日：2004-08-12
申请号：JP2004010378
申请日：2004-01-19
申请人： Samsung Electronics Co Ltd , 三星電子株式会社
发明人： HWANG JUNG-SUNG , RI KENKO , LEE SOO-WOONG
IPC分类号： B65G49/00 , C23C14/56 , H01L21/00 , H01L21/02 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67167 , C23C14/566 , H01L21/67017 , H01L21/67766
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for holding differential pressure between the pressure of a clean room and the internal pressure of a substrate transfer chamber constant.
SOLUTION: A differential gage 150 measures differential pressure between the internal pressure of a substrate transfer module 104 and a clean room, and a pressure adjusting unit 130 adjusts the internal pressure of the substrate transfer module 104 by the differential pressure. The pressure adjusting unit 130 comprises a base panel 132 having a plurality of first exhaust holes 132a for discharging clean air supplied from a fan filter unit 116 of the substrate transfer module 104, a movement panel 134 arranged in parallel to the base panel 132 and having a plurality of second exhaust holes 134a, and a drive portion 136 for moving the movement panel 134. A control unit 152 controls the drive portion 136 by the measured differential pressure, and moves the movement panel 134 for holding the differential pressure by a preset differential pressure.
COPYRIGHT: (C)2004,JPO&NCIPI

7. 发明专利

JPH11304671A METHOD AND SYSTEM FOR ANALYZING ENVIRONMENT INSIDE CLEAN CHAMBER 失效
公开(公告)号：JPH11304671A
公开(公告)日：1999-11-05
申请号：JP31189198
申请日：1998-11-02
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： YOU NAM-HEE , LEE SOON-YOUNG , HWANG JUNG-SUNG , KIN KOEI
IPC分类号： G01N15/00 , G01N1/00 , G01N1/22 , G01N1/34 , G01N30/02 , G01N30/08 , G01N30/88 , G01N33/00 , G01N33/18
摘要： PROBLEM TO BE SOLVED: To provide a method and system for analyzing environment inside a clean chamber wherein by condensing water vapor contained in the air, water- soluble contaminant contained in the condensed water is analyzed. SOLUTION: A condensing pipe 10 (condenser) wherein the sample air in a clean chamber is allowed to contact a cooling surface so that water-soluble contaminant contained in the sample air is condensed, and a conductivity measuring device 41 (analyzer) for analyzing condensed water provided from the condensing pipe 10, are provided. An environment analyzing method for the inside of the clean chamber comprises a condensing stage where the water vapor contained in the sample air is cooled to be condensed water, a supply stage wherein the condensed water is supplied to the analyzer, and an analyzing stage where the supplied condensed water is analyzed with the analyzer. Thus, collecting time for water-soluble contaminant is shortened for higher collecting efficiency and accuracy while no post-process operation is required with online analyzing operation allowed. In addition, concentration absolute value of water- soluble contaminant of different kind is analyzed.

8. 发明专利

JP2004037067A Clean air duct and device for providing air for clean room 有权
公开(公告)号：JP2004037067A
公开(公告)日：2004-02-05
申请号：JP2003027046
申请日：2003-02-04
申请人： Samsung Electronics Co Ltd , 三星電子株式会社
发明人： HWANG JUNG-SUNG , IM SUK-HEE , LIM CHANG-SU
IPC分类号： F24F13/28 , B01D50/00 , F24F3/16 , F24F7/06
CPC分类号： F24F3/161 , B01D50/00
摘要： PROBLEM TO BE SOLVED: To provide a clean air duct for a system for cleaning the air of a clean room appropriate for cleaning the air containing a large quantity of fine particles.
SOLUTION: The clean air duct 2 is arranged to transfer the filtered clean air from an air conditioner 300 to a lower end of the clean room, and the filtered clean air has a first concentration of the particles. Each particle filter 106 inside of the clean air duct 302 is positioned in rear of the air conditioning device and in front of the clean room. The clean air having the first concentration of particles is filtered by each filter 106 to supply the clean air having a second concentration of particles smaller than the first concentration of particles to the clean room.
COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2004311940A Substrate processing equipment capable of controlling contamination of substrate transferring module and its processing method 有权
公开(公告)号：JP2004311940A
公开(公告)日：2004-11-04
申请号：JP2003397403
申请日：2003-11-27
申请人： Samsung Electronics Co Ltd , 三星電子株式会社
发明人： HWANG JUNG-SUNG , KIM HYEOG-KI , KIN KITO , LEE SOO-WOONG , AHN YO-HAN
IPC分类号： H01L21/68 , B65G49/07 , H01L21/00 , H01L21/673 , H01L21/677
CPC分类号： H01L21/00 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing equipment capable of controlling contamination of a substrate transferring module and to provide its processing method.
SOLUTION: The substrate processing equipment is equipped with; a substrate transferring module 108 which has a load port 112a for supporting a container 106 to housing the substrate and includes a substrate transferring chamber 110 in which a robot, for transferring the substrate to the substrate processing section containing a process chamber for processing the substrate, is located inside; a gas feeding section 132 which supplies a cleaning gas to the substrate transferring chamber 110 to purge the inside; and a contamination controlling section 130 which includes a gas circulating tube 138 for recirculating the cleaning gas. The inside of the substrate transferring chamber is purged to remove humidity and contaminations, then the processed substrate is prevented from reacting with humidity and contaminations to produce condensed particles while waiting in the container.
COPYRIGHT: (C)2005,JPO&NCIPI

10. 发明专利

JP2002035640A GAS PURIFICATION SYSTEM 失效
公开(公告)号：JP2002035640A
公开(公告)日：2002-02-05
申请号：JP2001153054
申请日：2001-05-22
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： HWANG JUNG-SUNG , KIN DAGO , LEE SOON-YOUNG , SAI SAIKO
IPC分类号： F24F6/14 , A61L9/16 , A61L9/18 , B01D47/06 , B01D50/00 , B01D53/14 , B01D53/86 , B01D57/00 , B01J35/02 , B03C3/014 , B03C3/02 , B03C3/38 , B03C3/45 , B03C3/47 , B03C3/60
摘要： PROBLEM TO BE SOLVED: To provide a gas purification system capable of removing contaminants from a gas and obtaining a highly purified gas. SOLUTION: This gas purification system comprises a water showering system 110 used as a first unit for removing contaminants from a gas, and a contaminant collector 140 used as a second unit, which is placed downstream from the water showering system 110 and consists of electron emitting members each capable of emitting electrons from at least its surface with light rays such as visible rays or ultraviolet rays, or electric energy. Thus contaminants including water-soluble contaminants can primarily be removed by the water showering system 110 and contaminants including water-insoluble contaminants can be removed by the contaminant collector 140.

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