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    • 10. 发明专利
    • Method for forming carbon film, and method for manufacturing magnetic recording medium
    • 形成碳膜的方法和制造磁记录介质的方法
    • JP2010205323A
    • 2010-09-16
    • JP2009047970
    • 2009-03-02
    • Showa Denko Kk昭和電工株式会社
    • NAKAJIMA SATORUKATO JUNYA
    • G11B5/84C01B31/02C23C16/26
    • PROBLEM TO BE SOLVED: To provide a method for forming a dense carbon film with high hardness, while reducing the thickness of the carbon film.
      SOLUTION: In the method for forming the carbon film, a gas G which is a raw material containing carbon is introduced into a pressure-reduced film-forming chamber 101, the gas G is ionized with high frequency plasma, and the carbon films are formed on both surfaces of a substrate D by using the ions. The method for forming the carbon film includes: a first step where the substrate D is arranged in an accelerating space 108 in the film-forming chamber 101 including a plasma space 106 in which the raw material gas G is ionized with the high frequency plasma and the accelerating space 108 in which the ions are accelerated, which are consecutive, and the carbon film is formed on both surfaces of the substrate D in this state by using non-accelerated ions or accelerated ions; and a second step for forming the carbon film on both surfaces of the substrate D after the first step while reaction pressure is reduced in comparison with that in the first step and by using ions with acceleration higher than that in the first step.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种形成具有高硬度的致密碳膜的方法,同时减小碳膜的厚度。 解决方案:在形成碳膜的方法中,将作为含碳原料的气体G引入减压成膜室101中,气体G用高频等离子体离子化,碳 通过使用离子在基板D的两个表面上形成膜。 形成碳膜的方法包括:第一步骤,其中基板D布置在成膜室101中的加速空间108中,其包括等离子体空间106,原料气体G用高频等离子体离子化, 其中离子被加速的加速空间108是连续的,并且在该状态下通过使用非加速离子或加速离子在基底D的两个表面上形成碳膜; 以及在第一步骤之后在基板D的两个表面上形成碳膜的第二步骤,同时反应压力与第一步骤相比降低,并且通过使用比第一步骤中的加速度高的离子。 版权所有(C)2010,JPO&INPIT