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    • 1. 发明专利
    • PIEZOELECTRIC SINGLE CRYSTAL WAFER FOR PSEUDO-ELASTIC SURFACE WAVE DEVICE AND MANUFACTURE THEREOF
    • JP2000124520A
    • 2000-04-28
    • JP30478798
    • 1998-10-12
    • SHINETSU CHEMICAL CO
    • SHIONO YOSHIYUKIKUWABARA YOSHINORIRYUO TOSHIHIKO
    • H01L41/18
    • PROBLEM TO BE SOLVED: To provide a piezoelectric single crystal wafer for pseudo-elastic surface wave device, which is manufactured by a method wherein a pseudo-elastic surface wave device, which is not exerted the effect of bulk waves, can be manufactured, a warpage of the wafer is lessened, and the yield of the production of the wafer at the time of the production of the wafer is increased favorably. SOLUTION: In a method, wherein a piezoelectric single crystal wafer for pseudo- elastic surface wave device with the wafer surface, which is propagated with pseudo- elastic surface waves, and the wafer surface, whose mean surface roughness (Ra) is less than 0.30 μm, on the opposite side to the above wafer surface and a piezoelectric single crystal for pseudo-elastic surface wave device are fostered, this wafer is sliced to cut out the wafer and after that, the wafer is subjected to lapping and moreover, the surface of this wafer which is propagated with the pseudo-elastic surface waves, is mirror-polished to manufacture the piezoelectric single crystal wafer for pseudo- elastic surface wave device, and the wafer surface on the opposite side to the wafer surface propagated with the pseudo-elastic surface waves by the lapping is formed so that its mean surface roughness (Ra) becomes a roughness less than 0.30 μm.
    • 6. 发明专利
    • GARNET SINGLE CRYSTAL FILM AND MANUFACTURE THEREOF
    • JPH02232906A
    • 1990-09-14
    • JP5330789
    • 1989-03-06
    • SHINETSU CHEMICAL CO
    • RIYUUOU TOSHIHIKOKUWABARA YOSHINORITANJI MASAYUKI
    • C30B19/04C30B29/28H01F10/24H01F41/28
    • PURPOSE:To obtain an excellent magnetic film having no magnetoplumbite by a method wherein, after a metal oxide liquid solution has been maintained at saturation temperature or higher for a fixed period of time or longer, a garnet single crystal film is epitaxially grown using an LPE method. CONSTITUTION:The necessary of Y3Fe5O12 or (YMFe)8O12 [provided that M contains at least one element selected from La, Bi, Gd, Lu, Sm, Ca, Ge, Al, Sc and In] is laid in a platinum crucible together with a flux comprising PbO and B2P3, they are formed into a liquid solution at 900 to 1300 deg.C, and after it has been maintained for a fixed period of time, a gadolinium-gallium-garnet substrate is dipped therein, and a garnet single crystal film is epitaxially formed on the substrate. When crystal growth is started again using the residual solution, the residual solution is heated up to the saturation temperature or higher and this state is maintained for the predetermined period of time before the crystal growth is started again. Also, when new solution is added to the residual solution, the mixed solution is heated up to the saturation temperature or higher, and used after the lapse of the prescribed time. According to this constitution, a garnet single crystal film, having no deposition of magnetoplumbite and suitable for a magneto-optical element and the like, can be obtained easily.