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1. 发明专利

JP2002265788A HIGHLY DIELECTRIC, ADDITION-CURABLE COMPOSITION 失效
公开(公告)号：JP2002265788A
公开(公告)日：2002-09-18
申请号：JP2001071761
申请日：2001-03-14
申请人： SHINETSU CHEMICAL CO
发明人： KUDO MUNEO , YAMATANI MASAAKI
IPC分类号： C08L83/07 , C08F8/42 , C08L83/05 , C08L83/08
摘要： PROBLEM TO BE SOLVED: To obtain a highly dielectric, addition-curable composition which is in a liquid state and is therefore easily handled without any solvent, shows a low moisture-absorption, exerts an excellent film-forming property and forms a cured product exerting excellent dielectric properties with a large dielectric constant and a small dielectric loss. SOLUTION: This composition contains (a) an organopolysiloxane containing a cyanoalkyl group and a monovalent hydrocarbon group having an aliphatic unsaturated bond, (b) a cyanoalkyl group-containing organohydrogenpolysiloxane and (c) a platinum group metal-based catalyst.

2. 发明专利

JP2001214122A UNDERCOATING COMPOSITION AND COATING METHOD 失效
公开(公告)号：JP2001214122A
公开(公告)日：2001-08-07
申请号：JP2000027719
申请日：2000-02-04
申请人： SHINETSU CHEMICAL CO , TOYODA AUTOMATIC LOOM WORKS
发明人： KUDO MUNEO , YAMATANI MASAAKI , HIGUCHI KOICHI , KOMORI TAKASHI , SHIMO TOSHIHISA , KATO YOSHIFUMI
IPC分类号： B05D7/24 , C08F226/06 , C08J7/04 , C09D5/00 , C09D7/12 , C09D139/04 , C09D143/04 , C09D183/04
摘要： PROBLEM TO BE SOLVED: To provide an undercoating composition which forms a coating film capable of imparting excellent transparency, scratch resistance, weatherability, and chemical resistance to plastic articles, especially polycarbonate resin articles, and is suitable for outdoor applications such as windows and windshields of transporting machines (e.g. automobiles and airplanes) and sound insulation walls of roads. SOLUTION: This undercoating composition contains an alkoxy-group- containing organic copolymer which is formed from (A) a benzotriazole-based ultraviolet-absorbing vinyl monomer, (B) an alkoxysilyl-group-containing vinyl monomer, and (C) other copolymerizable monomers, the amount of monomer B copolymerized being 0.1-50 wt.% of the sum of all the monomers copolymerized.

3. 发明专利

JP2001194825A ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER EXTERNAL ADDITIVE 失效
公开(公告)号：JP2001194825A
公开(公告)日：2001-07-19
申请号：JP2000272172
申请日：2000-09-07
申请人： SHINETSU CHEMICAL CO
发明人： KUDO MUNEO , TANAKA MASAKI
IPC分类号： G03G9/08
摘要： PROBLEM TO BE SOLVED: To provide an external additive for toner which causes no reaction and no interaction with an organic photoreceptor and consequently causes no deterioration and no crack of the photoreceptor, which has excellent flowability and consequently causes no sticking of the toner to the photoreceptor and which has electrostatic chargeability independing on environmental condition. SOLUTION: The electrostatic charge image developing toner external additive is distinguished by being consisting of fine silica particles obtained by treatment of spherical hydrophobic fine silica particles which satisfies conditions (i) and (ii) described below, of which average grain size of primary particles is 0.01 to 5 μm, by a compound selected from a group composed of a quaternary ammonium salt compound, a floroalkyl group-containing betaine compound and a silicone oil. (i) When the fine silica particles are blended with an organic compound which is liquid at room temperature and has 1 to 40 F/m dielectric constant at 5:1 weight ratio and are shacked, the fine silica particles uniformly disperse into the organic compound. (ii) When the fine silica particles are kept at 100 deg.C for 2 hours after evaporating metyanol by an evaporator under heating from a dispersion obtained by dispersing the fine silica particles into methanol, ratio of primary particle quantity left as the primary particle to primary particle quantity present at first is >=20%.

4. 发明专利

JPH08291185A PRODUCTION OF MERCAPTOPROPYLALKOXYSILANE 失效
公开(公告)号：JPH08291185A
公开(公告)日：1996-11-05
申请号：JP30989595
申请日：1995-11-02
申请人： SHINETSU CHEMICAL CO
发明人： KUDO MUNEO , YANAGISAWA HIDEYOSHI , ICHINOHE SEIJI , YAMAMOTO AKIRA , BEPPU AKIRA , IWAKI HIROYUKI , SEKIZAWA SATOSHI
IPC分类号： C07F7/18
摘要： PURPOSE: To obtain a mercaptopropylalkoxysilane in a high yield under a mild condition, capable of suppressing the production of the by-product of a sulfide compound, and at the same time obtaining a by-product salt easily dealt with the waste treatment. CONSTITUTION: This mercaptopropylalkoxysilane is obtained by reacting 3- halopropylalkoxysilane expressed by the formula, X-(CH2 )3 -Si(OR)a R3-a (X is Cl or Br, R is methyl, ethyl or propyl group and may be either the same or different, (a) is an integer of 1, 2, 3) after reacting anhydrous sodium sulfide with hydrogen sulfide, or reacting a hydrogen sulfidized alkali metal with the 3-halopropylalkoxysilane expressed by the above formula in a hermetically sealed condition under a pressure in the presence of an excess hydrogen sulfide.

5. 发明专利

JPH04173794A PRODUCTION OF DIETHYLAMINOTRIMETHYLSILANE 失效
公开(公告)号：JPH04173794A
公开(公告)日：1992-06-22
申请号：JP30290890
申请日：1990-11-07
申请人： SHINETSU CHEMICAL CO
发明人： SHINOHARA NORIO , KUDO MUNEO , MATSUMURA KAZUYUKI , SUZUKI NOBUYUKI
IPC分类号： C07F7/10
摘要： PURPOSE:To obtain the subject compound useful as an electronic material such as primer for photoresist and obtain by-products in an efficiently utilizable state by reacting diethylamine with N,O-bis(trimethylsilyl)acetamide. CONSTITUTION:The objective compound is produced by reacting diethylamine with an N,O-bis(trimethylsilyl)acetamide of formula (X is H or F) preferably at an equivalent ratio of 1:(1.1-1.4) at 20-60 deg.C, optionally in the presence of a solvent such as benzene or THF. N-trimethylsilylacetamide or N- trimethylsilyltrifluoroacetamide produced as by-product can easily be converted to and reused as N,O-bis(trimethylsilyl)acetamide or N,O-bis(trimethylsilyl) trifluoroacetamide.

6. 发明专利

JPH044224A PURIFICATION OF POLYMER 失效
公开(公告)号：JPH044224A
公开(公告)日：1992-01-08
申请号：JP10502590
申请日：1990-04-20
申请人： SHINETSU CHEMICAL CO
发明人： SHINOHARA NORIO , SATO MAKOTO , KUDO MUNEO
IPC分类号： C08F6/08 , C08F6/00 , C08G77/04 , C08G77/32 , C08G77/34 , C08G85/00
摘要： PURPOSE:To obtain a silicone resin as an electronics material in high purity by dissolving a polymer containing water-soluble impurities in an organic solvent having a specific solubility in water and subsequently adding water to the solution. CONSTITUTION:An alkoxysilane is hydrolyzed and polymerized with e.g. sodium hydroxide and subsequently treated with HCl, etc., to prepare a silicone resin. The polymer is dissolved in an organic solvent such as a methyl acetate having a solubility of 0.1-40g in 100g of 20 deg.C water preferably in a concentration of 5-20wt.%. The solution is mixed with water, stirred and allowed to stand for separating the mixture into an oil layer and a water layer, followed by removing the water layer to provided the objective polymer.

7. 发明专利

JP2001194819A TONER EXTERNAL ADDITION AGENT FOR ELECTROSTATIC CHARGE IMAGE DEVELOPING 失效
公开(公告)号：JP2001194819A
公开(公告)日：2001-07-19
申请号：JP2000001084
申请日：2000-01-06
申请人： SHINETSU CHEMICAL CO
发明人： KUDO MUNEO , TANAKA MASAKI
IPC分类号： G03G9/08
摘要： PROBLEM TO BE SOLVED: To provide a toner external addition agent comprising silica fine particles which does not cause the deteriolation of a photoreceptor and the scraping because of no reaction or no interaction with an organic photoreceptor, does not produce toner sticking to the photoreceptor and a heating roll because of excellent flowability and affords the electrification independent of environments to the toner. SOLUTION: This toner external addition agent for electrostatic charge image developing comprises silica fine particles which are made by treating the surface of noncrystalline particular silica fine particles which have specific surface area of 5-50 m2/g and grain size distribution of 0.005-1 μm and are produced by a method of combustion in a flame by silicon oil.

8. 发明专利

JP2000330328A TONER EXTERIOR ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT 失效
公开(公告)号：JP2000330328A
公开(公告)日：2000-11-30
申请号：JP36931199
申请日：1999-12-27
申请人： SHINETSU CHEMICAL CO
发明人： KUDO MUNEO , TANAKA MASAKI , SAKAZUME KATSUAKI , ICHINOHE SEIJI , ASAI MITSUO
IPC分类号： C01B33/18 , G03G9/08 , G03G9/097
摘要： PROBLEM TO BE SOLVED: To provide an exterior additive for toner which does not generate reaction or interaction with an organic photoreceptor and thereby causes no deterioration and no cracking of the photoreceptor and which is excellent in fluidity and thereby does not generate adhesion of the toner onto the photoreceptor. SOLUTION: A toner exterior additive for electrostatic charge image development is composed of spherical hydrophobic silica fine particles which satisfies the conditions (i) and (ii) and in which average particle size of primary particles is 0.01 to 5 μ. (i) When silica based fine particles and an organic compound which is liquid at room temperature and has 1 to 40 F/m dielectric constant are blended at 1:5 weight ratio and are shaken, the silica based fine particles are uniformly dispersed in the organic compound; (ii) when methanol is evaporated with an evaporator under heating out of a dispersed liquid in which the silica based fine particles are dispersed in methanol and then the residue is held at 100 deg.C for two hours, ratio of quantity of primary particle remaining as the primary particles to quantity of primary particle present at first is >=20%.

9. 发明专利

JP2000264815A COSMETIC 失效
公开(公告)号：JP2000264815A
公开(公告)日：2000-09-26
申请号：JP7159899
申请日：1999-03-17
申请人： SHINETSU CHEMICAL CO
发明人： ICHINOHE SEIJI , KUDO MUNEO , YAMAMOTO AKIRA
IPC分类号： A61K8/19 , A61K8/00 , A61K8/04 , A61K8/18 , A61K8/25 , A61K9/16 , A61Q1/00 , A61Q1/02 , A61Q1/10 , A61Q1/12 , A61Q15/00 , A61Q19/10 , C01B33/18 , A61K7/02 , A61K7/00 , A61K7/032 , A61K7/035
摘要： PROBLEM TO BE SOLVED: To obtain a cosmetic improved in extensibility and feeling of inunction. SOLUTION: This cosmetic comprises further highly hydrophobized spherical hydrophobic silica microparticles having 0.01-5 μm average particle diameter and obtained by introducing R2SiO3/2 units (R2 denotes a 1-20C monovalent hydrocarbon group) into the surfaces of hydrophilic silica microparticles comprising SiO2 units and further introducing R13SiO1/2 units (R1 denotes a 1-6C monovalent hydrocarbon group of the same kind or a different kind) into the surfaces of the resultant hydrophobic microparticles.

10. 发明专利

JPH07173180A PRODUCTION OF HEXAMETHYLCYCLOTRISILAZANE 失效
公开(公告)号：JPH07173180A
公开(公告)日：1995-07-11
申请号：JP5448094
申请日：1994-02-28
申请人： SHINETSU CHEMICAL CO
发明人： SHINOHARA NORIO , YOKOO AKIO , KUDO MUNEO , IWABUCHI MOTOAKI , MATSUMURA KAZUYUKI
IPC分类号： C07B61/00 , C07F7/21
摘要： PURPOSE:To easily obtain hexamethylcyclotrisilazane in high yield using the by-product in the production process for this compound as raw material by heating octamethylcyclotetrasilazane in the presence of a Lewis acid. CONSTITUTION:This compound, hexamethylcyclotrisilazane, can be obtained by heating octamethylcyclotetrasilazane in the presence of a Lewis acid (pref. aluminum chloride or titanium chloride) or a sulfur oxide catalyst of the formula (M is Ca, Mg, etc.; R is OH, phenyl, etc.; x is 0-2; y and z are each 0-3; where, x and y are not zero at the same time) (pref. ammonium sulfate or benzenesulfonic acid) pref. at 120-170 deg.C in an inert atmosphere. For the reaction process, it is preferable that 1-5wt.% of the catalyst be added to the octamethylcyclotetrasilazane followed by cracking distillation using a distillation column under reduced or normal pressures for 1-5hr.

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