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1. 发明专利

JP2001305368A METHOD FOR PRODUCING OPTICAL WAVEGUIDE SUBSTRATE 失效
公开(公告)号：JP2001305368A
公开(公告)日：2001-10-31
申请号：JP2000120291
申请日：2000-04-21
申请人： SHINETSU CHEMICAL CO
发明人： MAKIKAWA SHINJI , AOI HIROSHI , SHIROTA MASAAKI , EJIMA MASAKI
IPC分类号： G02B6/13 , C30B33/00
摘要： PROBLEM TO BE SOLVED: To provide a method for producing high quality optical waveguide substrates with no stuck foreign matter particles on the surfaces by relatively thickly oxidizing the surfaces of silicon substrates. SOLUTION: In the method for producing optical waveguide substrates, silicon substrates 15 on which quartz films for optical waveguides are formed are set on a sample table 16 of carbon-containing ceramics and the table 16 is put in a core tube 18 of carbon-containing ceramics with a heating furnace 17 disposed around the periphery. When the interior of the core tube 18 attains to 200-600 deg.C by heating with the heating furnace 17, a gas which oxidizes the surface silicon of the silicon substrates 15 is introduced into the core tube 18 and the surface silicon is oxidized after heating to 1,200-1,350 deg.C.

2. 发明专利

JP2001247318A SYNTHESIZED SILICA GLASS OPTICAL MEMBER AHD METHOD FOR PRODUCING THE SAME 失效
公开(公告)号：JP2001247318A
公开(公告)日：2001-09-11
申请号：JP2000058810
申请日：2000-03-03
申请人： SHINETSU CHEMICAL CO
发明人： ABE ATSUSHI , MANTOKU NOBUYASU , MAKIKAWA SHINJI , EJIMA MASAKI
IPC分类号： G02B1/02 , C03B8/04 , C03B19/14 , C03B20/00 , C03C3/06 , C03C4/00 , C03C23/00
摘要： PROBLEM TO BE SOLVED: To obtain a synthesized silica glass member much excellent in laser radiation resistance as an ultraviolet ray-transparent optical glass by improving transmittance of a fluoridated synthesized silica glass in ultraviolet region and suppressing excimer laser light adsorption and fluorescence emission due to the laser, and to provide a method for producing the same. SOLUTION: This method for producing a synthesized silica glass optical member to be applied in irradiating laser beams of ultraviolet region is characterized by treating a porous silica glass body at high temperature in an atmosphere containing hydrogen or oxygen wherein the porous glass is obtained by flame hydrolysis of a glass forming material and, thereafter, heating and sintering the porous silica body to transparently vitrify it in an atmosphere containing fluorine.

3. 发明专利

JPH11109143A OPTICAL FIBER ADDED WITH RARE EARTH ELEMENT AND WIDE BAND OPTICAL FIBER AMPLIFIER USING IT 失效
公开(公告)号：JPH11109143A
公开(公告)日：1999-04-23
申请号：JP27449697
申请日：1997-10-07
申请人： HITACHI CABLE , SHINETSU CHEMICAL CO
发明人： IMOTO KATSUYUKI , NARITA YOSHIHIRO , EJIMA MASAKI , ABE ATSUSHI
IPC分类号： G02B6/00 , G02B6/036 , H01S3/06 , H01S3/10 , G02B6/22
摘要： PROBLEM TO BE SOLVED: To provide optical fiber added with rare earth elements which has high gain, wide band and low noise index characteristics, and is low in power consumption and cost, and to provide a wide band optical fiber amplifier using it. SOLUTION: A circular sectional clad 15 having a refractive index nc is provided with a first core 11 having a diameter D and a high refractive index n01 (n01 >nc ) and consisting of quartz glass (SiO2 ) to which erbium(Er), phosphor (P) and aluminum(Al) are co-added substantially in the center, a first intermediate layer 1 having a thickness S2 and a low refractive index nm1 (nm1 =n01 ) and consisting of quartz glass (SiO2 ) to which erbium(Er), aluminum(Al) and germanium(Ge) are co-added to the circumference of the first intermediate layer 12, and a second intermediate layer 14 having a thickness S2 and a low refractive index nm2 (nm2

4. 发明专利

JPH10251028A METHOD FOR REMOVING UNNECESSARY OXIDE GLASS FILM 失效
公开(公告)号：JPH10251028A
公开(公告)日：1998-09-22
申请号：JP7063997
申请日：1997-03-07
申请人： SHINETSU CHEMICAL CO
发明人： KONISHI SHIGERU , MAKIKAWA SHINJI , EJIMA MASAKI , KAMIYA KAZUO
IPC分类号： G02B6/13 , C03B8/04 , C03B19/14 , C03B20/00
摘要： PROBLEM TO BE SOLVED: To form a porous oxide glass film capable of easily and surely removing an oxide glass fine particle deposited on an unnecessary part except the surface of a substrate, uniform in film thickness and excellent in the surface condition in high yield. SOLUTION: At the time of blowing the oxide glass fine particle on the substrate placed on a table from an oxyhydrogen flame burner to deposit and removing the oxide glass fine particle deposited on the unnecessary part except the surface of the substrate, a fluorine compound is supplied to the burner and a flame containing hydrogen fluoride and water is applied to the oxide glass fine particle deposited on the unnecessary part from the burner.

5. 发明专利

JPH0935339A PRODUCTION OF OPTICAL DISK 失效
公开(公告)号：JPH0935339A
公开(公告)日：1997-02-07
申请号：JP17858995
申请日：1995-07-14
申请人： SHINETSU CHEMICAL CO
发明人： YAMAMURA KAZUICHI , SHIMIZU YOSHIMASA , EJIMA MASAKI
IPC分类号： G11B7/26
摘要： PROBLEM TO BE SOLVED: To obtain a process for producing thin films of aluminum allay reflection films which are uniform in a film thickness distribution and do not cause defects in the films by forming a target material of a sintered compact of an aluminum alloy or a sintered compact of a metallic powder mixture contg. aluminum. SOLUTION: The target 1 consisting of the sintered compact of the aluminum alloy or the sintered compact of the metallic powder mixture contg. the aluminum is fixed to a backing plate 2 facing a glass substrate 3 and a magnet 4 rotatable by a motor 5 is arranged on the rear surface of the backing plate 2. The angle distribution of the particles to be sputtered flying from the target 1 is made uniform if only the magnet 4 is rotated by the motor 5 and film formation is executed by a sputtering method. The uniformity of the thickness of the films adhered on the glass substrate 3 is then made uniform and the occurrence of the defects in the films is prevented. As a result, the process for producing the thin films of the aluminum alloy reflection films which makes the film thickness distribution uniform and obviates the occurrence of the defects in the films is obtd.

6. 发明专利

JPH08221830A PRODUCTION OF MAGNETO-OPTICAL DISK 失效
公开(公告)号：JPH08221830A
公开(公告)日：1996-08-30
申请号：JP2700495
申请日：1995-02-15
申请人： SHINETSU CHEMICAL CO
发明人： EJIMA MASAKI , YAMAMURA KAZUICHI , SHIMIZU YOSHIMASA , TAMURA KAZUYOSHI , KOBAYASHI TOSHIMI , FUKUSHIMA CHIKAYASU
IPC分类号： G11B11/10 , G11B11/105
摘要： PURPOSE: To suppress the occurrence of defects of magneto-optical disks by repetitive use as masks and to improve yield by executing attachment and detachment of these masks in a vacuum within a film forming device by sputtering. CONSTITUTION: The vacuum degree in a vacuum chamber 101 may be of a known value and is specified to, for example, 10 Torr. Disk substrates 105 carried by cassettes 112 through a load locking chamber (non shown in Fig.) and gate value 107a into the vacuum chamber 101 are ejected up by a vertical lifting and ejecting section 113 of a vertical lifting mechanism 114. The substrates 105 are ejected up by the vertical lifting and ejecting mechanism 113 up to the height of a mask attaching and detaching mechanism 111 which attracts an inner peripheral mask 106 and an outer peripheral mask 104 by electromagnets. The mask attaching and detaching mechanism 111 advances to transfer the disk substrates 105 onto a holder 103 where the inner peripheral masks 105 and the outer peripheral masks 104 are mounted on the disk substrate 105. The damage of the disk substrates 105 by the heat accumulated in the masks is prevented, the occurrence of the defects of the magneto-optical disks is suppressed and the yield is improved.

7. 发明专利

JPH08193264A METHOD FOR COOLING TARGET 失效
公开(公告)号：JPH08193264A
公开(公告)日：1996-07-30
申请号：JP379295
申请日：1995-01-13
申请人： SHINETSU CHEMICAL CO
发明人： EJIMA MASAKI
IPC分类号： C23C14/34
摘要： PURPOSE: To prevent the release and cracking of a target by allowing a refrigerant at a specified temp. to flow on the rear of the copper backing plate to which the target is fixed by metal bonding to remove the heat of the target. CONSTITUTION: A plasma ion is struck against a target 101 to form a thin film 120 on a substrate 114. Since the target 101 is heated to a high temp. by the plasma ion, the target 101 is cooled with a refrigerant 103 through a copper backing plate 102. The refrigerant 103 is controlled to

8. 发明专利

JPH0620321A PRODUCTION OF MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPH0620321A
公开(公告)日：1994-01-28
申请号：JP19784592
申请日：1992-07-01
申请人： SHINETSU CHEMICAL CO
发明人： EJIMA MASAKI , TAWARA YOSHIO , YAMAMURA KAZUICHI , SHIMIZU YOSHIMASA , SAKAGUCHI ARATA
IPC分类号： C23C14/06 , C23C14/34 , G11B5/85 , G11B5/851 , G11B11/10 , G11B11/105
摘要： PURPOSE:To improve productivity and to save space and manpower by executing a process of successively and continuously forming various kinds of laminated films by sputtering in a single vacuum chamber and using a common gaseous kind. CONSTITUTION:Six sheets of disk substrates 5 are put into a cassette 6 and are sent into a load locking chamber 2 by opening a gate valve 4a. After this load locking chamber 2 is vacuum evacuated, the substrates are set into the loading part of a vacuum chamber 1. One sheet of the disk substrates 1 is taken out of this part and is transferred into a transfer part 13. Disk holders constituted of five pieces are rotated stepwise by 72 deg. each at every cycle time in a direction (b) shown in Fig. The SiN film of the first layer is formed by sputtering in a first process section 9, the TiFeCo film of the second layer in the second process section 10, the Sin film of the third layer in the third process section 11 and the Al film in the fourth process section 12, respectively. After finishing the film formation, the substrates are transferred and housed into the cassette 6 from the transfer part 13 and are taken out to the arm. through an unload locking chamber.

9. 发明专利

JPH05230641A MANUFACTURE OF THIN FILM 失效
公开(公告)号：JPH05230641A
公开(公告)日：1993-09-07
申请号：JP6921692
申请日：1992-02-18
申请人： SHINETSU CHEMICAL CO
发明人： EJIMA MASAKI , FUKUDA KUNIO , YOSHIDA IKUO , YAMAMURA KAZUICHI , SAKAGUCHI ARATA , TAWARA YOSHIO
IPC分类号： C23C16/50 , C23C14/00 , C23C14/34 , C23F4/00
摘要： PURPOSE:To provide the method for manufacturing a thin film by which the sticking of dust to a thin film is prevented at the time of manufacturing a thin film by using discharge plasma. CONSTITUTION:The manufacturing a thin film is characterized, in the method for manufacturing a thin film by using discharge plasma, by using a main discharge chamber and a secondary discharge chamber and executing the manufacture of a thin film by the working of the main discharge chamber as well as by working the secondary discharge chamber prior to the completion of the formation of the thin film and stopping the working of the main discharge chamber.

10. 发明专利

JPH04182955A FILM FORMING DEVICE FOR MAGNETO-OPTICAL RECORDING MEDIUM AND PRODUCTION OF MAGNETO-OPTICAL RECORDING MEDIUM 失效
公开(公告)号：JPH04182955A
公开(公告)日：1992-06-30
申请号：JP31318690
申请日：1990-11-19
申请人： SHINETSU CHEMICAL CO
发明人： TAWARA YOSHIO , SAKAGUCHI ARATA , EJIMA MASAKI
IPC分类号： C23C14/34 , G11B11/10 , G11B11/105
摘要： PURPOSE:To improve the film quality by specifying the amt. of the gas leaking into each sputtering chamber to Torr.l/sec, and further by specifying the amt. of the gas released into chamber and the amt. of residual moisture. CONSTITUTION:The amt. of the gas leaking into the film forming chamber is specified to Torr.l/sec. Further, the amt. of the gas released into the chamber is specified at Torr.l/sec and the amt. of the residual moisture in the chamber to dew point -40 deg.C (100ppm) or below, by which the ultimate vacuum degree is specified to be Torr. Namely, a dielectric film, a magnetic film and a reflection film are formed by a sputtering method by using such film forming device. All of the resulted dielectric film, the magnetic film and the reflection film are improved in film quality in this way. The magneto-optical recording medium having excellent recording and reproducing characteristics and the reliability high over a long period of time is easily obtd. in this way.

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